Liquid Al surface density profile F.D. Di Tolla, PhD Thesis (1996)
IWLPC October 13-15, 2015 Daniel Duffy Ph.D., Hemal Bhavsar, Lin Xin, Jean Liu, Bruno Tolla Ph.D....
Transcript of IWLPC October 13-15, 2015 Daniel Duffy Ph.D., Hemal Bhavsar, Lin Xin, Jean Liu, Bruno Tolla Ph.D....
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IWLPC October 13-15, 2015
Daniel Duffy Ph.D., Hemal Bhavsar, Lin Xin, Jean Liu, Bruno Tolla Ph.D.
Kester Inc., Itasca, IL, USA
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Introduction◦ Conventional Flip Chip Assembly Process◦ One Step Chip Attach Process & Materials ( OSCA )
OSCA Materials for Reflow Processing ( OSCA-R )◦ Copper Pillar Test Vehicle◦ Design for Dispensing & Die Placement◦ Fluxing and Curing Kinetics During Reflow◦ Assembly by Conventional Reflow
Summary & Conclusions Acknowledgements
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New and Improved Process Flow
Flux / Chip Place Reflow De-flux Underfill Post Cure
Flux & Die Placement
Reflow
Cleaning
Post Cure Underfill
Underfill
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Process Simplification + Throughput
Dispense OSCA-R
Place Die
Next Process
Step
Dispense OSCA-R Die Placement Conventional Reflow Processing
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Wafer level assembly 3D assembly Fine pitch where flux residue
removal is challenging
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High device density Use where capillary
underfill materials face limitations
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Dispensing
Die Placement Reflow Processing Post Cure or Additional Assembly
StepsOSCA-R Material
OSCA-R Process
OSCA-R materials enable assembly process simplification ( no need to clean flux residues )
Rheology Wetting & Flow Design
Cure Kinetics & Thermomechanical Design
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Dispensing
Die Placement
Fluxing
Reflow Processing
Controlled Flow & Wetting
Filet Formation
Solder Wetting & Interconnection OSCA CuringAssembled Device
1/ Rheological Profile designed for Assembly
2/ Fluxing & Cure Kinetics balanced for appropriate sequencing
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OSCA-R materials have a range of flow and functional requirements during processing
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OSCA-R materials are multi functional reactive mixtures that thermally cure to a high performance thermoset polymer composite during reflow processing
FillersRheology
ColorDensity
Monomers Viscosity
Flow, tackWetting
Cure Chemistry
ActivatorsFluxing
Adhesion
HardenersViscosity Flow, tack
WettingCure Chemistry
Monomers Cross Links
Tg, CTEModulusAdhesion
Hardeners & ActivatorsCross Links
Thermal StabilityTg, CTEModulusAdhesion
FillersCTE
ModulusHardness
ToughnessThermal Conductivity
ReliabilityMoisture Resistance
Thermal Cure
CatalystCure Kinetics
1k Liquid MaterialHigh Tg Polymer Composite
Fluxing
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OSCA-R materials have been investigated using a number device configurations
◦ Silicon & ceramics tend to have better outgassing than organics and lower voiding with OSCA-R materials
◦ Solder capped structures are found to exclude fillers from the joint during reflow
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Organic Substrate Silicon Substrate
(a)
(b)
(c)
(d)
(e)
(f)
(g)
(h)
(i)
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Cu pillar test vehicle used for OSCA-R evaluations
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Wafer thickness = 0.75mm Die size = 6.35x 6.35mm. Two daisy chained arraysCentral Array 20x 20 bumps (400)Perimeter Array is 5x 70 bumps per side (1300) 128 interstitial bumps
Pitch = 80 microns Cu Pillar Height = Diameter = 40 micron 10 micron SnAg cap on pillarsCu Pad Diameter = 40 micronsCu Pad Height = 10 micron
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OSCA-R materials designed for use with different dispense technologies
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Time-Pressure Auger Jet
Optical Encoder
Voice-Coil Linear Motor
Material Piston
Removable Fluidic Module (houses wetted parts)
Yoke
Nozzle (Orifice)
Chamber
SmartStream
Shaft
A piston is used to displace the material from a chamber through a nozzle or needle.
