Facilities in the Molecular and Materials Physics group

Bill Gillin

Dept of Physics

Optical Spectroscopy

• Photoluminescence – Tunable (215nm – 2500nm) pulsed (~6ns)

excitation• Can be used for time resolved measurements with

detection in the range ~300-1700nm• Also photoluminescence excitation spectroscopy

– CW 405nm and 532nm pump lasers

• Spectroscopic ellipsometery– Horiba Jobin Yvon UVISEL NIR instrument on

order• 260-1700nm wavelength range• Automatic variable angle goniometer 40°-90°

(0.01° step)• Microspot optics 0.05, 0.1 and 1mm spot size• Heated sample stage RT-600°C• Liquid sample cell

• Time of flight– Facilities for photoconductivity measurements

to measure carrier mobilities in organics– Tuneable excitation using OPO – Ultrafast measurements using 355nm or

266nm

Electrical Characterisation

• A range of source measure units with current measurement down to femtoamps

• These can be used for transistor characterisation

Photolithography

• Spin coater

• Karl Suss MJB3 Mask Aligner

• Bakeout oven

• Also have UV light box for crude photolithography

Deposition systems

• Two dedicated organic evaporation systems– 6 organic sources 2 metal sources– 4 organic sources 2 metal sources

• Both systems have shadow mask facilities

• Also one general purpose evaporator mainly used for metal evaporation

Other equipment

• Dektak 3ST surface profiler

• Oxygen plasma system