Thermal Probe Nanopatterning Enables Nanoparticle · PDF file4 times PDMS replication (Error...
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Meniscus motion Henry S.C. Yu, Samuel T. Zimmermann, Juergen Brugger Microsystems Laboratory - École Polytechnique Fédérale de Lausanne (EPFL) - lmis1.epfl.ch Henry S.C. Yu ([email protected]), École Polytechnique Fédérale de Lausanne STI IMT LMIS1, Bâtiment BM Station 17, CH-1015 Lausanne, Switzerland Summary References 1 Fan, J. A. et al., Science 328 (2010) 1135-1138 2 Kraus, T. et al., Nature Nanotechnology 2 (2007) 570-576 3 Flauraud, V. et al., Nature Nanotechnology 12 (2017) 73-80 4 Sheikholeslami, S. et al., Nano Letters 10 (2010) 2655-2660 5 Knoll, A.W. et al., Advanced Materials 22 (2010) 3361-3365 Thermal Probe Nanopatterning Enables Nanoparticle Assembly on PDMS Substrates In this work, we demonstrate: A method of pattern transfer from thermal probe nanopatterning to polydimethylsiloxane (PDMS) The repeatibility of this pattern transfer method The capillary-assisted particle assembly (CAPA) on PDMS after pattern transfer Gold nano-rods assembly D: 40 nm L: 100 nm SPR peak: 700 nm 10:1 PDMS/curing agent 30 minutes degass 70 o C curing for 1.5 hour Peel-off by hand Thermal scanning probe nanopatterning Pattern replication on PDMS Capillary-asstisted particle assembly on patterned PDMS Meniscus motion poly-phthalaldehyde (PPA) Heat ~μs V Evaporated Repeatibility of pattern transfer to PDMS Capillary assisted nano-rods assembly on PDMS 500 nm -60 nm 11 nm 1 µm 11 nm -79 nm 1 µm -26 nm 75 nm The surface roughness of 500 x 500 nm 2 area above the initial writing on PPA is still smaller than 2.5 nm after 4 times PDMS replication PPA surface roughness (500 x 500 nm 2 ) PPA pattern depth/PDMS pattern height Roughness measurement The structure depth of the initial writing on PPA keeps the same level after 4 times PDMS replication (Error bar here is +/-1σ) Depth/height measurement: "E" & "1" AFM image of thermal scanning probe initial writing on PPA AFM image of new writing on the same PPA chip after 4 times PDMS replication. The thermal scanning probe nanopatterning still works well AFM image of the 4 th PDMS replication. The replication still works well (a)(b) AFM image of linear traps patterned on PPA and PDMS respectively. (c) PPA profile of deep trap (FWHM/height: 191nm/45nm) and shallow trap (FWHM/height: 82nm/45nm). (d) PDMS profile of deep trap (FWHM/depth: 180nm/41nm) and shallow trap (FWHM/depth: 68nm/26nm). Meniscus motion a b Images of Au nano-rods assembled by CAPA on PDMS: (a) In the dark field optical microscope image, the bright red dots are the light scattered by Au nano-rods, indicating they are trapped only at deep zone. (b) In the AFM image, Au nano-rods are trapped at the boundary of shallow and deep zones, where both the trap depth and width vary. Trap (a) AFM 3D image of hoofs- like trap design. (b) The red dots in the dark field optical microscope image indicate trapped Au nano-rods. The CAPA yield is higher with this design but multiple rods are trapped in a single trap as shown in the AFM 3D image. Backwall profile(µm) 125 nm Sidewall profile(µm) 65 nm Multiple Au rods a b 0.61 1.13 1.22 1.97 1.77 0.76 1.55 1.54 2.29 2.26 0.0 0.5 1.0 1.5 2.0 2.5 3.0 Initial writing After 1ˢᵗ replication After 2ⁿᵈ replication After 3ʳᵈ replication After 4ᵗʰ replication Surface roughness (nm) Ra Rq 40 45 50 55 60 65 70 Initial writing After 1ˢᵗ replication After 2ⁿᵈ replication After 3ʳᵈ replication After 4ᵗʰ replication Depth/height (nm) PPA-"E" PDMS-"E" PPA-"1" PDMS-"1"
Transcript of Thermal Probe Nanopatterning Enables Nanoparticle · PDF file4 times PDMS replication (Error...
