L ithography A nalysis using V irtual A ccess UC Berkeley TCAD Research 2000 1998 1997 Frank Gennari...
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Transcript of L ithography A nalysis using V irtual A ccess UC Berkeley TCAD Research 2000 1998 1997 Frank Gennari...
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Lithography Analysis using Virtual Access
UC Berkeley TCAD Research
2000 1998 1997 Frank Gennari Toshihiro Horie Peter Chien Steve Lee Timothy James Jefferey
Cheng Elmo Pittenger Ran Shen Rona Yang Takashi Orimoto Vinson Lee Chang Hsu Ka Chun Ng
Andrew Neureuther
Sang Fix 2001
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Motivation and Overview
• Avoid the hassle of • getting the right computer, • getting and licensing the software, and• installing and debugging the code
• Utilize the internet infrastructure• Application Oriented Applets• Internet Graphics• Horsepower of networks of workstations
When will I be able to use my
PDA?
ARN FIX
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Phase-Shifting Mask Edge Effects
SPLAT Output
ADAM and SANG
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Basic Aberration Applet
Submit to Splatsimulator
Select available mask patterns
Basic aberration applet Simulates 2D combinatorial aberration effects
Black and White VersionOf Intensity Output
Select aberrationsand adjust values
Default Splat Line Intensity Color OutputComparison of normal and aberrated intensity plots
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Deposition and Metalization
Submit your parameters to the Sample2D simulator.
The output is plotted using DrawPlot.
• Various source and profile types including user-defined profiles.• Plans for a multistep processing applet.
Choose from various source types.
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Etching and Pattern Transfer
• New, redesigned engine.
• Color coded etch rates.
• Predefined materials and profiles.
Customizable layers
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Chemically-Amplified Resist Profile Sharpening
Takashi and Mike
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Faster Tempest OutputJPEG Method:
-1s Load Time Over Ethernet
-30s Load Time Over 33.6 Modem
-Ability to save graphics
Java AWT Method:
-5m+ Load Time Over Ethernet
-20m+ Load Time Over 33.6 Modem
-Cannot save graphics
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Line-End Shortening
Mosong FIX
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Programmed-Probe AberrationTarget Applet
Select aberrationand adjust values
User-definedSplat Source Code
Select availablemask patterns
Adjust default mask parameters
Contour Plot OutputLine Intensity Output
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Online SimulationUsers input data to be simulated and results are displayed with graphical plotters.
Example taken from our SAMPLE-3D simulator.
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e-Beam Simulation Interface
Bo Make More self Explanatory
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e-Beam and 3D Tempest
e-Beam 3D Tempest
Kostas and Yunfei
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Visitors in Fall 00
Visits by organization typeVisits for 3 months
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Summary
• Applets – Aberrations and Aberration Measurements
– Chemically-Amplified Resist Mechanism
– Line-End Shortening with CARS
– Phase Defects on PSM
– Electron-Beam Probe Formation
– Deposition and Metalization
– Etching and Pattern Transfer
• Graphics using JPEG with capture
• Links to Networks-of-Workstations
ARN FIX
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Mask Editor
• Currently supports any number of rectangular regions
• Completely portable: can be reused in other applets
• Easily expandable
Ka Chun revisit?
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e-Beam Simulatore-Beam simulates the acceleration of a large number of electrons towards a target and calculates the inter-electron forces and scattering as they travel.
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SIMPL, SIMPL-DIX
• Decode SIMPLE-DIX and develop the interface for SIMPL.
• Crossing platforms from Unix to Windows.
• Erroneously prints in pink, black, and white.