Power Semiconductors - Fujielectric · 2008. 8. 19. · 2sk3522-01 to-247 2sk3523-01r to-3pf...

30
Whole Number 193 Power Semiconductors

Transcript of Power Semiconductors - Fujielectric · 2008. 8. 19. · 2sk3522-01 to-247 2sk3523-01r to-3pf...

Page 1: Power Semiconductors - Fujielectric · 2008. 8. 19. · 2sk3522-01 to-247 2sk3523-01r to-3pf 2sk3524-01 to-220 2sk3525-01r to-220f 2sk3501-01 to-220 2sk3502-01mr to-220f 2sk3450-01

Whole Number 193

Power Semiconductors

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Fuji Power MOSFET Realizes High-Efficiency, High-Frequency Switching Power Supply

The power MOSFET for low-loss, high-speed switching utilizing

micro-processing, resistance-reduction, and gate-area-reduction

technologies realizes

Low gate charge (Q g) as low as 40% of our conventional type

Low turn-off switching loss (E off) as low as 75% of our

conventional type

High ruggedness for repetitive avalanche

Small-sized packages

FUJI Power MOSFET “SuperFAP-G Series”

SuperFAP-G Series

2SK3514-01 TO-2202SK3515-01MR TO-220F2SK3517-01 TO-2202SK3518-01MR TO-220F2SK3519-01 TO-2202SK3520-01MR TO-220F2SK3468-01 TO-2202SK3469-01MR TO-220F2SK3504-01 TO-2202SK3505-01MR TO-220F2SK3522-01 TO-2472SK3523-01R TO-3PF2SK3524-01 TO-2202SK3525-01R TO-220F2SK3501-01 TO-2202SK3502-01MR TO-220F2SK3450-01 TO-2202SK3451-01MR TO-220F2SK3527-01 TO-2472SK3528-01R TO-3PF2SK3529-01 TO-2202SK3530-01MR TO-220F2SK3531-01 TO-2202SK3532-01MR TO-220F2SK3533-01 TO-2202SK3534-01MR TO-220F2SK3474-01 TFP 150V 23A2SK3535-01 TFP 250V 24A 105mΩ

500V

800V

900V

8A

5A

8A

12A

14A

21A

6A

10A

17A

12A

5A

4.6A

5.5A

450V

500V

500V

500V

500V

600V

600V

600V

600V

900V

0.46Ω

0.65Ω

1.5Ω

0.85Ω

0.26Ω

1.2Ω

0.75Ω

0.65Ω

0.37Ω

1.9Ω

2.0Ω

70mΩ

2.5Ω

0.52Ω

50

40

30

200.3 0.4 0.5 0.6 0.7

R DS(on) (Ω)

600V-0.75Ω devices

Eof

f (µJ

) at

Vcc

=30

0V,

I D=

10A

,R

G=

10 Ω

SuperFAP-G Series

Type Package V DSS I D R DS (on)

Conventionaltype

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Cover Photo:In the field of power conversion

semiconductor devices that supportpower electronics, Fuji Electric’sIGBT modules have been rated highin the market. Recently, there havebeen demands for still larger capac-ity IGBT modules suitable to makeup a conversion capacity of the40kW to 1MW class.

Fuji Electric newly starts selling“EconoPACK-Plus” to meet theseneeds for larger capacity. Thismodel, the fruit of an intensivestudy in pursuit of small size andeasy handling, will be Fuji Electric’sstandard for large capacity IGBTmodules.

The cover photo images the“EconoPACK-Plus” and the equiva-lent circuit for built-in devices.

Head Office : No.11-2, Osaki 1-chome, Shinagawa-ku, Tokyo 141-0032, Japan

CONTENTS

Power Semiconductors

Present Status and Trends of Power Semiconductor Devices 34

Large-Capacity 6-in-1 IGBT Module “EconoPACK-Plus” 37

Power MOSFET “SuperFAP-G Series” for 41Low-Loss, High-Speed Switching

Multiple-Chip Power Device “M-POWER” for Power Supplies 45

New 4.5kV High Power Flat-Packaged IGBTs 50

Reliability Design Technology for Power Semiconductor Modules 54

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW34

Yasukazu Seki

Present Status and Trends ofPower Semiconductor Devices

1. Introduction

The curtain has been raised on new century. Priorto discussing the present status and trends of powersemiconductor devices, allow us to briefly review FujiElectric’s history with power devices. The semiconduc-tor device was invented and developed in the latterhalf of the 20th century. When Shockley, Brattain,and Bardeen invented a transistor in 1948, they didnot think that this transistor could control a currentlarge enough to turn a motor, we suppose. Transistordevices began as small signal devices and later devel-oped into ICs, and then broadened their range ofapplication to power devices. These new power devicesgave birth to new control technology and developedinto new power electronics technology.

Fuji Electric has been developing power devicesand their control technology ever since the earlystages, including the power transistor in 1972, and hascontinued as a leader and developer of this industry.

In the 1980s, the highly anticipated MOS (metal-oxide-semiconductor) gate power device was intro-duced. Next, the power MOSFET (MOS field-effecttransistor) was invented and was soon followed by theIGBT (insulated-gate bipolar transistor). Production ofthe power MOSFET utilized the cutting-edge semicon-ductor technology of those days. Though it was apower device, it required production in a clean roomwhere the cleanliness level was on par with that ofnecessary for LSI (large-scale integrated circuit) pro-duction. Figure 1 shows the progress of device designrules over time. The design rule for LSI memories isalso shown for comparison. When the design rule forLSI memories was on the level of several microns inthe latter half of the 1970s, the design rule for thepower devices of thyristors and bipolar transistors wason the level of several tens of microns. However, whenMOS gate devices such as MOSFETs and IGBTsappeared in the latter half of the 1980s, the differencein design rules between these and LSI chips rapidlydecreased. In 2000, both achieved device design withsub-micron rules. At present, power devices and LSIchips are produced using equivalent level clean roomsand production equipment.

In the “Special issue on MOS gate power devicetechnology” (Vol. 63, No. 9) of the “Fuji Electric Jour-nal” issued in 1990, Dr. Uchida described the MOSFETand IGBT in an article entitled, “Progress of MOS-gatepower device technology.” At that time, Fuji Electricwas marketing 2nd generation IGBTs and was promot-ing the development of 3rd generation IGBTs. Wepredicted future development of the IGBT throughimproving the characteristics, adding intelligence andincreasing capacity.

The capacity of power devices has also undergonegreat changes. Figure 2 shows the progress in capacityof Fuji Electric’s power devices over time. Powerdevices started as discrete transistors in the 1970s,then changed to transistor modules, and then to IGBTmodules in the latter half of the 1980s. In 2000, a flat-packaged IGBT device rated at 4.5kV-2kA appeared.(1)

Please refer to the separate article in this special issuefor details of this flat-packaged IGBT.

In the “special issue on power semiconductordevices” (Vol. 72 No. 3) of the “Fuji Electric Journal”issued in 1999, Dr. Shigekane described the year of1998 as a historical year for the research and develop-ment of power devices in “Present status and trends ofpower semiconductor devices.” He cited the ISPSD(International symposium on power semiconductordevices & ICs) tenth anniversary symposium held inKyoto as the reason for its historical importance. The

Fig.1 Progress of the design rule

Des

ign

ru

le (

µm)

100

10

1

0.120001995199019851980197519701965

(Year)

16Mbit 4Mbit 256kbit

1Mbit 64kbit

16kbit1kbit

ThyristorBipolar transistor

IGBT

DRAM

MOSFET

64Mbit

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Present Status and Trends of Power Semiconductor Devices 35

IEE of Japan and the IEEE of the USA cosponsor theISPSD and the location of the annual symposiumrotates among the three regions of Japan, USA andEurope. It is the most authoritative internationalsymposium in the power semiconductor device field. Inthe first symposium held in 1988, only 31 papers werepresented; in the tenth anniversary symposium, morethan 70 papers were presented, and in the 13thsymposium to be held in Osaka in June 2001, morethan 90 papers will be presented. Thus the symposiumhas become an association that issues guideline for theresearch and development of power devices. FujiElectric has presented many highly rated papers ateach ISPSD, ever since the first symposium.

Over the past several years of presentations,ISPSD papers on the following three themes have beenincreasing.(1) MOS gate devices (MOSFETs, IGBTs, MOS gate

thyristors, etc.)(2) Power ICs and HVICs(3) SiC (silicon carbide).

In accordance with the trends of power deviceresearch and development, the MOS gate device is stillthe mainstream; however, at the ISPSD to be held inOsaka in 2001, it is notable that many papers thatdiscuss SiC as a next generation power device materialhave been accepted.

2. Trends of Fuji Electric’s Device Development

The development of semiconductor devices is thehistory of fine pattern processing and device designoptimization. Recent development of simulation tech-nology has made it possible to precisely estimatedevice characteristics. Integrated simulation systemsthat incorporate not only device and process simulationbut also heat conduction and stress simulation make agreat help to device development. From early on, FujiElectric has utilized various simulation tools to accel-

erate device development.This chapter outlines the power MOSFET, IGBT,

and assembly technologies that represent the leadingedge of Fuji Electric’s power device development.

2.1 SuperFAP-G seriesFuji Electric has newly developed the “SuperFAP-

G series” of power MOSFETs. Please refer to theseparate article in this special issue for details. Thebiggest problem facing development of the powerMOSFET, a unipolar device, is how to reduce on-stateresistance while maintaining the withstand voltage.Development of the SuperFAP-G series began withlofty goals. The design aimed to achieve the lowest on-state resistance theoretically possible with silicon. Toattain the targeted specifications, micro-processingwas used, of course, and the device was designed usinga stripe-construction cell to optimally weaken theelectric field of the cell structure part and to achievethe desired withstand voltage even at the low-resis-tance epitaxial layer. As the result, the powerMOSFET attained a withstand voltage near the theo-retical withstand limit of silicon in a low-resistanceepitaxial layer. With this design, the new 600V deviceattained approximately one-half of the Ron · A valuecompared with conventional devices. Also in the caseof application to a switching power supply, powerMOSFET loss was measured to be 35% less in thestandby mode compared with the conventional product,and consequently, conversion efficiency was improvedby 3.2%. Also, having the advantage of approximately20°C less temperature rise with a normal load, thepower MOSFET is a highly promising device. Aproduct lineup ranging from 150V to 900V is plannedfor this series and will be put on the market succes-sively from 2000 to 2001.