Meniscus motion
Henry S.C. Yu, Samuel T. Zimmermann, Juergen BruggerMicrosystems Laboratory - École Polytechnique Fédérale de Lausanne (EPFL) - lmis1.epfl.ch
Henry S.C. Yu ([email protected]), École Polytechnique Fédérale de Lausanne STI IMT LMIS1, Bâtiment BM Station 17, CH-1015 Lausanne, Switzerland
200 250 300
Summary
References1 Fan, J. A. et al., Science 328 (2010) 1135-11382 Kraus, T. et al., Nature Nanotechnology 2 (2007) 570-576 3 Flauraud, V. et al., Nature Nanotechnology 12 (2017) 73-804 Sheikholeslami, S. et al., Nano Letters 10 (2010) 2655-26605 Knoll, A.W. et al., Advanced Materials 22 (2010) 3361-3365
Thermal Probe Nanopatterning Enables Nanoparticle Assembly on PDMS Substrates
In this work, we demonstrate:A method of pattern transfer from thermal probe nanopatterning to polydimethylsiloxane (PDMS)The repeatibility of this pattern transfer methodThe capillary-assisted particle assembly (CAPA) on PDMS after pattern transfer
Gold nano-rods assembly
D: 40 nm
L: 100 nm
SPR peak: 700 nm
10:1 PDMS/curing agent
30 minutes degass
70 oC curing for 1.5 hour
Peel-off by hand
Thermal scanning probe nanopatterning
Pattern replication on PDMS Capillary-asstisted particle assembly on patterned PDMS
Meniscus motion
poly-phthalaldehyde (PPA)
Heat~μs
V
Evaporated
Repeatibility of pattern transfer to PDMS
Capillary assisted nano-rods assembly on PDMS
500 nm-60 nm
11 nm
1 µm
11 nm
-79 nm
1 µm-26 nm
75 nm
The surface roughness of
500 x 500 nm2 area
above the initial writing
on PPA is still smaller
than 2.5 nm after 4 times
PDMS replication
PPA surface roughness (500 x 500 nm2)
PPA pattern depth/PDMS pattern height
Roughness measurement
The structure depth of the
initial writing on PPA
keeps the same level after
4 times PDMS replication
(Error bar here is +/-1σ)
Depth/height measurement: "E" & "1"
AFM image of thermal
scanning probe initial
writing on PPA
AFM image of new writing on the same PPA chip after 4 times PDMS replication. The thermal scanning probe nanopatterning still works well
AFM image of the 4th
PDMS replication. The
replication still works
well
(a)(b) AFM image of linear traps patterned on PPA and PDMS respectively. (c) PPA profile of deep trap (FWHM/height: 191nm/45nm) and shallow trap (FWHM/height: 82nm/45nm). (d) PDMS profile of deep trap (FWHM/depth: 180nm/41nm) and shallow trap (FWHM/depth: 68nm/26nm).
Meniscus motion
a b
Images of Au nano-rods assembled by CAPA on PDMS: (a) In the dark field optical microscope image, the bright red dots are the light scattered by Au nano-rods, indicating they are trapped only at deep zone. (b) In the AFM image, Au nano-rods are trapped at the boundary of shallow and deep zones, where both the trap depth and width vary.
Trap
(a) AFM 3D image of hoofs-like trap design. (b) The red dots in the dark field optical microscope image indicate trapped Au nano-rods.The CAPA yield is higher with this design but multiple rods are trapped in a single trap as shown in the AFM 3D image.
Backwall profile(µm)
125 nm
Sidewall profile(µm)
65 nm
Multiple Au rodsa
b
0.61
1.131.22
1.971.77
0.76
1.55 1.54
2.29 2.26
0.0
0.5
1.0
1.5
2.0
2.5
3.0
Initial writing After 1ˢᵗ replication
After 2ⁿᵈ replication
After 3ʳᵈ replication
After 4ᵗʰ replication
Sur
face
rou
ghn
ess
(nm
)
Ra
Rq
40
45
50
55
60
65
70
Initial writing After 1ˢᵗ replication
After 2ⁿᵈ replication
After 3ʳᵈ replication
After 4ᵗʰ replication
Dep
th/h
eig
ht (
nm)
PPA-"E"
PDMS-"E"
PPA-"1"
PDMS-"1"
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