Ch 15. Group 15

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Ch 15. Group 15. N 2 / O 2 separation. BPMWmain uses N 2 77K28inert gas/coolant O 2 90K32fuel/medial. N 2 B(N ≡N) = 946 KJ/mol (kinetically inert) N 2 fixation: N 2 + 3 H 2  2 NH 3 Haber process, industrial source of all N compounds. - PowerPoint PPT Presentation

Transcript of Ch 15. Group 15

Ch 15. Group 15

2

N2 / O2 separation

BP MW main uses

N2 77K 28 inert gas/coolant

O2 90K 32 fuel/medial

3

Elemental Forms

N2 B(N≡N) = 946 KJ/mol (kinetically inert)

N2 fixation:

N2 + 3 H2 2 NH3

Haber process, industrial source of all N compounds

400C, 200 atm, Fe cat

4

N2 chemistry

6 Li + N2 2 Li3N

[Ru(NH3)5(H2O)]2+ (aq) Cat process to N cmpds?

N2 NH4+

enzyme w/ Fe4S4 cage + MoFe7S8 cofactors (ferrodoxins)

bacteria

cat = nitrogenase

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P allotropes

white P

black P

Molecular, Td, rapidly oxidized to phosphate in air

red P many polymorphs,air stable hexagonal puckered sheets

prep from high P or Bi flux, air stable

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History

From “The 13th Element: The Sordid Tale of Murder, Fire, and Phosphorus” by John Emsley

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Elemental forms

As, Sb, Bi incr. metallic character

Single vs. multiple bondsD(E-E) D(E=E) D(E≡E)

N 163 409 946 NNP 201 -P-P-O 142 447 O=OS 264 431 -S-S-

generally in the p-block, -bonds are uncommon except with period 2 elements

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Halidesalmost all group 15 halides are air sensitive:

PCl3 + ½O2 O = PCl3 oxidation

PCl3 + 4H2O H3PO4 + 3HCl + H2 oxidation + hydrolysis

all pentahalides hydrolyze rapidly and generate HX

N forms endoergic halides

NF3 to “NI3” show decreasing stability

NF4+ is isostructural to ammonium and is the only stable N(V) halide

P to BiMX3 MX5 MX6

all are known for X = F, most for Cl, some for Br,IC3v D5h Oh

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Halides

PF5 to BiF5 show increasing Lewis acidity

ex : PF5 + F PF6 ΔH = - 340kJ/mol

SbF5 + F SbF6 - 500kJ/mol

SbF5 is an oligomeric, viscous, colorless liquid

(SbF5)4

Heavier congeners tend to higher CN

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Group 15 Frost diagrams

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Group 15 redox trends• NO3

and Bi(V) are strong oxidants

• NO3 should be the strongest oxidant from general periodic trend down

a group (higher χ and higher IE result in less stable high oxidation state). But there is no regular trend.

• Bi(III) is unusually stable due to inert pair effect

• PO43 is unusually stable due to strong P=O bonding

• Low pH increases oxidation strength of nitrogen oxoanions and also often increases rate (via protonation of N-O bonds)

• most reactions are slow and many species are kinetically stable

ex: NO2 , N2O, NO, NO2 N2O4

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N oxides

N2O4 is isoelectronic w C2O42

(oxalate). Since C has lower χ than N, oxalate has a stronger M-M bond and there is no appreciable equ w/ monomer

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N oxides

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N oxides

4 HNO3 (aq) 4 NO2 (aq) + O2 (g) + 2 H2O (l)

More rapid for conc. HNO3 due to presence of undissociated acid

Easier to break N-OH vs N=O

N2O (g) + 2 H+ (aq) + 2 e- N2 (g) + H2O (l)

E = + 1.77 V at pH = 0, but it’s a poor oxidant due to slow reaction kinetics

NO+ (solv) + e- NO (g)

E ~ + 1.1 V, nitrosyl cation is a facile oxidant with rapid kinetics

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Low oxidation state N

Ox state -3 -1 -2

Ammonia hydroxylamine hydrazine

pKb 4.8 8.2 7.9

also N3- (azide) which is isoelectronic with CO2 and N2O

NaN3

Na (m) + 3/2N2 (g)

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Pourbaix diagrams

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P oxides

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Phosphates

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P oxidesmostly strong reducing agents (except for P(V)), especially in base

Generally labile reactions

Ox state

+1 H2PO2 (hypophosphite) H3PO2 is monoprotic

+3 HPO32 (phosphite) H3PO3 is diprotic

+5 PO43 (phosphate) Td H3PO4 is triprotic

Anhydride acid

P4O6 H3PO3

P4O10 H3PO4

H2O

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Sb2O4

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PS compounds

Matches:

P4S3 + KClO3 + filler/glue/water = strike anywhere

KClO3 (head) and red P (stripe) = safety

P4S3

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PN compounds

planar but not aromatic

P4(NR)6

Note that –P=N- is isoelectronic with –Si=O- (siloxanes)

nPCl3 + nNH4Cl (Cl2PN)n + 4n HCl n = 3 or 4

dichlorophosphazene trimer or tetramer

oligomer

290 C + Lewis acid initiator

(Cl2PN)n polydichlorophosphazene, elastomeric at RT

2n NaOR (can be OR , NR2)

[(RO)2PN]n

130 C

These hydrolyze in air to form phosphate and HCl

An air stable poly-phosphazene

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Arsine ligand

4 As + 6 CH3I → 3 (CH3)2AsI + AsI3

(CH3)2AsI + Na → Na+(CH3)2As- + NaI

Na+(CH3)2As- → o-C6H4(As(CH3)2)2 soft LB, bidentate

o-C6H4Cl2 / THF

[PdCl6]2-

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Organoarsine chemistry

As(CH3)3 + CH3Br → As(CH3)4+Br- oxidative addition As(III) -> As(V)

For As(Ph)3 , this does not work

Ph3As=O + PhMgBr → Ph4As+Br- + MgO acid-base exchange (Td)

LiPh

AsPh5 + LiBr

As-As bonding

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2As(CH3)2Br + Zn → (CH3)2As-As(CH3)2 + ZnBr2

As5(CH3)5