Small Feature Reproducibility. 11/8/99 SFR Workshop - Overview 2 Small Feature Reproducibility...
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Transcript of Small Feature Reproducibility. 11/8/99 SFR Workshop - Overview 2 Small Feature Reproducibility...
Small Feature Reproducibility
11/8/99 SFR Workshop - Overview
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Small Feature Reproducibility Measuring, Understanding and Controlling Variability in deep sub-micron patterning
UC-SMART Major Program AwardE. Aydil, J. Bokor, N. Cheung, D. Dornfeld, B. Dunn, D. Graves, E. Haller,
M. Lieberman, A. Neureuther, K. Poolla, R. Smith, O. Solgaard C. Spanos
University of CaliforniaBerkeley, Davis, Los Angeles, Santa Barbara
11/8/99
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Program Goals
• Cultivate a new discipline that focuses on the reproducibility of small features.
• Pursue solutions by focusing on:– fundamental understanding
– modeling variability mechanisms
– sensing variability causes during production
• Our context is lithography, plasma, CMP, diffusion, and the way these steps interact with each other.
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Target Technologies• Lithography 193 / 157 / 14nm (0.18m - 0.05m)• Plasma and Reactive Ion Etching• Chemical Mechanical Polishing• Transient Enhanced Diffusion• Sensors and Metrology for the above
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Small Feature Reproducibility
• Capture– In-situ and off-line metrology
– Hierarchical Analysis of Variance
• Understand– Resist, Plasma, Diffusion Modeling
– Variability Impact on Device / Interconnect Performance
• Control– on-wafer / real-time / in-situ sensors
– run-to-run and real-time control
– process diagnosis
– chamber, process and product design
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Major Program Thrusts
SFR
Lithography Plasma Etching
CMPSensor Integration
EducationTED
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Changes since May, 1999
• Professor Eugene Haller (UCB) joined us to work on transient enhanced diffusion in the second year.
• Professor Tsue-Jae King (UCB) helped us re-design the major undergraduate processing class.
• Professor Eray Aydil (UCSB) joined us to work on in-chamber plasma sensors.
• Aplex left the group (and the business), Nanometrics joined the group.
• The 6-inch conversion for the Berkeley Microlab has been funded by other means and is on its way.
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Industrial Relations
• Held two workshops (11/17/98 and 11/8/99), annual review (5/13/99).
• Established industrial mentors, 15-member steering committee.
• Opened bi-weekly seminars to industry via the Web.
• Our “interactions” database captures broad interactions since the beginning of this program.
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Technology Transfer• Many visits, discussions, presentations.
– Bi-weekly seminar regularly attended by project mentors via simulcast on our web site.
• Timbre Technology, winner of Haas business plan competition, received seed funding.– Auto calibration of lithography simulators.– Scatterometry based profile reconstruction.
• Autonomous Wafer Sensors (AWS)– Autonomous / modular temperature measurement wafers.– Plasma temperature metrology (>40 sensors/wafer, >1Hz full field
monitoring, new capabilities).
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Highlights...• Our second year has been approved by the state, after a
successful first year report in September 1999.
• Bi-weekly teleconferencing seminars continue with technical talks this semester.
• ~30 graduate students, 12 Professors, 4 UC campuses – SOPRA Spectroscopic Ellipsometer
– CMP Cleaner
– CMP in place
– New P5000 identified at Intel, refurbished by AMAT
– MR2 substituted with M2I, received from Novellus last week. New room completed.
– 6-inch conversion under way
– New teaching lab operational!
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http://sfr/berkeley.edu
Depository for
• publications• resumes• project database• meeting agendas• demonstrations• posters• presentations
New software for presentinginter-campus, inter-industry,interactive, technical seminars.
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http://sfr.berkeley.edu
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Today’s Objectives
1. Present and discuss Progress.
2. Discuss 2000-2002 ideas.
Two year extension proposal due late spring 2000.
3. Bring, PIs, students, industrial participants together.
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Plans for 2000 renewal
The theme for 1998-2000 was:
“how to measure, understand and model small feature reproducibility”.
The theme for 2000-2002 might be:
“why reproducibility matters and how to control it”
“why reproducibility matters and how to control it”
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What really limits these numbers?
ITRS Conference7/99
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CD Metrology will need a (R)evolution...
ITRS Conference7/99
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General Reproducibility Model
Fundamental causes
optics, chemistry, etc.
model and understand
CD, thin filmsmeasure and model
Circuit performancemodel, predict and improve
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Web site, etc.
Timothy D. Duncan524 Cory Hall, CSG
phone: (510) 643-7542
fax: (510) 642-2739
People to Meet and Places to Go
Account Management
Brad Dexter
558 Cory Hall, ERL
phone: (510) 643-6680
fax: (510) 643-5052
http://sfr.berkeley.edu Access restricted by password.
Administrative Support
Debra Krauss558 Cory Hall, ERL
phone: (510) 643-9705
fax: (510) 642-2739
University of California, Berkeley CA, 94720-1770
8:30 – 9:00 Introductions, Overview / Spanos 9:00 – 10:15 Lithography / Spanos, Neureuther, Bokor10:15 – 10:45 Break10:45 – 12:00 Sensor Integration / Poolla, Smith, Solgaard, Dunn12:00 – 1:00 lunch, poster session begins 1:00 – 2:15 Plasma, TED / Graves, Lieberman, Cheung, Aydil, Haller
2:15 – 2:45 CMP / Dornfeld 2:45 – 3:30 Education / Graves, King, Spanos 3:30 – 3:45 Break 3:45 – 5:30 Steering Committee Meeting in room 775A / Lozes 5:30 – 7:30 Reception, Dinner / Heynes rm, Men’s Faculty Club
2st Annual SFR Workshop, November 8, 1999
