Laboratory study of the PDX/PLT laser blowoff trace...
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Laboratory study of the PDX/PLT laser blowoff trace element injectors D. Manos, D. Ruzic, R. Moore, and S. Cohen Citation: J. Vac. Sci. Technol. 20, 1230 (1982); doi: 10.1116/1.571549 View online: http://dx.doi.org/10.1116/1.571549 View Table of Contents: http://avspublications.org/jvst/cresource/1/JVSTAL/v20/i4 Published by the AVS: Science & Technology of Materials, Interfaces, and Processing Related Articles Analysis of unstable species in cyclo-C4F8 plasma by ion attachment mass spectrometry J. Vac. Sci. Technol. A 24, 385 (2006) Threshold ionization mass spectrometry of reactive species in remote Ar/C2H2 expanding thermal plasma J. Vac. Sci. Technol. A 23, 1400 (2005) Measurement of absolute radical densities in a plasma using modulated-beam line-of-sight threshold ionization mass spectrometry J. Vac. Sci. Technol. A 22, 71 (2004) Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron J. Vac. Sci. Technol. A 21, L28 (2003) Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasma used for nanocrystalline diamond deposition J. Vac. Sci. Technol. A 21, 1988 (2003) Additional information on J. Vac. Sci. Technol. Journal Homepage: http://avspublications.org/jvst/resource/1/jvstal Downloaded 25 Dec 2012 to 130.126.32.13. Redistribution subject to AVS license or copyright; see http://avspublications.org/jvst/rights_and_permissions
Transcript of Laboratory study of the PDX/PLT laser blowoff trace...
Laboratory study of the PDX/PLT laser blowoff trace element injectorsD. Manos, D. Ruzic, R. Moore, and S. Cohen Citation: J. Vac. Sci. Technol. 20, 1230 (1982); doi: 10.1116/1.571549 View online: http://dx.doi.org/10.1116/1.571549 View Table of Contents: http://avspublications.org/jvst/cresource/1/JVSTAL/v20/i4 Published by the AVS: Science & Technology of Materials, Interfaces, and Processing Related ArticlesAnalysis of unstable species in cyclo-C4F8 plasma by ion attachment mass spectrometry J. Vac. Sci. Technol. A 24, 385 (2006) Threshold ionization mass spectrometry of reactive species in remote Ar/C2H2 expanding thermal plasma J. Vac. Sci. Technol. A 23, 1400 (2005) Measurement of absolute radical densities in a plasma using modulated-beam line-of-sight threshold ionizationmass spectrometry J. Vac. Sci. Technol. A 22, 71 (2004) Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron J. Vac. Sci. Technol. A 21, L28 (2003) Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasmaused for nanocrystalline diamond deposition J. Vac. Sci. Technol. A 21, 1988 (2003) Additional information on J. Vac. Sci. Technol.Journal Homepage: http://avspublications.org/jvst/resource/1/jvstal
Downloaded 25 Dec 2012 to 130.126.32.13. Redistribution subject to AVS license or copyright; see http://avspublications.org/jvst/rights_and_permissions
Downloaded 25 Dec 2012 to 130.126.32.13. Redistribution subject to AVS license or copyright; see http://avspublications.org/jvst/rights_and_permissions
Downloaded 25 Dec 2012 to 130.126.32.13. Redistribution subject to AVS license or copyright; see http://avspublications.org/jvst/rights_and_permissions
Downloaded 25 Dec 2012 to 130.126.32.13. Redistribution subject to AVS license or copyright; see http://avspublications.org/jvst/rights_and_permissions
Downloaded 25 Dec 2012 to 130.126.32.13. Redistribution subject to AVS license or copyright; see http://avspublications.org/jvst/rights_and_permissions
