Méthodes avancées de caractérisation et de modélisation des ... RF MICROWAVE 2018...Méthodes...
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Méthodes avancées de caractérisation et de modélisation des transistors HEMT GaN
Jean‐Christophe NALLATAMBY , Julien COUVIDAT, Sylvain LAURENT,Raphaël SOMMET, Michel PRIGENT & Raymond QUERE
XLIM, CNRS‐Université de Limoges
21‐22 mars 2018
INTRODUCTION
Potential applications for the GaN HEMTS are numerous
- For power amplifier of Radar T/R modules
- For base stations PA
- For multi-tone PA in space applications
- Pulsed, phase/frequency modulated for Radar Systems
- Highly complex signal (OFDM, QAM, ….)
All those applications involve complex modulated signals
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Key challenges of GaN HEMT Technology
• Deep level states (Traps) in the
bandgap of the material.
• Surface traps could be formed due to
defects or impurities formed at the
surface during crystal growth or in
device fabrication process.
• AlGaN/GaN HEMTs grown on
foreign substrates results in
imperfect crystals with dislocations
or defects.
• These defects cause the formation of
deep level states within the GaN and
AlGaN material.
Consequences of Traps
Gate lag, Drain lag and drain current collapse/ DC
– RF dispersion.
DC – RF dispersion – limits the large signal
performance of the device.
Trapping effects also contributes to dynamic RON,
which affects the power switching applications.
Physical location of traps in the device
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Different ways for characterization
Trap investigation using :Pulsed I-V characterization: Gate lag and drain lag identification but no information on the dynamics of the trapsLow frequency S-parameters measurementLow frequency noise characterizationDeep level transient spectroscopy (I-DLTS) measurement Large signal characterization (in frequency and time domain)
Parasitic effects still limit the performances of PA : Thermal effectsTrapping effects
All these characteristics should be consistently modeled
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Gate and Drain-Lag Mechanism
Gate-Lag Drain-Lag
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Ron & Idss measurements for thermal assessment
Based on a new and simple method proposed by J. Joh and all “Measurement of Channel Temperature in GaN High Electron Mobility Transistors”:
Ron measurement. Idss measurement.
Tools required : Pulsed I(V) Test bench measurement (PIV). (pulse width: 500 ns; duty cycle: 0.05%) Thermal chuck. (variation range: 25 °C to 175 °C)
Thermal Resistance Determination Methodology in 2 steps: Thermal chuck sweep with fixed zero dissipated output power. Dissipated output power sweep with fixed thermal chuck control.
Vds
IdsIdss
Ron=δVds/ δIds
Vgs=0V
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Ron & Idss measurements for thermal assessmentPulsed I(V) characteristics (VGSi = 0 V) from various quiescent bias points (VGS0 = 0 V, VDS0 = 2-13.5 V) with fixed thermal chuck at 25 °C :
Pulsed I-V characteristics (VGS = 0 V) from zero power quiescent bias point(VDS0 = VGS0 = 0 V) :
Vgs0: gate bias point.
Vds0: drain bias point.
Vdsi: drain pulsed point.
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Thermal Resistance
0( ) ( )
( ) (0)
ONON ON
ONON diss ON diss
diss
dRR T R T TdT
dRR P R PdP
/ON ON
THdiss diss
dR dRTRP dP dT
y = 0,0323x + 3,5969
y = -0,6888x + 449,79
320
340
360
380
400
420
440
0 50 100 150 200
Ta (°C)
Idss
(mA
)
4
5
6
7
8
9
10
Ron
(Ohm
)Idss
Ron
Linear (Ron)
Linear (Idss)
Baseplate temperature sweep Dissipated power sweep
|| ||
8
320
340
360
380
400
420
440
0 1 2 3 4 5Power dissipation (W)
Idss
(mA
)
44,555,566,577,588,5
Ron
(Ohm
)
Idss Ron
Trapping and Thermal Effects
• Difficult to disassociate trapping and thermal effects, especially at lower operating frequencies.
• Trapping and thermal time constants are almost of the same order.
