Innovative Metal System for IGBT

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    Innovative Metal System for IGBTPress Pack Modules

    S. Gunturi, J. Assal, D. Schneider, S. Eicher

    ISPSD, April 2003, Cambridge, England

    Copyright [2003] IEEE. Reprinted from the International Symposium onPower Semiconductor Devices and ICs.

    This material is posted here with permission of the IEEE. Such permission of theIEEE does not in any way imply IEEE endorsement of any of ABB Switzerland Ltd,Semiconductors's products or services. Internal or personal use of this material ispermitted. However, permission to reprint/republish this material for advertising orpromotional purposes or for creating new collective works for resale or redistributionmust be obtained from the IEEE by writing to [email protected].

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    Innovative Metal System for IGBT

    Press Pack Modules

    S. Gunturi *, J. Assal #, D. Schneider#, S. Eicher#*

    ABB Switzerland Ltd, Corporate Research, 5405 Dttwil, [email protected]# ABB Switzerland Ltd, Semiconductors, Fabrikstrasse 3, 5600 Lenzburg, Switzerland

    Abstract. Two important design aspects

    encountered in IGBT press pack modules used for

    HVDC applications are short circuit failure mode

    (SCFM) and intermittent operating life (IOL)

    capabilities. The requirement that press-pack

    IGBT (PPI) fail safely into a short causes a design

    conflict with the modules desired capability to

    survive a high number of power cycles in normal

    operation. An innovative materials design to

    optimise this trade-off is described. The failure

    mechanism that leads to an open circuit after the

    PPI has operated extensively in SCFM was found

    to be liquid metal corrosion of the baseplate

    followed by the formation of intermetallics with

    poor conductivity and silicone gel degradation.

    The beneficial effects of dry interface plating

    materials to avoid thermomechanical fatigue

    under IOL conditions are described.

    INTRODUCTION

    IGBT press pack modules with high blocking

    voltages up to 10 kV are offering new possibilities in

    power systems applications, e.g. HVDC transmission

    and power quality management, as well as in driveand traction applications. High flexibility and easy

    handling are obtained by a non-hermetic, modular

    design, in which each silicon (Si) chip is pressed by

    an individual contact spring [1], see also figure 1.

    These modules are currently used successfully in

    HVDC transmission systems with a power ranging upto 300 MW. This translates into operating junction

    temperatures of up to 125C and temperature cycles

    of up to 100C. Therefore, the capability in

    intermittent operating life (IOL) i.e. power cycling is

    crucial for the reliable operation of the modules.

    In HVDC applications, dozens of modules are

    connected in series to block dc-link voltages of up to

    100 kV. To prevent shut down of the system due to a

    defect arising in a module, redundant modules are

    included in the system, such that the surviving

    modules share the voltage and the failed module is

    still able to carry the load current. Accordingly, a

    stable short circuit condition through the failed

    module must be formed and guaranteed until the

    system is serviced. This so-called short circuit failure

    mode (SCFM) has an important consequence on the

    press pack design. A single failed chip and its contact

    system, which is illustrated in figure 2a, take up thewhole module current of up to 1500 A (phase-rms).

    To reduce the resistance of the failure path through

    the chip, a metal platelet is used in contact with the

    silicon chip [2]. When the chip fails it dissipates, for avery short duration, a sufficiently high energy to melt

    the platelet and forms a stable alloy with silicon.

    Metals like silver and aluminium are preferred as they

    form low melting eutectic alloys with silicon.

    Figure 1. IGBT press pack modulecomposed of four submodules.

    (a)

    soldermaterial

    pin

    silicone gel

    platelet

    Si chip

    base plate

    (b)

    IGBTs emitter

    surface

    gate pad1000 N

    thermal

    expansion

    thermal

    expansion

    platelet

    Si chip

    current flow

    Figure 2. (a) Design of the contacted Si-chip.(b) Emitter interface of the Si-chip.

