J. Electroanul Chem., 187 (1985) 203- 204 Elsevier Sequoia S A , Lausanne - Printed in The Netherlands

203

Book reviews

Industrial Electrochemistry. D. Pletcher. Chapman and Hall, London, 1984, xii + 325 pp., f14.95.

This is a paperback reprint of the book already reviewed in this Journal (157 (1983) 189) where it was highly praised.

Since this a reprint there is little to add to the previous remarks except that the lower price should make this excellent text accessible to more students. It 1s a maJor contnbution towards interesting more of them in electrochemistry.

ROGER PARSONS Bristol

Thin Films and Interfaces II. Volume 25. Mater&s Research Society Symposia Proceedmgs, J.E. Baglin, D.R. Campbell and W.K. Chu (Editors). Elsevier, New York, 1984, xv + 684 pp., Dfl. 265.00.

This volume contains the proceedings of a major international symposium on thm films and interfaces which took place in Boston as part of the 1983 Matenals Research Society Meeting. Nmety-seven short papers are presented u1 camera-ready script and concern a wide variety of aspects relating to the formation, structure and properhes of thm films on solid surfaces. The con-

tent is heavily oriented towards the field of microelectronics and concentrates on sohdsolid interfaces and vapour phase processing rather than electrochem- ical deposition. However, much of the volume should be of interest to anyone concerned mth the structure and properties of thin films. The general standard of presentation is unusually high for a volume of this nature and the editors have successfully organised the numerous mdividual contributions to produce a coherent text.

The first section of the book sets the theme for subsequent chapters and is concerned with general questions relating to phase formation and diffusion kinetics in thin films. Theoretical aspects involving nucleation and precipita- tion of new phases at solidsohd interfaces are considered and this is Lam- plemented with the inclusion of experimental studies of the &con-metal interface and sllicide formation using such experimental techniques as EDX, EELS, TEM, XPS, RBS and Raman scattering. The theme is broadened in following sections which deal with such issues as the structure and composition of grain boundaries; metal-compound semiconductor and metal-dielectic interfaces; epitaxial growth. The particular chemical systems studied are varied but alI, such as the epitaxial growth of metal fluorides and siiicidcs$ are related to possible apphcations in microelectronics. Special&d chapters on strained superlattices and ion-beam processing of surfaces are included_ Strained superlattices consist of thin alternating layers of lattice-mismatched compound semiconductors and their fabrication, structural study by ion- channeling techniques and possible future electronic and optoelectronic