Positive Pulse
Negative Pulse
Illustration of Trapping and Thermal Effects
Trapping +Thermal
TrappingTj = Tchuck + RTH × Pdiss
Pdiss = VDS× IDS
Power limit
Tchuck =25ºC
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LF- Y22 Parameter setup
• Study of the output admittance (Y22) Low‐Frequency Y22 analysis at several temperatures
• Output admittance very sensitive to trapping phenomena• Easy extraction of time constant
(Low Frequency S22 measurement [10Hz to 10MHz])
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Trapping model
The emission constants can be extracted either from peak values of Y22 imaginary part
The number of traps is defined by the number of peaks of the Y22 imaginary part
In Low Frequency Cds is equal to open then
AlGaN/GaN : 8x250 μm
Ids=50mA and Vds=40V @ 100°C
with
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LF‐ Y22 Parameter (8×75 µm Device)
en – trap emission rate σn – Cross section of traps NC – effective density of electrons in the conduction band Vth – thermal velocity of electrons g – degeneracy factor Ea – Trap activation energy
f , f =
eT
σ Ag exp.
EKT
A . e
Traps Energy Level: Ea = 0.4 eV
FI,peak
• The frequency at the peak of Imag(Y22) gives the emission time constant
• Arrhenius law extraction of activation energy (Ea) and capture cross section (σn)
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LF Noise Measurement (6×75 μm Device)
_ ∗ ∗
Measurement Setup
Equivalent Circuit
Voltage Amplifier:
eati – Voltage noise source
iati – Current noise source
Zati – Impedance
SV_meas – Measured voltage noise spectral density
Sir – Thermal noise spectral density
Z = Zeq || R
= .
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LF Noise Measurement (6×75 μm Device)
Ea1 = 0.57 eV; σn = 2.13× 10-16 cm2
Ea2 = 0.51 eV; σn = 4.96× 10-15 cm2
Identified Traps Physical Properties: • Extracted physical properties of traps are inagreement with literature reported data forFe-doped GaN devices.
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I‐DLTS Test Bench (Vg Pulse)
Bias TeeDC
RF+DCRF
DC SupplyE3641A
Bias TeeDC
RF+DC RF 50 Ω50 Ω
Pulse Generator8114A
DUT
AWGAF3252
TRIGHigh Sampling Scope DPO7054
GPIB
Thermal Chuck
Slow Sampling Scope DPO7054
Gauss Probe
Gauss Probe
• Pulse generator on the gate• DC voltage supply on the drain• Pulses qualified (dc path bandwidth = 20MHz) bias tees• One scope acquires the range 10‐7 to 10‐2 sec, the other for
10‐3 to 102 sec• Sampling first scope=100‐9 sec second scope=1‐6 sec• An AWG is used to generate pulse width and triggered start
point measurement• Probe station with thermal chuck
Example : Vgs_pulse = ‐8VVds0 = 10VId = 50mA/mmTfilling = 10µs, 1ms et 100msTempérature = 25°C, 75°C, 100°C et 125°C
0
0,2
0,4
0,6
0,8
1
1,2
1,0E‐06 1,0E‐05 1,0E‐04 1,0E‐03 1,0E‐02 1,0E‐01 1,0E+00 1,0E+01
Id normalisé
Temps (s)
25°C
50°C
75°C
100°C
125°CTfilling=1ms
AlGaN/GaN 2x100 um
