Ch4_ICprocess.ppt
Euvl Final
Evaluating Baseline Deposition and Etch Recipes for Silicon Dioxide and Silicon Nitride using PECVD and RIE Tools Presented by Ayesha K. Denny NNIN RET.
Chapter 2 3d
Trieste, 8-10 November 1999 CMOS technology1 Outline Introduction CMOS devices CMOS technology CMOS logic structures CMOS sequential circuits CMOS regular.
Microfluidics: Catalytic Pumping Systems Paul Longwell Hollidaysburg Area High School Summer 2005.
Outline
Chapter Extra-2 Micro-fabrication process Si wafer fabrication IC fabrication – Deposition Spin coating PVD – physical vapor deposition CVD – chemical.
Microfluidics: Catalytic Pumping Systems
©2008 R. Gupta, UCSD COSMOS Summer 2008 Chips and Chip Making Rajesh K. Gupta Computer Science and Engineering University of California, San Diego.
COSMOS Summer 2008 Chips and Chip Making
