Limited Partnership Limited Liability Partnership Limited Liability Company.
Teknek Limited
Transcript of Teknek Limited
Teknek
Limited
Who are we?
• Company formed 1984
• Acquired by ITW (Illinois Tool Works) in July 2011.
- $18billion sales
• Inventors & world leaders in the manufacture & design of roller
contact cleaning systems
• Global footprint
• Distribution world-wide
• Over 20,000 machines manufactured and delivered to diverse range
of industries
• Produces its own cleaning rollers & adhesives
– 10,000 cleaning rollers per year
– Design and Produce in UK, adhesive centres in UK, USA & UK
– Use around 1.2 million sq. metres of adhesive product per year
Contact Cleaning Technology
The Teknek Cleaning Core
PPT 7 / 21
Our Capabilities
• Inventors & world leaders in Contact Cleaning
• Unique chemistry and elastomer formulations
• Unique in house Roller & Adhesive facilities– Cleaning rollers up to 4metres
• Roller Production – Semi clean area Facility investment >$1m
– Just ordered new production machine at $160,000
• Research & Development Facilities
• Wide range of external scientific projects
• Most experienced people
• Vacuum Chamber Certified
Contemporary Manufacturing
Teknek Approach
• Partnership Approach
– Develop specific solutions
• We lead, others follow
– Polymers
» After 20 years competitors cannot match our silicone
products
» Nanocleen is still unique
• Machines
– New ideas – fast development
– Competitors – poor copies, no innovation
External R&D
# Project Title PartnersA HiQSurf DuPont Teikin Films, Plastic Logic,
Centre for Process Innovation, Teknek
B Clean4Yield DuPont Teijin Films, Phillips, Horiba, Dr Shenk
GmbH, IBS Precision Engineering, Teknek,
Innophysics BV, Eight19 Ltd,
Thermosensorik GmbH, Orbotech Ltd,
Coatema Coating machinery GmbH
TNO Netherlands, Riso Denmark, TU Delft
Netherlands.
C Cleaning in High Vacuum The Holst Centre Netherlands, Teknek
D Macromolecular and Particle Adsorption on Different Surfaces University of Sheffield, Teknek
E Advanced Organic Polymers Aston University, Teknek
Innovation Partnerships
June 2013
Global Expertise
• Internal R&D
– We know our stuff
• Rollers and Adhesive
– Dr June Calliston, Polymer Expert
– Sheila Hamilton, Engineer and 30 years roller experience
– Steve Mitchell, Managing Director, Physicist and Chemist
• External collaboration
– Teknek works with the best Universities and
companies to develop the science
Scale
• Big is sometimes Beautiful?!
– To supply good rollers you have to MAKE
many not BUY many
• In 2013 will MAKE over 10,000 rollers
– To be able to produce reliable adhesive you
have to Specify the paper, the adhesive, the
production process etc. etc.
• In 2013 we will make around 1.2 million sq. metres
Trust in us – Teknek Brand
• All rollers are made to International
Standard– ISO 6123 Rubber or Plastics covered rollers -Parts 1,2 & 3
– Rollers used above 200 mtrs per min are balanced to ISO 1940-
1:2003 G6.3
• Large rollers now available at G2.5
• We test, everything• Rollers for pick up, leach, straightness, TIR etc.
• Adhesive for pick up, sheer, peel, etc.
– Tested to FTM 1,8,9 &12 (International Standards)
• And we test all competitors the same way
We speak – others Listen
• Teknek is invited to speak at International
conferences on
– Cleaning advanced electronics
– Coating & converting
• Why?
