Rapid, Predictive Modeling for High Frequency Interconnect on Low Cost Substrates

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Rapid, Predictive Modeling for High Frequency Interconnect on Low Cost Substrates Jaemin Shin Advisor: Dr. Martin A. Brooke School of Electrical and Computer Engineering Georgia Institute of Technology, Atlanta, GA 30332 April 2005 Dissertation Defense Presentation Spring, 2005

description

Rapid, Predictive Modeling for High Frequency Interconnect on Low Cost Substrates. Dissertation Defense Presentation Spring, 2005. Jaemin Shin Advisor: Dr. Martin A. Brooke School of Electrical and Computer Engineering Georgia Institute of Technology, Atlanta, GA 30332 April 2005. - PowerPoint PPT Presentation

Transcript of Rapid, Predictive Modeling for High Frequency Interconnect on Low Cost Substrates

Page 1: Rapid, Predictive Modeling for High Frequency Interconnect on Low Cost Substrates

Rapid, Predictive Modeling for High Frequency Interconnect on Low Cost

Substrates

Jaemin ShinAdvisor: Dr. Martin A. Brooke

School of Electrical and Computer Engineering

Georgia Institute of Technology, Atlanta, GA 30332

April 2005

Dissertation Defense Presentation

Spring, 2005

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Outline

Objective

Limitations of Electrical Board-level Interconnects

Background

Motivation

Proposed Modeling Procedure

Modeling of Straight Microstrip Lines

Modeling of Serpentine Interconnects

Conclusions

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Objective

Our goal is to develop a rapid, predictive (scalable) measurement-based modeling method for high frequency interconnects on low cost substrates:

Modeling of interconnect structures

Prediction by scalability and interpolation

Evaluation of modeling performance with measured behaviors and a simulation tool.

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Outline

Objective

Limitations of Electrical Board-level Interconnects Board-level Interconnect Geometrical limitations at high frequency

Background

Motivation

Proposed Modeling Procedure

Modeling of Straight Microstrip Lines

Modeling of Serpentine Interconnects

Conclusions

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Board-level Interconnect in Telecommunication

Backplane Interconnect

Chip-to-chip Interconnect

[1] http://www.ece.gatech.edu/research/labs/mag/mixed_signal/mixedsig3.htm

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Limitations of Electrical Board-level Interconnects 1

Signal integrity problems Transmission-line effects

High rising and falling time and delay time High channel loss of long channels

Non-ideal effects at high frequency Skin effect Frequency-dependent dielectric loss Manufacturing variations

Geometrical issues Geometrical discontinuity

Reflection loss (Echo effect) Dense connections

Self-coupling Crosstalk

Electromagnetic interference (EMI)

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Limitations of Electrical Board-level Interconnects 2

Switching noise High power consumption

Thermal problem

Approaches to addressing the limitations Advanced electrical technology

High speed interconnect driver : LVDS, CML, and PECL Clock & data recovering circuit (CDR) High performance board material Co-design with accurate channel model

Optical interconnect technology Optical technology

VSCEL (Vertical Surface Cavity Emitting Laser), micro-mirror, and optical waveguide embedding techniques

Contribution of this thesis work

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Trend of Board-level Interconnect

According to 2003 ITRS (International Technology Roadmap of Semiconductor)

In near-term years, off-chip frequency will be to keep its speed lower than 10 GHz.

Most telecommunication companies have preferred the use of low cost FR4 materials.

Moreover, cost-performance and low-cost products occupy a considerable area of the market

Thus, interconnects on FR4 are still attractive.

However, at high frequency, FR4 material needs more design work with an efficient, accurate model to achieve acceptable electrical performance.