2.2 Trends of the IGBTFuji Electric started producing and marketing

IGBTs in 1988. Through introduction of a new IGBTgeneration every several years, improvement in char-acteristics rapidly progressed from the 1st generationto the 2nd and then to the new 3rd generation. Thelast decade of the 20th century was a golden era for theIGBT, and this movement is expected to continue forsome time into the 21st century. Conventional IGBTchips of the 1st through new 3rd generation offeredimproved characteristics while using epitaxial wafersand controlling switching speed by lifetime control.Next generation IGBT chips are being developed usingFZ (floating zone) wafers instead of epitaxial ones andemploying NPT (non-punch-through) types withoutlifetime control and PT (punch-through) types. In theproduction of 1,200V IGBT modules in 1999, FujiElectric commercially produced IGBT modules usingNPT type chips as the 4th generation IGBT-S series.

To use FZ wafers for fabricating IGBT chips of the600V and 1,200V class, the wafer thickness must be

Fig.2 Progress in the power device capacityD

evic

e ca

paci

ty (

MV

A)

101

100

10–1

10–2

10–3

20021998199419901986198219781974

(Year)

DiscreteBJT

BJT module

IGBT module

Flat-packaged IGBT

1,400 V300 A

1,200 V800 A

2,000 V400 A

3,300 V1,200 A

2,500 V1,800 A

4,500 V2,000 A

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW36

reduced to approximately one-third or less of theformer thickness, and a major technical innovation inwafer processing is required. Fuji Electric will strivefor the technical development of IGBT chips using FZwafers and will promote FZ wafer applications startingwith the 1,200V IGBT module S series of the 4thgeneration.

The separate article of this special issue introducesthe new “EconoPACK-Plus” package, which uses newgeneration IGBT chips that are the successor to the4th generation. This series is developed to meet theneed for large capacities, and Fuji Electric plans toproduce a series of 1,200V-225A to 450A modules.This EconoPACK utilizes PT type chips that employthe newly developed FZ wafers, and provides greatlyimproved characteristics. The diodes that are usedconcurrently were also improved and overall loss hasbeen significantly reduced.

Figure 3 shows the change in loss reduction of aninverter using a 1,200V-300A IGBT module. This is anexample of a 55kW inverter. Losses are indicated forthe cases of the 2nd generation (L series) of 1990, thenew 3rd generation (N series) of 1994, the 4thgeneration (S series) of 1999, and the above-mentionednew generation IGBT modules.

2.3 Assembly technologyIn power devices, the power chip and the assembly

technology are necessarily similar to the device tech-nology. Recently, particularly from the viewpoint ofpower management, treatment of the heat generatedin the chip has become a serious issue. The mostimportant problem is how to ensure high reliability.

Fuji Electric has so far actively promoted researchand development into the reliability of power devices.This special issue analyzes in detail and from a newperspective, the life of the power cycle within a moduleand investigates factors that detract from modulereliability such as the problems of wire bonding andsolder cracks as well as their countermeasures. Mind-ful of these analysis results and of environmentalmeasures, we newly developed highly reliable lead-freeSn/Ag solder. Although conventional lead solderensures sufficient power cycle endurance, modules

Fig.3 Comparison of inverter loss using various generationIGBT modules (1,200 V-300 A)

using the new Sn/Ag solder proved that it has evenhigher power cycle endurance. Fuji Electric will applythis new solder to its power transistor modules in turnand provide highly reliable modules to the market.

3. Conclusion

Power semiconductor device technology is rapidlyprogress and there is no time to be wasted. Asmentioned in the beginning, enormous changes oc-curred in the last ten years of the 20th century. Nowis the Renaissance of the power device, and the authorfeels privileged to be involved in the activities.

This paper introduces the power MOSFET, IGBTand assembly technology, which are at the forefront ofdevelopment. Moreover, intelligent power devices arean indispensable technology. Without such technolo-gies, “user-friendly” power devices cannot be realized.

Through declaring “Quality is our message” andrealizing “user-friendly” devices by ourselves, we willfully satisfy users with our products.

Reference(1) Fujii, T et al. 4.5kV-2000A Power Pack IGBT. Proceed-

ings of ISPSD’00. 2000, p. 33-36.

Pow

er c

onsu

mpt

ion

(W

)

400

300

55kW inverter

200

100

0

2nd generation(L series)

New 3rd generation(N series) 4th generation

(S series)New

generation IGBT

Tj = 125°CIo = 112Armsfo = 50Hz , fc = 6kHzcos ø = 0.85

Eon

Eoff

VCE(sat)

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Large-Capacity 6-in-1 IGBT Module “EconoPACK-Plus” 37

Shin-ichi YoshiwatariNobuhiko Betsuda

Large-Capacity 6-in-1 IGBT Module“EconoPACK-Plus”

1. Introduction

In recent years, there has been an increasingdemand for high-current power converters, such asindustrial inverters, ranging from 40kW to 1MW.With this trend, smaller, higher performance, higherreliability, high current semiconductor which are easi-er to use are required for power converters. Inresponse to these requirements, Fuji Electric willcommercialize the “EconoPACK-Plus” that integratesinverter bridge circuitry into a single package usinghigh-current IGBTs (insulated gate bipolar transistors)(Fig. 1). This paper introduces the EconoPACK-Plusproduct family, its features, and device technologies.

2. Features of the EconoPACK-Plus

To meet the demand for smaller size and simplifiedassembly of power converters, Fuji Electric has alreadycommercialized the EconoPIM and PC-PACK (6-in-1module) in the 10 to 100A range, using 1,200V-classfourth-generation IGBTs. At present, Fuji Electric hasnearly completed development of the high-currentrated EconoPACK-Plus. To satisfy the various marketdemands described above, this device has the followingfeatures.(1) Rating: 1,200V product series slated to range from

225 to 450A devices.(2) Smaller size: One-half the surface area of conven-

tional devices (Refer to Fig. 2).

(3) Ease of use: PCB mounted 6-in-1 configuration forhigh-current rating (Refer to Fig. 3).

(4) Higher reliability: More precise temperature pro-tection with a built-in thermistor (Refer to Fig. 3).

(5) Higher-current rating: Easy parallel connection ofIGBTs due to positive temperature coefficient ofon-voltage, and package design intended for paral-lel connection, facilitates higher current ratings asshown in Fig. 4.

(6) Higher performance: Reduction in power dissipa-tion by approximately 20% as compared withconventional devices through an efficient chiplayout that reduces thermal concentration result-ing from size reduction, and development andapplication of new-generation IGBTs and newFWDs (free wheeling diodes) (Refer to Fig. 5).

A technological overview of the development of theEconoPACK-Plus is described in the following chap-ters.

3. New Generation IGBT Chip

Fuji Electric has improved the performance of thePT (punch through) type IGBT [refer to Fig. 6 (a)]through lifetime control and by using a finer cel, andcommercialized first-, second- and new third-genera-

Fig.2 Size comparison between EconoPACK-Plus and aconventional device

Fig.1 Exterior view of EconoPACK-Plus

(b) EconoPACK-Plus1,200V/450A

1 set of a 6-in-1 configuration

(a) Conventional device1,200V/400A

6 sets of a 1-in-1 configuration

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW38

tion (N series) IGBT modules in 1988, 1990 and 1994,respectively. PT construction is intended to raiseinjection efficiency and lower transport efficiency.Thereafter, Fuji Electric improved the performance ofthe NPT (Non-Punch Through) type IGBT [refer toFig. 6 (b)] and commercialized fourth-generation IGBTmodules (S series) in 1990. NPT construction isintended to lower injection efficiency and raise trans-port efficiency.

Fuji Electric has recently developed New-genera-tion PT type IGBT chips. Their FZ (floating zone)wafers are ground to a thickness which reduces n–

layer resistance, and ions are injected from the reverseside of the chips as shown in Fig. 6 (c) to form n layersthat prevent depletion layers and p layers that injectholes. The new-generation IGBT permits dramatic

Fig.3 External dimensions and equivalent circuit of EconoPACK-Plus

Fig.4 Example of parallel connection of EconoPACK-PlusFig.7 Comparison of VCE(sat)/Eoff tradeoffs for various-genera-

tion IGBTs

C5

[Inverter part]

(a) External dimensions

(b) Equivalent circuit

[Thermistor part]

G5E5

G6

U

+

–E6

C3

G3E3

G4

V

+

–E4

C1T1

110

T2

G1E1

G2

W

+

–E2

122

137

150

222222505050

1621722

U WV

G5E5

G6E6

G3E3

G2E2

G1E1

T1T2

G4E4

C1C3C5

EconoPACK-Plus1,200V/450A×1

EconoPACK-Plus1,200V/450A×3

1,200V/1,350A

Fig.6 Comparison of IGBT chip cross sectional view

Fig.5 Comparison of power dissipation during inverteroperation

Inve

rter

pow

er d

issi

pati

on (

W)

[ V

CE

(sat

)+ E

off +

Eon

+V

F +

Err

]

400

200

0

1,200V/450A device

Fourth generation

(S series)

New generationIGBT+FWD

Approx. 20%

Tj = 125°CUd = 600V DC

Io = 242 Armsfo = 50Hz

λ = 1fc = 6kHzcosø = 0.85

VCE(sat)

Eoff

Eon

VF

Err

GE

n–n

p

p

p+

GE

n–

p

p

p+

GE

C

C

C

(a) PT-IGBT (b) NPT-IGBT (c) New generation IGBT

n+ n+ n+ n+ n+ n+

n–

n+

pp+

p+

Tu

rn-o

ff lo

ss (

mJ/

puls

e)

12

10

8

6

4

2

03.43.23.02.8

New-3rd generation (N series)

Fourth generation (S series)

New-generation IGBT

P series

2.62.42.22.01.8VCE(sat) (V) at 125°C

Tj =125°C

Vcc = 600 VIc = 50 ARg = 24 ΩVge = ±15 V

1,200V/50A device

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Large-Capacity 6-in-1 IGBT Module “EconoPACK-Plus” 39

improvement in VCE(sat) /Eoff tradeoffs and IGBT perfor-mance as shown in Fig. 7. The new-generation IGBThas a positive temperature coefficient for on-voltage asshown in Fig. 8 and is suitable for use in modules withhigh current ratings.

