IS 7265 (1973): Coating Materials (Metals, Alloys and ... · IS : 7265 - 1973 Indian Standard...

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IS 7265 (1973): Coating Materials (Metals, Alloys andDielectrics) Used in Optical Instrument Industry [PGD 22:Educational Instruments and Equipment]

IS : 7265 - 1973

Indian Standard COATING MATERIALS (METALS, ALLOYS AND

DIELECTRICS) USED IN OPTICAL INSTRUMENT INDUSTRY

Optical and Mathematical Instruments Sectional Committee, EDC 36

Chairman

DR C. S. RAO Kailas, Frenchpet, Machilipatnam

Members Rebresenting

SHRI A. ALVARES

SHRI V. K. VA~UDEVAN (Alternate) SHRI A. N. BHATTACHARYA SHRI J. CHATTERJEE CHIEF HYDROCRAPHER (NAVY) DEPUTY DIRECTOR, STANDARDS (TRACK)

All India Instrument Manufacturers and Dealers Asso- ciation, Bombay

Ministry of Defence (R & D) Survey of India, Dehra Dun Naval Headquarters Research, Designs & Standards Organization (Ministry

of Railways), Lucknow ASSISTANT DIRECTOR, STANDARDS (TRACK) (Alternate)

DIRECTOR, INSTRUMENTS RESEARCH & DEVELOP- Ministry of Defence (R & D) MENT ESTABLISHMENT SHRI S. S. DHARMAYYA (Alternate)

SHRI S. K. GAUTAM Quality Marked Goods Manufacturers’ Co-operative Association Ltd, Roorkee

SHRI P. L. BHARDWAJ (Alternate) SHRI S. K. GHOSE Directorate General, Ordnance Factories, Ministry of

Defence SHRI A. G HOSH SHRI P. C.JAIN

SHRI RAM PRA~AD (Alternate) SHRI D. D. KHOSLA

National Test House, Calcutta National Physical Laboratory (CSIR), New Delhi

Directorate of Industries, Government of Haryana, Chandigarh

COL K. L. KHOSLA COL N. P. MANAKTALA

LT-COL H. LAL (Alternate) SHRI B. R. MANKHAND DR M. V. R. K. MURTY LT-COL B. PAPANNA DR J. PRA~AD

The Institution of Surveyors, New Delhi Ministry of Defence (DGI)

The Koh-I-Noor (India) Private Ltd, Varanasi Department of Atomic Energy, Bombay Army Headquarters Central Scientific Instruments Organization (CSIR),

Chandigarh SHRI RAM SINGH (Alternate)

SHRI S. RAGHVIAH Development Commissioner, Small Scale Industries, New Delhi

SHRI E. B. RAJDERKAR Raj-Der-Kar & Co, Bombay KUMARI SUBAS RAJDERKAR (Alternate)

SHRI K. N. RAMA~WAMY SHRI P. V. MAMMEN (Alternate)

SHRX C. NARAYANA RAO DR I. RAMAKRISHNA RAO

Directorate General of Technical Development, New Delhi

The Andhra Scientific Co Ltd, Machilipatnam In personal capacity (Toshniwal Instruments and Engineer-

ing Co, IOA, Najafgarh Road, New Delhi 110015) PROF G. S. S. SARMA Madras Institute of Technology, Madras LT-COL G. S. SIHOTA Directorate General of Armed Forces Medical Service,

Ministry of Defence, New Delhi SURVEYOR OF WORKS I [OFFICE OF THE Central Public Works Department, New Delhi

SUPERINTENDING SURVEYOR OF WORKS (NDZ)] SHRI K. G. TORGAL The National Instruments and Ophthalmic Glass Ltd,

Calcutta SHRI A. GHOSH (Alternate)

(Continued on page 2)

0 Copyright 1975

INDIAN STANDARDS INSTITUTION

This publication is protected under the Indian Copyright Act (XIV of 1957 ) and reproduction in whole or in part by any means except with written permission of the publisher shall be deemed to be an infringement of copyright under the said Act.

(Continued from page 1)

Members

SHRX H. C. VERMA

SHRI K. G. PURANG (Alternate) SHRI S. M. RAZVI,

Deputy Director (Mech Engg)

Re@esenting

Associated Instrument Manufacturers (India) Private Limited, New Delhi

Director General, IS1 (Ex-oficio Member)

Secretary

SHRI S. P. ABBEY Assistant Director (Mech Engg), IS1

Materials and Components for Instruments Subcommittee, EDC 36 : 5

Convener p

SHRI H. C. VERMA Associated Instrument Manufacturers (India) Private Limited, New Delhi

Members

SHRI N. R. CHAKARABARTI Ministry of Defence (R & D) SHRI S. K. CHOSE Directorate General, Ordnance Factories, hlinistry of

T.T-COL H. LAL Defence

Ministry of Defence (DGI) _ SHRI H. N. DE (Alternate)

SHRI S. K. MUKHERJEE DR J. PRA~AD

SHRI K. N. RAMASWAMY SIIRI P. V. MAMMEN (Alternate)

SHRI RAM PRASAD

I

Precision Optics & Machineries (P) Ltd, Calcutta Central Scientific Instruments Organization (CSIR),

Chandigarh Directorate General of Te~chnical Development, NW Delhi

National Physical Laboratory (CSIR), New Delhi

2

IS : 7265 - 1973

Indian Standard COATING MATERIALS (METALS, ALLOYS AND

DIELECTRICS) USED IN OPTI-CAL INSTRUMENT

INDUSTRY

0. FOR

0.1 This Indian Standard was adopted by the Indian Standards Institution on 29 November, 1973, after the draft finalized by the Optical and Mathematical Instruments Sectional Committee had been approved by the Mechanical Engineer- ing Division Council.

0.2 This standard highlights the various details

EWORD

about the coating dielectrics) used in order to facilitate

8

materials (metals, alloys and optical instrument industry in comparison and selection of

proper coating materials-for particular use. This standard further highlights the ‘various optical, physical and chemical properties of metals, alloys and dielectrics used as coating materials (massive as well as evaporated) in optical instrument industry.

1. SCOPE

1.1 This standard covers chemical characteristics

(massive as well as evaporated) including metals,

the optical, physical and alloys and dielectrics used in optical instrument

of coating materials industry in order to facilitate their comparison and selection for particular use (see Table 1).

3

IS : 7265 - 1973

SL SUBSTANCE No.