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Equation of fitting curvefor one temperature :
·
I-DLTS Test Bench (Vd Pulse)
Bias TeeDC
RF+DCRF
DC SupplyE3641A
Bias TeeDC
RF+DC RF 50 Ω50 Ω
Pulse Generator8114A
DUT
AWGAF3252
TRIG
High Sampling Scope DPO7054
GPIB
Thermal Chuck
Slow Sampling Scope DPO7054
Gauss Probe
Gauss Probe
• Pulse generator on the drain• DC voltage supply on the gate• Pulses qualified (dc path bandwidth = 20MHz)
bias tees• One scope acquires the range 10-7 to 10-2 sec, the
other for 10-3 to 102 sec• Sampling first scope=100-9 sec second scope=1-6
sec• An AWG is used to generate pulse width and
triggered start point measurement• Probe station with thermal chuck
Example :Vds_pulse = 20VVds0 = 10VId = 50mA/mmTfilling = 10μs, 1ms et 100msTempérature = 25°C, 75°C, 100°C et 125°C
AlGaN/GaN 2x100 um
0
0,2
0,4
0,6
0,8
1
1,2
1,0E‐06 1,0E‐05 1,0E‐04 1,0E‐03 1,0E‐02 1,0E‐01 1,0E+00 1,0E+01
Id normalisé
Temps (s)
25°C
75°C
100°C
125°C
Tfilling=1ms
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Equation of fitting curve forone temperature :
·
y = 0,4806x ‐ 11,303
y = 0,2517x ‐ 0,3644
0
1
2
3
4
5
6
7
8
9
27 29 31 33 35 37 39 41
ln(τT²)
1/KT
Trap 1Trap 2Fit (Trap1)Fit (Trap2)
y = 0,4522x ‐ 11,321
0
1
2
3
4
5
6
7
27 29 31 33 35 37 39 41
ln(τT²)
1/KT
Trap 1
Fit (Trap1)
Identification of traps
Ea = 0,4522 eVσ = 1,43E-16 cm²
Ea = 0,2517 eV and 0,4806 eVσ = 2,50E-21 cm² and 1,40E-16 cm²
Vg Pulse
Vd Pulse
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· ··
·
g = 1 ; T² = 158404 K² Nc = 3,13E18cm‐3 Vth = 2,92E7cm/s
To determine the activation energy Ea and the capture cross‐section σn by using the Arrhenius equation : ·
· ·
· 1
ln · · ln·
With and
Steps of the modeling process
freq (2.000GHz to 40.00GHz)
S(1,
1) ;
S(2,
2)
5 10 15 20 25 300 35
-60
-40
-20
0
20
40
-80
60
freq, GHz
Pha
se (S
(1,2
))
5 10 15 20 25 300 35
-5
0
5
10
15
-10
20
freq, GHz
dB (S
(2,1
))
5 10 15 20 25 300 35
-24
-22
-20
-26
-18
freq, GHz
dB (S
(1,2
))
5 10 15 20 25 300 35
0
50
100
-50
150
freq, GHzPh
ase
(S(2
,1))
10 20 300 40
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.0
0.8
Vds (V)Id
s (A
)
-0.1
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
-5 0 5 10 15 20 25 30 35 40 45 50
Id e
n Am
pere
s
Vds en Volts
8x75 POLAR Vgs=-4.401 V, Vds=+22.97 V, Id =+0.163 A
Vgs=+1.000 VVgs= +0.00nVVgs=-1.000 VVgs=-2.000 VVgs=-3.000 VVgs=-4.000 VVgs=-5.000 VVgs=-6.000 VVgs=-7.000 VVgs=-8.000 V
Idss
y = -0,0024x + 1,6085
1,2
1,25
1,3
1,35
1,4
1,45
1,5
1,55
1,6
0 20 40 60 80 100 120 140 160
Is_gs
0,00E+00
5,00E-15
1,00E-14
1,50E-14
2,00E-14
2,50E-14
3,00E-14
3,50E-14
0 20 40 60 80 100 120 140 160
y= 1,6E-16+1,04973E-16*EXP(T/26,3157)
Cgs_1D
0,00E+00
1,00E-13
2,00E-13
3,00E-13
4,00E-13
5,00E-13
6,00E-13
-10 -8 -6 -4 -2 0 2Vgs
Cgs
(F)
MesureModele
Cgd_1D
0,00E+00
2,00E-14
4,00E-14
6,00E-14
8,00E-14
1,00E-13
1,20E-13
1,40E-13
-60 -50 -40 -30 -20 -10 0Vgd
