PLANSEE High Performance Materials
PVD Target Materials forHard Coating Solutions
2Leading PVD coating solutions
PLANSEEs mission is to develop PVD coating solutions that offer our customers real competitive advantages. As the global
market leader, we are a reliable partner in the manufacturing of sputtering targets and arcing cathodes. We integrate our
development, production and logistics processes within our customers value chains.
Our global sales network ensures availability and expert service at the customers site. Continuous investments made to our
in-house production allow PLANSEE to offer exceptional levels of flexibility, availability and quality.
By establishing industrial and scientific partnerships to develop new technologies, we set new standards for the industry and
ensure that coating solutions will continue to be developed for growth markets around the world.
Our expertise in powder metallurgy forms the basis of all our activities. The PVD coating solutions we develop together with
our customers involve target materials such as: chromium, titanium, aluminum, zirconium, copper, tungsten, molybdenum,
composites and alloys thereof and novel ceramic materials. PLANSEE offers all of the target materials from this catalogue
in any OEM target design.
Targets that strengthen your products
Hard coatings are designed to significantly increase the life span of a product. Providing wear protection and serving as
tribological thin films, their main applications are for tools, components, and as decorative layers. Two main processes are
employed to deposit the layers magnetron sputtering and arc evaporation. PLANSEE supplies high-quality sputtering targets
and arc cathodes for the entire variety of advanced hard coatings.
Our materials provide the flexibility to produce coatings that achieve high oxidation resistance, tailored tribological behavior
and outstanding wear resistance.
3Data concerning the condition or recommendations for the use of materials and pro-
ducts are given for information only. All data are based on practical experience. In-
formation referring to the existence of specific properties is given to the best of our
knowledge, but does not imply any guarantee. Any assurances in this respect must
always be obtained specifically in writing.
All rights reserved, in particular for translation into foreign languages. Reproduction of
any part of this brochure is not permitted without the express consent of PLANSEE.
Right picture on page 3 with the permission of Hauzer Techno Coating.
Left picture on page 3 with the permission of Schaeffler Technologies GmbH.
CONTENTS
Hard Coating Solutions Page
Aluminum-Based Composite Materials 4
Other Metallic Composites 10
Ceramics 13
Pure Elements 16
Services & Accessories 18
4Aluminium-Chromium
AlCr 70/30 at% AlCr 50/50 at% AlCr 30/70 at%
AlCrB 52/28/20 at% AlCrC 25/50/25 at% AlCrSi 50/40/8 at%
Aluminum-Based Composite Materials
PLANSEE offers the full range of compositions of the AlCr
system. This can be achieved only by powder metallurgical
processes to obtain a suitable quality. We are use different
raw materials as well as various methods for densification.
AlCrN coatings are widely used for tool coating, where out-
standing high temperature wear resistance is needed and
highest oxidation resistance is beneficial. Those properties
can be even more pronounced by selective alloying with
other elements (see also page 9).
(Al, Cr)2O3 coatings have been introduced to the coating market quite recently. These new types of PVD coatings are inten-
ded to compete with Al2O3 coatings produced by CVD. As the PVD process is limited in temperature, the formation of pure
alpha-aluminumoxide is not possible yet. The addition of Cr to the target material results in a growth of mixed (Al, Cr)2O3 in
the preferred corundum structure.
PLANSEEs AlCr target materials are of the highest purity, density and homogeneity. The powder metallurgical production
routes allow us to introduce other additional elements for creating tailored coatings.
From the pictures of microstructure below it can be seen that PLANSEE has a wealth of experience with different com-
positions in the AlCr binary system. Beyond that, also many ternary and quarternary AlCr targets have been successfully
produced.