(1) (2)

Metals

1 Aluminium Al 144

2 Antimony Sb 3.04

3 Barium Ba -

4 Beryllium Be

5 Bismuth Bi

TABLE 1 CHARACTERISTICS OF COATING MATERIALS

SYMBOL/

COMPOSITION I

-y

MASSIVE MATERIAL (Clause

- c ,

Optical Physical L .I-

(3)

I

Complex refractive index ?-------- Refractive Index of Absorption Index at Region of

0.589 pm Transparency*

(4) (5)

Varies from 2.85 to 3.92 for X=431 to 0.657 pm

6 Boron B 2.5 at 0.579 /l

7 Cadmium Cd 1.13

8 Cesium cs 0.32

Reflectance ’ ’ Melting

“%”

1 Density g/cm* at

20°C

8 Varies from 73% to 660 2.70

97.3% for X=1 to 12 pm

- a) 53% for h=0.6 pm

b) Varies from 55% to 72% for X=1 to 9 pm

630 6.68

- 717 3.50

- - 1 284 1.85

a) 1.78 a) Varies from 1.01 to b) 4.5 at 1.66for X=0.257 to

1.0 0.398 pm

b) Varies from 1.64 to 1.58for X=0.441 to 0.668 pm

-

Varies from 4.43 to 4.05 for X=0.589 pm

Varies from 2.37 to 4.34 Varies from 37.2% to for X=0.455 to 0.68 63.2% for X=0.455

pm to 0.68 pm

Varies from 71.7% to 81.6% for h=3 pm

Varies from 70.8% to 9812% for /\= 1.06 to 12.03 pm

271 9.78

2 000 to 2.5 2 080

321 8.65

29 . 1.87

*For dielectric materials. TResistance to abrasion of the evaporated material on glass substrate is grouped in three categories as explained below:

a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning. c) Exceptionally Good - Not removable by scratching with a steel pin.

4

. IS : 7265 - 1973

FOR USE IN OPTICAL INSTRUMENT INDUSTRY 1.1)

EVAPORATED MATERLAL *

c \ Optical Physical

n ( , Resistance

Complex refractive index Reflectance to Abrasion at 0.546/0.589 pm* at 0.546 pm on Glass

-Extinction region of Substrate?

Refractive transparency* Index Coeficient

CHEMICAL DEPOSITION REPORTED DURABILITY TECHNIQUE APPLICATIONS

(9) (10) (11) (12) (13) (14) (15)

n Vacuum evapora-

tion tungsten fila- \ ment ; most diffi-

cult to sputter

0.02 5.99 91.6 Good Produces film which does not tarnish quickly; excellent resistance to atmospheric corrosion except near coastal areas; dis- solved by alkalis & acid

hydrochloric

Optical mirrors for visible; ultraviolet and i&a-red regions; ultraviolet and vacuum ultraviolet interference filters; beam splitters; drawn and cast aluminium used in vacuum chambers

3.4 at 1.0 pm 4.1 at 1.0 pm 62.2 at 1.0 pm -

0.89 1.51 39.2 -

Oxidized on heating strongly in air;

Vacuum evaporation

attacked by acids (tungsten); can be sputtered easily

Oxidized in contact with air

Vacuum evaporation (tungsten)

Better material ; much employed (mixed with stron- tium) as cathode material

Lenard window in X-ray tube; film on glass gives high reflectivity in ultraviolet region

Bismuth oxide film is used as beam splitters; two-layer anti-reflection coating and heat reflecting filters in combination with gold film

2.66 2.36 43.9 - Does not corrode easily; an oxidized film protects it from further oxidation

- %ood, when Oxidized on heating oxidized to bismuth

strongly in air; attacked by oxidi-

oxide zing acids only

Vacuum evaporation (electron beam, tungsten basket, tantalum spirals)

Vacuum evaporation (tungsten) 5 can be reactivelv snutte- red to $or& bismuth oxide

- - - Soluble in nitric and sulphuric acids

Vacuum evaporation (electron beam)

Co;;2 $ bo;;;o;

crystals of solar batteries

Used for special photocell cathodes

Oxidized on heating strongly -in air;

Vacuum evaporation

attacked by acids (tungsten) ; can be sputtered easily

Oxidized very rapid- ly at atmospheric pressure; attacked by acids

Vacuum evaporation

- - -

0.950 56.1 - 0.278 Used as an evaporated layer on oxidized silver layer in vacuum to form a photosensitive *

(Continued)

5

IS : 7265 - 1973

TABLE 1 CI-L4RACTERISTICS OF COATING MATERIAZS

SL SUBSTANCE SYMBOL/ MASSIVE MATERIAL No. COMPOSITION r ,, I

Optical Physical I\ I * \

(1) (2) (3)

9 Chromium Cr

, Complex refractive index

r- n ‘\ Refractive Index of Absorption Irrdex at Region of

0.589 pm Tran.$arenq*

(4) (5)

2.97 at a) Varies from 2.25 to 0.579 p 2.13 for X=0.257 to

0.415 pm b) Varies from 1.88 to

1.31 for X=0.444 to 0.608 pm

Spectral emissivity for X=0.65 pm is 0.34

Reflectance Melting Density point

“C g/cma at

20°C

V-3

Varies from 33% to 4176 for X=0.18% to 0.357 pm Varies from 55% to 56% for X=0.50 to 0.70 pm Varies from 57% to 93% for X=1 to 10 m

(7) (8)

1 900 7.14

4

b)

Varies from 33% to 54% for X=0.1& to 0.357 pm Varies from 67.50;, to 96.6% for X= 1.06 to 12.03 pm

co 1 478 8.71 10 Cobalt Varies from I.30 to 1.83 for A=0.2310 to 0.420 pm Varies from 1.87 to 1.78 for h=0.44 to 0.68 pm


11 Copper cu 0.64 a) Varies from 1.05 to I.50 for h=0.231 to 0.395 pm

b) Varies from I.90 to 5.77 for h=0.45 to 0.66 pm

Spectral emissivity for h=0.65 pm is 0.10

Varies from 25.92% to 32.7% for h= 0.251 to 0.420 pm Varies from 37.0% to 88.6% for X= 0.45 to 0.8 pm Varies from 90.1% to 97.9% for X= 1 to 14pm

1 083 8.93

12 Gallium Ga

13 Germanium Ge

14 Gold Au

29.78 5.91

959 5.36

1 063 19.3

5.70 at 0.600 //.

-

0.42 at Varies from 1.13 to 0,580 fi 13.60 for h=0.40 to

0.70 pm Spectral emissivity for

X=0.65 pm is 0.14

-

15 Iridium Ir 2.13 at Varies from 2.28 to 0.579 /L 2.10 for X=0.578 to

0.66 pm Spectral emissivity for

X=0.65 pm is 0.30

Fe 2.36

2 454 22.42

1 535 7.86

Varies from 79.4% to 96.1% for h=l to 12.03 pm

16 Iron Spectral emissivity for a) A=O.66 I*rn is 0.39

b)

*For dielectric materials.

