SENTECH equipment for thin film measurement · SENTECH Instruments GmbH Schwarzschildstr. 2 12489...
Transcript of SENTECH equipment for thin film measurement · SENTECH Instruments GmbH Schwarzschildstr. 2 12489...
SENTECH equipmentfor thin film measurement
• Research & development• Quality control in production• Photovoltaics• LEDs & OLEDs
Spectroscopic ellipsometersLaser ellipsometersAutomated measurement systemsReflectometers
Spectroscopic ellipsometers
Spectroscopic ellipsometer family SENresearchLarge variety of options for R & D and routine applications from DUV to NIR
• Widest spectral range 190 – 3,500 nm• Step Scan Analyzer principle for highest
measurement accuracy• Proprietary ellipsometer software
SpectraRay/3
Cost-effective ellipsometer SENproFocused on speed and accuracy for the measurementofthinfilms(1nmto15μm)
• Spectral range 370 –1,050 nm• Goniometer with preset angles of incidence• Step Scan Analyzer principle for highest
measurement accuracy• Spectroscopic ellipsometer
software SpectraRay LT
Infrared spectroscopic ellipsometer
SENDIRAVibrational spectroscopic analysis of thin layers (dielectriclayers,TCOs,semiconductors,organiclayers)
• IR spectral range 1,700 – 25,000 nm• FullyapplicableFTIRspectrometer• Proprietary ellipsometer software
SpectraRay/3
Spectroscopic ellipsometer software SpectraRay/3User-friendly software with recipe orien-ted mode for operators and advanced mode for inter active measurement and modeling
• Supports variable angle, multi-experiment, and combined photometric measurements
• Ellipsometric,reflection,andtransmission data
• Huge library of materials‘ data, large number of dispersion models
• Sample effects: depolarization, non-uniformity,scattering(Mueller-matrix),backsidereflection
Automated ellipsometer for R & D SENDUROFast, highly precise, and repeatable measurements in production, process monitoring, and R & D
• Spectral range 290 – 850 nm• Patented automatic alignment sensors• Step Scan Analyzer principle for highest
measurement accuracy• Small footprint• Routine applications• Proprietary ellipsometer
software SpectraRay/3
Laser ellipsometers
Multipleanglelaserellipsometer SE 400advCharacterizationofsinglefilmsandsubstratesinmicroelectronic, photovoltaic, data storage, display technology, life science, metal processing, etc.
• Applicationspecificanglesofincidence• HeNe laser of 632.8 nm wavelength• Measurementprecisionof0.1Å• Highmeasurementspeedallowsforfilmgrowth
monitoring and endpoint detection
CombinedEllipsometryReflectometry SE 500advMaximumflexibilityfortheanalysisofthickdielectric, organic, photoresist, silicon, or polysiliconfilms
• Fast and unembiguous determination of the thicknessoftransparentfilmsupto25µm
• Multipleanglemanualgoniometerforthecharacterizationofsinglefilmsandlayerstacks
Automated measurement tools
Ellipsometer for routine applications SENDURO 200 / 300Veryfastmeasurementoffilmsbetweenafewångstromandmorethan50µmthickness
• Cassette to cassette load for 200 mm and 300 mm wafers
• Spectral range 290 – 850 nm• Recipe based measurements• Proprietary ellipsometer software
SpectraRay/3
Summary
SENTECH Instruments GmbHSchwarzschildstr. 212489 Berlin, GermanyTel:+493063925520Fax:+493063925522E-mail:[email protected]
Sales office:SENTECHGesellschaftfürSensortechnikmbHKonrad-Zuse-Bogen 1382152Krailling/KIM,GermanyTel:+498989796070Fax:+4989897960722E-mail:[email protected]
Reflectometers
FilmThicknessProbe FTPadvFast and easy measurementoffilmthicknessinproduction, process monitoring, and R & D
• Thicknessrange20–25µm• Recipe oriented software• Adaptation to a microscope
for measurements in small areas
• Small spot size• UV to NIR spectral range• Mostaccuratemeasurementbyheight
and tilt adjustment of samples• Optionalhighresolutionmapping• Comprehensive, recipe-oriented
reflectometersoftwareFTPadv EXPERT
Spectroscopicreflectometer
RM 1000 / 2000 Accurate measurements of reflectance,filmthickness, andopticalconstantsoffilms between5nmand50µm
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SE 400adv ( )SE 500adv ( ) ( )SENpro
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( )onlyinspecialapplicationsPlease consult also our broschures about thin film metrologyfor crystalline silicon and thin film solar cells.