0

10

20

30

40

50

60

1999 2001 2003 2005 2007 2009 2011 2013 2015 2017

Year

Freq

uenc

y (G

Hz)

On-chip frequency Off-chip frequency

[2] http://public.itrs.net/Files/2003ITRS/Home2003.htm

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Example 1: Long Straight Lines of Different Dielectric Materials 1

[3] http://www.tycoelectronics.com/products/simulation/files/papers/dc00brdh.pdf

Four different board materials Configuration of striplines with 50-Ω characteristic impedance 12-mil wide, 18-inch long channel line

Material εr

@1 MHz

εr

@1 GHz

tanδ@1GHz

Relative Cost

FR4 4.30 4.05 0.020 1

GETEK 4.15 4.00 0.015 1.1

ROGERS 4350/4320

3.75 3.60 0.009 2.1

ARLON CLTE 3.15 3.05 0.004 6.8

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[3] http://www.tycoelectronics.com/products/simulation/files/papers/dc00brdh.pdf

Eye diagrams at 5 Gbps and 10 Gbps

a) 5 Gbps b) 10 Gbps

Example 1: Long Straight Lines of Different Dielectric Materials 2

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Example 2: Long Straight Lines with a Via

Straight transmission line with viaStraight transmission line without via

Low-cost FR4 material Microstrip with

50-Ω characteristic impedance Via connection Three different line lengths (1, 10 and 20cm)

and three different speeds (1 G, 2.5 G and10 Gbps)

εr=4.3

130 mil

1.7 mil

FR420 mil

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130-mil wide serpentine structures on FR4 board Coupling effects and bending effects

Example 3: Interconnect Structures with Couplings and Bends

130-mil wide M-shaped serpentine structure with 130-mil spacing

Bending effect & Line length

10Gbps

Coupling effect

130-mil wide M-shaped serpentine structure

with 65-mil spacing

130-mil wide 7-turn serpentine structure with 130-mil spacing

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Outline

Objective

Limitations of Electrical Board-level Interconnects

Background Non-ideal Effects Previous Modeling Methods

Motivation

Proposed Modeling Procedure

Modeling of Straight Microstrip Lines

Modeling of Serpentine Interconnects

Conclusions

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Non-ideal Effects on Transmission Line 1

Skin effect Skin depth

=130mil

mF 00

2

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Complex dielectric constant due to the electric polarization

Loss tangent

Non-ideal Effects on Transmission Line 2

Frequency-dependent dielectric loss

"'-j

''

"tan

FR4

Polymide

BT/Epoxy

951 Green TapeTM

[4] D. I. Amey and S. J. Horowitz, "Materials performance at frequencies up to 20 GHz," presented at IEMT/IMC Symposium, 1997., 1st [Joint International Electronic Manufacturing Symposium and the International Microelectronics Conference], 1997.

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Non-ideal Effects on Transmission Line 3

Manufacturing variations Composite ratio (glass- to- resin ratio)

Conductor surface roughness Too rough and random

Fabrication tolerance The need for statistical approaches

glsglsrsnrsnr VV Metal

FR4

SEM (Scanning Electron Microscope) picture

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Previous Modeling Methods

Earlier interconnect research: microwave and digital engineering Microwave engineering: transmission lines in narrow

bandwidths Digital engineering: timing analysis at low frequency High-frequency digital interconnect: frequency analysis

based on the electromagnetic equations, numerical methods, and measurement techniques

Three classical methods Analytical equation-based method Numerical full-wave-based method Measurement-based method

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Direct derivation of a model from the fundamental electromagnetic equations

Neither accurate nor practical unless the structures of interest are simple

Not flexible

Difficult to develop, in general

Basic insight and background for the two following methods

Analytical Equation-based Method

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Maxwell equation-based method

Discretization of a structure into small segments to obtain accurate responses of the entire system (trade-off between accuracy and computational efficiency)

Accurate and highly flexible

Slow speed and extensive memory requirements for complex geometrical systems

Difficult to incorporate the non-ideal effects such as frequency-dependent variables and manufacturing variations

Numerical Full-wave-based Method

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Measured data in the frequency domain can be used to find circuit model parameters. Optimization techniques are used for the equivalent-circuit parameters