– We have information that scientists and
engineers need
– What we do advances the industry
Technical conferences
# Paper/Workshop Title Conference Organisation1 Short Course Instructor for Ultra Barrier Coatings Flexible and Printed Electronics
Conference
Flextech Alliance
2 Contact Cleaning for Barrier Coatings 18th New Industrial Chemistry and
Engineering Workshop on Barrier
Technologies
Council for Chemical Research
3 Contact Cleaning for Functional Coating in Emerging
Technologies
AIMCAL Fall Conference AIMCAL
4 Improved Yields through Elastomeric Contact Cleaning AIMCAL European Conference AIMCAL
5 Role of Surface Cleanliness in Yield Enhancement European Electronics Assembly
Reliability Summit
6 Reducing Waste in Plastic Electronics LOPEC Organic Electronics Association
7 Improving Yields in High Gloss Laminates Decorative Surfaces Conference TCM
8 Optimising Cleaning Techniques for Increasing
Manufacturing Yields
Think Light Conference Ligna
9 Reducing Waste in Thin Film Manufacture ICE Conference International Converting
Association
UPCOMING
10 Cleaning in a High Vacuum Environment International Meeting Information
Display (Aug 13)
IMID Korea
11 Web cleaning Requirements for Vacuum Coating AIMCAL Fall Conference
(Oct 13)
AIMCAL
What are we saying?
• Cleaning is difficult but we understand it
– The Science of Cleaning
• Contact Cleaning Conceptual Framework
• Model developed by Teknek & University of Sheffield
– Key Scientific Outcomes
» Cleaning efficiency≠ Shore Hardness
» Contact pressure ≠ Cleaning efficiency
» Processing ≠ Cleaning
» More rollers ≠ More Cleaning
AIMCAL 2012 14
INTERFACIAL FORCES
AIMCAL 2012 15
EXAMPLES OF ADHESION FORCES
What are we saying 2
• Not all cleaning rollers are the same
• Smooth tacky rollers don’t work best
• Our roughest rollers work best – why?
• Topographic mapping & Atomic Force
Spectroscopy have lead to advanced roller
surfaces which have unique properties
Innovation 1
• Silicone Free Cleaning Engine
– Silicone free cleaning rollers
– Silicone free adhesive
– Silicone free confirmed by
– FTIR,
– Edx (Energy-dispersive X-ray spectroscopy)
– RGA (residual gas analysis)
Innovation 2
• Nanocleen
– Silicone free
– Static dissipating NO conductive particles – clever
polymers not cheap additives
– Dyne Neutral, contact angle (Measurements
on PET)
• Uncleaned contact angle 71.57, SD +/- 1.49
• Cleaned with Nanocleen 71.80, SD +/- I.46
Innovation 3
• UTF Elastomer
– Surface modified
– High cleaning capacity
– Can clean sheets of film as thin as 15 microns
– Can clean thin copper foil without wrinkles
Innovation 4
• Vacuum Compatibility
– Can be used in high vacuum environments
– No outgassing from elastomer or adhesive
– Silicone free system
– No reduction in cleaning performance
– No detriment to vacuum system
Introduction
Vacuum Process
Teknek Technology
100 75 50 30 25 10 5 1 0.5 0.2
Air Knife
Brush & Vac
High Velocity Vacuum
Ultrasonic
Contact Clean Machine
0%
10%
20%
30%
40%
50%
60%
70%
80%
90%
100%
Particle Size, Microns
Efficiency of Cleaning Methods
$
Comparison of cleaning efficiency's
(End of sub-section) 5/5
Primary Converting Secondary Converting FPD and BLU Assembly
一次加工 二次加工 组装
www.teknek.com.cn
一次加工 二次加工 アッセンブリー工程
World leader in Contact Cleaning
www.teknek.com
Customer Results 1
16/05/2013 23
Cleaning the edge of polyester web
before coating
World leader in Contact Cleaning
www.teknek.com
Customer Results 2
16/05/2013 24
Cleaning the impression roller in
hot foil coating
Customer ROI: SMT
16/05/2013 25
Environment
Wide web
16/05/2013 26
Ca
len
da
rin
g
Sp
utt
eri
ng
Pri
nti
ng
Co
ati
ng
La
min
ati
on
Se
alin
g
Pri
ma
ry
slit
tin
g/r
ew
ind
Slit
tin
g n
ew
ma
ch
ine
s o
nly
Em
bo
ss
ing
Ins
pe
cti
on
Ro
ller
cle
an
ing
Film production Cast
Cast/Stretched
Extrusion
co-extrusion
Blown
Label stock production
Siliconising Film Film
Paper
Window tinting film
Packaging Drink
FPD Films Diffuser/Polariser
Battery production Separator film
Cathode/anode
Abrasives
CCL
Paper Technical
co-extruded
Medical Pouch
Blister
Films/tape
Holographic /security
Photo Imagable film Dry film
Filter / screen mesh
Flexible circuits FPCB
Digital
BIB/BIC
Ceramics
Glass
Existing application
Requested Requested
Teknek – Leading SupplierFilms and Conversion
• 3M
• Bayer
• DuPont Teijin
• Nitto Denko
• Sumitomo Bakelite
• Toray TAF
• SKC Group
• Mitsibushi Group
• Sekisui
• Unitika
• COSMO
• Cheil (Samsung Group)
• Innox Group
• Ube
• Solutia
• Tsujiden Group
• Ashai Kasei
• Lintec
• Zeon Optes
Teknek Benefits
• Teknek technology can now
– Remove particles down to 100 nm
– From all types of substrates
– As thin as 15 microns
– In both sheet and roll format
– At speeds from 1m/min to 300m/min
– In a high vacuum environment
– Without silicone
– Gives significant yield improvements
Questions?
