EUV characterization Christian LaubisChristian Laubis,...

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membrane sample EUV characterization Christian Laubis PTB Christian Laubis, PTB

Transcript of EUV characterization Christian LaubisChristian Laubis,...

  • membrane samplepEUV characterization

    Christian Laubis PTBChristian Laubis, PTB

  • Outline

    • PTB's synchrotron radiation laby

    • Scatter from structures

    • Scatter from random rough surfaces

    • Measurement geometries• Measurement geometries

    • SAXS

    • Lifetime testing

    • Wrap-up

    2 Pellicle-TWG 21-Feb-201619.02.2016

  • PTB - the National Metrology Institute

    About PTB:

    PTB the national metrology institutePTB – the national metrology institute providing scientific and technical services

    What are PTB's capabilities?

    PTB measures with the highest accuracyand reliability – metrology as the corecompetence

    www ptb dewww.ptb.de

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  • Storage Rings in Berlin-Adlershof

    BESSY II

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  • PTB @ BESSY I, II, MLS

    1982 – 1999: BESSY I BESSY II:circumference 250 m

    PTB:

    circumference 250 m electron energy 1.7 GeV

    since 1999: BESSY II 10 beamline branchesfrom 400 nm (3 eV)

    to 0.02 nm (60 keV)

    UV X‐ray

    Metrology Light Source MLSi f 48

    EUV

    since 2008: MLS 

    8 beamlines

    circumference 48 m electron energy 100 ‐ 630 MeV

    8 beamlinesfrom 8 mm

    to  4 nm (300 eV)

    UVUV

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    THz EUVUV

    19.02.2016

  • Experimental stations at the MLS

    Undulator1a IR radiation1b d fl t d di t b

    EUVVUV

    1b deflected direct beam1c Compton backscatter1d VUV/EUV  monochrom.

    bending magnet 2a calculable radiation2b UV/VUV monochrom.

    (so rce calibration)

    irradiation(source calibration)

    3 EUV radiometry4 VUV radiometry5 THz beamline6 IR beamline7 diagnostics front end

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  • PTB‘s EUV Reflectometer

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  • Optics for EUV Sources

    5 sr collector, 670 mm outer diameterdesigndesign

    coatingmounted for measurements at PTBmounted for measurements at PTB

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  • EUV-Ellipso-ScatterometerDetector

    azimuthal 110° 0.0002°l ° °polar 210° 0.0002°

    flip 358° 0.01°

    S lSampleX 100 mm   0.5 µmY 100 mm   0.5 µmZ 25 mm 0 5 µmZ 25 mm   0.5 µmrot.‐X 130° 0.0002°rot.‐Y 130° 0.0002°rot ‐Z 358° 0 0002°rot. Z 358 0.0002

    sample size: 190 x 190 x 70 weight: up to 5 kgweight: up to 5 kg

    no lubricants used(no organic contaminants)

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    ( g )

    19.02.2016

  • Soft X-ray radiometry beamline at BESSY II

    wavelength range 1 nm to 25 nm

    EUV ellipso‐scatterometer

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    EUV ellipso‐scatterometer

    19.02.2016

  • at wavelength reflectometryat-wavelength reflectometry

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  • EUV reflectance

    reflectance of reference membranes

    => clear thickness oscillations> clear thickness oscillations

    => minor differences between fields

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  • EUV transmittance

    transmittance of reference membranes

    => rather SiN instead of Si3N4

    transmittance broad spectral rangegrey curves:  CXRO datasolid line:  SiNdashed line:  Si3N4CXRO data shifted by 0 36 nm to account for chemical shift

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    CXRO data shifted by 0.36 nm to account for chemical shift

    19.02.2016

  • at wavelength scatter measurementsat-wavelength scatter measurements

    scatter in reflection geometry

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  • EUV Scatterometry

    Scheme of scatterometry measurements

    geometrical properties:• structure width• structure height

    measurements

    test pattern: • structure height• edge angles • edge profiles 

    p

    semi‐dense bright linesCD 180 nm, duty cycle 1:3

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    • …..