Cgd
(F)
MesureModele
VdsVgs_int
VgsRfill
Rempty C
k+
+
k
Vds
Vds
VdsVgs_int
VgsRfill
Rempty C
k+
+
k
Vds
Vds
5.40E-02
5.50E-02
5.60E-02
5.70E-02
5.80E-02
5.90E-02
6.00E-02
0.00E+00 2.00E-06 4.00E-06 6.00E-06 8.00E-06 1.00E-0
Modèle petit-signal Modèle I-V Capacités NL Modèle thermique Modèles de pièges
Cgs=f(Vgs)
Cgd=f(Vgd)
Ids=f(Vgs_pièges,Vds,T)
Dgs=f(Vgs)
Dgd=f(Vgd)
Rs=f(T)
Rd=f(T)
Rgd=f(T)
Étapes de modélisation
RgLgCpgLsCpdLdRsRd
RiCdsτGmGdCgsCgdRgd
Ids=f(Vgs,Vds,T)
Dgs=f(Vgs)
Dgd=f(Vgd)Ids=f(Vgs,Vds)
freq (2.000GHz to 40.00GHz)
S(1,
1) ;
S(2,
2)
5 10 15 20 25 300 35
-60
-40
-20
0
20
40
-80
60
freq, GHz
Pha
se (S
(1,2
))
5 10 15 20 25 300 35
-5
0
5
10
15
-10
20
freq, GHz
dB (S
(2,1
))
5 10 15 20 25 300 35
-24
-22
-20
-26
-18
freq, GHz
dB (S
(1,2
))
5 10 15 20 25 300 35
0
50
100
-50
150
freq, GHzPh
ase
(S(2
,1))
10 20 300 40
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.0
0.8
Vds (V)Id
s (A
)
-0.1
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
-5 0 5 10 15 20 25 30 35 40 45 50
Id e
n Am
pere
s
Vds en Volts
8x75 POLAR Vgs=-4.401 V, Vds=+22.97 V, Id =+0.163 A
Vgs=+1.000 VVgs= +0.00nVVgs=-1.000 VVgs=-2.000 VVgs=-3.000 VVgs=-4.000 VVgs=-5.000 VVgs=-6.000 VVgs=-7.000 VVgs=-8.000 V
-0.1
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
-5 0 5 10 15 20 25 30 35 40 45 50
Id e
n Am
pere
s
Vds en Volts
8x75 POLAR Vgs=-4.401 V, Vds=+22.97 V, Id =+0.163 A
Vgs=+1.000 VVgs= +0.00nVVgs=-1.000 VVgs=-2.000 VVgs=-3.000 VVgs=-4.000 VVgs=-5.000 VVgs=-6.000 VVgs=-7.000 VVgs=-8.000 V
Idss
y = -0,0024x + 1,6085
1,2
1,25
1,3
1,35
1,4
1,45
1,5
1,55
1,6
0 20 40 60 80 100 120 140 160
Is_gs
0,00E+00
5,00E-15
1,00E-14
1,50E-14
2,00E-14
2,50E-14
3,00E-14
3,50E-14
0 20 40 60 80 100 120 140 160
y= 1,6E-16+1,04973E-16*EXP(T/26,3157)
Cgs_1D
0,00E+00
1,00E-13
2,00E-13
3,00E-13
4,00E-13
5,00E-13
6,00E-13
-10 -8 -6 -4 -2 0 2Vgs
Cgs
(F)
MesureModele
Cgd_1D
0,00E+00
2,00E-14
4,00E-14
6,00E-14
8,00E-14
1,00E-13
1,20E-13
1,40E-13
-60 -50 -40 -30 -20 -10 0Vgd
Cgd
(F)
MesureModele
VdsVgs_int
VgsRfill
Rempty C
k+
+
k
Vds
Vds
VdsVgs_int
VgsRfill
Rempty C
k+
+
k
Vds
Vds
5.40E-02
5.50E-02
5.60E-02
5.70E-02
5.80E-02
5.90E-02
6.00E-02
0.00E+00 2.00E-06 4.00E-06 6.00E-06 8.00E-06 1.00E-0
VdsVgs_int
VgsRfill
Rempty C
k+
+
k
Vds
Vds
VdsVgs_int
VgsRfill
Rempty C
k+
+
k
Vds
Vds
5.40E-02
5.50E-02
5.60E-02
5.70E-02
5.80E-02
5.90E-02
6.00E-02
0.00E+00 2.00E-06 4.00E-06 6.00E-06 8.00E-06 1.00E-0
Modèle petit-signal Modèle I-V Capacités NL Modèle thermique Modèles de pièges
Cgs=f(Vgs)
Cgd=f(Vgd)
Ids=f(Vgs_pièges,Vds,T)
Dgs=f(Vgs)
Dgd=f(Vgd)
Rs=f(T)
Rd=f(T)
Rgd=f(T)
Étapes de modélisation
RgLgCpgLsCpdLdRsRd
RiCdsτGmGdCgsCgdRgd
Ids=f(Vgs,Vds,T)
Dgs=f(Vgs)
Dgd=f(Vgd)Ids=f(Vgs,Vds)
Various parasitics effects are successively added
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We call these traps "Fast Emitting Traps". Highlighted in low frequency
[S] meas.
