Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules...

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Repetition: Physical Deposition Processes PVD (P hysical V apour D eposition) Evaporation Sputtering Diode-system Triode-system Magnetron-system ("balanced/unbalanced") Ion beam-system Ionplating DC-glow-discharge RF-glow-discharge Magnetron- discharge Arc-discharge Ion-Cluster-beam Reactive versions of the above processes

Transcript of Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules...

Page 1: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Repetition: Physical Deposition Processes

PVD (Physical

Vapour

Deposition)

Evaporation

SputteringDiode-systemTriode-systemMagnetron-system ("balanced/unbalanced")Ion beam-system

IonplatingDC-glow-dischargeRF-glow-dischargeMagnetron-

dischargeArc-dischargeIon-Cluster-beam

Reactive

versions

of the

above

processes

Page 2: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Repetition: Rates and Cooling Rates PVD

10

377

29

3.77·10

2.9·10 2.9·10

3.77·10

Sputtering

Evaporation

Effusion cell,Ion Gun

High ratemagnetron

High rateelectrongun

E =1eV

E =0.1eV

R[nm/s]

R [K/s]

R [K/s]

10 1010 101-2

T

T

3

particle

particle

4

3

7

6

-1

These extremely

high achievable

cooling

rates

show, that

PVD processes

(apart from

being

a direct

transition

from

vapor

solid state) often

can

be

considered

as non equilibrium

processes.

Page 3: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Vacuum Physics

Mean

free

path: the

way a gas particle

(or

a film particle) can

travel

without

a collision

with

another

particle.

Impingement

rate:

number

of particles

which

hit

a surface

per second and unit

area

at constant

pressure.

Coverage

time: time needed

for

the

formation

of a full

monolayer.

Central Termini:

Page 4: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path ICollision

of two

particles, 1 and 2 with

radius

r = R/2:

2r

R

1

If

both

particles

are

considered

as points

then

a collision happens, if

particle

1 is

located

within

a disk of the

area

= ·R2.

is

called

the

collision

cross

section.

Page 5: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path IIAparticle

moves

straight

for

a distance l through

a gas.

Within

a cylinder

of the

volume

V = l·

it

will collide

with each

particle

located

in V.

l

The

cylinder

contains

N = n ·

V

particles. For straight movement

this

is

the

collision

number.

Page 6: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path IIIOne collision

happens

if

N = 1. This

yields

the

mean

free

path

as:

1nVn1N

22 rn41

Rn1

n1

Macroscopic

information:

Particle

density

n,from

the

ideal gas equation.

Microscoic

information:

Collision

cross

section

contains

energy

dependent

atom/molecule

radii

or

the

general

interaction

cross

sections

of the

colliding particles.

Page 7: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path IVState of movement

of the

background

gas:

2rn41

Energeticcoating

particle: relative

movement

maybe

neglected

Gas particle:relative movementmay

not be

neglected

2rn421

Page 8: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path - Example

Tkpn

VNTkNVp

rn41

BB2

p = 0.1 Pa kB

=1,38·10-23J/KT = 300Kr = 1.5·10-10m

cm6.14]m[105.1]mJ[1.04

]K[300]K/J[1038.1rp4

Tk

2103

23

2B

Page 9: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path - Rough Estimate

p=5mmPap = 1 Pa

= 5 mm

p = 10-4

Pa

= 50 m

10-5 10-4 10-3 10-2 10-1 100 101 1021E-4

1E-3

0,01

0,1

1

10

100

CO2; Ar; N

2

He

H2O

Mitt

lere

Fre

ie W

eglä

nge

[m]

Druck [Pa]

Page 10: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Mean Free Path: Scale Consideration

p=5mmPaCERN –

LHC:U = 2·4.3 ·

= 27 km

mbar108.1Pa108.1107.2

5]mm[

5]Pa[p

]Pa[p5]mm[

97

7

Within

LHC a pressure

of approx. 10-9

mbar

has to be

maintained, to exclude interparticle

collisions.

Page 11: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Gas Phase Transport

xexp)0(N)x(N

A significant

number

of collisions

happens

before the

mean

free

path

is

reached.

Only

approx. 37% of the

particles

reach

without

a collision.The

mean

free

path

is

only

a statistical

measure.

This

means:

Clausius' law

of distance:

Page 12: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Gas Phase Transport - Statistics

0

0

xexp

xexpxd

d1 d2

dn

Consider

large ensemble

of single

situations:

Calculate

the

expectation

value

of free

throw

distances:

Page 13: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Areal Impingement Rate IInitial situation: Gas molecules

hit

surface

Wanted: number

of gas molecules, which

hit

the

unit surface

within

1 second.

Page 14: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Areal Impingement Rate IIApproach: cylinder

with

unit

top

areas, heigth

u.

Only

particles

with

a velocity

component

u

in the direction

of e1

, which

trespass

the

top

cylinder

surface reach

the

surface

within

unit

time.

