Chapter 9 Thin Film Deposition _ I
Chapter 5 Lithography _ III
SiO 2 properties and applications. Thermal oxidation basics. Manufacturing methods and equipment.
Introduction and application. Light source and photomask, alignment. Photolithography systems.
Introduction to etching. Wet chemical etching: isotropic. Anisotropic etching of crystalline Si.
Introduction and application. Dopant solid solubility and sheet resistance.
Introduction and application. Ion implantation tools. Dopant distribution. Mask thickness and lateral distribution. Effect of channeling.
Introduction and application. Dopant solid solubility and sheet resistance. Microscopic view point: diffusion equations. Physical basis for diffusion.
Introduction and application. Light source and photomask, alignment. Photolithography systems. Resolution, depth of focus, modulation transfer function.
Chapter 10 Etching