5Titanium-Aluminum
TiAl-based coatings are used for various applications to improve/generate:
- surface hardness
- corrosion resistance
Material properties
PLANSEE produces powder metallurgical TiAl targets and cathodes ensure constant quality in a wide range of material
compositions. The unique advantages of powder metallurgically manufactured TiAl arc cathodes and sputter targets include:
- high ductility of Al-based microstructure prevents crack
formation in the target during use. This guarantees a
high utilization for each target
- high thermal conductivity due to Al matrix
compound microstructure
- high homogeneity due to uniform distribution
of Ti grains in Al matrix
- highest stability of material quality due to selected
raw materials as well as constant manufacturing process
Ther
mal
con
duc
tivity
[W/m
K]
Temperature / C
50 100 150 200 250 300 350 400 450 500
70
50
60
10
20
30
40
0
TiAl 50 / 50 at% molten qualityTiAl 50 / 50 at% PLANSEE pm-standard qualityTiAl 50 / 50 at% PLANSEE pm-finegrain quality
Thermal conductivity of different TiAl 50/50 at% target qualities
Our powder metallurgically produced TiAl targets are characterized by several advantageous properties such as high density,
uniform elemental distribution, fine-grained microstructure and a low content of residual impurities. Due to the typical micro-
structure of powder metallurgical TiAl targets, where pure Ti-particles are embedded into a pure Al-matrix, the thermal as well
as electrical conductivity is twice as high as for cast -TiAl material. Therefore PLANSEEs TiAl-based targets show improved
performance. In the case of arcing cathodes, a simple substitution from cast-type to powder metallurgical TiAl achieved similar
tool life, without the need to change process parameters.
High quality is guaranteed by many years of experience and the selection of high purity powders sourced from long-standing
and reliable partners. Due to the combination of our advanced production expertise and extensive quality assurance processes,
PLANSEE products achieve outstanding results.
- oxidation resistance
- decorative colors
- wear resistance
TiAl 25/75 at% TiAl 50/50 at% TiAl 75/25 at%
6Microstructure of fine grain TiAl 50/50 at% Microstructure of standard TiAl 50/50 at% Microstructure of axial deformed TiAl 33/67 at%
Using different raw material powders and densification processes the microstructure of the target material can be influenced to
meet special customer requirements. For example, droplet rate and droplet size can be influenced by the grain morphology (see
picture above). On the other hand, this effect seems to be related to the PVD equipment type also.
Some scientific investigations concerning the effect of target microstructure on deposited coatings have been carried out by
PLANSEE.
In a study, cast and powder metallurgical TiAl 50/50 at% targets were used in an arc-ionplating system from Oerlikon Balzers
(type BAI 1200) to deposit coatings using a standard coating recipe.
Both types of targets produced coatings that had similar coating structure and composition. Milling tests showed the average
droplet size and distribution can be further improved, using fine grained PM targets.
Microstructure of cast-type TiAl 50/50 at%
Cross section of a coated sample using cast-type TiAl 50/50 at% targets
deposited in an Oerlikon Balzers BAI 1200 coating unit
Cross section of a coated sample using PM (fine grain) TiAl 50/50 at% targets
deposited in an Oerlikon Balzers BAI 1200 coating unit
Microstructure of PM (fine grain) TiAl 50/50 at%
7TiAl 50/50at% can be manufactured either via powder metallurgy (PM) or casting technology. For PM production the target
consists of fine Ti particles homogeneously embedded in a ductile Al-matrix. The cast target, on the other hand, consists
of different brittle phases of TiAl intermetallics. During the arc evaporation process, a local melting of the target material
happens at the arc spot.
Therefore the surface of the PM target transforms to a similar structure as is usually seen for cast-type targets. During the
conditioning process, before the actual coating cycle, a thin layer (~3-5m) of TiAl intermetallic phases is already formed
at the target surface.
PLANSEE investigated this topic very thoroughly,
to demonstrate that cast-type TiAl 50/50 at%
can be easily replaced by powder metallurgical
material, resulting in similar coating structure and
performance.
More detailed results of this investigation may be
found in the following publication:
Impact of the targets microstructure on the
microstructure of the cathodic arc evaporated
Ti0.5Al0.5N coatings by D. Rafaja et. al.,
Proceedings 17th INTERNATIONAL PLANSEE
SEMINAR, Vol. 2 (2009) Reutte, Austria, HM38/1.
PM TiAl 50/50 at% target (arced surface) Intermetallic layer at the PM target surface Intermetallic layer at the PM target surface
Graphic: Diffraction patterns of the Ti0.5Al0.5N coatings deposited at UB = -80 V from a cast-type cathode (a) and from a coarse-
grain and fine-grain cathodes produced using powder metallurgy (b and c, respectively). Thin solid lines indicate the respective
background intensity. Positions of the diffraction lines are labelled at the bottom of the figure. The order of phases is as follows:
WC (substrate), fcc Ti0.5Al0.5N, fcc AlN, wurtzitic AlN (from top to bottom).