Statistical modeling approaches can be applied to overcome the manufacturing variations

The non-ideal effects are naturally incorporated

Compatible with the existing circuit simulators

Very accurate and fast

Needs to be more flexible

Measurement-based Method

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Motivation The need for an accurate, rapid model for interconnects on FR4

to address electrical board-level interconnect limitations at high frequency

FR4 material limitations Non-ideal effects Geometrical limitations Inefficiency of numerical methods for complex structures

Advantages of the measurement-based method compared with others

Easy: Compatibility with the circuit simulators Efficient - Very fast simulation speed

- No need for heavy computation resources Accurate: Incorporation of the non-ideal effects Statistical: Incorporation of the fabrication tolerance

The need for improved flexibility: the use of scalability and interpolation can achieve this goal.

Co-simulation and Co-design with circuits

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Proposed Modeling Procedure

Determining the interconnect structures to be considered

Defining building blocks

Design and fabrication

Calibration and measurement

Extraction of EC-parameters using optimization

Predicting other structures by using the scalable model and

interpolation

Verification with measured data

Co-simulation and co-design with circuitry

Statistical approaches

ExtensionInitial modeling Generalization

Generating model library

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Performance Evaluation

Modeling performance attributes

Accuracy

Frequency domain: Impedance parameters

Time domain: Eye diagrams

Efficiency

Computation resources

Simulation times

Utility

Limited to accessibility

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Measurement Setup

Frequency response Channel characterization

Z-parameters converted from measured S-parameters

SOLT (Short-open-load-thru) calibration using 3.5 mm calibration kit

Vector network analyzer (VNA)

Time response Interconnect verification

Eye diagrams Pattern generator and digital

oscilloscope

VNA

Device Under Test (DUT)

Port 1 Port 2

Pattern generator

DUT

Digital Oscilloscope

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Z21

Mag

nit

ud

e (d

B)

Z11

Mag

nit

ud

e (d

B)

Z21

Ph

ase

(deg

ree)

Z11

Ph

ase

(deg

ree)

Momentum simulation results of the 2400 mil microstrip with SMA connector

Measured Momentum

Momentum Simulation

Momentum simulation Layout

2400 mils

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Outline

Objective

Limitations of Electrical Board-level Interconnects

Background

Motivation

Modeling Procedure

Modeling of Straight Microstrip Lines Modeling Description Results and Performance Comparison

Modeling of Serpentine Interconnects

Conclusions

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Building Block Diagrams and Equivalent Circuits

Rectangular Building Block

50 mil

SMA Building Block

SMA Building Block

SMA Connector Building Block

Rectangular Building Block

400-mil long line 800-mil long line

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Test Structures of the Straight Microstrip Lines

2400 mil long line 1600 mil long line

1200 mil long line 800 mil long line

400 mil long line (Predictive model)

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Optimization of Equivalent-circuit Parameters

50 mil long microstrip building block

SMA connector building block

Measured s-parameter data block

Equivalent-circuit block

Optimization setup

Initial values

S-parameter simulation setup

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Optimized Z-parameter Data of the 400-mil Long Line

Measured Modeled

Z2

1 M

ag

nit

ud

e

(dB

)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

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Predicted Z-parameter Data of the 800-mil Long LineZ

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled Momentum

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Z2

1 M

ag

nit

ud

e

(dB

)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled Momentum

Predicted Z-parameter Data of the 2400-mil Long Line

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0 V

500 mV

0 V

500 mV

1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Comparison of Eye Diagrams of the 2400-mil Long Line

Measured eye diagrams

Simulated eye diagrams using the predicted structure

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Simulation Time vs. Line Length

Simulation Resources a UNIX computer

500 MHz Ultra SPARC IIi CPU

2 G-byte memory

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Outline

Objective

Limitations of Electrical board-level Interconnects

Background

Motivation

Modeling Procedure

Modeling of Straight Microstrip Lines

Modeling of Serpentine Interconnects Modeling Description Results and Performance Comparison Interpolation