4. New FWD Chip

The new FWD chip has the surface structureshown in Fig. 9 (b), and soft reverse recovery character-istics shown in Fig. 10 (c) through controlled injectionof minority carriers from the anode. Temperaturedependence of the on-state resistance was improved asshown in Fig. 11, targeting applications for IGBTmodules with high current ratings, even though thenew FWD chip has almost the same on-voltage/Err

tradeoff characteristic as conventional FWD chips asshown in Fig. 12. Moreover the new FWD chip permitsreduction in turn-on loss (Eon) as shown in Fig. 13through controlled injection of minority carriers fromthe anode.

5. Features of EconoPACK-Plus

5.1 EconoPACK-Plus seriesTo be applicable to inverters which operate at an

input voltage of AC 480V, as is required in Europe andthe Americas, the EconoPACK-Plus series consists of1,200V-class devices with 225A, 300A and 450A rat-ings.

5.2 Features of the packageFeatures of the package are as follows:

(1) 6-in-1 module for all types(2) Adoption of solderable pin structure that allows

control terminals to be connected to an inverter byusing a solder flow method

(3) Small, lightweight, thin package, similar to theEconoPIM and PC-PACK

(4) Eight positioners that facilitate easy mounting ofprinted circuit boards on the top.

5.3 Internal structureAs is the case with the EconoPIM and PC-PACK,

the main terminals of the EconoPACK-Plus are notsoldered to a DBC (direct bonding copper) substratebut are instead connected to the substrate with wires,resulting in simplified construction, a smaller, lighterweight package that is easier to assemble. In addition,proper arrangement of IGBT and FWD chips permits

Fig.10 Switching waveforms of EconoPACK-Plus

Fig.9 Comparison of FWD chip cross sectional view

Fig.8 Output characteristics of new-generation IGBT

Col

lect

or c

urr

ent

IC (

A)

Collector-to-emitter voltage VCE (V)

100

75

125°C

50

25

03.02.52.01.51.00.50

1,200V/75A device Measurement condition: +VGE= 15V

Room temperature

Anode

p

n–

n+

Cathode(a) Conventional FWD

Anode

p p p

n–

n+

Cathode(b) New FWD

3

(a) Turn-on waveform

2

VGE (20 V/div)

VCE (200 V/div)

0.2 µs/div

IC (100 A/div)

1

(c) Reverse recovery waveform

2

VCE (200 V/div)

IF (100 A/div)

3

(b) Turn-off waveform

2

VGE (20 V/div)

VCE (200 V/div)

IC (100 A/div)

1,200 V/225 A EconoPACK-Plus

Tj = 125°CVcc = 600V , I = 225AVGE = ±15V , Rg = 6.3Ω

0.2 µs/div

0.1 µs/div

Fig.11 Comparison of output characteristics of FWD chips

I F (

A)

I F (

A)

100

75

50

25

032

VF (V)(a) Conventional FWD

(1,200 V/75 A)

VF (V)(b) New FWD(1,200 V/75 A)

1

125°C

0

100

75

50

25

0321

125°C

Room temperature

0

Room tempe-rature

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW40

effective thermal distribution, and uniform arrange-ment of the upper and lower arm IGBTs bringstransient currents into balance at turn-on and pre-vents an increase in turn-on loss.

Internal inductance of the EconoPACK-Plus is aslow as approximately 20nH, realizing the contradictoryperformance of low spike voltage at quick turn-off asshown in Fig. 10 (b).

6. Future Prospects

This paper introduced the technology used in a1,200V-class device. Fuji Electric is now developing600 to 1,700V-class new generation devices based onthe same concept including new chip technology andaims to apply them not only to the EconoPACK-Plusbut also to the EconoPIM and PC-PACK.

Fig.12 Comparison of VF /Err tradeoffs of FWD chips

5

4

3

2

1

0

New FWD

Conventional FWD

2.752.502.252.001.751.501.25VF (V) at 125°C

Rev

erse

rec

over

y lo

ss E

rr (

mJ/

puls

e) 1,200V/75A-FWD deviceTj=125°CVcc=600V, IF=75A

Fig.13 Comparison of turn-on waveforms

VC

E :

25

0 V

/div

, I F

: 5

0 A

/div

VCE

IF

Time: 0.5 µs/div.

Conventional FWD

New FWD

1,200V/75A-FWD deviceTj=125°CVcc=600V, IF=75A

7. Conclusion

The EconoPACK-Plus developed using varioustechnologies and promises to contribute is being notonly to existing applications but also to new applica-tions, and to the improved performance and easierdesign of power converters. Fuji Electric is determinedto develop higher-performance, enhanced-function,highly reliable power devices, and to contribute to thedevelopment of the power converter field.

References(1) Onishi, Y. et al. Analysis on Device Structure for next

Generation IGBT. Proceedings of the 10th ISPSD.1998, pp. 85-88.

(2) Lasaka, T. et al. The Field Stop IGBT (FS-IGBT) -ANew Power Device Concept with a Great ImprovementPotential. Proceedings of the 12th ISPSD. 2000, pp.355-358.

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Power MOSFET “SuperFAP-G Series” for Low-Loss, High-Speed Switching 41

Tadanori YamadaAtsushi KurosakiHitoshi Abe

Power MOSFET “SuperFAP-G Series” forLow-Loss, High-Speed Switching

1. Introduction

With the progress of our high-level informationbased society, personal computers, mobile internetterminals, and BS digital TVs have rapidly becomepopular among consumer households. Preparation andinnovation have also progressed for the internet serverand high-speed backbone network infrastructureswhich support these information services. For thesereasons, electric energy consumption has increased by2.2 to 3.0% a year on average. There is concern thatthis increase may be a cause of global warming.Therefore, the International Energy Star Programstarted in 1995 for the purpose of reducing the stand-by electric consumption of office automation machines,at which they operate for long periods of time.Furthermore, electric utility industries and companieshave struggled to obey the Revised Energy Saving Lawand to implement energy conservation measures of the“first runner method” established by COP3 (The 3rdSession of the Conference of the Parties: Prevention ofGlobal Warming Meeting in Kyoto) in 1997.

The subjects for energy conservation are consumerelectronics devices such as air conditioners, TVs,lighting and office automation machines such ascomputers, display monitors and printers. The powerconversion units for these types of equipment usecharacteristically high-efficiency switched mode powersupply (SMPS). But, reflecting the trend towardenergy conservation, there are increasing demands forsuch power supplies with higher efficiency, lower lossand reduced stand-by waiting power.

This paper presents a summary of the characteris-tics of the new “SuperFAP-G” series of power MOS-FETs developed based on market trends for low loss,super high speed switching.

2. Required Specifications for Power MOSFETs

Figure 1 through Figure 3 show the typical 3 typesof simulation results for the power loss in an SMPS.

The ringing choke converter has characteristicssuch as a varying switching frequency that changesdepending on the output power. At light loads, the

switching frequency increases to more than 300kHz.For that reason, losses due to turn-off and gate drivingaccount for about 80% and 18% of total loss respective-ly in the light load mode. In the rated load mode(output current: 3.9A), switching frequency decrease toless than 100kHz and on-state loss RDS(on) becomes the

Fig.1 Power loss simulation result of ringing choke converter

Fig.2 Power loss simulation result of flyback converter

Pow

er lo

ss (

W)

5.0

Sw

itch

ing

freq

uen

cy (

kHz)

400

2.5 200

0 0

Switching frequency

5.02.50Output current Io (A)

Po=75 W/MOSFET (600 V-0.75Ω)

: Turn-on loss: Turn-off loss: RON loss: Gate-driving loss: Total loss

Pow

er lo

ss (

W)

5.0

2.5

05.02.50

Output current Io (A)

fs =100 kHz / Po=75 W/MOSFET(600 V-0.75Ω)

: Turn-on loss: Turn-off loss: RON loss: Gate-driving loss: Total loss

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW42

Fig.3 Power loss simulation result of forward converter

same as turn-off loss due to the higher on-duty.The external fly back converter differs from the

self-oscillated ringing choke converter and fixes theswitching frequency at the optimum controllable value.The turn-off loss accounts for about 83% of the totalloss in the light load mode and 74% in the rated loadmode (output current: 3.9A). The percentage of turn-off loss accounts for the majority of loss in the full-loadmode.

The switching frequency of the forward converteris also fixed similarly to that of the external fly-backconverter. About 90% of the total loss is turn-off lossin the light load mode. At the rated load (outputcurrent: 8A), turn-off loss occupies about 50% of thetotal loss. The rate of on-state resistance loss alsoincreases with the increasing output current and atthe rated load mode, reaches about 32% of total loss.

The following can be observed from the losssimulation results of each type of converter. The 3items below are important characteristics required bypower MOSFETs in order to reduce stand-by andSMPS power loss.(1) Reduction of turn-off loss(2) Reduction of RDS(on) loss(3) Reduction of gate driving loss

The switching frequency in loss simulation is theresult from analysis using the switching frequency of ageneral SMPS. Future technology is expected toincrease the switching frequency even more in order tominimize the size of SMPS. In such a case, reducingthe turn-off and gate driving losses will become evenmore important.

3. Design Technologies

As described above, the main requirement forswitching regulator power supplies is reduced loss atturn-off and RDS(on). However, there is a trade-offinvolved in both types of loss. It is important to

improve the trade-off relation to reduce both RDS(ON)

and turn-off losses.Figure 4 shows the improved trade-off characteris-

tics of turn-off loss versus on-state resistance for thenew “SuperFAP-G” series of power MOSFETs.

By combining three newly developed technologies,the “SuperFAP-G” series has reduced by half thetypical turn-off loss at the same on-state resistancecharacteristic. This paper describes specifically thedesign policy which realized the improved trade-offrelation.

3.1 Low RDS(on) technologyOver 90% of the on-state resistance characteristics

of 500V and above high-voltage power MOSFETs aredetermined largely by the resistivity of the epitaxiallayer. Therefore it is possible to reduce the epitaxiallayer’s resistance to achieve low on-state resistivity,but this method has the drawback of decreasing thedrain-source breakdown voltage Vb.

