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Confirmation Number: 11715059 Order Date: 05/01/2018
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Modeling and Simulation
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Decoupling of IonDiffusivity andElectromobility in PorousDielectrics
Editor of portion(s)Ye Fan, Rizwan Ali, SeanW. King, Jeff Bielefeld andMarius K Orlowski
Author of portion(s)Ye Fan, Rizwan Ali, SeanW. King, Jeff Bielefeld andMarius K Orlowski
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Decoupling of IonDiffusivity andElectromobility in PorousDielectrics
Instructor name Rizwan Ali
Institution nameVIRGINIA POLYTECHNICINSTITUTE AND STATEUNIVERSITY
Expected presentationdate May 2018
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Modeling and Simulationof Cu Diffusion in PorousLow-k Dielectrics ECSTrans. 2017 volume 77,issue 5, 121-132
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Modeling and Simulationof Cu Diffusion in PorousLow-k Dielectrics
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Order detail ID: 71094429Order License Id: 4319471125261
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TitleModeling and Simulationof Cu Diffusion in PorousLow-k Dielectrics
Instructor name Rizwan Ali
Institution nameVIRGINIA POLYTECHNICINSTITUTE AND STATEUNIVERSITY
Expected presentationdate Apr 2018
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This is not an invoice.
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Confirmation Number: 11708296 Order Date: 03/31/2018
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Modeling and Simulationof Cu Drift in Porous Low-kDielectrics.
Title of the article orchapter the portion isfrom
Modeling and Simulationof Cu Drift in Porous Low-kDielectrics
Editor of portion(s) Rizwan Ali, Sean W. Kingand Marius K Orlowski
Author of portion(s) Rizwan Ali, Sean W. Kingand Marius K Orlowski
Order detail ID: 71094430Order License Id: 4319480009644
ISSN: 1938-6737Publication Type: e-JournalVolume:Issue:Start page:Publisher: ELECTROCHEMICAL SOCIETYAuthor/Editor: Electrochemical Society
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TitleModeling and Simulationof Cu Drift in Porous Low-kDielectrics
Instructor name Rizwan Ali
Institution nameVIRGINIA POLYTECHNICINSTITUTE AND STATEUNIVERSITY
Expected presentationdate Apr 2018
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Draft 09/01/2009
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Description of item under review for fair use: Fig. 1.1 Technology scaling according to Moore's Law [100]. Source: ITRSRoadmap (2009).
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Description of item under review for fair use: Fig. 1.2 90 nm interconnect technology on 300 nm wafer with six levels of metal(Photo courtesy, Intel Corp.).
Report generated on: 05-01-2018 at : 22:59:03
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Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
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Description of item under review for fair use: Fig. 1.3 Schematic of an abstract circuit representing the interconnect structure .Source: M. He and T. Lu, Metal Dielectric Interfaces in Giga-scale Electronics, Springer Series.
Report generated on: 05-01-2018 at : 23:02:23
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
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Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.4 Trend of interconnect and gate delay as technology scales. Source ITRSRoadmap 1999.
Report generated on: 05-01-2018 at : 23:03:23
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.5 schematic of the Cu interconnect structure. The metal barrier anddielectric capping layer are to block Cu penetration into ILD. Source: M. He and T. Lu, Metal Dielectric Interfaces in Giga-scale Electronics, Springer Series in Materials Science (2012).
Report generated on: 05-01-2018 at : 23:04:22
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.6 Roadmap of dielectric constant given by ITRS. Source: ITRS Roadmap2009.
Report generated on: 05-01-2018 at : 23:05:32
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.7 Embedding RS devices in CMOS back-end would reduce logic-memorylatency. Source: N. Xu, EE 290D, Fall 2013, University of California, Berkeley.
