Impact of UV/H2 O2 on subsequent chlorine stability and ...
Transcript of Impact of UV/H2 O2 on subsequent chlorine stability and ...
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Impact of UV/H2
O2
on subsequent chlorine stability and DBP Formation
Sophie Pantin, Ron Hofmann
Department of Civil Engineering University of Toronto
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What is an Advanced Oxidation Process?
•
Remove pollutants that cannot be removed by conventional treatment
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Involves the production of hydroxyl radicals OH•
Short lived (1/1,000,000 second)Very strong oxidantNon-selective reagent
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UV/H2
O2
Treatment
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UV lamps
H2
O2
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UV/H2
O2
Treatment
•
H2
O2
+ UV
2 OH•
•
UV doses used are higher than in disinfection process
600 mJ/cm2 vs. 40 mJ/cm2
•
Peroxide dose ~ 1-10 mg/l
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Cornwall (Ontario) Water Purification Plant
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First plant in the world to use UV-H2
O2
for periodic taste and odor (T&O) control
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Why?–
Operation based on needs (turn on or off)
–
UV disinfection was installed for primary disinfection
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Coagulation/Flocculation Sedimentation /Filtration
UV lamp
Distribution system
Chlorine addition
Raw water
T&O compounds
Peroxide addition
OH•
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Cornwall Water Purification Plant
•
Leader in the implementation of UV-H2
O2
for T&O removal
•
Use their experience for future guidance–
Integration of UV-H2
O2
into an existing DWTP train
–
Impact on downstream process (secondary disinfection)
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Integration of UV-H2
O2
into an existing WTP train
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Raw water Coagulation/ Flocculation Clarification
Filter 1 Filter 2 Filter 3 Filter 4
UV reactor UV reactor UV reactor UV reactor
Reservoir
Chlorine addition
Clearwell
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T&O Event
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When a T&O event occurs–
Fluence
is increased (from 40 to 600 mJ/cm2)
–
H2
O2
is added
•
Depending on the severity of the event–
5 levels of treatment (1, 2, 4, 8, and 15 mg-H2
O2
/l)
•
BUT H2
O2
needs to be quenched
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H2
O2
quenching
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Only ~10% of the initial H2
O2
is consumed through UV treatment
•
Chlorine is added to:–
Quench H2
O2
(H2
O2
/Cl2
ratio = 1:2)–
Maintain a residual of 0.8 ppm
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H2
O2
quenching•
No on-line H2
O2
measurement
•
Implementation:–
Control panel that gives the predicted amount of H2
O2
added–
Calculate an expected H2
O2
residual–
Inject enough chlorine to quench the expected H2
O2
residual and maintain chlorine residual
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H2
O2
quenching• Really delicate operation:– Flow-rate is constantly changing– Filter backwash
H2
O2
residual is constantly changing
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Clearwell
Chlorine addition
Chlorine analyzer
Chlorine analyzer
UV 1 UV 2 UV 4UV 3
Reservoir
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Impact on disinfection
•
OH•
radicals oxidize T&O compounds
but also the natural organic matter (NOM)
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No mineralization—only alterationsUV and peroxide doses too lowScavengersOH• reacts with almost anything!
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Pathogens
UV lamp 40 mJ/cm2
NOM
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Pathogens
UV lamp 600 mJ/cm2
OH•
H2
O2
NOMNOM
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Different Chlorine dose?
Disinfection by-products
(DBPs)
UV OH•
Different amount?
Disinfection by-products
(DBPs)
Water(NOM)
NOMNOMNeed tools to predict reactivity of this
new altered organic matter
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Case study at Cornwall
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Sampling before and after UV/H2
O2
and UV treatment alone
•
Assess the impact of the process on:NOM alterations Chlorine demandDBP Formation
•
Sampling campaigns performed during fall 2007 and fall 2008
Lab Tests
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Results
•
NOM characteristics, DBPs
and chlorine demand are not affected by UV disinfection
•
UV-H2
O2 treatment (Dose = 600 mJ/cm2)No mineralization of the NOMpH, alkalinity, TOC are not affectedNOM spectral properties are not significantly
affected
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Influence of UV-H2
O2 on chlorine demand: Fall 2007
0.0
0.4
0.8
1.2
1.6
1 2 4 8 24 48Contact time (hr)
Chl
orin
e de
man
d (m
g/l)
Chlorine demand before UV-H2
O2 Chlorine demand after UV-H2
O2
Chlorine demand increases
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Influence of UV-H2
O2 on chlorine demand: Fall 2008
0
0.5
1.0
1.5
2.0
2.5
1 2 4 7 24 48 72Contact time (hr)
Chl
orin
e de
man
d (m
g/l)
Chlorine demand before UV-H2
O2 Chlorine demand after UV-H2
O2
Chlorine demand increases
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Influence of UV/H2
O2 on THM formation: Fall 2007
0
20
40
60
80
1 2 4 8 24 48Contact time (hr)
THM
form
atio
n (μ
g/l)
THM formation before UV-H2
O2 THM formation after UV-H2
O2
THM formation decreases
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Influence of UV/H2
O2 on THM formation: Fall 2008
0
20
40
60
80
1 2 4 7 24 48 72Contact time (hr)
THM
form
atio
n (μ
g/l)
THM formation before UV-H2
O2 THM formation
after UV-H2
O2
THM formation increases
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Influence of UV/H2
O2 on disinfection
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UV-H2
O2
process affects NOM characteristics
•
Altered NOM is more reactive towards chlorine
•
UV-H2
O2
treatment affects THM formation
UV-H2
O2
impacts behaviour
of Cl2
and DBPs
BUT we don’t have tools to predict these impacts
More research is needed!!!
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Ongoing experiments
•
2009 campaign:
– Spiking Geosmin
and MIB upstream from one reactor
– Study the impact of different levels of treatment on T&O removal, DBP-FP and chlorine demand
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Acknowledgments
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Morris McCormick and the operators at Cornwall Water Purification Plant
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Canadian Water Network (CWN)
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Trojan Technologies
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Removal of Geosmin by UV-H2
O2
treatment
0
2
4
6
8
10
12
14
08-Sep-08 10-Sep-08 11-Sep-08 12-Sep-08 19-Sep-08 23-Sep-08 29-Sep-08
Sampling time
GSM
(ng/
l)
Before UV-H2
O2 After UV-H2
O2
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Removal of MIB by UV-H2
O2
treatment
0
1
2
3
4
5
6
7
8
9
10
08-Sep-08 10-Sep-08 11-Sep-08 12-Sep-08 19-Sep-08 23-Sep-08 29-Sep-08
Time of sampling
MIB
(ng/
l)
Before UV-H2
O2 After UV-H2
O2