Figure 5 -① shows Vb versus Ron · A characteristicsof the conventional polygonal cellular structure withhigh electric-field of the cellular part due to use of ahigh resistance epitaxial layer.

We applied stripe-shaped cellular structures to the“SuperFAP-G” series to lessen the high electric field inthe structures as shown in Fig. 6.

By applying fine patterning technology in a preci-sion alignment process, the electric field in the cellularpart is lessened by reducing the width of the surfacedrain layer and optimizing the depth, width anddoping profile of the p-well.

With this design, the cellular part maintains itsbreakdown voltage. Therefore, the lower resistivity ofthe epitaxial layer can be applied to the MOSFET.

3.2 Optimized guard-ring technologyWe have established a design which lessens the

electric field of cellular structures through utilization

Fig.4 Eoff – RDS(on) trade-off characteristics

Pow

er lo

ss (

W)

10

5

01050

Output current Io (A)

fs =100 kHz / Po=75 W/MOSFET(600 V-0.75Ω)

: Turn-on loss: Turn-off loss: RON loss: Gate-driving loss: Total loss

60

50

40

SuperFAP-G

Conventional device

30

206 10 14 18 22

Eof

f (µJ

) [V

cc=3

00V,

Io=

10A

]

RDS(on) · A

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Power MOSFET “SuperFAP-G Series” for Low-Loss, High-Speed Switching 43

of the lower resistivity of an epitaxial layer. But, thereare some problems of unbalance in which the break-down voltage decreases between cellular regions, dueto the increased electric field of the conventionalguard-ring design technology.

Newly developed inequality pitched optimizedguard-ring (OGR) technology has been applied to thisdevice, in order to lessen the breakdown voltage at theguard-ring field of the low resistance epitaxial layer.

We have designed the optimum pitch, width andspacing for each guard ring and number of guard ringsby simulating the electric field of these cellularstructures to decrease the field. By integrating theabove described design of cellular stripe-shaped struc-tures and OGR structures, a MOSFET with higherbreakdown voltage can be realized through utilizationof the low resistance epitaxial layer.

As shown in Fig. 5 -② , the relation of Ron · A versusdrain-source breakdown voltage Vb is improved, andon-state resistivity has been reduced by half comparedto conventional devices.

3.3 Low gate-drain charge (Qgd) technologyIn order to reduce the turn-off power loss, which is

determined by the charge time constant of drain-gatemiller capacitance Crss, it is necessary to decrease thegate-drain charge Qgd.

As RDS(on) and Qgd have a trade-off relation, J-FETresistance can be reduced by designing cells withlarger gate poly-silicon areas. However, unfortunatelyQgd increases with increasing Crss.

In order to improve the trade-off relation of the“SuperFAP-G” series, we have designed the cellularpart with a smaller gate electrode area using the poly-silicon precision alignment process of fine patterningtechnology. Meanwhile, the design restricts the in-crease in J-FET resistance by optimizing the profile ofthe n-type doping impurity.

As the result of the above cell design, a Qgd

characteristic was realized that is lower than the Qgd ofconventional devices by about 1/3.

Figure 7 compares gate charge characteristics atthe same on-state resistance.

4. Characteristics

Table 1 shows a typical model of the recentlydeveloped “SuperFAP-G” series. We have defined aFOM (figure of merit) which indicates the MOSFETpower loss as the product of on-state resistivity andgate-drain charge Qgd.

The typical FOM of this recently developed modelwas 5.75Ω · nC, which is approximately 3 times theFOM value of conventional devices at the same on-state resistance.

A product line of this series is planned withbreakdown voltages in the 450V to 900V class.

Fig.5 On resistance Ron·A versus breakdown voltage Vb Fig.7 Gate charge characteristics (600V-0.75Ω device)

1

0.1

0.012,0001,000500300

①Con

vent

iona

l dev

ice

②Su

perF

AP-G

Ron

· A

Vb (V)

Fig.6 Stripe-shaped cellular structure of SuperFAP-G

SiO2

SiO2

SiO2

SiO2

n+

n–

Al-Si

Polysilicon Polysilicon Polysilicon

Al-Si

n+

n–

n+

n+

p

n+n+

p

n+

p n

n

n

n

n+n+

n+pp

Drain

Gate Source

100806040200

15

SuperFAP-G

10

5

0

Conventional device

Gate charge Qg (nC)

VG

S (

V)

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW44

5. Application to the SMPS

As a reference example, Table 2 shows the results(reference values) of applying the newly developed“SuperFAP-G” series to a forward converter SMPS.

The power MOSFET loss decreased by 35% and theconversion efficiency improved by 3.2% compared witha conventional device in the stand-by mode.

In spite of the smaller package than that ofconventional devices, the heat sink can be miniatur-ized due to the low temperature rise of 20°C at therated load. Compared to conventional devices at thesame temperature rise, output will increase by about20%.

Figure 8 shows the EMI measurement results

Fig.8 EMI measurement resultTable 1 Ratings

Item 2SK3450-01 2SK3504-01

VDS 600V 500V

ID ±12A ±14A

PD 115W 115W

VGS(th) 3 to 5V 3 to 5V

RDS(on) 0.65Ωmax 0.46Ωmax

Qg 34nC 33nC

Qgs 12.5nC 12.5nC

Qgd

FOMRon · Qgd

11.5nC 10.5nC

5.75Ω · nC 3.68Ω · nC

Table 2 Operating result of commercial SMPS (forwardconverter)

(a) Standby mode (Po = 2W, fc = 130kHz)

Item Conversion efficiency

DC-DCType

31.90%

MOSFET loss

Ploss

1.28W

35.10% 0.82W

MOSFET temperature rise

∆Tc

5.8°C

2.6°C

Conventionaldevice600V/0.75Ω/TO-3PF

SuperFAP-G600V/0.75Ω/TO-220F

η

(b) Rated load mode (Po = 125W, fc = 130kHz)

Item Conversion efficiency

DC-DCType

81.40%

MOSFET loss

Ploss

8.31W

83.30% 4.47W

MOSFET temperature rise

∆Tc

54.0°C

34.1°C

Conventionaldevice600V/0.75Ω/TO-3PF

SuperFAP-G600V/0.75Ω/TO-220F

η

EM

C le

vel (

dBµV

)

50

45

40

35

30

25

20

15

10

5

030020010090807060

Frequency (MHz)

(a) Measurement result of EMR

(b) Measurement result of EMC

504030

70

60

50

40

30

20

10

01Frequency (MHz)

CISPR22 Class B

CISPR22 Class B

0.5 10 3050.1

EM

R le

vel (

dBµV

/m)

(reference) when a “SuperFAP-G” series device is usedin the AC adapter of a commercial fly-back converter.In the case of lower Qgd, in another words higher-speedswitching, EMC noise is at the same level as in aconventional device and EMR noise is approximately+2dB at peak. Therefore, the “SuperFAP-G” seriessatisfies the CISPR Pub.22 Class B standard.

6. Conclusion

This paper has presented the developed technologyand a product summary of Fuji Electric’s newlydeveloped “SuperFAP-G” series of low loss, high-speedswitching power MOSFETs.

We at Fuji Electric, believe that the “SuperFAP-G”series will contribute to society with its higher efficien-cy, lower stand-by loss, increased output power densityand smaller size.

At the same time, based on the same technology,we are planning to develop a series of medium voltagepower MOSFETs of 100 to 250V for application tohigher frequency switching DC-DC converters.

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Multiple-Chip Power Device “M-POWER” for Power Supplies 45

Hiroyuki OtaNoriho Terasawa

Multiple-Chip Power Device “M-POWER” forPower Supplies

Fig.2 Circuit configuration

1. Introduction

Recently, in consideration of the environment,measures to reduce energy dissipation, input currentdistortion, EMI-noise, etc. have become required in theswitching power supplies of telecommunication andhome electronic equipment. To address these and therequirements for fail-safe operation, Fuji Electric hasdeveloped a power supply that can satisfy theserequirements with a one-converter-type supply, andhas marketed the M-POWER as application specificmultiple-chip power device (Fig. 1).

The power supply that uses M-POWER satisfiesenergy saving, low-input current distortion and highsafety demands while being compact. High efficiencyis achieved by applying a novel soft-switching circuit,and low-input current distortion is achieved by using anovel one-converter-type power factor correction (PFC)circuit. Low-dissipation losses while in standby modeare achieved using a standby mode control thatoperates at a lower switching frequency than that ofthe normal mode. Fail-safe operation is achieved byvarious protection functions with latched shutdown.

2. Features

The main features of the Fuji Electric one-convert-er-type power supply and M-POWER are as follows.(1) High efficiency by regenerating snubber energy(2) Standby input power less than 3W (at output

power of 1W), Energy 2000 compliant; does notrequire auxiliary power supply for standby

(3) Input current satisfies the harmonic regulation ofIEC 1000-3-2; no active filter circuit required

(4) Low EMI-noise by soft switching operation(5) Universal input(6) Various types of protection functions with latched

shutdown; a fail-safe power supply can be con-structed

3. Power Supply Using M-POWER

3.1 Circuit configurationFigure 2 shows the circuit configuration of the

switching power supply that uses the M-POWERdevice. This circuit is basically a fly-back converterthat operates by constant frequency PWM (pulse widthmodulation) control and has two notable circuits.

The first circuit is for soft-switching operation. Itis comprised of MOSFETs Q1 and Q2., capacitor C2 andwinding N4. The main switch Q1 can operate zero-voltage switching using the auxiliary switch Q2. It is azero-voltage transition type soft-switching circuit(ZVT)[1].

The second circuit is a one-converter-type powerfactor correction circuit (PFC), and is comprised ofreactor L1, diodes D1 and D2, and winding N3 oftransformer Tr.

Fig.1 External view of M-POWER

IC

Tr

C1

+

+

M-POWER

80 to 288 V AC

C2

C3

Q1 Q2D2

D4

D3

D1

N3

N1

N4L1

N2

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW46

In Fig. 2, the M-POWER multi-chip power device iscomprised of MOSFET Q1, MOSFET Q2 and a controlIC (the part enclosed with dotted line).