Varies from 55% to I”

61.5% for A=0.5 to 0.8 pm Varies from 65.0% to 93.8% for r\= 1 to 9 pm

TResistance to abrasion of the evaporated material on glass substrate is grouped in three categories as explained below: a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning. c) Exccfitionally Good - Not removable by scratching with a steel pin.

6

-

IS : 7265 - 1973

FOR USE IN OPTICAL INSTRUMENT INDUSTRY - Contd

EVAPORATED MATERIAL CHEMICAL DEPOSITION REPORTED I h > DURABILITY TECHNIQUE APPLICATIONS

Optical Physical Resistance to Abrasion

on Glass Substrate?

Complex refractive index Reflectance ’ at @546/0.589 pm* at 0.546 pm

r------------h----7 region of Refractive Extinction

Index transparency*

Coeficient

Exceptionally good

(14)

2.48 2.30 43.0 Does not react with Vacuum evaporation Base layer foralumi- alkalis and acids (tungsten) ; diffi- nised mirror to in- but with great cult to sputter crease the adhe- difficulty with sion ; shadowing hydrochloric acid for optical micro- plus zinc dust scopy; graticula-

tion work; beam splitters

- - - - Oxidized on heating Sputtered readily; strongly in air; vacuum evapora- attacked by acids tion (electron

beam, columbium)

-

0.756 at 0.550 2.462 at 0,550 66.9 at 0.550 Poor pm tLm pm

Oxide formed at re- latively low temperature but is decomposed at higher temperature; attacked by oxidizing acids only

Vacuum evaporation -Highly reflecting film (molybdenum in infrared region ; boat) ; readily protection of back sputtered surface mirrors

Soluble in acid alkali, oxidized on heating strongly in air

Soluble in hot sulphuric acid

Electron carrier in solar batteries and in silicon rectifiers

- -

3.47 1.40 36.7 Good

0.331 at 0.550 2.324 at 0.550 pm pm

81.5 Poor

Vacuum evaporation (electron beam, tantalum, molybdenum)

Vacuum evaporation (electron beam, molybdenum)

Cold mirror in combination with dielectric coatings

Does not tarnish; attacked by con- centrated nitric and hydrochloric acids

Aircraft windows and heat reflecting filters in combination with bismuth oxide film; useful as photo cathode also

4.26 at 1.16 pm for sputtered material

6.86 at 1.16 74.6 for pm for sputtered sputtered material material

Attacked by hot nitric and hydrochloric acids

Vacuum evaporation (electron beam)

- - - Exceptionally good for oxidized film

Oxidized on heating strongly in air; attacked by acids

Vacuum evaporation Oxidized film of iron (electron beam, is used as beam tungsten helical splitters and in tint- coil) ; can ~also -be ing the ophthalmic sputtered glasses

(Continued)

7

IS J 7265 - 1973


2. SUBSTANCE SYMBOL/ MASSIVE MATERIAL

COMPOSITION , L > Optical Physical

* L r 1 r , Complex refractive index Reflectance Melting Density

w- g/ems at Refractive Index of Absorption ‘% 20°C Index at Region of

P589 pm ~Transjarency*

(1) (2) (3)

17 Lead Pb

(4)

2.01

(5) (6) (7) (8)

2.10 for A=@578 Varies from 74.8% 327.3 11.34 pm to 96.5% I’ for

X=1.06 to 12.03 pm

18 Lithium Li 3.16 - - 180.55 0.534

19 Magnesium Mg 0.31 Varies from 11.82 to a) Varies from 11.5 for r\=O.589 13.0% to 45% to 063 pm for X=0.188 to

0.357 pm

b) Varies from 70% to 73% for h=0.5 to 0.6 pm

c) Varies from 74% to 93% for h=l to9pm

651 1.74

2.26 Varies from 1.79 to 1.83 for h=0.257 to 0.397 firn


- 1 244 7.3 20 Manganese Mn

1 455 8.9 21 Nickel Ni 1.79 Varies from 1.79 to 1.97 for h-O.42 to 0.7 pm

Suectral emissivitv ‘for X=0.65 pm is

0.36

22 Palladium Pd 1.62 at 2.10 for h=0*578

0.578~ Spectral emissivity for X=0.65 pm is 0.33

2.06 Varies from 2.08 to 2.11 for X=0.439 to 0.704 pm

Spectral emissivity is 0.30 for A-O.66

pm

Varies from 74.8% to 96.5% for h= 1.06 to 12.03 pm

1 555 12.0

23 Platinum Pt 1774 21.45 Varies from 35% to 51% for h= 0.188 to 0.357 pm

b) Varies from 95.4% to 96.40/, for X=9 to 14 pm

*For ~dielectric materials. TResistance to abrasion of the evaporated material on glass substrate is grouped in three categories as explained below:


8

IS : 7265 - 1973

FOR USE -IN OPTICAL INSTRUMENT INDUSTRY - Contd

EVAPORATED MATERIAL CHEMICAL DEPOSITION REPORTED , , 1 DURABILITY

Optical TECHNIQUE APPLICATIONS

Physical I L , Resistance

Complex refractive index Reflectance to Abrasion at 0.546/0.589 pm* eat 0.546 pm on Glass

r Refractive

L

Extinction , region of Substratet

Index Coe$icient transparency*

(10) (11) (12)

0.57

2.46 3.07 54.0 -

-

3.47 84.3

2.63 at 1.12 428 at 1.12 66.6 at 1.12 pm pm pm

2.3 2.7 49.4 -

-

-

(13) (14) (15)

Oxidized on heating Vacuum c tctPO~~

Thick lead in wires strongly in air; tion ; to electrodes of very resistant to corrosion; soluble

sputtered transmitting values

in nitric acid

Soluble in acids Vacuum evaporation

E;JFhe E;;)l; -

metal to sputter

Good resistance to Vacuum evaporation Base layer for alu- atmospheric corro- (tungsten) ; most minium-mirrors to sion; oxidized on difficult to sputter increase the adho- heatmg in air, not affected by alkalis

sion properties

but by salt solu- tion; readily attacked by acids

Oxidized on heating Vacuum evaporation strongly in air ; (electron beam, attacked by acids tungsten); can be

sputtered

-

- Excellent resistance Vacuum evaporation to atmospheric (electron beam, corrosion and to tungsten heavy most acids except gauze helical coil) ; nitric acid; oxidi- sed on heating

can be sputtered

strongly in air

Highly resistant to Vacuum evaporation atmospheric cor- (electron beam, rosion and acids; tungsten helical dissolves in aqua coil) ; can be regia readdy sputtered

