THE MOST POWERFUL ECR ion source produced by Pantechnik
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lorem ipsum dolor met set quam nunc parum PK - ISIS PK-ISIS 18GHz is the most powerful ECR ion source produced by Pantechnik. The axial field is generated by three low temperature superconducting coils (4 K) cooled by a single cryo- cooler. The radial field is produced by a 40 liters permanent magnet hexapole. Nevertheless, its configuration is somewhat “easy” to assemble. Special care has been taken in evaluating the radial component of the field generated by the superconducting coils, together with temperature issues in the hexapole. The final design is robust, allowing the permanent magnets to work up to a safe 40°C. The superconducting coils are cooled by a two stage High performance Pulse Tube cryo-cooler. PK-ISIS can produce any beam, gaseous or metal. Independent inputs are available for introducing very close to the plasma an oven with temperatures reaching 1400 °C or a sputtering system, with variable position, allowing to produce refractory elements beams. The gas system can include UDV valves from PFEIFFER for very high charge state production or our new system based on Mass-Flow controllers, which guarantees precise reproducibility of source parameters. The beam intensities this source can reach are listed in the table in the back. WWW.PANTECHNIK.COM ECR ion source with “He-free” 4 K Superconducting coils (axial field) + High performance Permanent Magnets (radial field) THE MOST POWERFUL ECR ion source produced by Pantechnik
Transcript of THE MOST POWERFUL ECR ion source produced by Pantechnik
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PK -
ISIS
PK-ISIS 18GHz is the most powerful ECR ion source produced by Pantechnik.The axial field is generated by three low temperature superconducting coils (4 K) cooled by a single cryo-cooler. The radial field is produced by a 40 liters permanent magnet hexapole. Nevertheless, its configuration is somewhat “easy” to assemble. Special care has been taken in evaluating the radial component of the field
generated by the superconducting coils, together with temperature issues in the hexapole. The final design is robust, allowing the permanent magnets to work up to a safe 40°C. The superconducting coils are cooled by a two stage High performance Pulse Tube cryo-cooler. PK-ISIS can produce any beam, gaseous or metal. Independent inputs are available for introducing very close to the plasma an oven with temperatures
reaching 1400 °C or a sputtering system, with variable position, allowing to produce refractory elements beams. The gas system can include UDV valves from PFEIFFER for very high charge state production or our new system based on Mass-Flow controllers, which guarantees precise reproducibility of source parameters. The beam intensities this source can reach are listed in the table in the back.
WWW.PANTECHNIK.COM
ECR ion source with “He-free” 4 K Superconducting coils (axial field) + High performance Permanent Magnets (radial field)
THE MOST POWERFUL ECR ion source produced by Pantechnik
PK-ISIS specifications
Magnetic field: • B injection variable < 2.1 T• B extraction variable < 1.5 T• B minimum variable 0.4 < B < 0.6 T• B radial at chamber wall = 1.32 T
Radio Frequency:• f = 18 GHz• Available RF power = 2.5 kW
Mechanical dimensions• Plasma chamber diameter = 82 mm• Plasma chamber Length = 450 mm• Yoke diameter = 680 mm• Yoke length = 730 mm• Weight = 1,500 kg
Insulation• V max = 30 kV
Cryogenics• (4.2-45) K Pulsed Tube cryo-cooler• P = (1 - 40) W• He free
Features• Double support chariot• Sputtering system in the axis• Oven out of axis (9° inclination)• Double wall water cooled chamber• 35 KVA power consumption• 2 years warranty
For more information, call or email us.
PANTECHNIK13 rue de la Résistance14400, BayeuxFranceT: +33 231 51 27 60F: +33 231 21 96 33
This document was conceived with PAGES
A / q 2+ 4+ 6+ 7+ 12+ 14+ 26+ 30+ 33+
4He 2400
12C >500 50
16O 1500 230
40Ar 200 100
129Xe 100
181Ta 13 4
209Bi 25 15
PK-ISIS measured beam intensities for selected ions (electric µA).
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March 2013