3.2 Soft-switching circuit by zero-voltage-transitionmethod (ZVT)The soft-switching circuit has three operation

modes, which are shown in Fig. 3.Mode 1 (period T1 to T2):

Q2 is turned on first. The stored electric charge incapacitor C2 discharges through winding N4 of trans-former Tr. Voltage VN4 is applied to winding N4, andvoltage VN1 is excited in winding N1. Voltage VN1

becomes larger than DC voltage VC1, and current ir

flows through capacitor C1. A part of the storedelectric charge in capacitor C2 is regenerated incapacitor C1. Moreover, winding N4 current iN4 be-comes the excitation current of Tr. Switch Q2 operateszero-current switching (ZCS) at turn-on, because theleakage inductance of N4 causes the Q2 turn-on currentto rise gradually.Mode 2 (period T2 to T3):

After VC2 becomes 0V, Q1 turns on. Therefore, Q1

achieves zero-voltage switching (ZVS). Voltage VC1 isapplied to winding N1, and voltage VN4 (= VC1 × N4/N1)is applied to winding N4. Current iN4 is decreased dueto the reverse counter voltage VN4, and soon becomes0A. When Q2 turns off at T3, Q2 achieves zero-voltageswitching (ZVS).Mode 3 (period T4 to T5):

When Q1 turns off at T4, Q1 achieves zero-voltageswitching (ZVS) because C2, which is connected in

parallel to Q1, is 0V at this time.The efficiency characteristics are shown in Fig. 4,

along with the efficiency characteristic of the RCC,which used capacitor C2 and the excitation inductanceof transformer Tr for resonance. The efficiency of theproposed circuit is 86.4%, and the efficiency of the RCCis 84.3% at an input voltage of 200V, an improvementof 2.1%. Because the RCC ceases to perform ZVSoperation when VC1 becomes larger than the resetvoltage of Tr, the turn-on loss increases. Moreover,since the switching frequency of the RCC increaseswhen VC1 becomes larger, the switching losses increaseas well.

3.3 PFC circuitThe PFC circuit is shown in Fig. 5.

(1) The effect of winding N3

Voltage VN3 is generated in winding N3 when Q1 isturned off. Current i3 can flow when the sum of VN3

and the rectified input voltage (|Vin|+VN3) is larger

Fig.3 Operation of switching transient

Fig.5 Operation of PFC circuit

Fig.4 Comparison of efficiency at Po=100W

iDQ1

iN4

irN2

N4 D3

Q2

C2

N1

C1

T1 T2 T3 T4T5

VRS

Tr

+

Q1

VC1

VC2

VN4

VN1

VGSQ2

VGSQ2

VGSQ2

VGSQ1

VDSQ1

iDQ1 iDQ1

iN2

iN2

VDSQ1

VDSQ2

VGSQ1

90.0

86.485.084.3

80.0 (53 kHz)(60 kHz)

(88 kHz)(102 kHz)

(106 kHz)

Fuji circuit(60 kHz)

RCC

( ): Switching frequency

75.0

70.030025020015010050

Vin (V)

(%)

η

Tr

C1

+

+

C2Q1

C3

D2

D4

D1

N1

N3

L1

N2

VC1 i2

iincnv

i2

iin= i2 + i3

i1iin i3

VN3

Vin

Vin+VN3

VinVC1

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Multiple-Chip Power Device “M-POWER” for Power Supplies 47

than VC1. As a result, the distortion current of i3 can belower than that of iinc.(2) The effect of reactor L1

On the other hand, with only winding N3, the PFCeffect is reduced when the input voltage Vin is higher.

The reactor L1 circuit is added to improve thischaracteristic. Current i2 can flow through the inputsupply, through D1, through L1 and to Q1, when Q1 isturned on. Current i2 becomes larger and the PFCeffect becomes larger when the input voltage is higher.

The effect of winding N3 is mainly used at lowerinput voltages and that of reactor L1 is mainly used athigher voltages. As a result, the novel one-converter-type PFC circuit can satisfy the regulations for inputcurrent distortion over a wide range of input voltages,such as from 80V to 288V.

The harmonic input currents are shown in Fig. 6,and it can be seen that the input current satisfies theIEC 1000-3-2 regulations.

4. M-POWER

4.1 Block diagram and pin functionsThe circuit block diagram of the M-POWER device

is shown in Fig. 7 and is comprised of MOSFET Q1,MOSFET Q2 and a control IC. Pin functions are shownin Table 1. Through the use of multiple function pins,the M-POWER achieves a compact construction withonly 7 pins, a relatively small number of pins.

4.2 Control ICFeatures of the control IC are as follows.

(1) Current mode PWM control IC(2) Contains 2 output stages for driving MOSFETs Q1

and Q2 ; has a function to turn Q2 on about 300nsfaster than Q1.

(3) Low-power dissipation due to C-MOS (Comple-mentary MOS) fabrication process

(4) UVLO (undervoltage lockout) with hysteresis

4.3 Output stagesThe output stages of the control IC have a built-in

C-MOS inverter construction, thereby enabling thegate voltages of MOSFETs Q1 and Q2 to fully swing tothe applied voltage at the Vcc pin. Output stages aredirectly connected to the gates of MOSFETs Q1 and Q2

and the resistance between drain and source of the C-MOS inverter contributes to gate resistance. So both

Fig.6 Harmonic currents

Fig.7 M-POWER circuit block diagram

Harmonic number: N

1.6

1.2

0.8

0.4

01 3

IEC1000-3-2: class D

5 7 9

I in (

A)

VREF(5V)

Vcc

Fc

COMP

GND S

D1 D2

30V

UVLO

Vcc(SAVE)

2R

R

ISCP

OCCP

SCCP

OHCP

OSC

OV

Control IC Block

LV (5V) Controlled Block

ONETIMELATCH

1secTimer

OUT1

OUT2

Q2

Q1VLL(5V)

SRS-FFR QB

T1T2

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW48

the impedance between the output stage and theMOSFET gate, and the inductance of the wiring arevery small. The delay time when driving the MOSFETis very short and IC malfunctions seldom or neveroccur.

4.4 Power saving standby mode operationThe M-POWER device has a standby mode opera-

tion function, which reduces the switching frequency(20kHz) to lower than the normal switching frequencyin order to reduce switching losses. Operation at thetime of a change from the normal mode to the standbymode is shown in Fig. 8. When Vcc (supply voltage ofIC) is set to 15V, the circuit operates in the normalmode. When Vcc is set to 12V, the circuit operates inthe standby mode at a lower switching frequency(20kHz).

Figure 9 shows the dissipation losses when outputpower Po=1W, and for the sake of comparison, dissipa-tion losses of the RCC. With ZVT operation, thedissipation losses can be reduced to 1.5W, as comparedto 3.5W for the RCC. Recently, it has become commonto use an additional power supply that operates only instandby mode. However, the M-POWER system doesnot use an additional power supply, and as a result iscompact and inexpensive.

4.5 Protection functionsProtection functions of the M-POWER device are

listed in Table 2. The M-POWER device has four typesof protection functions: over current protection (OC),short-circuit protection (SC), Vcc over voltage protec-tion (OV) and over heating protection (OH). Eachfunction is equipped with a latched shutdown function.In the case of OC, the current is limited pulse-by-pulse.

Moreover, the latched shutdown function of OC,OV and OH has a built-in timer of about one-second. Ifan abnormal operation continues for approximatelyone-second, the latched shutdown function operates.This function keeps the output voltage of the control IClow and absolutely halts all MOSFET switching.

Fig.9 Dissipation loss during power saving standby operation

Fig.8 Operation mode transition

Table 2 Protection functions of the M-POWER

Under voltage9V

Normal mode Power saving mode

Switching frequency : 30k to 150 kHz

Switching frequency : 20 kHz

Normal operating15V

Changing voltage13V

Power saving operating 12V

VCC

Los

s (W

)

5

4

3

2

1

0Proposed circuit

(20 kHz)RCC

(20 kHz)

Others

DriveDiode

Transformer

Power device

Protectionfunction

Detectingelement

Over current(OC)

Voltage of 3-5pin

Detection level

Voltage of over current(VOC) : 0.90V(typ.)

Latchedshutdown

1sec. Timer

Over voltage(OV)

Voltage of 4-5pin

Over voltage threshold voltage(VCCH(OFF)) : 22V(typ.)

1 time

Over heating(OH)

Temperatureof control IC

Operating temperature(Tj(OH)) : 150°C(max.) 1sec. Timer

Short circuit(SC)

Voltage of 3-5pin

Short circuit current limiting voltage(VSC) : 1.50V(typ.)

1 time

Pulse-by -pulse current limiting voltage(Vpp) : 0.95V(typ.)

Table 1 Pin functions

TerminalNo.

1 D1

Symbol

Drain of main MOSFET

Function

Drain of main MOSFET

2 D2

3 S

Drain(sub MOSFET) Drain(sub MOSFET)

4 Vcc

5 GND

6 Fc

7 COMP

Power supply Power supply input

Ground GND of IC power supply

GND of current sensing GND of current sensing

Oscillator control

Setting oscillation frequency with capacitor which is connectedbetween Fc-GND

Synchronized signalinput

Synchronized operationis started when Fcterminal voltage hasfallen to 0V

FeedbackInput feedback signalfrom the secondary side

Standby signal input

Setting to 15V→normal mode operationSetting to 12V→standby mode operation

Source of main MOSFET

Source of main MOSFET

Source of sub MOSFET

Source of sub MOSFET

Current sensing

Input voltage proportional to inductor currentDetection of over-currentDetection of short-circuit current

Description

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Multiple-Chip Power Device “M-POWER” for Power Supplies 49

connected with Al-wire. The structure is designedto be both simple and highly reliable.

4.7 Product seriesThe drain-source breakdown voltage (VDS) is de-

signed to be compatible with a universal input. Theproduct series of M-POWER devices, as listed in Table3, combines drain-source on-state resistance (RDS(on)),the voltage of start threshold and the operatingtemperature of over heating protection (Tj(OH)).

5. Conclusion

The one-converter-type power supply and the M-POWER device, both developed by Fuji Electric, havebeen introduced. Through their use, high efficiency,low dissipation loss at standby mode, low inputdistortion, small size and fail-safe power supplies canbe constructed. We are confident that the M-POWERwill contribute to the energy savings of power supplies.

In the future, we will develop a series of devices fora wide range of applications, and make the productseasier to use.

