News from CMS Process Quality Control

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News from CMS Process Quality Control Thomas Bergauer HEPHY Vienna CMS TK Week, 29.1.2003, CERN

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News from CMS Process Quality Control. Thomas Bergauer HEPHY Vienna. CMS TK Week, 29.1.2003, CERN. Centers. Three Process Qualification Centers:. Florence Anna Macchiolo Carlo Civinini Mirko Brianzi. Strasbourg Jean-Charles Fontaine Jean-Marie Helleboid Jean-Laurent Agram. Vienna - PowerPoint PPT Presentation

Transcript of News from CMS Process Quality Control

Page 1: News from  CMS Process Quality Control

News from CMS Process Quality Control

Thomas BergauerHEPHY Vienna

CMS TK Week, 29.1.2003, CERN

Page 2: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 2

Centers Three Process Qualification Centers:

FlorenceAnna Macchiolo

Carlo Civinini

Mirko Brianzi

StrasbourgJean-Charles Fontaine

Jean-Marie Helleboid

Jean-Laurent Agram

ViennaThomas Bergauer

Margit Oberegger

Characterization by QTC

Process stability on test structures with 9 different measurements

Page 3: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 5

CVmos at different temperatures

• Just a test (Vienna coolingbox was available)

•CVmos at 5 different temperatures

•CVmos chosen because it is the simplest measurement

No temperature dependence of Vfb

-25 -20 -15 -10 -5 0 5 10 15Voltage (V)

Capacitance (F)

0

1E-10

2E-10

3E-10

4E-10

5E-10

6E-10

+20°C +10°C 0°C -10°C -20°C -30°C

Page 4: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 6

Thicker Aluminium

Rho_Alu Histogram

0

2

4

6

8

10

12

14

16

0-5 5-10 10-15 15-20 20-25 25-30 30-35

39 Teststructures from PQC Florence•Perugia 12 (prod.week 34/02)•Perugia 13 (03/02)•Perugia 14 (06/02 and 23/02)

Average data:• before Week 20/02: 26,09mOhms/sq. • After week 20/02: 14,34mOhms/sq.

Before week 20/02after

•Pisa 59 (08/02)•Pisa 60 (24/02)

Influence to rho_Alu

Also: slightly lower C_ac value:•17,01pF (before week 20/02) -> •16,65pF (after)

Page 5: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 7

Mask Problem W7B

Cac R (Al, p+, poly) Ivgcd Cint IVbaby Rint CVdiode CVMOS& IV diel

•Misalignment of 3 structures at the standard half moon•Not able to contact with probecard in one cycle•W7B: 1440 pcs.

Page 6: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 8

Mask Problem W7B

3 structures on the standard half moon affected

Sensor mask is OK

Options: new probecard

design OR new wafer mask

design

GCD C_int

Page 7: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 9

Inter-calibration

Circulation of 5 Teststructures Vienna -> Strasbourg Strasbourg -> Florence Florence -> Vienna

-> Florence-> Vienna-> Strasbourg(Exchange of TS during this Tracker Week)

Results: (up to now)

• Good agreement in all measurements• Higher Leakage current of Vienna Probecard causes lower R_int and higher IV_dielectric and GCD problems (fit)• small differences in capacitances values caused by stray capacitances. (<1pF)

Page 8: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 10

Software New Software allows re-read of local files

Up to now: Stand-alone program Re-analyze Re-write XML file

Acquisition Analysis DB Interface

Future: Fully integrated into acquisition software

Local files

Acquisition Analysis DB Interface

Local files

Analysis DB Interface

Page 9: News from  CMS Process Quality Control

Thomas Bergauer, HEPHY Vienna 11

Database

322 teststructures successfully loaded into db 61 faulty (status: 28.1.03)