-

-

3.42 at 1.0 pm 6.3 at I.0 em 86.9at I.Oprn Exceptionally Inert to all acids Vacuumevaporation Used in the manu- gAputtered for sputtered for sputtered good beam,

film except aqua regia

film (electron multi-strand tung-

facture of thigh

sten filament with grade optical grati- cules ;

platinum wire commonly

used where mini- twisted together) ; mum corrosion is can be sputtered desirable

(Continued)

9

IS : 7265 - 1973


EVAPORATED MATERIAL r----------- h__-__--_--_~

Optical Physical ~___~~_~~~_JL~~~~_~~ Resistance


~~---_* -- region of Substrate? Refractive Extinction transparency*

Index Coe$cient


(10) (11) (12) (13) (14)

Vacuum evaporation 3

(15)

Used in manufacture of special types ofphotocells. Pota- ssium oxide photocell has a high green and blue sensitivity but is sensitive in the infra-red region

Durable front surface mirrors; beam splitters

0,091 1.42 88.6 - React strongly with air at normal temperature soluble in acids; to be kept in kerosine

1.62 4.63 77.1

74.2

Exceptionally Good resistant to sea good, extre- atmosphere and mely hard and tropical condi- adhesive if tions; oxide forms deposited in a on heating at low mercury diffu- temperature, sion pump, attacked by oxidi- system zing acids only

- Easily oxidized in air ; attacked by acids

Sublimation from electro deposited rhodium on tungsten spiral; vacuum evaporation (electron beam)

Used in rubidium oxide photocell giving a spectral sensitivity appro- ximate to that of human eye

Photo-voltaic cells and rectifier plate

0,157 1.05 Vacuum evaporation ; can be readily sputtered

3.05 at 0.55 0.28 at 0.55 26.0 at 0.55 pm for am- pm for am- pm for am- orphous film orphous film orphous film

- Oxidized on heating Vacuum evaporation strongly in air ; (molybdenum attacked by acids boat)

3.5 Vacuum evapoEra: (electron beryllium oxidd crucible) ; difficult to prepare film free from silicon monoxide

Vacuum evaporation Best reflector for (molybdenum tan- visible as well as talum boat) infra-red regions;

interference filters in combination with dielectric films; fabry-Perot reflecting plates

Vacuum evaporation Its oxide mixed with (tungsten, tanta- ~barium oxide is lum) used to form the

standard thermi- onic cathode coating

- - -

0.055 at 0.55 3.32 at 0.55 98.2 at 0.55 pm pm pm

Poor Tarnishes quickly when left expose to air; attacked by oxidizing acids only

0.63 1.99 61.9 - Easily oxidized in air; attacked by acids

(Continued)

11

IS : 7265 - 1973


SYMBOL/ COMPOSITION 7

--

MASSIVE MATERIAL II >

Optical Physical n -PI__-- ------

SL SUBSTANCE No.

(3)

TC

Complex refractive index rA-__7 Refractiue Index at

Index of Absorption Region of

0.589 pm Tron.@arency*

(4) (5)

a) 4.9 at - @O/L

b) l.Oat 0.589 P

a)

b)

Reflectance ’ ’ Melting point

“C

Density ’ gl;;$at

(1) (2)

31 Tellurium Varies from 2 11 0 to 41% for X=O~&S to 0.357 I_Lm

49% and 48% for h=0.60 ~_lm and 0.80 pm

Varies from 49.5% to 78% for h=1.2 to 9.0 pm

cl

.1‘1 - -

33 Thorium 1-11 - Spectral emissivity is 0.36 for h=0.65 pm

303% 11.85

1 695 11.0

-

34 Tin sn 1.48 a) Varies from 2.98 IO \.arics from 54y0 to 232 2.82 for A=O.257 86.90,,, for A=].06 to 0.398 CLm

b) Varies from 3.55 to 10 12.03 pm

3.53 for X=0.425 to 0.668 pm

6.55

35 Titanium Ti - 4.5 - Spectral emissivity for X=0.65 pm is 0.63

1 727

36 Urauium U - Spectral emissivity is 0.55 for X=0.65 pm

1 133 18.90 at 25°C:

37 Vanadium V 3.03 at 1.16 for X=578 p a) \Taries from 570/ to 1917 0.579 p Spectral emissivity is 78.8yb for X250

0.35 for h=0.65 Grn to4rm b) Varies from 85% to

92% for X=6 to 9 gm

5.87

*For die’ ’

iResiP bar lectrlc materials.. ’

ice to abrasion of the evaporated material on glass substrate is grouped in three categories as explained below: a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning. c) Exceptionally Good- Not removable by scratching with a steel pin.

12

IS : 7265 - 1973


EVAPORATED MATERIAL c h-----__--_?

Optical Physical _-----------JL____ Resistance

Complex refractive index Reflectancz to Abrasion at 0.546/0.589 pm* at 0.546 pm on Glass

r----7 Refktive Extinction

region of Substrate?

Index transparency*

Coe$%ient

CHEMICAI. DEPOSITION REPORTED DURABIIJTY TECHNIQW APPt.ro.4~r0x~

(9) (10) (11) (12) - - - -

(13) (14) (15)

Solau~~: in oxidizing Vacuum evaporation Fabrication of sele- (tantalum boat) ; mum photocells can also be sputtered

-

-

-

2.52

-

-

-

- -

- Soluble in nitric and sulphuric acids ;

Can be sputtered

oxidized on heating strongly in air

- - Exceptionally Tin oxide film atta- good (for eked by alkalis heat oxidized sputtered tin oxide film)

3.33 57.0 Exceptionally Oxidized on heating good in air; attacked by

acids

- -

Soluble in hydrochloric and sulphuric acids; oxidized on heating in air

Reactively sputtered in an oxygen and inert gas atmosphere at lO-4 torr

Vacuum evaporation (electron beam, tungsten conical basket with titanium wire twisted together)

Soluble in acids -

Insoluble in alkalis and hydrochloric acid ; soluble in oxidizing acids; oxidized on heating’in’air _ _

Vacuum evaporation (electron -beam, tungsten molybdenum)

-

Mixture of thorium with tungsten gives thoriated tungsten filament which emits electrons more efficiently when heated than pure tungsten

Transparent heating elements and antistatic coatings on glass in the form of tin oxide

Neutral film; titanium dioxide film is used as durable beam splitters; multilayer antireflection and highly reflecting coatings

Used as a cathode to photo electric tubes responsive to ultra violet radia- tions in atomic applications

-

(Continued)

13

IS : 7265 - 1973


SL SUBSTANCE SYMBOL/ MASSIVE MATERIAL No. COMPOSITION r -AC ___-- -7

Optical Physical I JL-_ ,-------Y

Complex refractive index Reflectance

(3)

Zn

r---Jc-----_

Refractive Index of Absorption Index at Region of


(4) (5) (6)

