Growth, Structure and Pattern Formation for Thin Films Lecture 1. Growth of Thin Films

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U Tenn, 4/28/2007 1 Growth, Structure and Pattern Formation for Thin Films Lecture 1. Growth of Thin Films Russel Caflisch Mathematics Department Materials Science and Engineering Department UCLA www.math.ucla.edu/~material

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Growth, Structure and Pattern Formation for Thin Films Lecture 1. Growth of Thin Films. Russel Caflisch Mathematics Department Materials Science and Engineering Department UCLA. www.math.ucla.edu/~material. Outline. Epitaxial Growth molecular beam epitaxy (MBE) Step edges and islands - PowerPoint PPT Presentation

Transcript of Growth, Structure and Pattern Formation for Thin Films Lecture 1. Growth of Thin Films

Page 1: Growth, Structure and Pattern Formation  for Thin Films Lecture 1. Growth of Thin Films

U Tenn, 4/28/20071

Growth, Structure and Pattern Formation for Thin Films

Lecture 1. Growth of Thin Films

Russel CaflischMathematics Department

Materials Science and Engineering DepartmentUCLA

www.math.ucla.edu/~material

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Outline

• Epitaxial Growth– molecular beam epitaxy (MBE)

– Step edges and islands

• Solid-on-Solid using kinetic Monte Carlo– Atomistic, stochastic

• Island dynamics model– Continuum in lateral directions/atomistic in growth

direction

– Level set implementation

– Kinetic step edge model

• Conclusions

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Outline

• Epitaxial Growth– molecular beam epitaxy (MBE)

– Step edges and islands

• Solid-on-Solid using kinetic Monte Carlo– Atomistic, stochastic

• Island dynamics model– Continuum in lateral directions/atomistic in growth

direction

– Level set implementation

– Kinetic step edge model

• Conclusions

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Effusion Cells

MBE ChamberSTM Chamber

Molecular Beam Epitaxy (MBE)Growth and Analysis Facility

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STM Image of InAs

20nmx20nm

250nmx250nm1.8 V, Filled States

HRL whole-wafer STMsurface quenched from 450°C, “low As”

Barvosa-Carter, Owen, Zinck (HRL Labs)

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AlSb Growth by MBE

Barvosa-Carter and Whitman, NRL

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Basic Processes in Epitaxial Growth

9750-00-444

(a) (a)

(h)

(f) (e) (b)

(c)

(i)

(g)

(d)

(a) deposition (f) edge diffusion(b) diffusion (g) diffusion down step(c) nucleation (h) nucleation on top of islands(d) attachment (i) dimer diffusion(e) detachment

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Outline

• Epitaxial Growth– molecular beam epitaxy (MBE)

– Step edges and islands

• Solid-on-Solid using kinetic Monte Carlo– Atomistic, stochastic

• Island dynamics model– Continuum in lateral directions/atomistic in growth

direction

– Level set implementation

– Kinetic step edge model

• Conclusions

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Solid-on-Solid Model

• Interacting particle system – Stack of particles above each lattice point

• Particles hop to neighboring points– random hopping times

– hopping rate D= D0exp(-E/T),

– E = energy barrier, depends on nearest neighbors

• Deposition of new particles– random position

– arrival frequency from deposition rate

• Simulation using kinetic Monte Carlo method– Gilmer & Weeks (1979), Smilauer & Vvedensky, …

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Kinetic Monte Carlo • Random hopping from site A→ B

• hopping rate D0exp(-E/T),

– E = Eb = energy barrier between sites

– not δE = energy difference between sites

• Transition state theory

A

B

δEEb

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SOS Simulation for coverage=.2

Gyure and Ross, HRL

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SOS Simulation for coverage=10.2

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SOS Simulation for coverage=30.2

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Effusion Cells

MBE ChamberSTM Chamber

Molecular Beam Epitaxy (MBE)Growth and Analysis Facility

RHEED

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Validation of SOS Model:Comparison of Experiment and KMC Simulation

(Vvedensky & Smilauer)

Island size density Step Edge Density (RHEED)

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Difficulties with SOS/KMC

• Difficult to analyze• Computationally slow

– adatom hopping rate must be resolved

– difficult to include additional physics, e.g. strain

• Rates are empirical– idealized geometry of cubic SOS

– cf. “high resolution” KMC

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High Resolution KMC Simulations