For the remaining wide range of typically-used compositions of the TiAl system (other than the TiAl 50/50 at%), there has never
been an alternative to PM targets, as casting technology would not be able to overcome some of its intrinsic disadvantages, like
segregation and pore formation.
Inte
nsity
(cou
nts)
10-1
100
101
102
103
Diffraction angle (20)
30 40 50 60 70 80 90
(a)
(b)
(c)
Inte
nsity
(cou
nts)
Diffraction angle (20)
8In addition to the possibilities to adapt the microstructure of target materials, PLANSEE has developed and patented a
method to produce advanced Al-based targets with an integrated heat sink (WO 0240735). As can be seen from the
pictures, the highly thermal conductive Al- heat sink material is interconnected with the functional target material, without
any additional bonding interface.
There are some outstanding features of this target type with integrated heat sink:
- improved thermal conductivity leads to reduced
number of droplets generated
- clamping areas (e.g. bayonet) have high strength
to protect against target breakage
- some brittle compositions (Cr-rich or Ti-rich compositions)
may only be feasible applying heat sink type design
- cost-saving effect when noble or other expensive
materials are incorporated into the target material
Heat sink solutions for Al-based targets
TiAl 50/50 at% arc cathode with Al heat sink for improved thermal conductivity
Close-up: interface between TiAl 50/50 at% and Al heat sink Microstructure (BSE) of the interface (Al = dark color / Ti = light color)
Close-up: interface between TiAl 50/50 at% and Al heat sink
9PLANSEE products deliver outstanding benefits that are realized through powder metallurgical (PM) production routes. The
nearly unlimited flexibility in production of binary, ternary and quaternary target compositions opens new horizons for advanced
PVD coatings.
The fully in-house production, using a wide range of PM manufacturing technologies, allows PLANSEE to offer target compo-
sitions tailored for advanced hard coatings with optimized mechanical and tribological properties. Further topics that might be
addressed are: enhancing of thermal and chemical stability, adding of functional properties like self-lubrication, self-hardening
and self-healing. To adjust the coating characteristics to the dedicated application, PLANSEE offers its scientific expertise in
alloying of targets and cathodes with elements that influence the coating properties as follows:
- Grain size and morphology
- Hardness adaption
- High temperature oxidation resistance
- Friction coefficient
- Thermal stability
- Thermal conductivity
- Electrical conductivity
- Antibacterial properties
- Color effects
Selective alloying for tailored coatings
2 1
29
CuCopper
[Ar]3d104s1
8.9628361357.6
63.55
24
CrChromium
[Ar]3d54s
7.1929452130
52.00
26 3
3 4
58
CeCerium
[Xe]4f5d6s
6.7836991071
140.12
12
MgMagnesium
[Ne]3s
1.741363922
24.31
2
246 38
44
RuRuthenium
[Kr]4d75s1
12.244232523
101.07
42
MoMolybdenum
[Kr]4d55s
10.249122890
93.94
245 36
23
VVanadium
[Ar]3d34s
5.836822175
50.94
24 35 35
41
NbNiobium
[Kr]4d45s
8.5550172740
92.915
BBoron
1s2sp1
2.3442752300
10.81
3
4
14
SiSilicon
[Ne]3s2p
2.3335401685
26.09
13
81
TiThallium
[Xe]4f145d106s2p1
11.851746577
204.37
1
47
AgSilver
[Kr]4d105s1
10.524361234
107.87
40
ZrZirconium
[Kr]4d5s
6.4946822125
91.22
4
39
YYttrium
[Kr]4d5s
4.536111799
88.91
3
73
TaTantalum
[Xe]4f145d36s
16.657313287
180.95
5
72
HfHafnium
[Xe]4f145d6s
13.148762500
178.49
4
6
CCarbon
1s22s2p2
2.624470*4100*
12.01
4 2
8
OOxygen
1s22s2p4
1.42990.1850.35 -
16.00
2 245 36
74
WTungsten
[Xe]4f145d46s
19.358283680
183.85
6
16
SSutfur
[Ne]3s2p4
2.07717.75388.36
32.06
2 4
7
NNitrogen
1s22s2p3
1.251*77.3563.14
14.01
3 5 4 2
21
ScScandium
[Ar]3d4s
3.031041812
44.96
3
3 2
28
NiNickel
[Ar]3d84s
8.9031871726
58.70
3 2
27
CoCobalt
[Ar]3d74s
8.9032011768
58.93
10
Overview
The following sputtering targets and arcing cathodes are offered by PLANSEE in a wide range of compositions:
- Titanium composites and alloys: Ti-Si, Ti-Cr, Ti-B, Ti-Zr
- Chromium composites and alloys: Cr-Si, Cr-B
Other Metallic Composites
PLANSEE has a wide range of in-house production capabilities. The technologies available for the processing of powder
metallurgical materials allow PLANSEE to manufacture the products in a highly efficient manner. Therefore we are able to
adapt the manufacturing technology to match either small (R&D) batch size or mass production levels. Particularly in the
field of metallic composites and ceramics, powder metallurgical technologies can generate a wide range of compositions.