2.72 a) Varies from I.10 to a) Varies from 54.0% 3.45 for X=0.257 to to 61.5% for’ h- 0.398 pm 0.45 to 0.80 pm

b) Varies from 3.4 to b) Varies from 55.5% 1.94 for X=0.441 to 98.3% for X= to 668 pm 0.90 to 12 pm

- Spectral emissivity is - 0.426 for AsO. pm

Melting point

“C

Density g/cm3 at

20°C

(1) (2)

38 Zinc

Zr 39 Zirconium

Alloys

40 Chrome1 a) At transmission above 10% the films are closely neutral throughout the visible spectrum, but below the transmission is more selec- tive for red light

b) Soectral emissivitv I 1

for X=0.65 pm is 0.35

41

42

43

Inconel Neutral transmission in the region 0.4 to 0.12 pm

Kanthal 65-75x Fe - 25-30% Cr

5% Al

-

Nichrome Spectral emissivity is 0.35 for X=0.65 pm

Dielectrics

44 Aluminium oxide

A&O, - Spectral emissivity : Probable value for oxide formed on smooth metal is 0.30 for range of observed value 0.22 to 0.40 pm

-

-

-

(7) (8)

419.5 7.14

1 852+ 10 6.4

-_ 8.36

- 2 050

-

-

3.5 to 3.9


a) Poor - Removable on rubbing with a soft cloth. b) Good-Withstand polishing and cleaning. c) Exceptionally Good-Not removable by scratching with a steel pin.

14

IS : 7265 - 1973 .

FOR -USE IN OPTICAL INSTRUMENT INDUSTRY - Contd

EVAPORATED MATERIAL CHEMICAL DEPOSITION REPORTED < -- \ DURABILITY

Optical TECHNIQUE APPLICATIONS

Physical r- -AL_----_ Resistance


C *------T Refractive

region of Extinction

Substratet

Index transparency*

CoeJcien t

(9) (10) (11) (12)

-

-

-

-

-

-

1.62 for anodised film at 0.6 pm 1.78 for reactively sputtered film

-

At transmis- - sion above 10% the film is closely neutral throughout the visible spectrum but below the transmission is more selec- tive for red light

Neutral Exceptionally transmission good in the region 0.40 to 1.2 pm

- -

- Exceptionally good

(13) (14)

Oxidized on heating V’acuum evaporation strongly in air; or soluble virtually in

(tungsteri’

all acids; dissolves molybdenum) ; can

in hot alkalis also be sputtered

(1.5)

-

Soluble in hydrofluoric acid; oxi-

Vacuum evaporation As a better material (electron beam)

dized on heating in used for high inten-

air sity electric lamp filament; grid wires and plates in vacuum tubes

-

-

-

Vacuum evaporation Transmission filters (electron beam) of uniform or

graded optical density

Vacuum evaporation Neutral transmis- (electron beam, sion filters cover- tungsten helical filament)

ing a range of optical densities

Vacuum evaporation (electron beam, tungsten helical filament)

Good Slifz&$ soluble in Vacuum evaporation W;on beaq-4 ;

oxldatlon of aluminium film; reactively sputtered metal oxide film

Graticulation work

Base coatings on glass and ceramic for improving the adhesion of evaporated copper film

Protection of aluminium mirrors spe- cimen supports for electron difraction multilayers and antireflection coat- tings

(Continued)

15

IS : 7265-1973


SL No.

(1) (2)

SYMBOL/ MASSIVE MATERIAL COMPOSITION ~~~~~~- L --7

Optical Physical r--- _JL-_...--_--_ r-____h______T

Complex refractive index Reflectance Melting Density r~.----J--_ point Refractice

g/cm3 at

Index at Index of Absorption “C 20°C

0.589 pm Region of

Transparency*

45 Antimon) trioxide

(3)

Sb,O, - - - *

46 Antimony trisulphide

St& 4.3 Range of transparency Reflectivity: from 500 nm to 10 a) Varies from 52% to

$Zn = lo-$m) ;O;$ fg X=0.24 to

b) Varies Lam 54% to 44% for h=0.4 to 0.7 pm

550

c) Varies from 4Oo/0 to 30% for X=0.1 to 13 pm

4.64

47 Barium oxide BaO - -

Be0 - Spectral emissivity: Probable value 0.35 for range 0.07 to 0.37 pm

- 1 923 -

48 Beryllium oxide

- 2 530130 3.01

817 8.9 49 Bismuth oxide B&O, - - -

50 Cadmium oxide

Cd0 - > 1 426 (decomposes)

6.95 - -

51 Cadmium sulphide

CdS 2.52 Range of transparency : From 520 nm to > 14 /Lm

1 750 4.82 -

52 Cadmium CdTe telluride

2.6 in near infra-red

- - - -

*For dielectric materials. +Resistance to abrasion of the evaporated material on glass substrate is grouped in three categories as explained below :

a) Poor- Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning. c) Exceptionally Good - Not‘removable by scratching with a steel pin.

16

IS:: 7265 - 1973


EVAPORATED MATERIAL

r------ ______hPP__ ---7 Optical Physical

r-------- _-___--_~ Resistance Complex refractive index Reflectance to Abrasion

at 0.546/0.589 pm* at 0.546 pm on Glass i------h , region of Substrate?

Refractive Extinction transparency* Index Co&cien t

CHEMICAL DEPOSITIOX REPORTED DURABILITY TECHNIQUE APPr.rcArt0N~

(9)

1.85 for reactively sputtered film; 2.04 at 0.546 for evapZ ated film

(10)

-

(11)

0.3 to > 1.0 pm

(12) (13)

- Soluble in hydrochloric acid and potassium hydro-

xide

(14)

Vacuum evaporation (molybd$nu m boat, platinum) ; metal oxide film prepared by baking, in air, an evaporated lower oxide deposit

Vacuum evaporation (molybdenum)

3.01 at 0.623 pm; 2.5 at 10.0 &&

- 0.5 to 10.0 Poor Soluble in alkalis Evaporated films arc transparent in the infra-red and highly absorbing below 0.6 pm; beam splitter; multilayers

Vacuum evaportion (platinum)

- - -

Soluble in concen- trated sulphuric acid

-

1.719 -

2.45 for rcac- tively sputtered 6lm

- - Good Attacked by acids Reactive sputtering of bismuth in oxygen and argon atmosphere at 5~ lo-& torr; vacuum evaporation (platinum)

Beam splitter, base coating for gold film used as transparent electrically conducting air craft windows and heat filters

reflecting

2.06 for rc- actively sputtered film

Poor Attacked by acids Reactive sputtering and water of cadmium in

oxygen and argon atmosphere at 5 x lo+ torr

Transparent electrically conducting window glass for aircrafts and auto- mobiles; electrodes on selenmm photocells

-

2.42: 2.6 at 0.04 0.6 to 7.0 I-Lm

- - Vacuum evaporation (quartz crucible with tungsten filament in contract with the charge)

Photo conductive cells; infra-red filters

0.6 pm and 2.27 at 7.0 wm

3.03 in near infra-red

- - Vacuum evaporation (molybdenum boat)

-

(Continued)

17

IS : 7265 - 1973


SYMBOL/ bLwrve MATERIAL COMPOSITION r----- -____-A_

, Optical Physical

r--- ---___-JL---__________~ r__.-__h , . Complex refractive index Reflectance Melting Density

r-____-JL -----7 Refractive Index of Absorption

point g/cm3 at ‘C 20°C

Index at Region of 0.589 /m Transparency*

(3) (4) (5) (6) (7) (8)

C!aF, 1.434 Range of transparency - 8 1 360 3.1

(crystal) from < 150 nm to 10 pm

SL

No.