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  • EUV Scatterometry

    Diffraction of semi‐dense 180 nm bright lines at 1:3 duty cycle. 

    fix  angle of incidence, 6°3 wavelengths: 13.65, 13.92, 13.40 nm

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  • Comparison: Scatterometry vs. AFM

    CDblue: scatterometry,  red: AFMoffset scatterometry:  ‐2.7(18) nm

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  • PSD from scatter measurements0.2 s200 s4000 s

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  • Membranes: EUV scatter in reflectance

    scatter in reflectance

    Scale is log10 of CCD‐counts /100 s

    the reflected beam indicates severe distortions of the membrane for fields 2 and 4

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  • at wavelength scatter measurementsat-wavelength scatter measurements

    scatter in transmission geometry

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  • EUV scatter in transmission geometry

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  • Membranes: EUV scatter in transmission

    membrane broken

    scatter in transmission

    Scale isScale is log10 of CCD‐counts /100 s

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  • SAXSSAXS

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  • X-ray Beamline

    energy range: 1.75 keV to 10 keV(0.7 nm to 0.1 nm)

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    (0.7 nm to 0.1 nm)

    19.02.2016

  • SAXS / GISAXS set-up at X-ray beamline

    HZB SAXS set-up:HZB SAXS set-up:• length about 3 m• weight about 3 t

    Sample – detector distance: 1.4 m to 4.3 m

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  • X-ray detector PILATUS

    Pilatus 1M Vacuum version, 320 µm Si thickness981 x 1043 pixels, pixel size 172 x 172 µm², area 169 x 179 mm²981 x 1043 pixels, pixel size 172 x 172 µm , area 169 x 179 mm

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  • SAXS measurement geometry

    Intense monochromaticradiation photon energy E

    Sample 2D detectorradiation, photon energy E

    4R di l i t ti S tt d i t it 4 hc

    Radial integration Scattered intensity as function of momentum transfer

    q = E sin

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  • SAXS: position sensitivity the X‐ray beam cross section is 0.5 x 0.5 mm²

    data in center of membrane data 0.6 mm off center

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  • SAXS radial integral

    scheme of the reciprocal grid:unit vectors indicated in red

    length: pitcha 1

    23

    pitch adapted to measured peaks: 28.2 nm

    i di d 7 i h

    pitch2

    indicated are 7 vectors seen in the scatter image ; ; ; ; ;; 

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    note that the unit vectors are not orthogonal here:  length^2 = h^2 + k^2 + hk

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  • Lif ti t tiLifetime testing

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  • Irradiation beamline setup

    The irradiation beamline is designed to captureand focus the available radiation from a bending magnet of BESSY II

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  • Irradiation beamline: Spectral distribution

    blue dashes:  spectrum after mirrorred line:  with additional Si  filter

    i t l 0 9 W ( filt ) 2 5 J / lintegral power :  0.9  W (no filter)        2.5 nJ / pulse0.15 W (Si‐Filter) 0.4 nJ / pulse

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  • Irradiation testing

    Chamber with gas supply system 

    distance "161"

    and load lock

    distance "334"

    Power density for different 

    chamberpositions.chamberpositions.

    Two scalingsfor best depiction of 'H ' d 'C ld'

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    'Hot ' and 'Cold' spot.

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  • wrap-up

    • PTB offers EUV scatterometry measurements in transmission 

    and reflection geometry on membrane samples and surfacesand reflection geometry on membrane samples and surfaces

    • Structures as well as random rough surfaces can be investigatedg g

    • SAXS measurements are available at PTB

    • PTB operates an EUV lifetime testing facility

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  • Th k !Th k !Thank you !Thank you !

    Physikalisch-Technische BundesanstaltyBraunschweig and BerlinAbbestraße 2-1210587 Berlin10587 BerlinChristian LaubisTelefon:+49 30 3481-7125E M il h i ti l bi @ tb dE-Mail: [email protected]


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