Knee walk-out for Vds,max > 15V Slow traps activated and not
modeled
model (fast-trap only)meas. Bias 0V/0V, VDS,max = 15Vmeas. Bias 0V/0V, VDS,max = 30V
Non linear electrothermal model with trapping effects
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Large signal validation : DC drain current drop due to both fast and slow traps
New trap model :
Investigation of Fast and Slow Charge Trapping Mechanisms of GaN/AlGaN HEMTs through Pulsed I-V Measurements and the Associated
New Trap Model
Presentation by Julien Couvidatat IMS Philadelphie 2018
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Linearity Measurement with Multi-Tones Signal
• PA Linearity Performances hugely depend on driven signals
• To measure linearity with Complex Modulated Signals like real signals (LTE,..) the needto demodulate signal
10.
% 10
• Emulation with an 8-ton generic signal with same statistical properties than ComplexModulated Signals (PAPR, PDF,…)
• No need to demodulate• Signal composed of 8 tones such as IM3, IM5 non overlap with themselves and 8-tones
signal • Computation of a C/I by summing all InBand (between the 1st and last signal tone)
IM3 and IM5 powers
• Definition of Figure Of Merite (by analogy with EVM)
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38
1 . ∆ with 1≤ k ≤ n
. 1st frequency
rank of frequency
∆ . distance between tons
. offset frequency
. .
Building of the 8-tones Signal
are Unequally Spaced
Powerf1 f2
kfk ).( 1
...fk
...f8
FFT grid : 217 Frequencies separatedby
pk 0,1, 3 , 3 , 3 , 3 , 3 , 3 guaranteesnon overlapbetweenIM3, IM5and8tones
22
Example of simulated PA Output Signal
Non overlap between IM3, IM5 and 8-tones Signals
23
Unequally Spaced Multi Tons test bench up to 6 GHz
IF BW : 10 MHzDynamic range: 65~70 dB
IF 160MHz
% 10
24
Multi-tone LP measurement
• 1-tone to 8-tones characteristics
Power characteristics are obtained for each frequency in the same way as for
classical LP systems
• C/IM3 is the total power for carriers / total IM power
• FOM is an EVM like measure (can be set equal to the EVM in some particular cases)
25
• Linearity Assessment
AlGaN/GaN 8x75 m – VDS0=30V, f0= 2 GHz
Spectrum results and Linearity measurement
Pin=-33dBm
Pin=4dBm
Input Output
26
AML26P2401Bias : 15V 190mA
Power sweep : -33dBm to 4dBm8 tones around 2GHz
With >2MHz of bandwidth
“Linearity Characterization of RF Circuits through an Unequally Spaced Multi-Tone Signal” Sylvain Laurent et al.Microwave Measurement Conference (ARFTG), 2016 88th ARFTG
IF bandwidth : 38MHz
Typical dynamic: 90dB
Unequally Spaced Multi Tons test benchUnder development up to 50 GHz
“A fully calibrated NVNA set-up for linearity characterization of RF power devices using Unequally Spaced Multi-Tone signal through IM3 & IM5 measurements » Presentation by V. Gillet at
91st ARFTG Microwave Measurement Symposium June 15, 2018, Philadelphia PA
27
Conclusion
• GaN HEMTs modeling still remains a challenging task
• Impact of Low Frequency parasitic on large signal performances must be evaluated
• Dynamics of traps play a major role• A tentative model able to consistently take into
account those dynamics has been proposed • Special nonlinear measurement set-ups are
mandatory to assess all the effects
28
Acknowledgements
• Thanks to III-V lab and UMS Foundry for supplying the device wafers.
• Thanks to PhD Students of XLIM for providing measurement characteristics
• Thanks to the Agence Nationale de la Recherche (ANR) and Direction
Générale de l'Armement (DGA) France.
• This work was supported by COMPACT project under contract ANR-17-
ASTR- 0007-01 and VeGaN project, France, under Contract FUI 18
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