(1)

53

SUBSTANCE

(2)

Calcium fluoride

54 Calcium oxide CaO 1.837 Diffuse reflecting power 2 570 85.4:~; for X=0.6 I-1 m

1 540

2.62

55 Calcium CaO.SiO, 1.63 silicate

56 Cerium dioxide

CeO, - - - 1 950 7.3

5-8 CcF, - - - 1 324 57 Cerous fluoride

58 Cesium oxide C&O, 400 4.25

5.21

- -

59 Chromium oxide

Cr,O, - Spectral emissivity : Probable value 0.70

Diffuse reflecting power 2 440

for range of observed 27% for X=0.6 pm

value of 0.60 to 0.80 pm

60 Cryolite Na,AlF, 1.36 Range of transparency from 200 nm to 10 pm

1 000 - -

61 Gadolinium Gd,Ti,O, titanate

- - -


a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand -polishing and cleaning. c) Exceptioncilly Good - Not removable by scratching with a steel pin.

18

IS : 7265 - 1973


EVAPORATED MATERIAL I- * ,

Optical Physical < ‘C , Resistance

Complex refractive index Reflectance to Abrasion at 0*546/0.589 pm* at 0.546 pm on Glass

r-Y region of Substratet Refractive Extinction

Index transparency*

Coejicient


(11) (12)

1.23 to 1.26 at 0.546 1.37 to FZ at @589pm

- From 0.15 to Poor 12.0 pm

-

1.68 at 0.60 pm and 1.71 at 0.44 pm

- -

-

(13)

Hygroscopic Vacuum evaporation Used in early work (molybdentm, tan- on antireflection talum boat) coating of ~glass;

transparent film in ultraviolet and infra-red region

- -

Good Soluble in hydro- Vacuum evaporation Base layer of double chloric acid (tungsten boat or layer antireflec-

conical basket) tion coating

2.2 at 0.54 - firn on glass heated to 25°C hand 2.4 on glass heated to 300°C

0.4 to 16,Opm Exceptionally Insoluble in dilute Vacuum evaporation Beam splitter; used good acids and water (tungsten boat, with

electron beam) magnesium

fluoride films in multilayer high reflection and antireflection coatings

1.63 at 0.55 p - 0.3 to >5.0 - - 1.59 at 2.0 rm

Vacuum evaporati;; Multilayer (tungsten

coating 9

pm electron beam)

1.28 to 1.34

-

- - Soluble in acids -

- - Insoluble in acids Vacuum evaporation and alkalis (tungsten)

- from 0.2 to > 14.0 pm

-

Poor Hygroscopic

- -

-

Vacuum evaporation Used in combination (molybdenum boat) with zinc sulphide/

cerium dioxide films for multilayer filter and high reflection coating; optically efficient antireflection film on glass

Vacuum evaporation High reflecting

j;~;~;;;,.,~ mirrors in combi- - nation with lan-

ture of Gd,O, and thanum oxide for TiO, laser

(Continued)

19

IS : 7265 - 1973

TABLE -1 CHARACTERISTICS OF COATING MATERIALS

SL SUBSTANCE SYMBOL/ MASIVE MATERIAL No. COMPOSITION r A

Optical -1

Physical t A

Complex refractive index Reflectance , r----_-l

Melting A

Density I , Refractive Index of Absorption

point “C

g/ems at 20°C

Index at Region of 0.589 pm Transparency*

(1) (2) (3)

62 Indium oxide In,%

(6) -

b

(4) (5) (7) (8)

- 7.17 - -

63 a) Iron oxide Fe& - Spectral emissivity : Diffused Probable value 0.70

reflecting 1 565 5.24

for range 0.63 to 0.98 power 26.3% for A= 0.6

(decomposes) pm

pm

3.46 at 1371 0.546 pm

b) Hematite Fe&A

c) Magnatite Fe,O,. 2.5 at 0.546 pm

1 457

64 Mixture of 50% Fe,O, - iron oxide 50% CaO and cal- SO, cium silicate

- - -

65 Lanthanum LaF, fluoride

- - - -

66 Lanthanum oxide

La&?, - 6.51 -

67 Lead chloride PbCI, 2.2 to Range of transparency 2.26 from 300 nm to > 14

pm

- 501 5.85

68 Lead fluoride PbF? - 855 8.24

9.53

- -

888 69 Lead oxide PbO 2.51 - -


a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning, c) Exce@tionally Good - Not removable by scratching with a steel pin.

20

IS : 7265 - 1973

FOR USE IN OPTICAL INSTRUMENT INDUSTRY - Conkf

EVAPORATED MATERIAL CHEMICAL < * , DURABILITY

Optical Physical )I I , Resistance

Complex refractive index Reflectance to Abrasion at 0.546/0*589 pm* at 0.546 pm on Glass

r- region of Refractive

Substrate? Extinction

In&.X transparency*

Coefiient

(11) (12) - Exceptionally -

good

2.75 at 0.55 0.107 at 0.55 pm of pm of reactively reactively sputtered sputtered film film

- Exceptionally Not attacked except good by hot hydrochlo-

ric acid or oxalic acid

2.0 - - Exceptionally Soluble in hydro- good; film chloric acid must be bak- ed at 300°C to develop maximum hardness

1.59 at O-55 pm; 1.57at 2.0 firn

- 0.22 to >2.0 pm

-

1.95 at 0.55 p; 1.86at2.0p

- 0.35 to >2*0 pm

Good

2.3 at 0.55 - pm; 2.0 at 10.0 firn

1.75 at 0.55 pm; 1.70 at 1.0 pm

-

- -

0.3 to 7.0 pm -

0.24 to >20*0 pm

Poor

- -

DEPOSITION REPORTED TECHNIQUE APPLICATIONS

(14)

v~:gz:q;;:: tive sputtering of indium in oxygen and argon gas atmosphere at 5X lo-* torr