Conclusions

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Building-block Diagrams and Equivalent Circuits

SMA Connector Building Block

Uncoupled Rectangular Building Block

Coupled Rectangular Building Block U-shaped Building Block

N-shaped structure M-shaped structure

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Combination of Equivalent Circuits

Equivalent circuits of the N-shaped structure

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Test Structures 1

Predicting

3 different widths and 3 different spacings

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Test Structures 2

Four additional extended structures 130-mil width and 130-mil spacing (1S) 4-, 5-, 6- and 7- turn serpentine interconnect structures

4 turns 5 turns 6 turns 7 turns

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Predictive equivalent circuit block

Measured s-parameter data block

Optimization of Equivalent-circuit Parameters

Optimization setupUncoupled Rectangle

SMA connector

Coupled Rectangle

U-shape

Initial values

Uncoupled Rectangle

Mutual Coupling Element

S-parameter simulation setup

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Optimized Z-parameter Data of the N-shaped Serpentine Structure Z

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled

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Predicted Z-parameter Data of the M-shaped Serpentine Structure Z

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled Momentum

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1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Comparison of Eye Diagrams of the M-shaped Serpentine Structure

Measured eye diagrams

Simulated eye diagrams using the predicted structure

0 V

500 mV

0 V

500 mV

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Predicted Z-parameter Data of the 7-turn Serpentine Structure Z

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled Momentum

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1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Measured eye diagrams

Simulated eye diagrams using the predicted structure

0 V

500 mV

0 V

500 mV

Comparison of Eye Diagrams of the 7-turn Serpentine Structure

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Simulation Time vs. Number of Turns

Simulation Resources a UNIX computer

500 MHz Ultra SPARC IIi CPU

2 G-byte memory

N-shaped M-shaped

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Interpolation

104-mil width (-20%) 156-mil width (+20%)

65-mil spacing (0.5 S)

260-mil spacing (2 S)

130-mil width and 130-mil spacing (1S)

Width-interpolation

Spacing-interpolation

N-shaped Structure Interpolation

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Z-parameter Data of N-shaped Structure Predicted by Width-interpolationZ

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled

Predicted Z-parameter data of the 130-mil wide N-shaped serpentine structure

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1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Measured eye diagrams

Simulated eye diagrams using the predicted structure obtained by width-interpolation

Comparison of Eye Diagrams of the Predicted N-shaped Structure by Width-interpolation

0 V

500 mV

0 V

500 mV

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Z-parameter Data of M-shaped Structure Predicted by Width-interpolationZ

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled

Z-parameter data of the 130-mil wide M-shaped serpentine structure predicted using EC-parameters of the width-interpolated N-shaped structure

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1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Measured eye diagrams

Simulated eye diagrams using the width-interpolated predicted structure

Comparison of Eye Diagrams of the Predicted M-shaped Structure using the EC-parameters of the Width-interpolated N-shaped Structure

0 V

500 mV

0 V

500 mV

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Z-parameter Data of N-shaped Structure Predicted by Spacing-interpolationZ

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled

Predicted Z-parameter data of the N-shaped serpentine structure with 130-mil spacing (1S)

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1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Measured eye diagrams

Simulated eye diagrams using the spacing-interpolated predictive model

Comparison of Eye Diagrams of the Predicted N-shaped Structure Obtained by Spacing-interpolation

0 V

500 mV

0 V

500 mV

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Predicted Z-parameter Data of M-shaped Structure by Spacing-interpolationZ

21

Ma

gn

itu

de

(d

B)

Z1

1 M

ag

nit

ud

e (

dB

)

Z21

Ph

ase

(de

gre

e)

Z1

1 P

ha

se

(d

eg

ree

)

Measured Modeled

Z-parameter data of the M-shaped serpentine structure with 130-mil spacing (1S) predicted using EC-parameters of the spacing-interpolated N-shaped structure

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1 Gbps 2.5 Gbps 5 Gbps 7.5 Gbps 10 Gbps

Measured eye diagrams

Simulated eye diagrams from the predictive model by spacing-interpolation

Comparison of Eye Diagrams of the Predicted M-shaped Structure using EC-parameters of the Spacing-interpolated N-shaped Structure

0 V

500 mV

0 V

500 mV

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Conclusions

A rapid, predictive measurement-based modeling method was developed for high-frequency interconnects on FR4.