    Unfortunately Ag and Al have high coefficients

    of thermal expansion (CTE = 19 and 23 ppm/K,

    respectively) compared to Si (3 ppm/K) causing a

    trade-off between IOL and SCFM performance. As

    illustrated in figure 2b the changes in temperature,due to power cycling, cause relative lateral

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    movements of more than 10 m at the chip to platelet

    interface. These cyclic motions combined with high

    current densities and high operating temperatures can

    damage the chip surface, thereby generating early

    electrical failures.

    EXPERIMENTAL

    Short circuit failure mode. The IGBT modules for

    testing in SCFM were initially destroyed by applying

    an over-voltage to form the short circuit in one of the

    Si chips. Thereafter they were subjected to high

    currents in the range of 1000-1500 A and load cycling

    to accelerate the degradation of the contact system.

    The voltage drop across the module was recorded as a

    function of time. Specially built modules were also

    tested to monitor the voltage drop across the various

    materials interfaces. Tests were interrupted at various

    stages of the degradation process. In order to identify

    the aging mechanisms, the samples were sectionedand prepared for metallurgical analysis by grinding

    and polishing to reveal the alloying zone as shown in

    figure 3. Samples were analysed using optical,

    scanning acoustic microscopy, scanning electron

    microscopy aided by EDX for chemical compositionanalysis and micro hardness testing techniques to

    determine the mechanisms leading to the failure by

    opening up of the short circuit.

    Intermittent Operating Lifetime. In order to

    simulate the operating conditions, power cycling wastested on the modules as shown in figure 1. An

    applied DC current between 1500 A and 1700 A wasswitched on and off every 30 through the stacks

    composed alternatively of modules and coolers. The

    contact resistances of the complete module and of the

    interface between the metallization of the emitter sideof the chip and the contact platelet were previously

    measured, to ensure a controlled T (typically of40C and 80C) between the switching on and off

    cycle periods. During the test the collector-emitter

    voltage of each module was measured regularly and,

    in case of a failure, by-passed. Every 10000 cycles,

    the test was stopped, the stacks were dismantled andevery device was electrically tested (gate-emitter and

    collector-emitter leakage currents, and gate-emitterthreshold voltage). Failed modules were replaced by

    new ones, stacks were remounted and the test was

    started again. The interfaces at the emitter surface of

    the chips and the platelets, as well as the nature of thefailures were analyzed using optical microscopy and

    scanning electron microscopy (SEM) with chemical

    composition analysis capability (EDX).

    RESULTS & DISCUSSION

    Short circuit failure mode. Statistical modelling

    activities [3] and the available results from the field

    confirm that the IGBT modules meet the requirednumber of operating hours. However, experiments

    under accelerated conditions were performed to study

    the possible failure mechanisms after long term

    operation. Two modes which result in the undesired

    opening up of the short circuit were identified, firstly

    a failure in the alloying zone and secondly a

    degradation of the dry interfaces due to the the

    silicone gel creeping into them. These results arediscussed below.

    Al-plate

    Si - chip

    Pb-solder

    Mo-baseplate

    Figure 3. Alloying zone.

    The microstructure of a typical cross section

    through the alloying zone during the early stages of

    operation in SCFM is shown in figure 3. It revealed

    predominantly, the formation of a hemispherical Al-

    Si alloy above the Mo baseplate and in the Al-Si

    interface. Compositional analysis by EDX in the SEMconfirmed that this alloy had the composition ranging

    from 8 to 25 wt. % Si (either side of the eutectic

    composition of 12.7 wt. % Si in Al) in various regions

    of the alloying zone. A low Si content in the alloywould be preferable as otherwise the resistivity and

    hence power dissipated in the alloy increase with theSi content resulting in rapid degradation of the

    materials. Spherical chunks of Pb from the solder

    alloy (joining the chip to the base plate) were found

    embedded in this alloy, as Pb is insoluble in Al.

