Scalability of CO amplifiers to generate stable > 500W extreme … · 2017. 7. 28. · 3. Toward >...

© Mitsubishi Electric Corporation

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Scalability of CO2 amplifiers to generate stable

> 500W extreme ultraviolet (EUV) beams

Koji Yasui1, Ph.D

Naoyuki Nakamura2, Jun-ichi Nishimae2

Masashi Naruse3, Kazuo Sugihara3, Masato Matsubara3

1Mitsubishi Electric Corporation, Head quarter, Tokyo, Japan 2Mitsubishi Electric Corporation, Advanced technology R&D center, Hyogo, Japan 3Mitsubishi Electric Corporation, Nagoya works, Nagoya, Japan


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1. We are supplying advanced machines for fast-growing

market such as smart phones.

2. Today IoT/AI market is emerging and we are preparing

for the new demands.

Introduction


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Contents

Introduction

1. Why we need EUVL for IoT/AI era

2. Our progress for EUVL success

3. Toward > 500W EUV beams

Summary


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CPS

Physic

al

Smart Ecosystem

CPS

CPS:Cyber Physical System, AI：Artificial Intelligence

AI

AIComparable with

today's super computer

Comparable with today's human brains

We need low-cost high-end devices for our machines



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http://www.jdzb.de/en/events/single-view/id/1632/


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Total Optimization Model

A-

Model

B-

Model

T-

ModelR-

Model

A-

CompanyUniversity

Research

Institute

Cyber

Space

B-

Company

PD-Model F-Model S-Model SS-Model

Under

Development

Trial model

Proposed


Middle

Goal


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Machine

Model

Factory

Model

Design

Model

C-

Machine

F-

FactoryB-

Company D-

MachineA-

CompanyE-

Factory

Final

Goal

Customer

Business Physical Space

Products, ServiceMarketing Data

CPS

CPS

CPS

CPS

CPS

Integrator

CPS

Smart

Ecosystem

B-

Company

C-

Machine

E-

Factory



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Physic

al S

pace

Engineering Model Data analysis approach

Experiments

Analysis / Theory Proposal Supported

by computers

and statistics

Manufacturing

Assemble

Distributing Sales

data AIIoT

Semiconductor

Chips

Modeling requires advanced theories and calculation powers

EUV-Lithography

Cut Add Paint Logistics



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(2)Stable operations

(1)Higher gain (1)High power >25kW

with better efficiency

(2)Lower loss

Technological Advantages User Advantages

(3)High EUV power


(3)Better beam shapesToday Also presented by Gigaphoton Inc.

Today


Today


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Laser Tube

Amplified Diffraction Beam

Main Laser Beam

Fast-axial-flow CO2 laser

反射型アパーチャ

Main Laser Beam

Designated Absorber

DiffractionCleaner

Transverse-gas-flow CO2 laser

Amplified

Diffraction BeamFar Field

Pattern

Better beam shapes improved for fine metal cutting

applications are also effective for efficient EUV generation

2. Our roll for EUVL success


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(2)Stable operations

(1)Higher gain (1)High power >25kW


(2)Lower loss

Technological Advantages User Advantages

(3)High EUV power


(3)Better beam shapesToday Also presented by Gigaphoton Inc.

Today


Today


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Possible technological bottlenecks toward higher power

generation and prospects.

1. Beam shape degradation Within our estimation

2. Higher electric powers

OK


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)(

111

11

1

lr

eMM

eeelW

v

vv

lWMv

lrM

v

lrM

v

l

LM

eev

WM v

WM

v

LM

1

11

11

0

0.5

1

1.5

2

2.5

3

0 5 10 15 20 25 30

Laser Beam Intensity M ( I/IS)

Effective E

xcitation D

ensity

(a.u

.)

Transverse Flow Laser

Fast Axial Flow Laser

Wall Cooling Laser= 1

IS : Saturation Intensity

Theoretical calculation to explain electrical input power

reduction of > 50% compared with other CO2 lasers



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2. Higher electric powers Within conventional powers

even at 40kW

OK

OK

3. Extraction degradation




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0

10

20

30

40

50

60

1 2 3 4 5 6 7

Our design

Lase

r o

utp

ut

po

wer

[kW

]

Number of stages of amplifiers

Scalable amplification system by increasing the number

of stages of amplifiers can be easily configured

Other design


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Higher optical transmission efficiency

is the essential property for high-power amplifiers

High-power amplifier(assuming power extraction ability of 10kW )

Complex structures tend toreduce transmission efficiency

IN 40kW

OUT h100%: 50kWh90% : 45kWh80% : 40kW

(no gain)

The ultimately simple structure of our amplifierallows for the highest transmission efficiency

and lead to scalable amplifier system

IN 40kW

OUT～50kW


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1

1.1

1.2

1.3

1.4

1.5

1.6

30 35 40 45 50


( Sm

all s

ign

al g

ain

[re

l.] )

Ris

k o

f se

lf o

scill

atio

n

Laser output power [kW]

The output power can be increased without significantly

increasing the risk of self-oscillation

Our design

Other design


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0.5

0

10

20

30

40

50

60

1 1.1 1.2 1.3 1.4 1.5 1.6 1.7 1.8 1.9 2

lase

r o

utp

ut

po

wer

(kW

)

smal

l sig

nal

gai

n (

rel.)

transverse flow parameter (rel.)

0

1

2

1.5

The output power can be increased without significantly

increasing the risk of self-oscillation

Our design


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2. Higher electric powers

OK

3. Extraction degradation Within our estimation OK

Within conventional powers

even at 40kW OK




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Summary1. Scalability of CO2 amplifiers to generate > 500W EUV beams that are

required in the near future for high-volume-manufacturing of IoT/AI

devices are discussed.

2. We consider that with the emerging application fields related to IoT/AI

technology, EUV lithography has become essential technology.

3. We have shown that CO2 amplifiers with transverse-gas-flow

configuration could solve technological bottlenecks to enhance the EUV

powers more than 500W.


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One appendix

Digital pre-pulsing technology based on controllable

digital picosecond lasers are also going to be proposed

in the near future for better EUV efficiency.


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Acknowledgements

・A part of this work was supported by The New Energy and Industrial Technology Development Organization (NEDO, Japan)

・The experiments were performed by research members of Mitsubishi Electric corp. and Gigaphoton Inc.

Thank you very much for your attention

Scalability of CO amplifiers to generate stable > 500W extreme … · 2017. 7. 28. · 3. Toward >...

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