Our method was applied to the modeling of straight microstrip lines and serpentine interconnect structures.

The predictive power of the developed scalable models was demonstrated in several extended interconnect structures, and the ability to use interpolation to predict the high frequency performance of structures with differently sized building blocks was demonstrated.

The usefulness of this predictive method was validated by comparing our predictions with measurements both in the frequency and time domains and by comparing our predictions with the ADS momentum simulations in terms of efficiency and accuracy.

Therefore, this proposed high-frequency interconnect modeling method is not only efficient but accurate as well, compared with the measured behaviors and the momentum simulation. Furthermore, the interpolation enable fast accurate predictions for variations of interconnects in width and spacing.

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Publications Generated 1) J. Shin, C.-S. Seo, A. Chellappa, M. Brooke, A. Chattejce and N. M. Jokerst, "Comparison of electrical

and optical interconnect," Electronic Components and Technology Conference, 2003.

2) O. Bourdreaux, S.-Y. Cho, J. Shin, A. Chellappa, D. Schimmel, M. Brooke and N. M. Jokerst, "Optical chip-to-chip interconnects for memory systems," presented at Lasers and Electro-Optics Society, LEOS, the 16th Annual Meeting of the IEEE, 2003.

3) C. Cha, J. Shin, Z. huang, N. M. Jokerst and M. Brooke, “High-Frequency Equivalent Circuit-Level Model of MSM PD for Optical Front-end Receiver Applications,” presented at Asia Pacific Microwave conference, APMC 2003.

4) N. M. Jokerst, T. K. Gaylord, E. Glytsis, M. A. Brooke, S. Cho, T. Nonaka, T. Suzuki, D. L. Geddis, J. Shin, R. Villalaz, J. Hall, A. Chellapa and M. Vrazel,"Planar lightwave integrated circuits with embedded actives for board and substrate level optical signal distribution," Advanced Packaging, IEEE Transactions on [see also Components, Packaging and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on], vol. 27, pp. 376-385, 2004.

5) J. Shin, C. Cha, S. Cho, J. Kim, N. M. Jokerst and M. Brooke,"FR4 printed circuit board design for Giga-bits embedded optical interconnect applications," presented at Electronic Components and Technology, ECTC '04. Proceedings, 2004.

6) J. Shin, S.-W. Seo, S.-Y. Cho, J. H. Kim, M. Brook and N. M. Jokerst,"Embedded photodetectors in polymer waveguides for optical interconnect integrated with a Si-Ge transimpedance amplifier circuit operating at 2.5 Gbit/s,"presented at Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, Digest of the LEOS Summer Topical Meetings, 2004.

7) J. H. Kim, J. Shin, C. Cha, N. Jokerst and M. Brooke, “Wideband multiple resonance small-signal laser diode model for the co-design of laser drive circuits,” presented at the 47th Midwest Symposium, 2004.

8) J. Shin, J. H. Kim, C. Cha, N. M. Jokerst and M. Brooke,”Rapid, Predictive Measurement-based Modeling for High Frequency Interconnect on FR4 Substrate,” accepted at Electronic Components and Technology, 2005.

9) J. H. Kim, J. Shin, C. Cha, N. M. Jokerst, and M. A. Brooke, “An Improved Wideband Laser Diode Lumped Element Equivalent Circuit Model for the Optoelectronic Circuit Design,” submitted at Information and Communication Engineers (IEICE) Transactions on Information and Systems, 2005

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Question

Thank You