1.Introduction and application. 2.Ion implantation tools. 3.Dopant distribution. 4.Mask thickness and lateral distribution. 5.Effect of channeling. 6.Damage.
Ion selective electrodes(ise)
Michael S. Murillo and Jon C. Weisheit- Dense plasmas, screened interactions, and atomic ionization
Quantum Computation With Trapped Ions Brian Fields.
Prospects for High-Aspect-Ratio FinFETs in Low-Power Logic Mark Rodwell, Doron Elias University of California, Santa Barbara 3rd Berkeley Symposium on.