Reference(1) G.Hua, F.C.Lee: “Soft-Switching Techniques in PWM

Converters” IEEE Trans. Ind. Electr., Vol.42, No. 6,1995

Therefore, a fail-safe power supply can be constructedusing the M-POWER device.

4.6 PackageThe M-POWER’s package is shown in Fig. 10.

Features of the package are as follows.(1) Same dimensions as the TO-3PL size.(2) The heat dissipation of Q1, which generates the

most heat, was carefully considered in the designand the construction was devised to move theframe for Q1 to the backside. By construction theframe for Q2 and the control IC, which generatelittle heat, as a full-molded design, heat dissipa-tion and insulation of each chip is secured.

(3) Without wiring boards, such as a ceramic board,each chip is mounted on a separate frame and is

Table 3 M-POWER product seriesFig.10 Internal configuration of the M-POWER

2.54

ControlICQ2

Q1

15.0

min

26.0

20.0 max 4.5

COMPFcGNDVccSQ2Q1

Type name

F9202LA

Main-MOSFET

VDS RDS(ON)

700V 1.2Ω

F9203LA 700V 0.8Ω

F9206L 700V 1.2Ω

F9207L 700V 0.8Ω

F9208L 700V 0.8Ω

VDS RDS(ON) VCC(ON)

800V 2.0Ω 10V

800V 2.0Ω 16.5V

Tj(OH)

125 to150°C

150°Cor more

Sub-MOSFET Control IC

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW50

Takeshi FujiiKoh YoshikawaKunio Matsubara

New 4.5kV High Power Flat-Packaged IGBTs

Fig.1 External view of 4.5kV-2.0kA flat-packaged IGBT1. Introduction

Recently, high-voltage and high power IGBTs(insulated gate bipolar transistors) have been increas-ingly used in industrial fields, and in tractions andtransformer facilities, where GTO (gate turn-off) thy-ristors were generally used in the past. The majorreasons for the increase in IGBT applications arebecause, compared to GTO thyristors, IGBTs have theadvantage of being easier to handle due to theirvoltage driving method and also have a wider safe-operating-area characteristic.

Large-scale and highly public systems require highreliability of their mechanical and electrical character-istics. To meet this requirement, Fuji Electric hasdeveloped highly reliable 2.5kV-1.0kA and 2.5kV-1.8kA flat-packaged IGBTs, and has promoted theirapplication to industrial or traction systems. Theseflat-packaged IGBT devices have achieved long-termhigh reliability of their mechanical characteristics.Their high resistance to rupture and distinctive flat-packaged structure allow them to be easily applied toequipment through series connections.

As use of IGBT applications expand, IGBT deviceswith higher voltage and higher power are beingrequired. By further developing the technology of the2.5kV flat-packaged IGBT, Fuji Electric has developedhigher voltage and higher power 4.5kV-2.0kA and4.5kV-1.2kA flat-packaged IGBT devices.

This paper presents an overview of the devicedesign and electrical characteristics of the above flat-packaged IGBT devices.

2. Device Design

2.1 Structure and features of flat-packaged IGBTThe 4.5kV IGBTs have square ceramic packages.

Figure 1 and Fig. 2 show the external views of the4.5kV-2.0A and 4.5kV-1.2kA flat-packaged IGBTs, re-spectively. The package size of the 4.5kV-2.0kA IGBTis 175 × 175 × 26mm, and that of the 4.5kV-1.2kAIGBT is 140 × 140 × 26mm. The devices have a doubleside cooling structure that allows cooling from both theemitter and collector electrodes. With its hermetic

sealing, the structure is also highly resistant torupture.

Figure 3 shows the external view of IGBT anddiode elements, which are contained in the flat-packaged IGBTs. Each chip is designed so as to placeeach IGBT or diode element on its own collector(cathode) electrode terminal of molybdenum so that itoperates as an independent element. Based on thisform, the 4.5kV-2.0kA flat-packaged IGBT contains 16IGBT elements and 9 diode elements that work asFWDs (free wheel diodes); and the 4.5kV-1.2kA flat-packaged IGBT contains 11 IGBT elements and 5diode elements. We refer to this internal architectureas a multi-collector structure.

Through utilization of the multi-collector structure,

Fig.2 External view of 4.5kV-1.2kA flat-packaged IGBT

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New 4.5kV High Power Flat-Packaged IGBTs 51

high reliability of long-term power cycles has beenachieved even in cases where the device contains manychips such as the 4.5kV flat-packaged IGBT.

2.2 Chip design and featuresFigure 4 shows the external view of the 4.5kV

IGBT and the diode chips contained in the 4.5kV flat-packaged IGBT devices. The size of both chips is 21.5× 21.5mm.

The IGBT chip utilizes a punch-through typestructure. The formation of thin n+ buffer and p+

collector layers on the reverse face side allows theimpurity concentration to be well controlled. Thisstructure suppresses injection from the reverse facelayers to optimize the characteristics.

The structure of the diode chip is so optimized withparticular emphasis on to restraining wave oscillationsduring reverse recovery.

2.3 Higher breakdown strength of IGBT and diode chipsTo achieve high turn-off strength, the 4.5kV IGBT

chip is designed as follows.First, the saturation current of the IGBT is set to

be lower than the latch-up current value. Breakdownof the IGBT chip at turn-off is mostly caused by thephenomenon of latch-up of parasitic thyristors. There-for, designing the IGBT saturation current to be lowerthan the latch-up current of parasitic thyristors allowsthe turn-off strength to be improved.

Secondly, the dynamic avalanche phenomenon at

turn-off is restrained. During turn-off, the electricfield intensity increases and the turn-off currentconcentrates in a part of the active region of chip,causing the phenomenon of dynamic avalanching. Thestructure of the 4.5kV IGBT chip is optimized torestrain this phenomenon.

In high-voltage high power inverter systems, snub-ber circuits having been eliminated or circuit inductancehas been reduced to promote the downsizing of thesystems. Accordingly, a large capacity to withstandreverse recovery is required for free wheel diodes.

We analyzed the breakdown phenomena at reverse

Table 1 Specifications of 4.5kV-2.0kA flat-packaged IGBT

Fig.3 External view of IGBT element and diode element

Fig.4 External view of IGBT chip and diode chip

DiodeIGBT

DiodeIGBT

Item Symbol

Collector-emitter voltage

Rating

4,500VCES

Unit

V

Gate-emitter voltage ±20VGES V

Junction temperature – 40 to +125Tj °C

Mounting force 55 to 70– kN

DC collector current 2,000IC A

2,000– IC A

Pulse collector current

Maximum collector power dissipation

4,000IC (pulse) A

4,000– IC (pulse) A

10,000PC W

Item Symbol

ICESCollector leakage current

Min Typical

– –

Max

100

Unit

mA

Test condition

VGE = 0VVCE = 4,500VTj = 125 °C

IGESGate leakagecurrent – – ±10 µAVCE = 0V

VGE = ±20V

VGE(th)Gate threshold voltage 6.0 – 8.0 VVCE = 20V

IC = 2.0A

VCE(sat)Collector-emittersaturation voltage – 5.7 – V

VGE = 15VIC = 2,000ATj = 125 °C

VFDiode forward voltage – 4.3 – V

tonTurn-on characteristics

Turn-off characteristics

– 1.5 – µs

toff – 3.5 – µs

tr – 0.85 – µs

tf – 1.9 – µs

VGE = 15VIC = 2,000ATj = 125 °C

trrReverse recovery characteristics – 1.0 – µs

– di/dt= 9,000 A/µsIF = 2,000ATj = 125 °C

VCC = 2,600VIC = 2,000ATj = 125 °CVGE = ±15VRg(on) = 1.0ΩRg(off) = 0.7Ω

(b) Electrical characteristics

(c) Thermal characteristics

Item

IGBT

FWD

Rth(j-f)

Rth(j-f)

Symbol

Thermal resistance

Min Typical

Unit

°C/W

°C/W

Test condition

Doubleside

cooling

– –

Max

0.010

0.017

(a) Maximum ratings (Tj = 25°C)

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW52

Table 2 Specifications of 4.5kV-1.2kA flat-packaged IGBT

recovery, and reevaluated the structure of the partwhere current concentration occurred. This enabled usto improve the carrier distribution within the 4.5kVdiode chip and to achieve better reverse recoverycharacteristics.

3. Characteristics of 4.5kV Flat-Packaged IGBT

3.1 Maximum ratings and characteristicsThe specifications of the 4.5kV-2.0kA flat-packaged

IGBT, including the maximum ratings and characteris-tics, are shown in Table 1; and those of the 4.5kV-

Fig.5 Forward characteristics of 4.5kV-2.0kA flat-packaged IGBT

Item Symbol

Collector-emitter voltage

Rating

4,500VCES

Unit

V

Gate-emitter voltage ±20VGES V

Junction temperature – 40 to +125Tj °C

Mounting force 35 to 45– kN

DC collector current 1,200IC A

1,200– IC A

Pulse collector current

Maximum collector power dissipation

2,400IC (pulse) A

2,400– IC (pulse) A

7,100PC W

Item Symbol

ICES

Min Typical

– –

Max

65

Unit

mA

Test condition

VGE = 0VVCE = 4,500VTj = 125 °C

IGES – – ±10 µAVCE = 0VVGE = ±20V

VGE(th) 6.0 – 8.0 VVCE = 20VIC = 2.0A

VCE(sat) – 5.4 – VVGE = 15VIC = 1,200ATj = 125 °C

VFDiode forward voltage – 4.5 – V

tonTurn-on characteristics

Turn-off characteristics

– 2.4 – µs

toff – 3.6 – µs

tr – 1.6 – µs

tf – 2.1 – µs

VGE = 15VIC = 1,200ATj = 125 °C

trrReverse recovery characteristics – 0.74 – µs

– di/dt= 5,500 A/µsIF = 1,200ATj = 125 °C

VCC = 2,600VIC = 2,000ATj = 125 °CVGE = ±15VRg(on) = 1.5ΩRg(off) = 1.0Ω

(b) Electrical characteristics

(c) Thermal characteristics

Item

IGBT

FWD

Rth(j-f)

Rth(j-f)

Symbol

Thermal resistance

Min Typical

Unit

°C/W

°C/W

Test condition

Doubleside

cooling

– –

Max

0.014

0.030

(a) Maximum ratings (Tj = 25°C)

Collector leakage current

Gate leakagecurrent

Gate threshold voltage

Collector-emittersaturation voltage

0 1.0 2.0 3.0 4.0 5.0 6.0 7.0

2,000

1,800

1,600

1,400

1,200

1,000

800

600

400

200

00 1.0 2.0 3.0 4.0 5.0 6.0 7.0

VCE(sat) (V)

IC (

A)

2,000

1,800

1,600

1,400

1,200

1,000

800

600

400

200

0

IF (

A)

Tj=25°CTj=125°C

VF (V)

(a) VCE · IC characteristics

(b) VF · IF characteristics

Tj=25°C Tj=125°C

1.2kA flat-packaged IGBT are shown in Table 2.