Vacuum evaporation (tungsten) ; reactive sputtering of iron in oxygen and argon atmosphere at 5 X lo-” torr


(15)

Transparent electrically conducting glass window for aircraft and auto- mobile

Beam splitters and infra-red interference films

Absorption filters and tinting of ophthalmic lenses

Vacuum evapor;+;r Multilayer coatings (tungsten molybdenum boat;

Insoluble in water Vacuum evaporation High but soluble in (tungsten boat)

reflecting mirrors in combi-

hydrochloric acid nation with gadolinium titanate for lasers

Slightly soluble in Vacuum evaporation Beam dilutehydrochloric (platinum, molyb-

splitters; infra-red transmit-

acid denum boat) ting film

- Vacuum evaporation Protective ’ (platinum boat) for highly St%:

optical crystals; multilayer coating in ultraviolet region in combination with magnesium fluoride/ cryolite

Soluble in nitric acid and alkali

Can be sputtered

(Continued)

21

IS : 7265 - 1973

SL SUBSTANCE SYMBOL/ No. COMPOSITION

(1) (2)

70 Lead sulphide

71 Lead telluride

72 Lithium fluoride

73 Magnesium aluminate

74 Magnesium fluoride

75 Man~ganese dioxide

76 Molybdenum oxide

77 Neodymium fluoride

78 Neoodr$um

79 Nickel oxide

(3)

PbS

PbTe

LiF

MgOAl,O,

MgF,

MnO,

MOO,

NdF,

Nd@,

NiO

MASSIVE MATERIAL r----- L ,

Optical Physical -JC -77

Melting --E&G- Complex refractive index f h Refractive Index of Absorptio? Index at Region of

0.589 pm Transfiarency*

(4) (5)

Reflectance

(6)

point- “C

g/cm3 at 20°C

4.2 Range of transparency a) Varies from 40% to (thin slices 3 pm 48% for X4.24 of crystals) to 0.35 pm

b) Varies from 41% to

(7) (8)

1 114 7.5

TABLE 1 CHARACTERISTICS OF COATING MATERL4LS

-

1.39

1.72

1.38

-

-

-

-

2.15

42% for AGO.4 to 0.7 pm

c) Varies from 35% to 31% for X=1 to 11 pm

Range of transparency from ~110 nm to 10 pm

-

Range of transnarencv f&m 230 nm to 16 pm

-

-

-

-

-

-

917

870

2 135

1 395

8.16

2.5

3.6

3.0

> 230 5.026

793 4.5

- -

- 1 900 7.24

- 2.090 7.45


a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning. c) ExcejtionalJy Good - Not removable by scratching with a steel pin.

22

/

IS : 7265 - 1973


EVAPORATED MATERIAL CHEMICAL DEPOSITION REPORTED DURABILITY TECHNIQUE APPLICATIONS ,

Optical Physical ’ c L , Resistance


I--- region of Refractive transparency*

Substrate? Extinction

Index Coejicieni

(9) (10) (11) (12)

- - 3.0 pm Poor

(13)

Soluble in acids but Vacuum evaporation Photodetectors not in potassium hydroxide

(molybdenum)

5.1 to 5.5 3.4 to 30.0 -

tim

0.11 to 7.0 pm Poor

- Vacuum evaporation (tantalum boat)

1.36 at 0.546 pm

Hydroscopic Antireflection coating

Vacuum evaporation (electron beam, molybdenum and tantalum boat)

- - Slightly soluble in dilute hydrochloric acid

0.21 to 10.0 Exceptionally Not attacked by pm good water or acids after

baking at 300°C


- -

1.38 at 0.55 pm; 1.35 at 2.0 pm

Vacuum evaporation (electron beam, molybdenum, tantalum boat) at substrate temperature 250°C to 300°C

Most commonly used material for durable antireflection coating on glass; multilayer coating in combination with zinc sulphide or cerium dioxide; Fabry-Parot interference filters

- - - Soluble in hydrochloric acid

- - - Soluble in acids


-

- -

I.60 at 0.55 Pm; I.58 at 2.0 pm

- 0.22 to >2.0 Good - Vacuum evaporation Multilayer coating pm (molybdenum,

tungsten boat)

2.0 at 0.55 pm; 1.95 at 2.0 pm

- 0.4 to >2.0 - Soluble in hydro- Vacuum evaporation -

pm chloric acid; in- (tungsten boat) soluble in water

2.18 at lithium line

- - Exceptionally Attacked by acids Reactive sputtering Beam splitter good of metal in an

oxygen and argon atmosphere at 5 x lo-” torr

(Continued)

23

IS : 7265-1973


SL SUBSTANCE SYMBOL/ MASSIVE MATERIAL No. COMPOSITION r- L 1

Optical Physical r- n \

Complex-refractive index Reflectance -v Melting -1 Rtfractive Index of Absorption p%t

gl;T$at

Index at Region of 0.589 pm Transparency*

(1) (2) (3)

80 Platinum oxide Pto,

(6) (7) (8)

- b

81 Silicon dioxide SiO, 1.438 Range ~of transparancy (Silica) (For vit- from 200 nm to 5 pm

reous)

- 1 616 - (decomposes)

82 Silicon mono- SiO - Range of transparency xide from 500 nm to 8 pm

- - -

83 Silver chloride Agcl 2.071 - - 455 5.56

- 992 2.7 84 Sodium fluoride

NaF 1.328 Ra:y5;fnrparency

1470 (decomposes)

8.735 85 Tantalum pentaoxide

Ta,O, - - -

86 Tellurium oxide

TeO - Decomposed - on heating

2 950 IO.03

- -

87 Thorium dioxide

ThO, Spectral emissivity: Probable value 0.50 for range of 0.20 pm to 0.57 pm

88 Thorium fluoride

ThF, -

89 Tin oxide SnO, - Range of transparency: >lOprn

- Sublimates -



24

IS : 7265 - 1973

FOR USE IN OPTICAL INSTRUMENT INDUSTRY -Co&

EVAPORATED MATERIAL r * ,

Optical Physical I L , Resistance


rp region of Refractive Extinction transparency*

Substratet

Index Coejicient


(13) (14)

Not attacked by Reactive sputtering hydrofluoric acid of metat in an

oxygen and argon atmosphere at 5 x 10-P torr

Very slightly soluble Slow vacuum eva- in alkalis poration (tungsten

or tantalum boat, electron beam) ; reactive evaporation of silicon monoxide in oxygen atmosphere at 5 x 10-t torr

(15)

Surface replica for electron microscopy

(9) -

(10) -

(11) -

(12)

