Tutorial 2 Derek Wright Wednesday, January 26 th, 2005.
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Transcript of Tutorial 2 Derek Wright Wednesday, January 26 th, 2005.
![Page 1: Tutorial 2 Derek Wright Wednesday, January 26 th, 2005.](https://reader035.fdocuments.us/reader035/viewer/2022062407/56649d8e5503460f94a767ab/html5/thumbnails/1.jpg)
Tutorial 2
Derek Wright
Wednesday, January 26th, 2005
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Some Important Units
• 10 Å = 1 nm– Ex) Si-Si bonds are 2.33 Å, or 0.233 nm
• 1 micron = 1 m
• 1 atm= Standard Atmospheric Pressure
= 101.3 kPa
= 760 torr
= ~ 1 bar (1 bar = 100 kPa)
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Why are we learning about thin film process?
• It is easier to grow nanometer-scale films vertically than to mask nanometer-scale patterns horizontally.
• Combining thin films with very good lithography leads to nanometer-scale devices
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PhotoresistApplication
Exposure/Developing
Deposition/Growth or
Etching
PhotoresistEtching
Building Devices
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Overview
• Deposition (Growth)– Good vs. Bad Films– Physical Methods
• Evaporation• Pulsed Laser Deposition• Sputtering
– Chemical Methods• CVD• PECVD• Optical CVD• Chemical Solution Deposition• LB Films
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So What’s “Good Quality Film”?
• A bad film has defects• Defects are different for crystalline and
amorphous films• Crystal Defects:
– Vacancies (voids), Interstitials (stuff jammed into the lattice), and Dislocations (fractures in the lattice)
• Amorphous Defects:– Coordination Defects (dangling bonds)
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Deposition: Physical Methods
• Physical deposition means that nm sized chunks of material fly at the substrate and stick onto it
• The hotter the substrate, the more easily these pieces of material can move around (surface mobility)– They find their point of lowest energy resulting
in a better film
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Surface Mobility and Sticking
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Evaporation
• Material to be deposited is heated until it becomes vapor phase
• The heated material flies into the substrate
• The hotter the substrate, the better the film quality
• Can deposit very fast relative to other methods, but not always good quality film (up to 200 nm/s film growth)
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Evaporation
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Pulsed Laser Deposition
• Similar to Evaporation method, except uses a laser to heat the material to be deposited
• Different because the intense energy creates a plasma
• Plasmas not only contain inert material, but also ions and radicals which could chemically react with the surface– Depends on chemistry of reactants
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Pulsed Laser Deposition
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Sputtering
• The target (material to be deposited) and substrate are placed facing each other
• A plasma is ignited between them under vacuum
• A voltage bias between them causes ions from the plasma to ram into the target
• The ions eject pieces of the target that “sputter” onto the substrate
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Sputtering
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Magnetron Sputtering
• A big magnet is used to force the electrons into spiral paths so that they spend more time ionizing neutral gas particles
• This increases the number of ions
• More ions increases the chances of knocking out some of the material to be sputtered
• Increases efficiency
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Deposition: Chemical Methods
• In chemical deposition, the material being deposited on the substrate reacts with the surface– Form bonds with the surface– Chemical reaction with the surface
• The substrate as well as reactant temperature play a role in the rate of reaction
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Chemical Vapor Deposition
• Precursor gas (a gas phase version of what will be deposited on the surface) is pumped into the reaction chamber
• It’s heated until reactive species form– Ex) SiH4 SiH2 + H2
• The reactive species chemically interact with the surface to stick to (or react with) it
• Surface properties and temperature can determine how well something sticks
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Chemical Vapor Deposition
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Plasma Enhanced CVD
• Uses an RF or microwave E-field to strip electrons off the precursor gasses
• Since e- are so much lighter than the rest of the molecule (ion), they accelerate in the E-field faster than the molecules
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Plasma Enhanced CVD
• By the time the E-field changes direction (at RF or microwave frequencies) the electron has gained a lot of momentum and the remaining molecule (ion) has barely started to move
• Thus, the e- have a high temperature and the molecules (ions) have a low temperature
• This means that the substrate can have a lower temperature, too– Enables new substrates like glass and plastic– This is how TFT-LCD displays can be made