Report generated on: 05-01-2018 at : 23:06:28
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.9 (Left) Crossbar architecture to implement RS in a dense packing. Source:J.J. Yang, D.B. Strukov & D. R. Stewart, Nature Nanotechnology 8, 13-24 (2013). (Right) Cu/TaOX/Pt RS devicesimplemented in crossbar achitecture by G. Ghosh. Source: G. Ghosh, MS Thesis, Virginia Tech (2015).
Report generated on: 05-01-2018 at : 23:08:21
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.10 Owing to non-requirement of a Si substrate and a simple structure,possibility to embed RS devices in CMOS back-end has been proposed in many literatures. Source: J.J. Yang, D.B. Strukov &D. R. Stewart, Nature Nanotechnology 8, 13-24 (2013).
Report generated on: 05-01-2018 at : 23:10:14
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Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.13 Switching process in CBRAM due to [O] vacancy filament. Source: T.Liu, PhD. Dissertation, Virginia Tech (2013).
Report generated on: 05-01-2018 at : 23:11:24
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Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.15 Hybrid nanofilament model, four CFs are shown: a monolithic Vo CF, amonolithic Cu CF, a hybrid Vo/Cu CF and a Cu/Vo CF. Source: Y. Kang, Ph.D. dissertation, Virginia Tech (2015).
Report generated on: 05-01-2018 at : 23:13:07
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Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.16 VFORM increases linearly with electrolyte thickness, while VSET hasno relation. Source: C. Schindler, G. Staikov, and R. Waser, Appl. Phys. Lett. 94, 072109 (2009).
Report generated on: 05-01-2018 at : 23:14:14
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.17 Dependence of the ON resistance on the compliance current. Source: Y.Bernard, V. T. Renard, P. Gonon, and V. Jousseaume, Microelectronic Engineering, vol. 88, no. 5, pp. 814–816, (2011).
Report generated on: 05-01-2018 at : 23:15:26
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 1.18 VSET vs sweep rate v for Cu/SiO2/Ir cells. A logarithmic relation isobserved for v > 10mV/s, but below that, a critical VSET is approached. Source: C. Schindler, G. Staikov, and R. Waser, Appl.Phys. Lett. 94, 072109 (2009).
Report generated on: 05-01-2018 at : 23:16:56
Based on the information you provided:
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.6 Schematic diagram of positive and negative lithography. Source:Photolithography, http://www2.ece.gatech.edu/research/labs/vc/theory/photolith.html
Report generated on: 05-01-2018 at : 23:23:56
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Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.8 Schematic illustration of the electron beam deposition. Source: T. Liu,PhD. Dissertation, Virginia Tech (2013).
Report generated on: 05-01-2018 at : 23:25:28
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Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.12 TCR of Cu/TaOx/Pt different Icc; (a) TCR of Cu CF for Pt devices (Icc= 10 μA); (b) TCR of Cu CF for Pt devices (Icc = 10 mA). Source: Y. Fan, MS. Thesis, Virginia Tech (2016).
Report generated on: 05-01-2018 at : 23:27:16
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Virginia Tech ETD Fair Use Analysis Results
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.13 TCR of (a) Cu CF and (b) VO CF. Source: T. Liu, M. Verma, Y. Kangand M. K. Orlowski, “Coexistence of Bipolar and Unipolar Switching of Cu and Oxygen Vacancy Nanofilaments inCu/TaOx/Pt Resistive Devices,” ECS Solid-State Lett. 2012, vol.1, issue 1, pp q11q13
Report generated on: 05-01-2018 at : 23:28:10
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
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Virginia Tech ETD Fair Use Analysis Results
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Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.15 Cross-section of the devices received in the first phase andcharacterized by Ye Fan. Source: Y. Fan, S. King, J. Bielefeld, M. Orlowski, ECS Trans. 72(2), 35-50 (2016).
Report generated on: 05-01-2018 at : 23:42:26
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
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Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.18 Plot of the resistance as a function of the inverse value of the area of thetop electrode in 635-Pt. Source: Y. Fan, S. King, J. Bielefeld, M. Orlowski, ECS Trans. 72(2), 35-50 (2016).