Good

Protection of front surface aluminium mirrors ; interference films

1.46 at 0.50 -

pm; 1445 at 1.60 pm

0.20 to 8.0 w

Exceptionally good

1.45 to 1.9 ;FrzF$ -

evaporation and oxygen pressure)

0.50 to 8.0 pm

Exceptionally good

Vacuum evaporation (electron beam, tantalum or molybdenum boat)

Protection of front surface mirrors ; interference films and surface replica for electron micros- COPY

-

Poor -

Poor Hygroscopic

Vacuum evaporation (molybdenum)

Vacuum evaporation (tantalum, molybdenum boat)

-

1.28 to I.34 0.20 to 14.0 Irm

Antireflection coating

2.84 at 0.31

Z!?% at 0.80

&Tanodic film

- Vacuum evaporation; Protecting glass sur- anodic oxidation face against attack

by alkalis

- Soluble in hydrochloric acid and alkali

Exceptionally good

-

Can be sputtered - - - -

I.8 at 0.55 p and 1.75 at 2.0r

- from 0.25 to >2.0 /L

Highly durable beam splitters and antireflection coating

Vacuum evaporation (electron beam) at substrate temperature 200°C

Vacuum evaporation (tantalum boat)

1.52 at 0.40 p - from 0.2 to > 15.0 /&

Exceptionally good

- Multilayer high reflection and antireflection coating

Transparent electrically conducting window glass for aircraft; antistatic coating on glass

Exceptionally Attacked by alkalis good

Reactive sputtering of metal in oxygen and argon gas atmosphere at 5~ 1O-4 torr; vapour reaction in air between tin halide and water vapour; vacuum evaporation (tungsten)

2.1 for vapour reactive film

- -

(Continued)

25

IS : 7265 - 1973


SL SUBSTANCE SYMBOL/ MASSIVE MATERIAL No. COMPOSITION r--- -- n \

Optical Physical r-- --- \ r-----7

Complex refractive index Reflectance Melting Density < n 1 point g/cmr at Refractive Index of Absorption “C 20°C Index at Region of


(4) (5) (6) (7) (8)

2.54 to 2.71

(depending upon

crystal structure)

- - 1 640 to 3.84 to 4.26 1 850

(decomposes)

(1) (2)

90 Titanium dioxide

(3)

TiO,

91 Titanium monoxide

TiO -

92 Tungsten tri- wo: - Range of transparency oxide >lOprn

93 Mixture of wo,+.41,0, - - tungsten trioxide and aluminium oxide

94 Uranium oxide U,O,

95 Zinc selenide ZnSe

96 Zinc sulphide ZnS

- -

-

2.18 to Range of transparency 2.25 400 nm to 14 pm

-

-

-

-

-

1 473

2 700

>l 100

Sublimation

97 Zirconium dioxide

ZrO, ;*,ll to Spectral emissivity : Diffuse reflecting power 2 700 Probable value 0.40 85.8% for X=06 for range 0.18 to 0.43 pm pm

-

7.16

7.31

5.42

4.1

5.49

NOTE -The values in co1 9, 10 and 11 are subject to slight variations depending upon the thickness, rate of deposition, purity of material, etc.

*For dielectric materials. TResistance to abrasion of the evaporated material on glass substrate is grouped in three categories as explained-below:

_a) Poor - Removable on rubbing with a soft cloth. b) Good - Withstand polishing and cleaning. c) Exceptionally Good - Not removable by scratching with a steel pin.

26

fS : 7265 - 1973


EVAPORATED MATERIAL CHEWCAL D~P0srrr0~ REPORTED r -- , DURABILITY

Optical TECHNQUE APPLICATIONS

Physical r___----

Rcflectaz: Resistance

Complex refractive index to Abrasion at 0.546/0.589 pm* at 0.546 pm on ~Glass

r--------h---7 region of Refractive Extinction

Substrater transparency*

Index Coeficient

(9) (10) (11) (12) (13) (14) (15)

2.2 to 2.7 at - 0.35 to 12.0 0.55 pm

Exceptionally Marked resistance to Reactive sputtering Highly durable beam pm good salt water corro- of titanjrm/tita- splitters; multi-

(depending sion nium monoxide in on structure)

layer interference oxygen and argon filters and protec- atmosphere at 5 x tion offront surface 10-d torr; heat aluminised mirrors oxidization of titanium film in air at 500°C. vacuum cvapollation (electron beam)

- 2.08 to 2.32 (dependent

Exceptionally good

upon ralc of evaporation and osygcn pressure)

2.0 for - 1f.isibl.e to Good evaporated > 10.0 pm and reactively sputtered film

-

-

2.58 at 0,633 w

-

2.35 at 0.55 -

Et 2.0 /ml

2.1 at 0.55 pm; 2.0 at 2.8 pm

-


- -

0.6 to r5.0 Good I””

0.38 to approx Poor 25.0 pm


- Slow vacuum eva- Beam splitter; multi- poration in oxi- layer interference dized atmosphere filter at 5X lo-* torr (tungsten boat)

Attacked by hot Vacuumevaporation Shadow casting for alkalis but not by (platinum) acids except hydro-

electron microscopy

fluoric

- Vacuum evaporation Absorption filter of (tungsten) low reflectivity

- Vacuum evaporation Shadow casting for (tungsten) electron micros-

copy

- Vacuum evaporation Laser and mirrors; (molybdenum or infra-red filters platinum boat)

Hygroscopic Vacuum evaporation Beam splitters; mul- (molybdenum or tilayer interference tantalum boat) filters and high

rcfiection coating in combination with magnesium fluoride or cryolite

- Vacuum evaporation (electron beam, tungsten boat) at substrate temperature 200°C

-

27

- -_.-_-- - .--. - _~_ _ .IJ.--~ ~_~ ~._.-~ _I_ 1

_,_...

INmAN STANDARDS ON

SURVEYING INSTRUMENTS

IS: 1492-1959 Metric surveying chains 1632- 1960 Bubbles 1764-196 1 Trough compass 1779-1961 4-Metre, levelling staff, folding type 1842- 196 1 Surveying chains pins (arrows) 1955-1961 Prismatic compass, liquid 1957- 196 1 Prismatic compasses, non-liquid 2288-1963 Ranging rods 2539-1963 Plane tables 2976-1964 Optical theodolite 2988-1965 Vernier theodolite 4380-1967 Abney level 4590-~1967 Engineer’s level 5 146- 1969 Sounding sextant 5706-1970 Spirit levels for use in precision engineering 5928-1970 Tangent clinometer

IS 7265 (1973): Coating Materials (Metals, Alloys and ... · IS : 7265 - 1973 Indian Standard...

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Transcript of IS 7265 (1973): Coating Materials (Metals, Alloys and ... · IS : 7265 - 1973 Indian Standard...