3.2 Forward characteristicsFigure 5 shows the VCE vs. IC and VF vs. IF

characteristics of a 4.5kV-2.0kA flat-packaged IGBT;and Fig. 6 shows those of a 4.5kV-1.2kA flat-packagedIGBT. Both devices have a common tendency toincrease the saturation voltage between the IGBT’scollector and emitter as the junction temperature rises.When using two or more devices connected in parallel,this tendency is favorable because it works to adjustcurrent distribution among them.

3.3 Switching characteristicsFigure 7 shows the trade-off relation between the

collector-emitter saturation voltage (VCE (sat)) and theturn-off energy loss (Eoff) of a 4.5kV-2.0kA flat-pack-aged IGBT; and Fig. 8 shows those of a 4.5kV-1.2kAflat-packaged IGBT.

For a 4.5kV-2.0kA flat-packaged IGBT with VCE =5.7V, the turn-off time is 3.5µs when it interrupts a DCrated current of 2,000A. And, for a 4.5kV-1.2kA flat-packaged IGBT with VCE = 5.4V, the turn-off time is3.6µs when it interrupts a DC rated current of 1,200A.

Figure 9 shows the turn-off waveforms of a 4.5kV-2.0kA flat-packaged IGBT in the case of a high current.

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New 4.5kV High Power Flat-Packaged IGBTs 53

With a DC voltage of 2,600V, testing temperature of125°C, and no snubber circuit, the device successfullyturns off a collector current of 4,500A, more than twiceof the rated current. The 4.5kV flat-packaged IGBTshave high turn-off capability.

4. Conclusion

This paper has presented an overview of thetechnologies utilized in flat-packaged IGBTs withratings of 4.5kV-2.0kA and 4.5kV-1.2kA, and has alsodescribed their performance.

These devices meet the need to put IGBTs withhigher voltage into practical use in the field of high-voltage high power conversion systems where applica-tion of IGBTs have been increasingly promoted. Thedevices also have such performance as will enablethem to replace GTO thyristors in the future.

With respect to high-speed and reliability, applica-tion of IGBTs is expected to progress in high-voltageand large power fields. Fuji Electric will continue toimprove the developed 4.5kV flat-packaged IGBTs andto promote their application to various systems.

References(1) Takahashi, Y. et al. Ultra high-power 2.5 kV-1800 A

Fig.7 Trade-off between VCE(sat) and turn-off loss for 4.5kV-2.0kA flat-packaged IGBT

Power Pack IGBT. in Proceedings of ISPSD ’97. 1997.p.233-236.

(2) Koga, T. et al. Ruggedness and Reliability of 2.5kV-1.8kA Power Pack IGBT with a Novel Multi-CollectorStructure. in Proceedings of ISPSD ’98. 1998. p.437-440.

(3) Yoshikawa, K. et al. A Novel IGBT Chip DesignConcept of High Turn-off Current Capacity and HighShort Circuit Capability for 2.5kV Power Pack IGBT.in Proceedings of ISPSD ’99. 1999, p.177-180.

(4) Fujii, T. et al. 4.5kV-2000A Power Pack IGBT (UltraHigh Power Flat-Packaged PT type RC-IGBT). inProceedings of ISPSD ’00. 2000, p.33-36.

Fig.8 Trade-off between VCE(sat) and turn-off loss for 4.5kV-1.2kA flat-packaged IGBT

Fig.9 Turn-off waveforms under high current condition

Fig.6 Forward characteristics of 4.5kV-1.2kA flat-packaged IGBT

1,200

1,000

800

600

400

200

00 1.0 2.0 3.0 4.0 5.0 6.0

1,200

1,000

800

600

400

200

00 1.0 2.0 3.0 4.0 5.0 6.0

Tj=25°C Tj=125°CIC (

A)

VCE(sat) (V)

Tj=25°CTj=125°C

IF (

A)

VF (V)

(b) VF · IF characteristics

(a) VCE · IC characteristics

Tu

rn-o

ff e

ner

gy lo

ss E

off (m

J)

Saturation voltage VCE(sat) (V)

Ed= 2,600 VIc = 2,000 ATj = 125°C

9,000

8,000

7,000

6,0006.56.05.55.0

Tu

rn-o

ff e

ner

gy lo

ss E

off (m

J)

Saturation voltage VCE(sat) (V)

Ed= 2,600 VIc = 1,200 ATj = 125°C

6,000

5,000

4,000

3,0006.05.55.04.5

0 V VGE : 20 V/div

VCE : 1,000 V/div

ICE : 1,000 A/div

t : 1 µs/div

0 V,0 A

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW54

Akira MorozumiKatsumi YamadaTadashi Miyasaka

Reliability Design Technology forPower Semiconductor Modules

1. Introduction

The market for power semiconductor modules isspreading not only to general-purpose inverters, servomotor drives, NC machine tools and elevators but alsoto new applications through the realization of electricvehicles and renewable energy systems.

Fuji Electric has developed various power modulesin response to market needs, and as the marketexpands in the future, the required performance forpower modules will surely become diversified andadvanced.

This paper introduces our efforts to lengthen thepower cycling lifetime of IGBTs (insulated gate bipolartransistors), which is of great importance to themarket.

2. Lifetime Evaluation Technology and FailureMechanism

2.1 Power cycling testThe power cycling test is used to estimate the real

operation lifetime of IGBT modules. This test isrepeated until a IGBT module fails due to thermalstress generated from the rise and fall of the IGBTchip’s junction temperature Tj caused by turning onand off an electrical load, where the IGBT module hasbeen mounted on an air-cooled heat sink. Types ofpower cycling tests include the ∆Tj power cycling testand the ∆Tc power cycling test (thermal fatigue lifetimetest).

In the ∆Tj power cycling test, the junction tempera-ture is raised and lowered within relative short cyclesas shown in Fig. 1. This test is used mainly to evaluatethe lifetime of the aluminum wire bond and the solderjoint on the underside of a silicon chip. On the otherhand, the ∆Tc power cycling test is a heat cycle testwhereby in one cycle, current is turned on until thecase temperature (Tc) reaches an arbitrary value andthen is turned off from that time point until the casetemperature returns to the original value prior towhen current was on, as shown in Fig. 1. This test isapplied mainly to evaluate the lifetime of the solderjoint between the DCB substrate and copper base plate

as well as the solder joint on the underside of a siliconchip.

2.2 Failure mechanism of the ∆Tj power cycling testFigure 2 shows the structure of an IGBT module

made by Fuji Electric. As in the past, Pb-based solderis used at the joint between the silicon chip and theDCB substrate. The failure mechanisms resultingfrom power cycling tests of modules using Pb-basedsolder are as below.

When ∆Tj is approximately 100°C or above, cracksoccur at the interface between the silicon chip and thealuminum wire as shown in Fig. 3, due to shear stressgenerated by mismatched thermal expansion. Propa-gation of these cracks leads to wire bond lift-off and

Fig.1 Operating conditions of power cycling tests

ONIC

IC

T

T

Tj

TC

Tf

Tf

t

t

t

t

∆Tj

∆TC

∆Tj power cycling

∆TC power cycling

ON

OFF

OFF

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Reliability Design Technology for Power Semiconductor Modules 55

failure. This failure form is shown in Fig. 4. Wiremelting failure is not observed on the emitter bondingpad, and the lift-off surface can be plainly seen. Thisfact proves that the wire bond has been broken bymetal fatigue. In addition, via non-destructive inspec-tion using an acoustic microscope and cross-sectionalview of the solder joint, cracks of approximately 1mmaligned in parallel with the interface and originatingfrom the silicon chip outer surface are observed.

On the other hand, when ∆Tj is less than approxi-mately 80°C, cracks occur in the solder joint, due toshear strain generated by the mismatch of thermalexpansion between the DCB substrate and the siliconchip. The junction temperature increase due topropagation of these cracks leads to failure of theIGBT. This failure form is shown in Fig. 4. Theemitter bonding pad shows traces of burning due towire melting failure. Meanwhile, cracks in the solderjoint are observed throughout the silicon chip. Thewire melting failure is caused by melt-off of the wiredue to gradual temperature increase of the silicon chipresulted from increasing thermal resistance accompa-nied by propagation of the cracks.

Consequently, the power cycling lifetime with

conventional Pb-based solder structures depends onthe wire bond strength because there is almost nodamage to the solder itself in the range of relativelyhigh operating temperatures, namely when ∆Tj is about100°C or greater, and depends on the solder joint in therange of relatively low operating temperatures, when∆Tj is about 80°C or less.

3. Improvement of ∆Tj Power Cycling Lifetime

In chapter 2, it was explained that to prolong thepower cycling lifetime, improvements in the wire bondlifetime and the solder joint lifetime are required forthe high ∆Tj range and low ∆Tj range, respectively.Since most applications are in a relatively low temper-ature range such as below 100°C, the improvement ofpower cycling lifetime in this temperature range, inother words, improvement of the lifetime of the solderjoint is a practical necessity.

