Grayscale Lithography - Fraunhofer
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4 6 FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING IOF GRAYSCALE LITHOGRAPHY ON PLANAR AND NONPLANAR SURFACES 4 200 mm master wafer carrying Fresnel lenses. 5 Diffractive optical element for chromatic aberration control. 6 Large-area hexagonal dense- packed micro-lens array. High precision microstructures on various substrates With outstanding flexibility, direct writing grayscale photo-lithography enables the generation of high precision microstructures for the implementation into optical systems. Thus, individual solutions for micro refractive and diffractive optical elements, even on non-standard or non-flat surfaces, can be realized in close collaboration with design and integration. Technical data - Lithography system specially designed for generation of micro optical elements - High dynamic dosage control at 405 nm exposure wavelength - Resolution down to ≲ 1 μm - Maximum writing field size: 0.5 × 0.5 m 2 Realization of micro optical elements - Layout data and generation of exposure data for various applications - Fabrication of micro structures in photo resist: - Master for replication processes - Masks for RIE proportional transfer into diverse materials - Masks for structuring functional layers Typical applications - (A)spherical lenses and lens arrays in regular or chirped arrangement - Micro-prism, Fresnel lenses, kinoforms - Beam shaping elements - Efficient (blazed) gratings und CGHs - Diffractive correcting elements for spherical and chromatic aberrations - Lithography (also multilayer) on almost every substrate geometry Fraunhofer Institute für Applied Optics and Precision Engineering IOF Albert-Einstein-Straße 7 07745 Jena Director Prof. Dr. Andreas Tünnermann Head of department Mikro- & Nano-structured Optics Dr. Frank Burmeister Contact Dr. Robert Leitel +49 (0) 3641 / 807 375 [email protected] www.iof.fraunhofer.de 5
Transcript of Grayscale Lithography - Fraunhofer
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F R A U N H O F E R I N S T I T U T E F O R A P P L I E D O P T I C S A N D P R E C I S I O N E N G I N E E R I N G I O F
GRAYSCALE LITHOGRAPHY ON PLANAR AND NONPLANARSURFACES
4 200 mm master wafer carrying
Fresnel lenses.
5 Diffractive optical element for
chromatic aberration control.
6 Large-area hexagonal dense-
packed micro-lens array.
High precision microstructures
on various substrates
With outstanding fl exibility, direct
writing grayscale photo-lithography enables
the generation of high precision
microstructures for the implementation
into optical systems. Thus, individual
solutions for micro refractive and diffractive
optical elements, even on non-standard or
non-fl at surfaces, can be realized in close
collaboration with design and integration.
Technical data
- Lithography system specially designed for
generation of micro optical elements
- High dynamic dosage control at 405 nm
exposure wavelength
- Resolution down to ≲ 1 μm
- Maximum writing fi eld size: 0.5 × 0.5 m2
Realization of
micro optical elements
- Layout data and generation of exposure
data for various applications
- Fabrication of micro structures in
photo resist:
- Master for replication processes
- Masks for RIE proportional transfer into
diverse materials
- Masks for structuring functional layers
Typical applications
- (A)spherical lenses and lens arrays in
regular or chirped arrangement
- Micro-prism, Fresnel lenses, kinoforms
- Beam shaping elements
- Effi cient (blazed) gratings und CGHs
- Diffractive correcting elements for
spherical and chromatic aberrations
- Lithography (also multilayer) on almost
every substrate geometry
Fraunhofer Institute für Applied
Optics and Precision Engineering IOF
Albert-Einstein-Straße 7
07745 Jena
Director
Prof. Dr. Andreas Tünnermann
Head of department
Mikro- & Nano-structured Optics
Dr. Frank Burmeister
Contact
Dr. Robert Leitel
+49 (0) 3641 / 807 375
www.iof.fraunhofer.de
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