O-Ring
Bumper
O-RingNut Seal
Positive Displacement Pump
SmartStreamTM
Time-Pressure PDP - Auger
NanoShotTM
Jet Dispense
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1
10
100
0.01 0.1 1 10 100 1000
Vis
cosi
ty (
Pa-s
) at
25C
Shear Rate ( Hz )
Formation of Stable Droplets
Wetting & Flow Control During
dispenseNo Stringing
Controlled FlowPattern & Shape
Retention
Reology & Dispensing Behavior
Fluids with shear thinning / yield stress behavior meet patterning & flow control CTQs
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1
10
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0.01 0.1 1 10 100 1000
Vis
cosi
ty (
Pa-s
) at
25C
Shear Rate ( Hz )
Reology & Dispensing Behavior
OSCA-R materials have good jet dispensing characteristics and pattern retention
Controlled flow keeps materials out of “no-go” zones and avoids bleed out
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OSCA-R Dispensed on Test Vehicle
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OSCA-R materials designed to overcome key placement challenges
Traps voids
Air Escapes
Rebound (viscoelasticity)
Void Elimination
• Flow properties enable dispense pattern and void elimination
• Flow behavior during die placement under compression can complicate accurate die placement
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OSCA-R materials designed to overcome key placement challenges and to be compatible with common placement technologies
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Board Level Assembly
Flip Chip Assembly
R&D Bonder Thermo Compression Bonding
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Using a Finetech die bonder system◦ Multi step placement procedure ensures die contact, and flow
High Speed
Low Speed0.5 to 3mm/sec
Dwell0.05 to 0.2 Sec
Force1 to 15 Nt
( 10x10 mm die )
Approach Step 1Approach Step 2
+ ContactApply Force
Hold Retract Placement
Tool
Change Over Distance 0.5 to 2 mm
High Speed
Make Contact with SubstrateDrive to Target z-position
Depends on Deposit Profile & Die Size / Shape
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Timing kinetics of fluxing, solder melting, interconnection and cure
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0
50
100
150
200
250
0 60 120 180 240
Tem
pera
ture
( oC
)
Time ( seconds )
Fluxing
Solder Wetting & Interconnection
OSCA Curing
Assembled Device
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OSCA-R cure kinetics tunable to meet a given reflow profile Ensure fluxing, interconnection and cure occur in the proper
sequence and at desired times during reflow
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0
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Frac
tion
al C
onve
rsio
n
Tem
pera
ture
(oC)
Time ( sec )
Temperature
Conversion
TAL
BD Model Parameter
Definition Units Unfilled, 0% Filled, 40%
NReaction
order-- 0.4 0.6
EActivation
EnergykJ/mol 44 52
Log ( Z ) Pre Factor 1/min 3.9 4.9
HReaction Enthalpy
J/g 360 235
Reaction Kinetics Modeling via DSC
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Examples of reflow profiles used to assemble devices with OSCA-R materials
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0
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100
150
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250
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0 20 40 60 80 100120140160180200220240260280300320340360
Tem
pera
ture
(oC)
Time (sec)
1 2 3 Range of profiles for different assembly applications
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Illustration of relationship between placement voids and ORCA-R rheology design
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(a)
(b)
1
10
100
0.01 0.1 1 10 100 1000
Vis
cosi
ty (
Pa-s
) at
25C
Shear Rate ( Hz )
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0
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100
150
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250
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0 20 40 60 80 100120140160180200220240260280300320340360
Tem
pera
ture
(oC)
Time (sec)
Successful assembly of devices with copper pillar features using conventional reflow processing and OSCA-R materials
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Property (method) Units A B C DFiller % Wt% 40 55 0 40Filler Size micron 0.5 0.5 5Tg (a) °C 159 125 116 125CTE-1 (a) ppm/K 46 36 68 49CTE-2 (a) ppm/K 138 117 212 163H (b) J/g 235 165 348 212T-onset (b) °C 129 118 160 157T-peak (b) °C 197 162 204 203Viscosity(c) Pa-s 49 26 2.6 6.8Viscosity(d) Pa-s 14 40 2.6 6.7STI (e) Ratio 3.5 0.5 1.0 1.1Yield Stress (f) Pa 2 0 0 0Temperature Thinning (g) Kelvin 2200 7300 5000 6900
Flo
w
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Rheology, viscosity, flow properties tunable for target dispensing/flow during die placement, cure kinetics and thermomechanical properties
Th
ermo
.C
ure
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One Step Chip Attach (OSCA-R) materials can be used to assemble devices with copper pillar features using convection or conduction mass reflow◦ Single die devices assembled in this work◦ Can be extended to wafer level◦ Can be used for 3D assembly◦ Device density increase, close placement◦ Approach reduces complexity of manufacturing with respect to
conventional processing◦ Higher throughput with use existing processing equipment
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Approaches to overcoming the key technical challenges presented◦ Systematic studies of soldering, rheology cure kinetics
and used to design OSCA-R materials for dispensing and successful assembly
◦ Die and substrate size, configuration and type are integral considerations for OSCA-R materials and processing
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Process integration is key to enabling OSCA-R materials◦ Chemistry matched to desired reflow processing◦ Rheology adjusted for dispensing and die placement
process
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Kester Inc. David Eichstadt, Maulik Shah, Chris Klimaszewski, Jim Lowe, Kal Chokshi
ITW Innovation Center Marina Litvinsky Research Triangle Institute, NC. Chris Gregory, Alan
Huffman TA-Instruments Gregory Kamykowski PhD, Kushal
Modi Finetech Neil O’Brian, Adrienne Gerard, Wade Gay Sonoscan Michelle Forbes
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Thank You for Your Attention
Questions?
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