Metallic composites and ceramic targets Mo-Cu targets bonded on Cu backing plate
Ti-B targets as a multiple piece (clamped) version Cr-B targets as a multiple piece (clamped) version
- Zirconium composites and alloys: Zr-Si, Zr-B
- Molybdenum composites and alloys: Mo-Cu, Mo-Ag
CrSi clamped on Mo backing plate Ti/TiN composites having various Ti content
11
Titanium-Silicon
For applications like dry, high-speed cutting of high performance materials, PLANSEE recommends the use of TiSiN coatings.
Due to the high hardness and highest oxidation resistance of TiSiN nanocomposites, these coatings significantly extend the life
time of tools. PLANSEE offers a range of TiSi targets in standard compositions that are produced using powder metallurgical
technology. Upon your request, PLANSEE also produces individual compositions with Si contents up to 25 at%.
Product benefits:
- Uniform element distribution in the target due to
advanced powder metallurgical production route
- Fine grained microstructure optimized for sputtering
targets as well as for arcing cathodes
- High strength and ductility due to the microstructural
composition: TiSi/Ti5Si3 grains embedded in Ti matrix
- Guaranteed high density of > 98% of the theoretical
density
Product portfolio:
- TiSi 90/10 at%, TiSi 85/15 at%, TiSi 80/20 at% and TiSi 75/25 at%
Typical microstructure of PLANSEE powder metallurgical TiSi 80/20 at% material Wide range of dimensions of PLANSEE TiSi targets and cathodes
- High target/cathode purity due to high purity
powder ingredients
- Due to PLANSEEs licensing agreement, customers
who are using our TiSi targets are free to produce
TiSiN coatings which are covered under Japanese
Patent JP-3765475 (of Hitachi Metals Ltd.)
12
Molybdenum-Copper
Advanced PVD coatings already play an important role in automotive applications for reducing the friction losses and, as a
consequence, increasing the fuel efficiency. Nano-composite coatings based on hard metal nitrides surrounded by a soft (not
nitride-forming) metal, exhibit high hardness, low friction and high wear resistance.
For reasons of coating process stability, MoCu sputtering targets with a high volume fraction of molybdenum are best suited to
deposit such coatings. During the reactive PVD process the molybdenum will form its nitride while copper is inert in nitrogen at-
mosphere and therefore will deposit as a metal. For arc ion plating, specially designed MoCu cathodes are available on request.
Product benefits:
- Fine-grained microstructure with uniform distribution
of molybdenum grains in a copper matrix
- High density (>98%) in a wide composition range
- High target purity due to high purity powder ingredients
Product portfolio:
- Mo-Cu according to customer request
with Mo content from 40 to 90 at%
Microstructure of MoCu (Mo-rich) Fracture surface of MoCu (Mo-rich)
13
Multiple-piece SiC targets bonded on Mo backing plate Multiple-piece B4C target bonded on Cu backing plate
Multiple-piece SiC/C targets bonded on Cu backing plate TiN target clamped on Mo backing plate
Ceramics
Using the advantages of powder metallurgy, mixtures of different ceramic compounds are also available as sputtering targets
and cathodes for arc evaporation. By adjusting the microstructure with additions of carbon, a new spectrum of compositions is
available. These are mainly dedicated for advanced hard coatings in the field of tools and tribological coatings for components.
Examples are WC/C, TiC/C, SiC/C, TiB2/C.