High resolution KMC (left); STM images (right)Gyure, Barvosa-Carter (HRL), Grosse (UCLA,HRL)

•InAs

•zinc-blende lattice, dimers

•rates from ab initio computations

•computationally intensive

•many processes

•describes dynamical info (cf. STM)

•similar work

•Vvedensky (Imperial)

•Kratzer (FHI)

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Outline

• Epitaxial Growth– molecular beam epitaxy (MBE)

– Step edges and islands

• Solid-on-Solid using kinetic Monte Carlo– Atomistic, stochastic

• Island dynamics model– Continuum in lateral directions/atomistic in growth

direction

– Level set implementation

– Kinetic step edge model

• Conclusions

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Island Dynamics

F

D

v

F

dN/dt

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Island Dynamics• BCF Theory: Burton, Cabrera, Frank (1951)

• Epitaxial surface– adatom density ρ(x,t)

– Step edges = union of curves Γ(t)

– continuum in lateral direction, atomistic in growth direction

• Evolution of ρ and Γ– Adatom diffusion equation with equilibrium BC

ρt=DΔ ρ +F

ρ = ρeq on Γ(t)

– Step edge velocity: Γ(t) moves at normal velocity

v =D [∂ ρ/ ∂n]

v

ρ = ρeq

Γ

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Additions to BCF Theory• Nucleation and breakup of islands• Step stiffness/line tension• Strain effects (Lecture 2)• Numerical implementation: Level set method

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Nucleation (and Breakup)• Islands nucleate due to collisions between adatoms

– Rate = D σ1 ρ 2 – σ1 = capture number for nucleation

• accounts for correlation between random walkers: they have not collided earlier

• Modification in ρ eqtn– Nucleation is a loss term

ρt = DΔρ + F - dN/dtdN/dt = ∫ D σ1 ρ 2 dx

• Choice of nucleation time and position– Deterministic time, stochastic position– When N crosses an integer, nucleate a new island

• N(t) ≈ # islands at time t– Choose position at random with probability density proportional to

D σ1 ρ 2 – Alternatives to this choice of position were not successful– Ratsch et al. (2000)

• Similar method for adatom detachment and breakup of small islands

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Nucleation Rate:

Nucleation: Deterministic Time, Random Position

2),( tDdt

dNx

Random Seedingindependent of

Probabilistic Seedingweight by local 2

Deterministic Seedingseed at maximum 2

max

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C. Ratsch et al., Phys. Rev. B (2000)

Effect of Seeding Style on Scaled Island Size Distribution

Random Seeding Probabilistic Seeding Deterministic Seeding

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Line Tension/Step Stiffness

• Gibbs-Thomson terms: boundary condition for ρ and island velocity v

– Line tension and step stiffness satisfy

• Asymptotic analysis of detailed step edge model for |κ| <O( Pedge)<<1

– First derivation of Gibbs-Thomson from kinetics rather than energetics • Previous derivations use equilibrium or thermodynamic driving forces

– ρ* from kinetic steady state RC & Li (2003)

– Anisotropy of RC & Margetis (2007)

*D / n = D( ) -

D [ / n] - ssv

*( / )

ss

T D

= free energy per unit length

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Anisotropy of step stiffness

• θ = angle of step edge

• f+, f- are flux from upper, lower terrace

• θ-1 similar to results for Ising model, near-equilibrium by Einstein and Stasevich (2005)

1 1 2

1 2

for 1

(1) for 0E

E

c P

O P

( )c c f f

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Level Set Method• Level set equation for description and motion of

n(t) =boundary for islands of height n = { x : φ(x,t) = n }

φ t + v |grad φ| = 0

v = normal velocity of – Nucleation of new islands performed by “manual” raising of level set

function. Requires minimal size (4 atoms) for new islands

• Implementation– REC, Gyure, Merriman, Ratsch, Osher, Zinck (1999)– Chopp (2000)– Smereka (2000)

• Choice of grid– Numerical grid needed for diffusion and LS equations– Physical (atomistic) grid needed for nucleation and breakup– We use a single atomistic grid, which we consider to be a numerical grid

when needed

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The Levelset Method

Level Set Function Surface Morphology

t

=0

=0

=0

=0=1

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Simulated Growth by the Island Dynamics/Level Set Method