    Further, away from the Al-Si interface, platelets ofprimary Si, that did not melt were embedded in a

    matrix of Al. Although platelets of Si were present

    they do not lead to the immediate destruction of the

    current conducting path, but only contribute to the

    higher voltages observed during the early stages of

    the test and dissolve during subsequent melting andspreading of the alloy with time. Small volume

    fractions of Ni-Al intermetallic needles and platelets

    were also observed in the Al-Si alloy. They are

    formed from the interaction of the Ni plating on the

    Al platelet and Mo baseplate used to facilitate

    adequate solderability of the Si chip. Ni-Alintermetallics in general possess poor conductivities,

    but were not formed in significant volume fractions to

    affect the conductivity of the alloy. During the early

    stages of operation the top surface of the Mo

    baseplate displayed regions in which the Al-Si alloy

    penetrated into the Mo baseplate. However at that

    early stage, there was still a good contact between thebaseplate and the Al-Si alloy.

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    At a later stage in testing, examination of the Si-

    Mo interface in samples that were interrupted after

    longer operation but prior to failure, in the SEM

    revealed a number of long cracks branching in all

    directions in the Mo plate (figure 4). These cracks

    were formed due to the liquid Al (from the Al-Si

    alloy) corroding the Mo grain boundaries. Thecorroded grains were then drawn into the Al-Si alloy.

    Over long periods of operation, diffusion of Si and Al

    occurs into the Mo particles forming various

    intermetallics (eg. Mo(Si, Al)2, Al4Mo etc), figure 5,

    some of which are predicted by the phase diagrams.

    Their volume fraction increased with time and a

    majority of the alloy was observed to be composed of

    the intermetallics (supported by the microhardness

    measurement profiles) close to failure. The inherently

    high resistivity of intermetallics (MoSi2 has a

    resistivity that is one order higher than pure metals)

    along with the cracking in the baseplate increase the

    resistance to current flow and increase the ohmic heatthat is dissipated in the Si-Mo interface. Such increase

    in heat causes further deterioration of the baseplate

    and finally failure by oxidation of the alloy. Liquid

    metal corrosion of Mo [4] and formation of various

    intermetallics [5] were reported earlier.

    Figure 4. Molten Al penetrates along Mo grainboundaries.

    Figure 5. Intermetallics in the alloying zone.

    A second mechanism which results in an open

    circuit is due to the silicone gel creeping in to a

    majority of the dry interfacial contact area after the

    gel potting operation during the production ofmodules. The presence of silicone gel in the interface

    during SCFM (when high temperatures are generated

    in the dry contacts) (figure 6) resulted in the

    embrittlement of the gel and the formation of hard

    silica (SiO2) due to oxidation of the methyl groups in

    polydimethylsiloxane, which starts in air at

    temperatures >180C. Aging experiments on the gel

    in the temperature range of 200-275C confirmed theformation of SiO2. Formation of hard layers of silica

    from the soft silicone gel that creeps into the

    interfaces prevents further electrical contact points

    from being established after the initial contact points

    have deteriorated by aging/oxidation leading to higher

    power dissipation and failure of the contact by creep

    in the press-pin and oxidation.

    Ag-plating

    Ag-plating

    pin foot

    gel

    Figure 6. Silicone gel (dark) in a dry

    interface between two plated parts (bright).

    Intermittent Operating Lifetime. As mentioned

    above, aluminium is needed to ensure long lifetime in

    SCFM. Unfortunately aluminium has a high CTE

    (23 ppm/K) compared to that of silicon (3 ppm/K).

    This generates mechanical fatigue and can cause early

    failures under IOL. Therefore, the coating material ofthe platelet must be chosen carefully to meet the

    following requirements: (1) high electrical

    conductivity, (2) low coefficient of friction, (3) no

    oxide formation, and (4) chemically inert below

    150C with the IGBT top metal or the silicone gel

    under the influence of humidity. In addition, thecoating process must be compatible with Al bulk

    material and cost effective.

    Figure 7. Failed IGBT (left) and platelet (right)

    after 6000 cycles in IOL T= 80C.The location of the failure is marked.

    Palladium coatings (Pd) fulfil all these

    requirements reasonably well for most applications,

    including HVDC. IOL experiments reveal lifetimes(expressed as 10% failure probabilities) of more than

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    100000 cycles and 10000 cycles forT= 40C and

    80C, respectively. The typical failures exhibit

    transfer and sticking of Ag from the chip

    metallization on to the Pd coating of the platelet by

    interdiffusion of Ag and Pd. Such sticking damages

    the emitter surface of the IGBTs, and finally causes

    failure of the electronic devices (figures 7 and 8).

