Superjunction concept@nitc
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SUPERJUNCTION CONCEPT IN POWER MOSFET
RICHU JOSE CYRIAC
M120128EC
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Overview
Introduction
Superjunction concept
Limitation
Conclusion and future work
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Introduction
Only concept which proved wrong theoretical study on the limit of silicon in high voltage devices.
The relation in power MOSFET without superjunction is [1]
The idea of a superjunction has been used to improve this relationship from super-linear to linear [2].
5.2BVRon
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Superjunction concept
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Superjunction concept
The drift region of superjunction device is formed of multiple, alternate n and p semiconductor stripes.
p pillar does not contribute to on-state conduction in the on-state.
Cross-sectional area of the drift region is halved, Ron will be doubled for the super-junction but with increased doping Ron reduces significantly.
Poisson’s equation for 1D electric field
In a superjunction device, electric field is 2D
E
x
Ex
y
E
x
E yx
y
E
x
E yx
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Since the widths of the p and the n pillars are very small as compared with the height, the horizontal depletion takes place at a relatively low drain voltage.
n and the p pillars will be completely depleted well before the breakdown voltage is reached.
Due to the full depletion of the p and the n pillars, they should not create a maximum electric field for breakdown, Ec (critical field), at the vertical junction.
Designer’s freedom Doping profile of n region Design and pitch of p columns
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In normal Si VDMOSFET In superjunction Si VDMOSFET
Flat electric field profile instead of a triangular one as in a VDMOS transistor[3].
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Limitation
Difficulty of fabrication process. Higher aspect ratio of pillars requires large number of steps and higher costs.
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Conclusion and Future work
Semi SJVDMOSFET is an option in which a bottom assist layer is provided, so there can be some relaxation in aspect ratio.
Charge sheet super junction in which say p- pillars in SJVDMOSFET is replaced by negative charge sheet.
Al2O3 or SiO2 can be used as charge sheets. Tunable charge compensation technique can be
implemented using YFET concepts. Fabrication of SJVDMOS on wide gap
semiconductors like SiC, GaN is a research focal point.
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Reference
1. Silicon Carbide Power devices, B Jayant Baliga.
2. Jian Chen, Weifeng Sun, Long Zhang, Jing Zhu and Yanzhang Lin, “A Review of Superjunction Vertical Diffused MOSFET”, IETE Technical review, Vol29, Issue1, Jan-Feb 2012.
3. Pravin N. Kondekar and Hawn-Sool Oh, “Analysis of the Breakdown Voltage, the On- Resistance, and the Charge Imbalance of a Super-Junction Power MOSFET”, Journal of the Korean Physical Society, Vol. 44, No. 6, June 2004, pp. 1565-1570.
4. Dr. Gerald Deboy & Dr. Florin Udrea, “Superjunction devices & technologies – Benefits and Limitations of a revolutionary step in power electronics”, EPE 2007
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THANK YOU