Questions?
Adhesion Forces
Introduction To Vacuum
What is a vacuum chamber
• It is a large strong metal container
• It is completely sealed to stop any air
getting in
• The materials to be coated are put in the
chamber before it is sealedWhen the
chamber is sealed a pump is activated
which pumps out all gases
• The pump will also extract moisture
32
Issue
• Particles of contamination on substrates
cause defects in vacuum deposition
processes used in Flat Panel display
manufacturing
• Defects cause significant yield loss
• Removal of particles is essential for high
functionality and reliability
33
How particles cause defects1
• The particles prevent the coating reaching
the substrate
• The particles get covered in coating
• When the substrate is moved or rewound
the particles are knocked loose from the
substrate leaving uncoated areas called
pinholes in the coating
• These pinholes affect the functionality of
the film34
How particles cause defects 2
• Particles can fall from the walls and roof of
the vacuum chamber
• If they land on the surface of the film and
the film is wound up the particles will
cause a depression or dent in the film
which will repeat for several layers
• The particles can also fracture brittle
ceramic coatings during rewind
35
Technology Drivers
36
• Films are getting thinner – easier to
damage by particles in the wind of the roll
• Coatings are getting thinner – even
nanoscale particles can cause pinholes
• No air or wet systems can be used in
vacuum environments
• The functional requirements on coatings
are becoming more demanding
Challenges
37
• Need a cleaning system which can
operate under vacuum
• Needs to be able to remove very small
particles
• Cannot use air or liquid for cleaning
• Must not alter the surface energy
• Must not outgas
Pinhole reduction in metallised film
0
10
20
30
40
50
60
70
No cleaning CRC Vacuum Plasma
Cleaning Operation
Pin
ho
le D
en
sit
y (
>5
µ)
/ c
m²
(x1
00
) Average Pinhole
Density of commercially
available metallised
polyester film
38
Teknek
Data courtesy of Dupont
Teijin UK
39
Areas of Application
• After stripping of protective film to remove
possibility of static induced recontamination
• Immediately prior to sputtering to remove any
particles deposited from the walls of the
chamber
• Before rewind to stop particles imprinting on the
layer below or fracturing the film
• Cleaning the protective film at rewind prior to
application to stop damage to the coating
40
Benefits
• Teknek technology can now
– Remove particles down to 100 nm
– From all types of substrates
– As thin as 15 microns
– In both sheet and roll format
– At speeds from 1m/min to 300m/min
– In a high vacuum environment
– Without silicone
– Gives significant yield improvements
41
Vacuum Processes
Thermal Evaporation
• Thermal Evaporation often called vacuum
metallising.
