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Nanofabrication and Its Impact on Sensor Manufacturing2017-09-08

Nanofabrication and Its Impact on Sensor Manufacturing, 2017-09-08 - © Obducat 2017 CONFIDENTIAL

The context of Smart City and IoT


Artifical Intelligence drivning the need for new smart devices

2000 2010 2016

PC Era

Mobile Era

AI Era

Encompasses:Internet of ThingsAutonumos VechiclesBig DataCloudAR/VR


How does Smart City developments affect capitalequipment industry?

Explosion of data generationA smart city of 1 million people will generate 200 million GB of data per day by 2020.Majority of data will be generated by new categories of smart devices.

Social media and

Others

2 M

GB/daySmart Airplanes

4 M

GB/day

Smart Vehicles

40 M

GB/day

Smart Factories

50 M

GB/day

Public Safety

Systems

50 M

GB/day

Smart Buildings

55 M

GB/day


Key drivers generating need for new capabilities from capital equipment industry

• Exponential data growth

• Cloud analytics

• Wearable devices

• Network communications

• Automotive AI

• Industry IoT



What are the consequences of the new device needs?

• Historically most new process generations have been developed by using same materials but reduced size – now material development has to be integrated into the development programs.

• Development cycles increase in time – more difficult to predict development time and thereby time-to-market.

• Interdisciplinary approach will be required to a larger extent as well as borrow fabrication technologies and approach from other areas within the electronics industry.



Smart Module

Embedded chips

Modules

Wireless components

Senors/cameras

Communication device

Obducat’s position in the Smart Devices value chain

Substrate and materials suppliers

Lithography processing unit

Metallization processing unit

Chemical Mechanical Polishing

These processes are repeated many times depending on number of layers in the component

Inspection

and QA

Final component

assembly

Substrate cleaning and preparation

Resist application

Patterning process

Develop Etch Lift off

Wet processing equipment

Coating equipment;

Spin, spray, slit, inkjet etc

Lithography equipment;NIL

Wet processing equipment

Obducat processes


Obducat Group Overview


History

1989 Company is founded, aiming at replacing LBR mastering technology with EBR

1996 Development of Nano Imprint begins together with LTH

1999 Soft Press Key Imprint technology is Patented by Obducat

2000 The first NIL system is sold

2002 First Asian orders for NIL and first NIL into Semiconductor area

2004 Completed the development of process concept for mass-production

2005 IPS® and STU ® introduced on the market

2006 Breakthrough order for NIL production system, LG and Samsung launchesproducts with “Obducat Inside”

2008 Sold the first SINDRE ® 400 fully automated system for LED production

2013 Sold the first SINDRE ® production system for BIO applications to Kimberly-Clark

2013 Launched UV based NIL process for mass-production

2014 Launched and sold SINDRE ® 400 Gen2 system with UV based process

2016 Launch of EITRE ® Large Area

2015 Acquisition of solar-semi Gmbh

2008 Sold NIL system to Sony

2009 Sold NIL system to Toshiba


Business model

Obducat´s business concept is to develop and supply NIL and lithography processing solutions for production and replication of advanced micro- and nano structures for mass production as well as for R&D purposes.

The company’s revenues sources encompass Equipment, Consumables, Stampers, Services (Maintenance, Process optimization).

The company focuses on offering the most competitive Cost of Ownership

Key customers / Partners

Toshiba

Kimberly-Clark

LG

Hamamatsu Photonics

Sony

ST Microelectronics

NASA

NEC

Sumitomo

Infineon

First sensor

Flir

And others world leading companies under NDA

Obducat is the leading company in the lithography processing and nano imprint lithography (“NIL”) field

Obducat has established a world leading position in the market of lithography with an installation base far exceeding any competitor within NIL

More than 450 customer installations world-wide

More than 200 patent applications of which 168 granted patents

Organization of 55 employees

Facility space of 1800m2 including 150m2 Class 10/100 cleanroom

Publicly listed on Nordic Growth Market stock exchange in Sweden with approx. 10 000 shareholders (www.ngm.se)

The company

Obducat Overview

General presentation, 2017 - © Obducat 2017 CONFIDENTIAL

Obducat AB - Sales

- R&D

- Manufacturing

- Administration

Obducat China (in

collaboration with Business Sweden )

Obducat Japan (in

collaboration with APPEX Corp)

Distributor S. Korea

TricomtekDistributor Indien

EdgetechDistributor Israel

AVBA

Distributor Singapore, Malyasia and Thailand

LMS Technologies

Obducat Europe GmbH - Sales

- R&D

- Manufacturing

- Administration

Obducat

sales UK

Obducat North

America Inc

Obducat sales France

Obducat Asia Ltd

Obducat Overview


Obducat NIL technology


All our NIL systems are based on the patented Soft Press® Technology.

Air Pressure parallelism thin and uniform residual layer!

How does Obducat NIL work?

•Independent of stamp & substrate thickness variations, bow or waviness

•Any resist thickness

•High Imprint depth uniformity

•Homogenous pressure distribution

Always full area imprint in one shot!

Possible to print on curved surfaces!


