Metal Oxide Nanoparticles
no-title
Review
Sidorkin,.Domain.structure.in.Ferroelectrics.and.Related
Physical Processes at the Metal-Semiconductor Interface
mos capacitor
mos,mosfet's,mesfet's
etd
Modeling and Simulation TWG Hsinchu Dec. 6, 2000 1 Modeling and Simulation TWG Paco Leon, Intel International TWG Members: I. Bork, Infineon E. Hall, Motorola.
24 July 2002 Work In Progress – Not for Publication Modeling and Simulation ITWG Jürgen Lorenz - FhG-IISB ITWG/TWG Members H. Jaouen, STM * W. Molzer,
Modeling and Simulation ITWG Tokyo, December 4, 2002 Modeling and Simulation ITWG Jürgen Lorenz - FhG-IISB ITWG/TWG Members H. Jaouen, STM * W. Molzer,
1 Silicon on Insulator MOSFET Technology: Design and Evolution of the Modern SOI Fully-depleted MOSFET Presented By: Aniket A. Breed/ Dr. Marc Cahay Department.