Overview
The following materials are available as sputtering targets. The properties of the materials can also be adapted to meet the
conditions of the arc process:
- Carbides: WC (binder-free), TiC, B4C, SiC and others on request
- Borides: TiB2, CrB2, WB, W2B, ZrB2, NbB2 and others on request
- Nitrides like TiN
NbB2 bonded on Cu backing plate TiC/C bonded on Mo backing plate
14
Titanium Diboride (TiB2)
PLANSEE TiB2 is the material of choice when it comes to advanced coatings for high speed machining of aluminium alloys and a
variety of other non-ferrous alloys. Due to its low affinity to aluminum, this coating helps to eliminate the build-up on the cutting
edges of the tool during operation which is a major cause of failure. PLANSEE offers single as well as multiple-piece construction
targets, bonded on copper or molybdenum backing plates. Thanks to its fine grain size and advanced production processes,
PLANSEE TiB2 targets have outstanding properties regarding density and fracture toughness.
Product benefits:
- Fine grained microstructure optimized for sputtering with high power density
- High strength and thermal shock resistance due to the high temperature and high pressure densification process
- Guaranteed high density of > 98% of the theoretical density (corresponds to a specified 4.40 - 4.50 g/cm3)
- High target purity (> 99.8 wt% TiB2 content) due to high purity powder ingredients
- Unique microstructure developed for arcing cathodes
Product portfolio:
- Multiple-piece targets bonded on backing plate (Cu, Mo)
- Single piece targets up to 250 x 300 mm
- TiB2 cathodes with microstructure and cathode design adjusted for arc ion plating PVD processes
Typical microstructure of PLANSEE TiB2 material (SEM of fracture surface) Multiple-piece TiB2 targets bonded on Cu backing plate
15
Binder-free Tungsten Carbide (WC)
PLANSEEs binder-free WC is the right material for deposition of Diamond Like Carbon (DLC) coatings. It is applied for high qua-
lity and high purity WC/a-C:H coatings for automotive components as well as tool applications. Carbon-based nanostructured
composite thin film coatings such as WC/a-C:H have attracted large industrial attention because of their excellent tribological
properties. They show a high wear resistance and a low friction coefficient at the same time. PLANSEE offers single-piece as
well as multiple-piece constructions for sputtering targets, bonded on copper or molybdenum backing plates. Thanks to the fine
grain size and advanced production process, PLANSEEs binder-free WC targets have outstanding properties regarding density
and fracture toughness.
Another good reason to use PLANSEEs WC is the absence of nickel and cobalt, as inhaling these materials raises the risk of
cancer. The elimination of these elements normally used as a binder for WC products reduces these risks.
For Arc Ion Plating (AIP) process PLANSEE also offers advanced WC cathodes. Our unique cathode design has a copper heat
sink as well as an arc protection ring which leads to stable cathode evaporation.
Product benefits:
- Fine-grained microstructure optimized for sputtering with high power density
- Binder-free material with guaranteed Ni and Co content below 100 ppm
- High strength and thermal shock resistance
- Guaranteed high density of > 98% compared to the theoretical density (> 15.50 g/cm3)
- High target purity (> 99.9 wt% WC content) due to high purity powder ingredients
- Unique microstructure and cathode design developed for arcing cathodes
Product portfolio:
- Multiple-piece targets bonded on backing plates (Cu, Mo)
- Single piece targets up to 250 x 300 mm
- WC cathodes with microstructure and cathode design adjusted for arc ion plating PVD processes
Multiple-piece WC targets bonded on Cu backing plate WC arc cathodes on Cu with Mo or ceramic arc protection ring
16
Pure Elements
Titanium
Unalloyed commercially pure Titanium is available in four different Grades, 1, 2, 3 and 4, which are selected based on the corro-
sion resistance, ductility and strength requirements of the specific application. Grade 1 has the highest formability, while Grade
4 has the highest strength and moderate formability.
For PVD coating applications the most widespread quality in use is Titanium Grade 2. To offer short lead times to our customers,
PLANSEE stocks a large and varied inventory of Titanium Grade 2 mill-products such as plate, sheet, billet and bar. PLANSEEs
experienced operators are able to deal with complex operations like titanium machining and processing.
Zirconium
Commercially pure zirconium naturally contains 1-5 percent of hafnium, as it is extremely difficult to separate these two elements
from each other. Unalloyed Zirconium is specified as Alloy 702.