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Plasma Enhanced CVD
Electrode
Substrate
RFSource
PlasmaGas
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Optical CVD
• Not always applicable
• Uses different wavelengths of light to break precursor gas bond to form reactive species– Ex) Cl2 + h (photon) 2Cl (radicals)
• Also enables low temperature deposition
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Chemical Solution Deposition
• Material is deposited on the substrate in the liquid state– Spin Coating: Some liquid is placed on the substrate
and it’s spun really fast until only a thin coating is left– Dip Coating: Dunk the substrate in solution– Spray Coating: Like spray painting the substrate– Screen Printing: Put a stencil on the substrate and
use a squeegee to pull solution across– Ink-jet Printing: Same as in an ink-jet printer for a PC
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Langmuir-Blodgett (LB) Films
• A form of dip coating
• You have a solution with a layer of special molecules on the surface
• One side of the molecule is water-soluble, and the other is not (like soap)
• Thus all the molecules are aligned on top of the solution
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Langmuir-Blodgett (LB) Films
• When you dunk the substrate in, you get a monolayer (one layer) of aligned molecules on the substrate
• If you keep dunking it you’ll get a new layer each time– The water soluble side of one layer aligns with
the water soluble side of the next (alternating alignment)
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Langmuir-Blodgett (LB) Films
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PhotoresistApplication
Exposure/Developing
Deposition/Growth or
Etching
PhotoresistEtching
Building Devices
![Page 28: Tutorial 2 Derek Wright Wednesday, January 26 th, 2005.](https://reader035.fdocuments.us/reader035/viewer/2022062407/56649d8e5503460f94a767ab/html5/thumbnails/28.jpg)
Lithography
• When a pattern is applied to the substrate• The most common is optical lithography
where a mask is used to expose a pattern onto a substrate– Like how a transparency on an overhead
projector works
• The better the lithography, the smaller the feature size
• Small feature size nanoelectronics
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Technology Nodes
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Optical Lithography• “Resist” is spin-coated onto the substrate• A “mask” is placed in front of the
substrate– A mask is a clear plate with a pattern on it,
like an overhead transparency
• A light shines through the uncovered parts of the mask and chemically changes the resist (exposure)
• The exposed resist is etched away with a solvent (developing)
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Optical Lithography
• Smaller features need smaller wavelengths of light– UV: 365nm - 436nm– Deep UV (DUV): 157nm - 250nm– Extreme UV (EUV): 11nm - 14nm– X-ray: < 10nm
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Optical Lithography
• Three types:– Contact: The mask is directly against the substrate –
good minimum feature size, bad for the mask and substrate to touch
– Proximity: The mask is a few m away from the substrate – degrades minimum feature size but good for reliability because mask doesn’t touch substrate
– Projection: Lenses are used to focus the mask’s image onto the substrate – good minimum feature size, good for reliability
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Extreme UV Lithography
• Pretty soon UV lithography will hit the limit in terms of minimum feature size
• EUV is the next step
• Few materials allow EUV light to pass through, so reflective (instead of transmissive) optics must be used
• Mask pattern must be really absorbent to EUV light, so heavy metals are used
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X-ray Lithography
• After EUV comes X-ray lithography
• Enables super-high resolution pattern transfer
• There are technical hurdles to overcome before x-ray lithography systems are in place– Synchrotrons need to be further developed as
a source for x-rays
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E-beam Lithography
• Uses a focused beam of electrons to directly write to the substrate
• Works much like a CRT TV – an electron gun fires electrons and the beam is directed with magnetic fields
• There is a limit to how many electrons can be in the beam because they will start to repel each other and blur the beam
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E-beam Lithography
• Very precise, but very slow method• Can be accomplished in two ways:
– Use a narrow beam and turn it on and off to write or not write a pixel
– Use a wide beam and a mask to block the parts that shouldn’t be written
• Typically very slow and costly – good for making optical lithographic masks for use in UV, EUV, and X-ray
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Nano-imprint Technology
• Much like forging steel, except at a very small scale
• A stamp is fabricated at the nm-scale using traditional process methods
• A substrate is coated with some kind of polymer
• The polymer is stamped with the nm-scale stamp– The polymer is either cured with heat or light
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Thank You!
• This presentation will be available on the web.