Obducat Group Product Portfolio


Utilizing the proprietary technology developed in-house and the knowledge gained from application development projects the last 20 years, Obducat can offer the most comprehensive range of lithography solutions and application support for Nano and Micro patterning in the market.

Product overview – Nano Imprint Equipment

EITRE-Line

Manual R&D tools

Stand-alone

Nanoimprinters

- Eitre® 3”

- Eitre® 6”

- Eitre® 8” (8” x 8”)

EITRE-Line Large Substrates

Semiautomatic systems

NIL tool for Display standard sizes up

to Gen 2. Suitable for both Thermal,

UV and STU processes. Semi-

automatic imprint process

– up to GEN 2 size

SINDRE-Line

Fully automated systems

Production systems with throughput

~60wph (LED) and cassette handling

- Imprint size 4” – 8” wafers

- Other sizes and applications upon

request including > Display Sizes Gen 5

Consumables

Master stamps

Silicon, Quartz & Nickel

IPS ® and STU ® materials

Polymer and resist materials

with various characteristics that

can be tailored for specific

applications


Obducat also offer a wide range of fully automatic and semiautomatic wet processing equipment solutions.

Applications

Product overview – Coating and wet-processing

• Priming• Spin coating

(open bowl or RccT)

• Spray coating• Baking• Developing

• Lift-off• Stripping

• Etching• Cleaning• Post CMP cleaning

EL-Line (easyline)

Manual lab spinner

module

– up to Ø8” (Ø200 mm)

QS-Line (quickstep) Large Substrates

Semiautomatic systems

Stand-alone spin-coater, spray-coater,

developer, wet-process spinner, hot-,

cool & HMDS-plates – manual or full

automatic robotic system

– up to GEN 5 size

QS-Line (quickstep)

Bench mounted & stand-alone

spin-coater, spray-coater,

developer, wet-process

spinner, hot-, cool & HMDS-

plates for low volume

production

– up to Ø12” (Ø300 mm)

MC-Line (microcluster)

Fully automatic production systems

Consisting of platforms with robot

handling and all lithography processes

from coating, baking to development

and cleaning application


Obducat Overview –Application Areas


Micro/Nano Fluidics

50 nm Half-Pitch Aluminum Pattern

Display Components

Nano Wire Grid Polarizer for micro display and optical communication components.

High Density Interconnects

3D via imprinted using IPS®-STU®

process.

MEMS/NEMS Devices

The versatile NIMBLe NEMS device consisting of fingers electrically coupled in pairs.

Optical Components

3-dimensional optical lens structures for application in optical sensors, CMOS etc.

Obducat Overview – Application Areas

Life science

Micro needle array with nanotextured surface and cantilever for ultra low masses.

Etched micro-PSS substrate made with SINDRE 400

LED Micro/Nano Fluidics

100 nm fluidic device for DNA-analysis.


Optical Applications


Pseudo-Mangin Mirror seeker for MBDA Missile systems UK

Sony nano AR produced with Obducat NIL-technology

Optical components – Applications

• Patterning of lenses for images sensors

• Manufacturing of DFB lasers

• Reflective and diffractive patterns

• Photonic devices

• Plasmonic devices

• Light guides


Life science applications


Obducat supplied the pilot production line to Kimberly-Clark for manufacturing of the drug delivery devices in Q4 2013.

Problems with regards to maintaining the efficiency level of delivered drug and avoidance of foreign body and immune response can be inhibited by mimicking the cell structure (biomimetics).

Life Science – Application Nanostructured TDD


Display Application


Displays

The LCD infrastructure allows for scale up to large substrate manufacturing enabelling cost reduction

Three areas where NIL can create improvements

• Polarizer

• Color filters

• TFTs

The benefits are;

• Improved image quality

• Improved light transmission

• Lower power consumption

• Extended battery lifetime

• Reduced costs

• Thinner displays


How can Sensor Manufacturing benefit from nanofabrication

methods


How can sensor manufacturing benefit fromnanofabrication methods?

• Component size reduction

• Manufacturing cost reduction

• Ultra low power consumption – communication devices need to be shrunk to reduce power consumption

• Super hydrophobicity surfaces for sensors – low cost nanostructuring to improve sensor functionality and reliability

• Some applications requires the use of e.g. coating by use of shadow mask for selective deposition as alternative to inkjet – need for nano level means nano masks which can be produced cost effectively by NIL

• Selective area coating and nano patterning – substrate surface un-uniformity no problem for NIL compared to traditional litho where focus depth will limit

• Large substrate processing capabilities – enable switch from semi production infrastructure to LCD infrastructure but at the same time maintain possibility for sub-micron resolution


How can sensor manufacturing benefit fromnanofabrication methods?

• Currently new developments ongoing to include climate controlled substrate chambers to enable the processing of novel materials

• Substrate bow from pre-processing – NIL conformity eliminates limitations from this problem

• Extreme high frequency applications – need for 3D patterning for antenna fabrication and integration into small devices

• Patterning of lenses for better optical performance

• Local power generation – PZT with low defectivity

• Possibility of reduction of solar-cell size and thickness without loosing to much performance through the use of low cost nanofabriction – enables integration into smart devices and sensors


Thank You for Your attention

Patrik Lundström

Obducat AB (publ)

[email protected]

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