Zirconium targets are often used for decorative applications as ZrN layers. These are more brass-like in color and offer a higher
corrosion resistance than TiN coatings. PLANSEE offers Zirconium targets in every standard dimension.
Typical microsturcture of Ti Grade 2 Monolithic Ti target
Typical microstructure of Zirconium Alloy 702 Zirconium arc cathodes and sputtering targets
17
Chromium
Many years of experience in powder metallurgy allow PLANSEE to meet the highest requirements with respect to purity, grain
structure, density and target geometry.
Careful selection of raw materials and the use of the most up-to-date processing technology guarantee the consistently high
quality of PLANSEE Cr sputtering targets. According to customers needs PLANSEE employs aluminothermic High Purity (HP)
powder or electrolytic Ultra High Purity (UHP) powder.
ElementContent of impurities for UHP Cr(99.95 % metallic purity) in g/g
Content of impuities for HP Cr(99.8 % metallic purity) in g/g
Metallic impurities Fe 300 1300
Si 100 400
others 150 400
Non metallic impurities O 300 1000
N 200 200
C 100 300
Material specifications
Microstructure of UHP Chromium Cr sputtering target
Cr sputtering target bonded on Cu backing plate Cr rotatable targets
18
Graphite foils
PLANSEE offers all items which are necessary for the
different types of coatings as well as all items required for
mounting our targets including:
- Standards like graphite-foils
- Non-magnetic screws
- Non-magnetic washers
- Specially designed clamping bars and holders used for
PLANSEE clamping systemsGraphite-foils, mounting screws and washers
Services & Accessories
Backing plates and bonding
Depending on the target material, the use of a molybdenum backing plates can be advantageous. Molybdenum has a higher
Youngs Modulus compared to copper, making it a stiffer backing plate. It also has a lower expansion coefficient which better
matches most ceramic materials, reducing the risk of crack formation.
PLANSEE also supplies pure copper backing plates which have the advantage of highest heat conductivity.
MoCu and WCu composite materials may also be used as a heat sink material for certain dimensions. By varying the content
of copper, the material of the heat sink is adapted more specifically to match the thermal expansion coefficient of the target
material. Therefore such material combinations have minimized risk of crack formation.
PLANSEE offers in-house bonding capabilities. In most cases we use an indium bond, but also some high temperature soldering
is available on request. Please ask for further information.
MaterialThermal conductivity
0-100 C (W/mK)Coefficient of thermal expansion
x10-6/KYoungs Modulus
(GPa)
Mo 138 5.3 320
Cu 401 16.5 130
MoCu (30 - 50 wt% Cu) 190 - 240 7.5 - 9.9 225 - 170
WCu (20 - 30 wt% Cu) 225 - 240 8.3 - 10.3 280 - 220
Ti 22 8.6 110
WC 120 4.3 680
Cr 94 7.0 280
TiB2 64 7.4 560
19
R&D Services
Based on a long history of target development, PLANSEE shares a broad knowledge of target compositions and target designs
with its customers.
Coating parameters and fixing instructions for the usage of PLANSEE targets have been documented. Also an extensive databa-
se is available with recommendations on certain chemical compositions for creating tailored coatings.
According to the intrinsic properties of the target material systems, PLANSEE has established a huge variety of in-house manuf-
acturing methods. We individually choose the opimal production route to ensure that our customers receive only fully dense and
homogeneous targets, for R&D as well as for standard materials.
The PLANSEE R&D team assists you to solve any coating problems and to jointly engineer coating solutions for future demands.
Based on the scientific content and depth of the problem, cooperation can be established bi-laterally or include support from
scientific partners (universities, institutes).
PLANSEE serves all customers with its global network of experts. Main production plant for the Hard Coating Target Materials
is PLANSEE Composite Materials GmbH, located in Lechbruck, Germany. This PLANSEE site has its expertise in the production
of different metal and ceramic-based composite materials for almost 40 years.
Close to the customer - our global network
PLANSEE manufactures and markets its products worldwide. Production sites in Europe, USA, India, Japan, and China as well
as our global network of sales subsidiaries and sales partners, enable outstanding customer service and product quality delivered
by local teams. Stronger than any alliance and more diversified than single producers, PLANSEE is the most reliable source for
high performance components made of refractory metals.
For more information and local contacts please visit our website:
www.plansee.com
We reserve the right to make technical changes for improvement of the product.
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