• Metal is melted and turns into vapour
• Long established relatively low technology
• Used mainly in food packaging
applications to provide and oxygen barrier
• Metal used is mainly aluminium
43
Chemical Vapour Deposition(CVD)
• Different chemicals are injected into the
vacuum chamber
• They react to form a material which is
condensed onto the film surface
• They can form conductive or insulative
materials
• They can also form ceramic coatings
• Used for barrier coatings and TFT
44
Sputtering
• Sputtering
• A solid metal target is hit with ions which
knock particles of metal off
• The particles of metal are attracted to the
film surface by an electric field
• The most common material is ITO
• This gives a conductive surface which is
transparent
45
ALD
46
R2R vacuum line
47
Challenges
IMID 2013 48
• Need a cleaning system which can
operate under vacuum
• Needs to be able to remove very small
particles
• Cannot use air or liquid for cleaning
• Must not alter the surface energy
• Must not outgas
Teknek Technology
Outgassing Test
• Scud Vacuum System 032
• 2 small rollers
• 2 sheets adhesive
• Pumped down to 1E-7 mbar
• Time in vacuum 66 hours
• Each sample weighed before and after.
IMID 2013 50
Ultracleen RGA
IMID 2013 51
Ultracleen Outgassing
IMID 2013 52
Nanocleen RGA
IMID 2013 53
Adhesive Roll RGA
IMID 2013 54
Cleaning Efficiency Test
roller
roller vacuum
condition adhesive sheet condition
weight
before
weight
after
Differen
ce [g]
nanocleen ambient ambient 4.31 4.57 0.26
1 weekend in vac (0.1
mbar) 4.31 4.54 0.25
18 hours in high vac (1e-6
mbar) 4.3 4.55 0.25
1 weekend in vac
(0.1 mbar) ambient 4.31 4.57 0.26
1 weekend in vac
(1e-6 mbar) ambient 4.3 4.55 0.25
nanocleen ambient ambient 4.31 4.6 0.26
ambient ambient 4.3 4.55 0.25
IMID 2013 55
IMID 2013 56
AREAS OF APPLICATION
• After stripping of protective film to remove
possibility of static induced recontamination
• Immediately prior to sputtering to remove any
particles deposited from the walls of the
chamber
• Before rewind to stop particles imprinting on the
layer below or fracturing the film
• Cleaning the protective film at rewind prior to
application to stop damage to the coating
Benefits
• Teknek technology can now
– Remove particles down to 100 nm
– From all types of substrates
– As thin as 15 microns
– In both sheet and roll format
– At speeds from 1m/min to 300m/min
– In a high vacuum environment
– Without silicone
– Gives significant yield improvements
IMID 2013 57
Acknowledgements
• European Funding Programme FP7
Clean4Yield project
• The Holst Institute, Eindhoven
• The Technical University of Dresden
IMID 2013 58
Adhesion Forces
• Adhesion describes how a particle and a surface are
held together
• A number of different forces will act together to produce
the adhesion force combination
• Two bodies in contact, an attractive force occurs that
requires a mechanical load to separate them
• Strength of adhesion is determined by how strong the
interactions are
van der Waals Force
• Total force between polar and non-polar molecules
• Force between non charged particles (non ionic)
• Particles can have a positive end and a negative end
• Opposite ends can line up and attract
• Dipole formed between particles
• Attracted by positive and negative forces
Surface + Positive Side
Particle
-Negative Side
+
van der Waals Force due to 1%
Deformation
Surface Positive Side
Particle- Negative Side
+
+
Electric Double Layer Force
• Charged (ionic) particles
Surface + + + + + +Positive Charge
Negative Charge+ ++++
Charged
Particle
- - - - - - -
Electrostatic Image Force
• Electrostatic interaction occurs between a particle and
it’s image
Surface
Charged
Particle -
+
Capillary Force
• Capillary interactions form due to water being present in
the separation gap
• Force increased due to surface tension and liquid
miniscus formed
Surface
Particle
Liquid Film
Gravitational Force
• Natural phenomenon
• Physical bodies attract each other with a force
proportional to their masses, and inversely proportional
to the square of the distance between them.
Surface
Particle
Knowledge is Power
• Calculating each individual force makes up the total
adhesion force
• Force is dependent on size of particle, type of particle
and surface, environmental conditions, shape of particle
• Gives an indication of force needed to remove particles
ISO 6123
• Part 1 covers hardness measurement
• Part 2 covers Surface characteristics
– Grade 1/1 the highest possible
– Surface finish 1 the highest possible
• Part 3 covers Dimensional Tolerances