ICOT ALDicotcompany.com/.../2015/03/ICOT-ALD-Brochure-pdf.pdf · DGIST, Korea Youngyiel precision...
Transcript of ICOT ALDicotcompany.com/.../2015/03/ICOT-ALD-Brochure-pdf.pdf · DGIST, Korea Youngyiel precision...
Simple & Versatile Solution
ICOTALD
W W W . I C O T C O M P A N Y . C O M
ICOTAtomic Layer Deposition
LA
B &
SM
AL
L S
CA
LE
AL
D S
YS
TE
MS
+ C U S T O M I Z E D A L D S Y S T E M S
+ H I G H Q U A L I T Y C O A T I N G S E R V I C E
+ C O N S U L T I N G F O R A L D R & D
+ I C O T M I N I - D E S K T O P – S I Z E A L D
Simple & Versatile Solution
ICOTALD
Sensor & flow
part
600 mm
300 mm600 mm
Carrier & source gas
flow
Exhaust
Source gas
inlet
Source
cylinder (50cc)
Manual
diaphragm
valve
Pneumatic
diaphragm
valve
ALD
chamber
Substrate holder
Vent valve
Technical specs
▪ Dimension (w × d × h) = 600 × 300 × 600 mm
▪ Chamber design : viscous flow
▪ Chamber construction : 316L stainless steel
▪ Substrate size : up to 10 mm
▪ Substrate temperature : up to 300 °C
▪ Ports : up to 3 precursor lines available
▪ Precursor cylinder : Swagelok® 50 cc cylinder
▪ Carrier gas : N2 mass flow controlled, 20 SCCM
▪ Controls : LabVIEW TM software (NI 9472)
▪ Certification : Federal Communications Commission (FCC)
Chamber & precursor delivery> Suitable for small scale prototype production> Low precursor consumption
Cabinet & control> Compact design> Digital sensors & controllers for precise operation
Software> User-friendly interface> Compatible with PC & mobile platform
Basic model (ICOT mini basic)
A simple, versatile ALD system for various R&D needs
SP
EC
IF
IC
AT
IO
NBasic model + Glove Box (Option)
Options
▪ Heating jacket unit
▪ Powder coating assembly
▪ Glove box unit
Small system size similar to a desktop computer
Simple & Versatile Solution
ICOTALD
A simple add-on, a powerful result – powder coating
▪ Enabling of powder ALD by mounting multi-directional flow type powder holder
▪ Facile handling and compatibility with existing chamber
▪ Conformal and uniform coating on powder
Conformal coating.
> Uniform ultra-thin coating on 3D-complex structure> Able to coat thin film with well-crystallized lattice structure
Pure composition.
> High quality films with low impurity level> Precise stoichiometry and thickness control
Assemblies for powder coating.
> A simple add-on for enabling powder coating
> Various customization (volume, length and etc.)
High quality ALD thin film
▪ Research solutions for small-scale labs, universities and companies
▪ Rapid prototyping with easy-to-use device operation
▪ Reproducible nanoscale thin film with high quality
Uniform coating on powder.
> Conformal and uniform coating through multi-directional flow
> Appropriate for small-scale prototyping
0200400600800100012001400In
ten
sit
y (
a.u
.)
Binding Energy (eV)Z
n 2
s
Zn
2p
Zn
2p
O 1
s
Zn
3s
Zn
3p
Zn
3d
Polycrystalline
YSZ
Ag
ALD nano-laminate
Bare powder After deposition
ZnO 100cycles
Uniform
coating on
powder
OU
R S
ER
VI
CE
S
Materials
Applications
▪ For R&D use in energy, electric device, fuel cell etc.
Paper published using ICOT ALD
1. Shim et al., J. Mater. Chem. A, 1 (2013)
2. Son et al., J. Vac. Sci. Technol. A 31 (2013)
3. Park et al., J. Vac. Sci. Technol. A 32 (2014)
4. Choi et al., Appl. Phys. Lett. 104 (2014)
5. Choi et al., J. Electrochem. Soc. 162 (2015)
6. Lee et al., J. Vac. Sci. Technol. A 33 (2015)
7. Park et al., J. Vac. Sci. Technol. A 33 (2015)
8. Jeong et al., ACS Catal. 5 (2015)
9. Kim et al., Electrochimica Acta 184 (2015)
10. Neoh et al., Nanotechnology 27 (2016)
11. Jeong et al., ACS AMI 8 (2016)
12. Han et al., Chem. Eng. J. 328 (2017)
13. Alizera et al., ACS Omega. 2 (2017)
ICOT Inc.8, Nonhyeon-ro 102-gil, Gangnam-gu, Seoul, South KoreaTel : +82-2-741-1532E- mail : [email protected] : www.icotcompany.com
ALD research trend related review papers
1. George et al., Chem. Rev. 110 (2010)
2. Kim et al., Adv. Funct. Mater. 20 (2010)
3. Cassir et al., J. Mater. Chem. 20 (2010)
4. Elam et al., MRS Bull. 36 (2011)
5. Marichy et al., Adv. Mater. 24 (2012)
6. Peng et al., J. Vac. Sci. Technol. A 30 (2012)
7. Miikkulainen et al., J. Appl. Phys. 113 (2013)
8. Shim et al., J. Mater. Chem. A, 1 (2013)
9. Parsons et al., J. Vac. Sci. Technol. A 31 (2013)
10. Johnson et al., Mater. Today. 17 (2014)
11. Malachi et al., ACS Nano 9 (2015)
12. Shim et al., J. Mater. Chem. C 5 (2017)
Simple & Versatile Solution
ICOTALD
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There are many more materials and processes available in ALD today.Contact us for your specific needs.
Installation List
REFERENCES CONTACT US
▪ Stanford University, USA
▪ Korea University, Korea
▪ Seoul National University, Korea
▪ SNUST, Korea
▪ UC Merced, USA
▪ DGIST, Korea
▪ Youngyiel precision Inc., Korea
▪ Binary oxides1-8
Al2O3, ZnO, TiO2, SnO2, HfO2, Y2O3, ZrO2,
Li2O, SrO, CoOx, La2O3, CeO2 and etc.
▪ Ternary/quaternary oxides4-8
YSZ, SnOx-POX, SrTiO3,
Sr-doped LaCoO3 (LSC) and etc.
▪ Metals9-10
Pt, Pd, Ru and etc.