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Transcript of Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang...
![Page 1: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/1.jpg)
Native-Conflict-Aware Wire Perturbation for Double Patterning Technology
Szu-Yu Chen , Yao-Wen ChangICCAD 2010
![Page 2: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/2.jpg)
Outline
• Introduction• Preliminaries• Native conflict prediction• NC-Aware wire perturbation• Experimental result• Conclusion
![Page 3: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/3.jpg)
Introduction
• Foundries have been systematically reducing the printed feature size (half pitch) for years.
• From Rayleigh criterion, the half pitch is limited to 36 nm, which cannot satisfy the desired sub-22nm technology nodes.
• The most popular solution for sub-22nm node is double patterning technology (DPT).
![Page 4: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/4.jpg)
Introduction
• Two feature have to be assigned to different masks if the distance of them is less than the minimum double patterning spacing (DP-spacing).
![Page 5: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/5.jpg)
Introduction
• Minimum pitch size = minimum width (Wmin) +minimum spacing
(Smin)• DP-Spacing = 2Pmin - Wmin
![Page 6: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/6.jpg)
Introduction
• Not all the patterns can be directly decomposed into two masks.
![Page 7: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/7.jpg)
Introduction
• Nevertheless, the stitch insertion might not be powerful enough doe resolving all the conflicts.
• A conflict that cannot be resolved by inserting stitches anywhere is called a native conflict (NC).
• In this paper, it deals with the NC issue by two stages:– (1) NC prediction.– (2) NC removal
![Page 8: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/8.jpg)
Preliminaries
• NC conflict
![Page 9: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/9.jpg)
Preliminaries
• DPT-Compliant Redesign– A native conflict can only be resolved by DPT-
compliant redesign.– DPT-compliant redesign should first predict the
occurrence and the locations of NCs, and then further correct them.
![Page 10: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/10.jpg)
Problem Formulation
• Given a post-routing layout, the minimum spacing, and the double patterning spacing, the problem finds a perturbed layout so that the number of native conflicts is minimized, subject to minimum-spacing rule and the double-patterning constraint.
![Page 11: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/11.jpg)
Native Conflict Prediction
• An odd cycle in the conflict graph is not necessarily a NC because of the possible solution by stitch insertion.
![Page 12: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/12.jpg)
Native Conflict Prediction
• Pattern projection
![Page 13: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/13.jpg)
Native Conflict Prediction
• Segmentation
![Page 14: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/14.jpg)
Native Conflict Prediction
• Odd-Cycle Detection– The existence of odd cycles can be determined by a
DFS algorithm.– Finding all the odd cycles is time-consuming.
• Cycle basis– A cycle basis is a basis if we treat every cycle as a
vector represented by series of edges, and the linear combination of cycles is a ring sum operation of cycles. Then the basis form a linearly independent spanning set for all cycles.
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Native Conflict Prediction
• Ring sum operation– Let the edges in the cycles C1 and C2 be sets E1 and
E2, respectively. A ring sum operation on C1 and C2 is denoted as C1 C⊕ 2, which is a cycle with its edge being a set, (E1’∩E2) (E∪ 1∩E2’).
![Page 16: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/16.jpg)
Native Conflict Prediction
• Cycle basis of a graph can be found by applying a modified DFS algorithm.
• For a connected graph G = (V,E), the result of DFS traversal forms a spanning tree T on V. Inserting any other edge e ϵ (E - T) causes a cycle.
• If there is no odd cycle in the cycle basis of a graph, then the graph contains no odd cycle.
![Page 17: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/17.jpg)
NC-Aware Wire Perturbation
![Page 18: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/18.jpg)
NC-Aware Wire Perturbation
• Symbolic Layout Representation– Every wire (via) is represented by two points.– By the symbolic representation, it can perform the
compaction across layers simultaneously.
![Page 19: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/19.jpg)
NC-Aware Wire Perturbation
• DPT-Compliance Checking• Wire Perturbation– Add DPT constraints to remove odd cycles.– Perform a trial compaction to see whether the
level of DPT-compliance is improved.
![Page 20: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/20.jpg)
NC-Aware Wire Perturbation
• Compaction– The compaction problem is modeled as a longest-
path problem on the constraint graph.
– (1) Wire Constraint Graph Construction• An edge (u,v) → wire u is on the left or bottom of v.• The transitive edges in the graph can be removed.
![Page 21: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/21.jpg)
NC-Aware Wire Perturbation
• Compaction– (2) Point Constraint Graph Construction• An edge (u,v) with its weight w → point v should be on
the right of point u, and the distance between them should be at least w.• There are four constraints:
– (1) Design-rule constraint– (2) Wire shape constraint– (3) Fixed-pin constraint– (4) Layout-boundary constraint
![Page 22: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/22.jpg)
NC-Aware Wire Perturbation
![Page 23: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/23.jpg)
NC-Aware Wire Perturbation
• DPT Constraint Generation– (1) Separating Wire Pairs Generation
![Page 24: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/24.jpg)
Experimental Result
![Page 25: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/25.jpg)
Experimental Result
![Page 26: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010.](https://reader030.fdocuments.us/reader030/viewer/2022032516/56649c7d5503460f94932b5b/html5/thumbnails/26.jpg)
Conclusion
• It presents a NC-prediction method based on geometry relation of features and a NC-aware wire perturbation algorithm to minimize as many NC’s in layout as possible.
• Perform an efficient method to find odd cycles.