Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3
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Transcript of Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3
112&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Outgassing EvaluationMore Moore, SP3 WP6,
for Task 3.6.1.6.1 and 3.6.2.3
Elettra and AZ Electronic MaterialsAthens
12.Mai 2005
212&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Objectives for OutgassingLow or no Outgassing chemicals is a requirement for the EUV exposuretool shelf life
First specifications for outgassing are given byASML
Resist outgas specifications for Alpha tool:H20 4.7E15
(molec/s*cm2)CxHy (integr. > 44 AMU) 4.7E13F/Cl 4.7E14S/P 4.7E11Si 4.7E9
PAG fragments (S/P) most critical
Intel Outgassing 5*1010 [molecules/cm²] at Esize (only
internal)
312&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Intel and Sematech are working on outgassing• test procedure for outgassing• characterization of of outgassing behavior of EUV resists and related
materials:a) qualitativly
• b) quantitativly
Outgassing experiments within More Moore and ExCite
• are needed to have test equipment and to get experience
• are needed to characterize the EUV resist materials
• are needed for selection of appropriate EUV resist material.
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Intel
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Where More Moore stands
Outgassing test equipment set up at Elettra Synchrotron Trieste
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Difference Mass Spectra MMC6 exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1 7 13 19 25 31 37 43 49 55 61 67 73 79 85 91 97 103
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Ion
Cu
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A)
PHS-Methacrylate Polymer
m/e=28,CO, C2H4
m/e=44; CO2
m/e=15,CH3
m/e=12-18, Polymer
m/e=27-30, Polymer
m/e=43-45, Polymer
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Difference Mass Spectrum MMC10, exposed-unexposedlow flux
1E-17
1E-16
1E-15
1E-14
1E-13
1 6
11
16
21
26
31
36
41
46
51
56
61
66
71
76
81
86
91
96
10
1
amu
Ion
Cu
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t va
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(A
)PHS-Methacrylate Polymer + PAG (TPS-Triflat)
m/e=48; SOm/e=64; SO2
m/e=12-18, Polymer
m/e=27-30, Polymer
m/e=44-45, Polymer
m/e=78; C6H6
m/e=69; CF3
m/e=31-40, PAG
m/e=20,HFm/e=26, PAG
812&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectrum MMC1, exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-131 6
11
16
21
26
31
36
41
46
51
56
61
66
71
76
81
86
91
96
10
1
amu
Ion
Cu
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t va
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ion
(A
)
PHS-Methacrylate based EUV Photoresist
m/e=48; SO m/e=64; SO2
m/e=12-18, Polymer
m/e=28, Polymer
m/e=43-45, Polymer
m/e=31,38 PAG
m/e=78, C6H6,PAG
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1012&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectra MMC10 exposed-unexposed,high flux
1E-17
1E-16
1E-15
1E-14
1E-13
1E-12
1 5 9 13 17 21 25 29 33 37 41 45 49 53 57 61 65 69 73 77
amu
Ion
Cu
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A)
m/e=48; SO m/e=64; SO2
PHS-Methacrylate Polymer + PAG (TPS-Triflat)
1112&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL
Difference Mass Spectrum MMC11, exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1E-12
1 7 13 19 25 31 37 43 49 55 61 67 73 79 85 91 97 103 109
amu
Ion
Cu
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t V
aria
tio
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A)
m/e=48; SO m/e=64; SO2
PHS-Methacrylate Polymer + PAG (TPS-Nonaflat)
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Difference Mass Spectra MMC5 exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1 9 17 25 33 41 49 57 65 73 81 89 97 105 113 121 129 137
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Methacrylate Polymer Based Resist
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Difference Mass Spectrum MMC3, exposed-unexposed
1E-17
1E-16
1E-15
1E-14
1E-13
1 9 17 25 33 41 49 57 65 73 81 89 97 105 113 121 129 137
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Methacrylate Polymer Based Resist
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Conclusion
• PAGs, which create Perfluorsulfonic acids outgass under EUV with SO,SO2
• More data needed
• Confirmation of reliability and precicion of measurement
• Analyses of mass fragments
• Quantification of outgassing in relation to specification of exposure tool