Electron Beam Lithography
Extreme UV (EUV) lithography 1.Overview, why EUV lithography? 2.EUV source (hot and dense plasma). 3.Optics (reflection mirrors). 4.Mask (absorber on mirrors).
Chapter 5 Lithography _ III
1.Introduction and application. 2.Light source and photomask, alignment. 3.Photolithography systems. 4.Resolution, depth of focus, modulation transfer.
A.B. Kahng, I. Mandoiu and S. Muddu -- UCSD
Introduction and application. Light source and photomask, alignment. Photolithography systems.
Introduction and application. Light source and photomask, alignment. Photolithography systems. Resolution, depth of focus, modulation transfer function.
Extreme UV (EUV) lithography