    Figure 8. SEM of a Pd-coated Al-platelet

    (2000 cycles, T= 80C, no electrical failure).Ag particles are situated at the border of thecircular marking. The structure of the IGBT

    emitter surface is visible.

    In several applications like traction, SCFM

    capability is not required as in HVDC. In those cases,

    IOL can be dramatically improved by using Mo as

    bulk material for the platelet. Mo, with its CTE of

    5 ppm/K, is a traditional contact material for

    semiconductor devices. To protect it against

    oxidation, rhodium (Rh) is used as plating. Figure 9shows the excellent IOL results of using a Mo

    platelet on an IGBT after 5000 cycles in IOL at T=80C (the test was interrupted before failure).

    Figure 9. IGBT after 5000 cycles in IOL

    T= 80C. The emitter surface is notdamaged and the markings left by the Mo

    platelet are barely visible.

    Using contact platelets with this combination,

    IOL tests with T of 80C, exhibit an improvedlifetime close to 100000 cycles. In our first tests we

    have seen a shift in the collector-emitter leakage

    current from the nA to the A range after

    approximately 100 k cycles, but no catastrophic IGBT

    failure occurred (chips maintained their switching

    capability). The root cause of this observation remainsto be investigated. Mo clearly improves the IOL

    capability but experiments show that SCFM lifetime

    is reduced by a factor of 10 in comparison to Al

    platelets. Therefore, a Mo platelet in direct contact

    with the chip enables excellent IOL performance for

    modules which are not intended for use in

    applications where extended SCFM life is required,

    e.g. traction or industrial applications. It should,

    however, be noted that even the construction with theMo platelet fails safely into a short. However, such a

    short will not remain stable over extremely long

    periods as with Al or Ag platelets.

    CONCLUSIONS

    We present here a press pack IGBT module

    construction that fails safe into a short and is able to

    maintain this short for a long time. A relatively stable

    Al-Si alloy formed under SCFM conditions is able to

    carry the load current of the module stack, whose

    lifetime is limited by liquid Al from the Al-Si alloy

    corroding the Mo baseplate, thus forming cracks andvarious intermetallics with poor conductivity over

    long-term operation. When the volume fraction of the

    intermetallics increases to a critical level, the power

    dissipation and hence heat dissipated increases in the

    alloy leading to failure (open circuit) by oxidation.Silicone gel creeping into the dry interfaces also leads

    to failure by forming hard SiO2 in the contact

    interfaces.It has been shown that high IOL capability and

    good SCFM life are conflicting requirements. For

    HVDC stations where SCFM is necessary, Al coatedwith Pd is used for the contact platelet and, thus,

    power cycling lifetime above 100 k cycles are reachedfor T= 40C. In that case, failures are due to the

    high mismatch of the CTEs between Al and Si, and

    the interdiffusion process between the Ag top metal of

    the electronic device and the Pd coating. For

    applications where high IOL capability is critical andlong SCFM life is not required (e.g. traction), a Mo

    platelet coated with Rh, is adopted. This construction

    exhibits superior IOL lifetime of about 1 mio cycles

    forT= 40C.

    REFERENCES

    [1] S. Kaufmann et al. Innovative Press PackModules for High Power IGBTs. Proc. 13

    th

    ISPSD 2001, Osaka, Japan (2001). pp. 59.

    [2] T. Lang, H. Zeller, Short-circuit resistant IGBT

    module, Patent number: US 6426561 B1

    [3] R. Schlegel et al. Reliability of non-Hermetic

    Pressure Contact IGBT Modules Micro-

    electronics Reliability, 41 (2001). pp. 1689.

    [4] Metals Handbook Properties and Selection: Non

    Ferrous Alloys and Special Purpose Materials,

    10th

    Edn., Vol.2, ASM Intl.

    [5] N. Tunca, R.W. Smith Intermetallic Compound

    Layer Growth at the Interface of Solid Refractory

    Metals Molybdenum and Niobium with MoltenAluminium. Met. Trans. 20A (1989). pp. 825.