Differential areal impingement

rate:

u

e

1

1

du)u(n1udzdensityparticle

volumecylinder

u

Page 15: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Areal Impingement Rate III

Differential arealimpingement

rate:

du)u(n1udzdensityparticle

volumecylinder

u

Total arealimpingement

rate:

00

u du)u(undzZ

Maxwell-distribution of one

velocity-

component:

Tk2um

B

B

2

eTkm2

m)u(

Page 16: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Areal impingement rate IVCalculation

of the

total areal

impingement

rate:

Tk2m

mp

Tkpn

VN

mTk

Tk2mndueu

Tk2mn

du)u(undzZ

BB

B

B

mTk

0

Tk2um

B

00u

B

B

2

Page 17: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Areal Impingement Rate V

Z = Z(p,T,m)=

Tk2m

mp

B =

Z = 2.7·1017

s-1cm-2

etwa 270 ML/s

m= 5.3·10-26

kg (O2

)kB

=1,38.10-23J/KT = 300K

p = 0.1 Pa

Z = 2.7·1014

s-1cm-2

etwa 0.2 ML/s

p = 10-4

Pa

Page 18: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Areal Impingement Rate - Graphic

Page 19: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Types of Vacuum

Name

Pressure

[Pa]

Mean

free Coverage

time

path

[mm] O2

, 300K [ML/s]

Rough

vacuum

Atm1 5·10-55 2.7·105 2700Fine vacuum

1 0.1

5 50

2700 270

High vacuum

(HV) 0.1 10-5

505·105

270 0.027Ultra high vacuum

(UHV)

10-5

10-10

5·1055·1010

0.027 2.7·10-7

Extreme UHV (XHV)

<10-10

5·1010

2.7·10-7

5·105 mm ≡

500 m 5·1010 mm ≡

50 000 km (!)

Page 20: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Types of Pumps

Gas transporting:+ Rotary

pump

Rough

vacuum/fine vacuum

+ Diffusion pump High vacuum+ Turbomolecular

pump

High vacuum

Gas adsorbing:+ Cold traps

Fine vacuum

+ Cryo

pumps

High vacuum/UHV+ Sublimation pumps

UHV

+ Getter

pumps

UHVreactive

gases

+ Ione getter

pumps UHV

inert

molecules

(activation)

Page 21: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Flow Types

Laminar/turbulent:

Rough

vacuum/fine vacuum

Flow

through

a pipe, diameter

d:

Molecular: High vacuum, UHV

d

d

Particle

collisionsprobable, global flow

Wall collisionsprobable,no flow

d

d

Page 22: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Flow Types and Pumping Systems

Efficient

in the

laminar

region:+ Gas transporting

pumps:

Rotary

pumpEjector

pump

+ Rotary

pumps, except

Turbomolecular

pumps

Efficient

in the

molecular

region

:+ Gas transporting

pumps:

Diffusion pumpTurbomolecular

pump

+

Gas adsorbing

pumps

Page 23: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Design Criteria for Vacuum Systems

Mean

free

path

:+ Choice

of pump type

+ Pump velocity+ Dimension of pipe

diameters

Areal impingement

rate Z:+ Coverage

times

(e. g. surface

analytics)

+

Impurity

content

in coatings

(ratioof impingement

rate of the

coating

particles

and of the

background

gas particles)

Page 24: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Impurities

High

sticking

coefficient

1 (ZDes

0):Reactive

gases:

O2H2

0Complex

carbohydrates

(pump oil)

Low

sticking

coefficient

<< 1 (ZDes

Z):Inert

gases:

Noble gasesN2CH4Carbohydrates

without

reactive

groups

Sticking coefficient

: Z

Z1 Des Z ...

Ipingement

rateZDes

...

Desorption

rate

Page 25: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Impurities: Example

Coating

material:

Al, m = 4.5·10-26

kgRate Al: 10 nm/s = 3 ·1019

At/(m2s-1)

Impurity: O2

, m =

5.3 ·10-26

kgSticking

coefficient

:

approx. 1 für Al und O2

Temperture:

300KWanted: Background gas pressure, at which

1%

Oxygen

is

incorporated

unto

the

coating

Pa1011.1m

Tk2m10310p

Tk2m

mp

103110

ZZ

5

O

BO

192

B

O

O19

2

Al

O

2

2

2

2

2

Page 26: Repetition: Physical Deposition ProcessesUHV reactive gases + Ione getter pumps UHV inert molecules (activation) Flow Types Laminar/turbulent: Rough vacuum/fine vacuum Flow through

Design Criteria: Summary

Mean

free

path

:Influences

gas dynamics. Even at rather

high

pressures

(10-2

Pa) the

mean

free

path

reaches the

dimensions

of average

deposition

chambers

.

Areal impingement

rate Z:Crucial

for

coating

purity. The

pressure

of the

background

gas has to be

at least in the

medium high vacuum

to guarantee

sufficient

film purity.