Post on 30-Aug-2020
iEUVI Mask TWG October 6, 2013
1
Issue on Backside of EUV mask
EUV Mask
Defect
Overlay error
Scanner stage
Defect map (after chucking)
2
Total count > 10,000 defects
Height measurement (1)
3
Height: 10um Width: 20um
Height measurement (2)
4
Height: 1.1um Width: 18um
5
Lasertec “BASIC” Inspection Measurement Removal (*)
EUV Mask EUV Mask EUV Mask
After
(*) under feasibility study
Dual Pod Handling
6
EUV mask backside is Inspected and measured on Inner pod to reduce a possibility of particle adder
Inner Pod
Outer base
EUV Mask
Inner base
Outer Pod
Inspection capability
7
0.4um PSL on CrN
Capture rate 99.9%
8
Comparison with AFM
BASIC: 0.383um AFM: 0.379um
BASIC series 3D image
Profile for height
Example of defetct removal
9
53um
Height: 17um
Before After
Thank you very much for your attention.
T. Suzuki et al., “High Magnification Review Function for defect location accuracy improvement with EUV Actinic Blank Inspection Tool”, Session 5: Mask Inspection Tools on Tue, Oct. 8, 11:40 am
ABI tool development update