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LS = level set implementation of island dynamics

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Island size distributions

Experimental Data for Fe/Fe(001),Stroscio and Pierce, Phys. Rev. B 49 (1994)

Stochastic nucleation and breakup of islands

D = detachment rate

Petersen, Ratsch, REC, Zangwill (2001)

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Computational Speed: Level Set vs. KMC

• LS ≈ KMC for nucleation dominated growth– Diffusion computation on atomistic lattice is slow

• LS >> KMC for attachment/detachment dominated– Frequent attachment/detachment events represented by

single effective detachment

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Outline

• Epitaxial Growth– molecular beam epitaxy (MBE)

– Step edges and islands

• Solid-on-Solid using kinetic Monte Carlo– Atomistic, stochastic

• Island dynamics model– Continuum in lateral directions/atomistic in growth

direction

– Level set implementation

– Kinetic step edge model

• Conclusions

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Kinetic Theory for Step Edge Dynamics

• Theory for structure and evolution of a step edge– Mean-field assumption for edge atoms and kinks– Dynamics of corners are neglected

• Equilibrium solution (BCF)– Gibbs distribution e-E/kT for kinks and edge atoms– Detailed balance at edge between each process and the reverse process

• Kinetic steady state– Based on balance between unrelated processes

• Applications of detailed model– Estimate of roughness of step edge, which contributes to detachment rate– Starting point for kinetic derivation of Gibbs-Thomson

• References– REC, E, Gyure, Merriman & Ratsch (1999)– Similar model by Balykov & Voigt (2006), Filimonov & Hervieu (2004)

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Step Edge Model

•adatom density ρ•edge atom density φ•kink density (left, right) k•terraces (upper and lower)

• Evolution equations for φ, ρ, k

∂t ρ - DT ∆ ρ = F on terrace

∂t φ - DE ∂s2 φ = f+ + f- - f0 on edge

∂t k - ∂s (w ( kr - k ℓ))= 2 ( g - h ) on edge

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Equilibrium from Detailed Balance

edge atom ↔ terrace adatom:

DE φ = DT ρ

kink ↔ edge atom:

DK k = DE k φ

kink pair (“island”)

↔ edge atom pair:

DK (1/4) k2 = DE φ2

kink pair (“hole”) + edge atom

↔ straight step:

DS = DE (1/4) k2 φ

F

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Equilibrium from Detailed Balance

edge atom ↔ terrace adatom:

DE φ = DT ρ

kink ↔ edge atom:

DK k = DE k φ

kink pair (“island”)

↔ edge atom pair:

DK (1/4) k2 = DE φ2

kink pair (“hole”) + edge atom

↔ straight step:

DS = DE (1/4) k2 φ

KineticSteady State

f

f=

f= net flux to step edge

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Equilibrium Solution

•Solution for F=0 (no growth)•Derived from detailed balance•DT, DE, DK are diffusion coefficients (hopping rates) on Terrace, Edge, Kink in SOS model

Comparison of results from theory(-)

and KMC/SOS ()

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Kinetic Steady State vs. Equilibrium

•Solution for F>0•Derived from kinetic balance, not detailed balance•k >> keq

•Pedge=f/DE “edge Peclet #”

Comparison of scaled results from steady state (-), BCF(- - -), and KMC/SOS (∆) for L=25,50,100,with F=1, DT=1012

Kinetic steady state

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Hybrid and Accelerated Methods: Island Dynamics and KMC

• Schulze, Smereka, E (2003)• Russo, Sander, Smereka (2004)• Schulze (2004)• DeVita, Sander, Smereka (2006)• Sun, Engquist, REC, Ratsch (2007)

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Outline

• Epitaxial Growth– molecular beam epitaxy (MBE)

– Step edges and islands

• Solid-on-Solid using kinetic Monte Carlo– Atomistic, stochastic

• Island dynamics model– Continuum in lateral directions/atomistic in growth

direction

– Level set implementation

– Kinetic step edge model

• Conclusions

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Summary

• Island dynamics method for epitaxial growth– Coarse-graining of KMC

– Stochastic nucleation

• Kinetic model for step edge– kinetic steady state ≠ BCF equilibrium

– validated by comparison to SOS/KMC

• Next lectures– Inclusion of strain in epitaxial systems

– Strain leads to geometric structure (e.g. quantum dots) and alloy segregation