3.1 Improvement of solder joint lifetimeIn order to prolong the thermal fatigue lifetime of a

solder joint, minimizing shear strain generated in thesolder joint is most effective. In general, it is said thatlead-rich solder has a longer lifetime in the highershear strain range (∆γ ), and tin-rich solder has alonger lifetime in the lower ∆γ range. It can beestimated that application of a tin-rich solder would beeffective at the solder joint between the silicon chipand the DCB substrate, since the generated shearstrain therein is relatively low, namely less than 1%according to the results of finite element method(FEM) analysis. Furthermore, the strain generated atthe solder joint is related to the elastic modulus of thesolder, and solder with higher yield strength (resisting

Fig.4 Failure form after power cycling test of modules usingPb-based solder

Fig.3 Failure mechanism of power cycling test with Pb-basedsolder alloy

Fig.2 Vertical structure of IGBT module

Copper bonding

Copper base plate

Silicone soft gelSilicon chip

Aluminum bond wire

Solder

Solder

DCB substrate

CeramicCopper bonding

Shear stress

Silicon chip (Si)Solder

DCB substrate

Aluminum wire(Al)

CTE (coefficient of thermal expansion)

Al : 23.6×10–6/°CSl : 3.5×10–6/°C

CrackCrack

Shear strain Solder

Silicon chip (Si)

Aluminum wire

DCB substrate (Al2O3)

CTE (coefficient of thermal expansion)

Si : 3.5×10–6/°CAl2O3 : 7×10–6/°C

Crack Crack

∆Tj ≧100°C ∆Tj ≦80°C

Crack Crack

Silicon chip

Solder joint (acoustic image of solder interface)

Surface of emitter bonding pad

Cross section of cracks in solder joint

Crack Crack

Silicon chip

Solder joint (acoustic image of solder interface)

Surface of emitter bonding pad

Cross section of cracks in solder joint

∆Tj ≧100°C

∆Tj ≦80°C

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW56

strength against plastic deformation) generates lowerstrain. Accordingly, tin-rich solder is more effective torealize a longer lifetime under the same ∆Tj because ofits higher yield strength.3.1.1 Examination of new lead-free solder alloy

With the precondition that lead-free solder shouldbe used in due consideration of the environment, theSn/Ag based solder alloy has been selected as the basiccomposition to be examined. The reason is that Sn/Agbased solder alloy has relatively better balance ofproperties among the lead-free solders. However, lead-free solder – not limited only to the Sn/Ag based solderalloy – has the disadvantage of inferior wettabilitycompared with Pb-based solder. Accordingly, FujiElectric has developed a new lead-free Sn/Ag basedsolder alloy which possesses an excellent level ofmechanical properties and the same wettability as Pb-based solder by optimizing various additional elementsand their quantities. The properties of this new solderalloy are shown in Table 1.3.1.2 Estimation of solder joint lifetime with FEM analysis

Two-dimensional elastic-plastic thermal stressanalysis utilizing FEM was performed for both thenewly developed Sn/Ag based solder and the Pb-basedsolder to determine the strain generated at the solderjoint and estimate the lifetime. The results of analysisare shown in Table 2.

When the results are compared under the sametemperature condition, it can be seen that the new Sn/Ag based solder alloy has a smaller strain and longerlifetime compared with the Pb-based solder. Thisresult is attributed to the mechanical properties of the

new Sn/Ag based solder alloy, having 2.4 times higheryield strength and higher creep strength than the Pb-based solder.

3.2 Examination of ∆Tj power cycling lifetime (with newSn/Ag based solder)In order to clarify the power cycling lifetime of

IGBT modules using Sn/Ag based solder, tests areperformed under various operating temperatures ∆Tj.The lifetime is defined to be 1% of the unreliabilityrate (F (t)), obtained by plotting the number of cycles tofailure on Weibull probability paper. The operatingtemperatures, which are arbitrarily set, are measuredat the joint, case and heat sink, using IR thermogra-phy and thermocoupling. Figure 5 shows the results ofthe 1,200V-75A series IGBT module at 60°C, 80°C and110°C of ∆Tj. It can be understood that the lifetime is1.3 × 106 cycles, 1.7 × 105 cycles and 3 × 104 cycles at60°C, 80°C and 110°C of ∆Tj, respectively.

3.3 Failure mechanism of modules using Sn/Ag solderAccording to failure form inspection of power

cycling tests of 60°C and 110°C ∆Tj, intense wiremelting failure on the emitter wire bonding pad andsevere solder damage were observed after the powercycling test at 110°C ∆Tj. On the other hand, no wiremelting failure and very slight solder damage wereobserved after the power cycling test at 60°C ∆Tj,

however, the generation of cracks was observed in thesolder but it was very slight. From these failure forms,it is estimated that the power cycling lifetime of newSn/Ag based solder depends on that of the solder jointwhen ∆Tj is higher than about 110°C, and depends onthat of the wire bonds when ∆Tj is lower than about60°C. This fact differs from the failure mechanism ofPb-based solder mentioned in section 2.2. In addition,the crack propagation form in the solder joint alsodiffers between new Sn/Ag based solder and Pb-basedsolder. In the case of Pb-based solder that is easy todeform plastically, cracks propagate along the acting

Table 2 Result of thermal stress FEM analysis for solder joint

Table 1 Properties of newly developed lead-free Sn/Ag solderalloy

Fig.5 Weibull plot of power cycling test results of modulesusing Sn/Ag solder (1,200V-75A)

Items

Mechanical properties

Yield strength (MPa) 53 38 22

Elongation (%) 19 18 25

Creep rate (% h) 0.09 0.20 1.30

Spreading (%) 100 50 100

Contact angle (°) 17 27 9

Wetting force (mN) 0.39 0.36 0.41

Wettability

New Sn/Ag solder alloy

Sn3.5Agsolderalloy

ConventionalPb-based

solder alloy

Solders Number of cycles to failure of solder joint∆Tj (°C) ∆γ(%)

50New Sn/Ag solder

Conventional Pb-based solder

0.14 2.0×107

80 0.22 2.7×105

50 0.23 2.7×105

80 0.36 5.0×104

Un

reli

abil

ity

(%)

Number of cycles to failure

99.5

95

70

40

10

1

0.1104 105 106

∆Tj = 110°C ∆Tj = 80°C ∆Tj = 60°C

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Reliability Design Technology for Power Semiconductor Modules 57

direction of shear stress starting from the fillet, wherestress is concentrated as shown in Fig. 6. However, inthe case of new Sn/Ag based solder with high yieldstrength, the propagation of cracks is nearly concen-tric, originating almost directly under the silicon chipcenter. Furthermore, a characteristic of the cracksgenerated in new Sn/Ag based solder is that they arevertical or reticulated cracks, are parallel to the thickdirection of the solder, and propagate selectively alongthe tin grain boundary. From these facts, it issupposed that deterioration of Pb-based solder iscaused by plastic deformation due to strain, whiledeterioration of Sn/Ag based solder is caused bythermal damage due to the grain growth of tin.

4. Power Cycling Lifetime Curve of ModulesUsing Sn/Ag Solder

4.1 Relation between lifetime of wire bond/solder joint anda module’s lifetimeFrom consideration of the above, it is understood

that the power cycling lifetime of modules using newSn/Ag based solder is comprised of the lifetimes of thewire bond, the solder joint and the area in which thesecoexist as shown in Fig. 7. Thereupon, fatigue lifetimeof the wire bond and the solder joint are calculatedfrom detailed analysis of the failure lifetime in powercycling tests and from FEM stress analysis of the wirebond and solder joint. Figure 8 is obtained by plottingthe calculated lifetimes of each joint and the lifetime ofIGBT modules on the same graph. This graphindicates that the lifetime of a solder joint is in closeproximity to the lifetime of the module. On the otherhand, the lifetime of wire bond intersects the modulelifetime at about 50°C ∆Tj and falls below the modulelifetime at lower temperatures.

Consequently, fatigue damage of the solder jointrarely occurs in the range of ∆Tj less than 50°C, andthe module lifetime depends on the lifetime of wirebond fatigue. While, in the range of ∆Tj greater than50°C, the lifetime of solder joints exceeds the modulelifetime in this examination, but in actuality, both

lifetimes are judged as almost the same.

4.2 Reliability for power cycling of modules using Sn/AgsolderAs mentioned in section 4.1, the power cycling

lifetime curve of IGBT modules using new Sn/Ag basedsolder has an inflection point at 50°C ∆Tj. As shown inTable 3, these modules achieve a longer lifetime thanconventional modules that use Pb-based solder. Inparticular, the difference in lifetimes is remarkable atthe relatively low operation temperature range of lessthan 100°C. This achievement of longer lifetime in the

Fig.7 Relation of power cycling lifetime and failure mode

Fig.8 Power cycling lifetime curve of modules using newSn/Ag solder alloy

Fig.6 Crack propagation form of solder joint after powercycling test

Crack Crack Silicon chip

Pb-based solder

Cracks

Silicon chip

Sn/Ag solder

Failure form of Sn/Ag solder (acoustic image of Sn/Ag

solder interface)

Nu

mbe

r of

cyc

les

to f

ailu

reSolder joint lifetime area

Wire bond lifetime area

Wire bond lifetime area

Coexistent area of wire bond and solder joint lifetime

Solder joint lifetime area

Pb-based solder alloy

New Sn/Ag solder alloy

∆Tj (°C)

Nu

mbe

r of

cyc

les

to f

ailu

re

109

Lifetime of wire bond

(300µm Al wire)

Lifetime of solder joint (new Sn/Ag solder alloy)

Module lifetime (F (t)= 1% line)

108

107

106

105

104

103

10 50 100 200∆Tj (°C)

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Vol. 47 No. 2 FUJI ELECTRIC REVIEW58

power cycling test is attributed to improved mechani-cal properties of the new Sn/Ag based solder and tomaintaining a good wettability equivalent to Pb-basedsolder.

5. Conclusion

In the preceding chapters, our efforts to increasethe power cycling lifetime has been presented in thecontext of reliability design for power semiconductormodules. New Sn/Ag lead-free solder with excellentmechanical properties and wettability has been newlydeveloped, and can contribute to improved reliability ofthe modules. Through the longer power cyclinglifetime, miniaturization and price-reduction of thedevices are expected. Fuji Electric will endeavor tocontinue to respond to the needs of a market that isbecoming increasingly more demanding.

Table 3 Power cycling lifetime of modules under estimation ofF (t )=1%

Operatingtemperatures

Modules usingnew Sn/Ag solder

Modules using conventionalPb-based solder

∆Tj =100°C 2.5×104 1.7×104

∆Tj =60°C 1.3×106 1.8×105

∆Tj =30°C 8.0×107 5.0×106

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