Nanolitografi E-beam litografi Nano imprint litografi.
-
Upload
kaleigh-luty -
Category
Documents
-
view
214 -
download
1
Transcript of Nanolitografi E-beam litografi Nano imprint litografi.
NanolitografiE-beam litografiNano imprint litografi
Mikroskopi
SEM (scanning electron microscope)
F =-e v x B
Komponenter i SEM
Magnetisk linse
Schottky emitter elektronkilde
E-beam litografi
- Dedikerede e-beam systemer
- SEM med Raith Gmbh kontrolsystem og ’pattern generator’
DANCHIP
Test of nanowire writingE-beam writing+RIE(Nano 9 – Tom+Jeppe)
Wires and channels
2D grating:Periodicity - 250nm
Optiske strukturerDiffraktive komponenter
Nano Imprint Lithography (NIL)
Nanowire detektor
Appl. Phys. Lett. 89, 153102 (2006)
Focused Ion Beam (FIB) System
Focused Ion Beam Writing
As the diagram on the right shows,the gallium (Ga+) primary ion beam hitsthe sample surface and sputters a smallamount of material, which leaves thesurface as either secondary ions (i+ or i-) or neutral atoms (n0). The primary beam also produces secondary electrons (e-).As the primary beam rasters on the samplesurface, the signal from the sputtered ionsor secondary electrons is collected to forman image.
• E-beam ~10 nm• FIB ~20 nm• EDX
E-beam og FIB litografi
TEM samples
FIB skrivningAAU-logo på et hår
CVD med FIB stråle
Shinji MATSUI
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
FIB skrivningAAU-logo på et hår