Report generated on: 05-01-2018 at : 23:43:19
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.19 Resistance as a function of temperature for a sample that has beenfound highly conductive from the beginning. Source: Y. Fan, S. King, J. Bielefeld, M. Orlowski, ECS Trans. 72(2), 35-50(2016).
Report generated on: 05-01-2018 at : 23:43:53
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.20 Plot of the resistance as a function of the inverse value of the area of thetop electrode in 635-Pt. Source: Y. Fan, S. King, J. Bielefeld, M. Orlowski, ECS Trans. 72(2), 35-50 (2016).
Report generated on: 05-01-2018 at : 23:44:55
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Table 2.3 Forming voltages at positive bias for the four type of devices tested byYe Fan. Source: Y. Fan, MS. Thesis, Virginia Tech (2016).
Report generated on: 05-01-2018 at : 23:45:46
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 2.21 Resistance as a function of temperature for a filament formed in 391-Wat positive bias (Vform = 0.58 V) and 391-W at negative bias (Vform = -0.73 V), and 388-W (25% porosity) at positive bias(Vform = 2.2 V). Source: Y. Fan, S. King, J. Bielefeld, M. Orlowski, ECS Trans. 72(2), 35-50 (2016)
Report generated on: 05-01-2018 at : 23:46:50
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 5.2 Binary phase diagrams for Cu-W and Cu-Ir. In both diagrams, almost nosolubility is observed till 1000K. Source: P.R. Subramanian, D. J. Chakrabarti and D.E. Laughlin (eds.), Phase Diagrams ofBinary Copper Alloys, ASM International, Materials Park, OH, 1994.
Report generated on: 05-01-2018 at : 23:50:39
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 5.6 Schematic depiction of the barrier failure mechanism in Cu/Ru/Si: (a)Before barrier breakdown, (b) initiation of barrier breakdown with the nucleation of Ru2Si3, (c) complete consumption Ru toform Ru2Si3, and (d) diffusion of Cu through the Ru2Si3 to form Cu3Si in the substrate. Source: M. Damayanti, T. Sritharan,S.G. Mhaisalkar, E. Phoon and L. Chan, Journal of Materials Research, Vol 22, Issue 92007, pp. 2505-2511 (2007).
Report generated on: 05-01-2018 at : 23:51:37
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use
Draft 09/01/2009
(Questions? Concerns? Contact Gail McMillan, Director of the Digital Library and Archives at Virginia Tech's UniversityLibraries: [email protected])
(Please ensure that Javascript is enabled on your browser before using this tool.)
Virginia Tech ETD Fair Use Analysis Results
This is not a replacement for professional legal advice but an effort to assist you in making asound decision.
Name: Rizwan Ali
Description of item under review for fair use: Fig. 5.7 Cross-sectional TEM image of as-deposited Cu/Ru thin film on Si (100)showing Ru thin film’s columnar microstructure, (b) the Cu/Ru/Si sample vacuum annealed at 550°C, showing thin filmdelamination as well as diffusion into the Si substrate. Source: R. Chan, T. N. Arunagiri, Y. Zhang, O. Chyan, R. M. Wallace,M. J. Kim and T. Q. Hurd, Electrochemical and Solid-State Letters, 7 (8) G154-G157 (2004).
Report generated on: 05-01-2018 at : 23:52:35
Based on the information you provided:
Factor 1
Your consideration of the purpose and character of your use of the copyright workweighs: in favor of fair use
Factor 2
Your consideration of the nature of the copyrighted work you used weighs: in favor offair use
Factor 3
Your consideration of the amount and substantiality of your use of the copyrighted workweighs: in favor of fair use
Factor 4
Your consideration of the effect or potential effect on the market after your use of thecopyrighted work weighs: in favor of fair use
Based on the information you provided, your use of the copyrighted work weighs: in favorof fair use