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Page 1: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Fabrication process validation for a double sided Silicon pixel detector.

F. Quarati, S. Cadeddu, A. Lai

A. Sesselego, M. Caria

Physics Dep., University of Cagliari, ItalyPhysics and Astronomy Dep., University of

Glasgow, United Kingdom

Page 2: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Detector features and measurements equipment

• High resistivity n-type silicon bulk wafer

• Boron implantation • 3 detector for each wafer • Detector area 2.8 x 3.8 cm2

• No. of pixes 16512 [IWORID 2001]

• Probe station K .Suss• Keithley 237 source meter• Keithley 2400 source meter• Keithley 590 CV analyzer• Deuterium lamp

Hamamatsu• Monochromator Y. Jobin

Processed at COLIBRISNeuchatel, Switzerland

Page 3: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Characteristics of the standard detector:

responsivity

• The slope is regular after 5 V of bias

-20

-15

-10

-5

0

5

10

15

-1 4 9 14 19 24

bias [V]

Signal [nA]

dark

UV radiation

Page 4: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Characteristics of the standard detector:depletion

• The depletion begin at low bias

0,5

0,6

0,7

0,8

0 5 10 15 20 25

bias [V]

capa

city

[pF

]

1cost V+

Page 5: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Characteristics of the standard detector:

single pixel depletion

• The CV is reached biasing all the detector

0,05

0,1

0,15

0 5 10 15 20 25

bias [V]

capa

city

[pF

]

1cost V+

Page 6: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Validation examples with collected signal (UV-dark)

• The graf. show the current value difference between UV - dark

4,5

5,5

6,5

7,5

8,5

0 5 10 15 20 25bias [V]

current [nA]

STD

bad

good

bad: swing

Page 7: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Complete validation with CV charac.

• The CV comparison provide that the deplation condition is also well satisfy

0,5

0,6

0,7

0,8

0 5 10 15 20 25

bias [V]

capa

city

[pF

] STD detector &previous good detector

Page 8: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

The validation of the production process

• 24 wafer or 72 detector are been processed

• 1 wafer present C.C. for all the 3 detector

2 wafer present high noise for all 3 detector

That is 13%• 8 detector present high

noise That is 11%• 3 detector present

swing That is 4%• 21 wafer and 52

efficient detectors

72%

11%

4%

13%

detector pie

Page 9: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.

Further work

• Fit with the exponential addition is better

0,5

0,6

0,7

0,8

0 5 10 15 20 25bias [V]

capacity [pF]

2 0.0003c =

2 0.0005c =

2

1

cost1cost

VeV

-µ +

+

Page 10: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.
Page 11: Fabrication process validation for a double sided Silicon pixel detector. F. Quarati, S. Cadeddu, A. Lai A. Sesselego, M. Caria Physics Dep., University.