Report - Photolithography of SU8-2005 - nanotech.ucsb.edu 2 SU-8-2005 Resist Profile of Sample#05 (expose=9s). (a) and (b) Before O 2 Etch; (c) and (d) After O 2 etch, RIE5, for 15 minutes.

Select PornographicDefamatoryIllegal/UnlawfulSpamOther Terms Of Service ViolationFile a copyright complaint

Please pass captcha verification before submit form