ESD SYSTEM OVERVIEW
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ESD SYSTEM OVERVIEW Sample Holder plate Bias Filamen t Cu Sample 1 2 B-A gauge RGA Bias Sample Electromet er Butter fly valve Pumping group Conductance Gas Injection Line Filament Filament Power Supply Transport rod Full Range Gauge
description
ESD SYSTEM OVERVIEW. Transport rod. 1. Cu Sample. Butterfly valve. 2. Bias Sample. Sample Holder plate. Electrometer. RGA. B-A gauge. Pumping group. Filament. Conductance. Gas Injection Line. Filament Power Supply. Full Range Gauge. Bias Filament . ESD SYSTEM OVERVIEW. - PowerPoint PPT Presentation
Transcript of ESD SYSTEM OVERVIEW
ESD SYSTEM OVERVIEW
ESD SYSTEM OVERVIEWSample Holder plateBias Filament Cu Sample12B-A gaugeRGABias SampleElectrometerButterfly valvePumping groupConductanceGas Injection LineFilamentFilament Power SupplyTransport rodFull Range GaugeESD SYSTEM OVERVIEW
Cu SAMPLES
Circuit
AAVV+15 V2-3 A35 KVCu Samples
main steps: MachiningCleaningHeat treatmentESDBake out: lower part
123456/1178910
Bake out: upper part
1B2B3B4B
RGA scans
RGA scans (valve closed)
Degassing: 9 Cycles @ 0.35KV
H2 %H2O%N2/CO %O2 %F %Ar %CO2 %9.5634.1 16.9 1312.49.2536.9Degassing: 9 Cycles @ 0.70KV
H2 %H2O%N2/CO %O2 %F %Ar %CO2 %233430.8 4018.916.244.9Degassing: 9 Cycles @ 1.5KV
H2 %H2O%N2/CO %O2 %F %Ar %CO2 %0.94-0.220.773.7-0.44-3.291.47Calibration: H2
Calibration FactorCalibration: N2
Calibration FactorCalibration: N2 2nd set of data
Calibration FactorDegassing: 30 Cycles @ 0.35 KV
CURRENT!!!!!
Desorption Yield
Desorption Yield
15 RGA Cycles for background Signal + biassing of the sample 15 RGA Cycles with the filament switched on filament + sample degassingDesorption Yield switch on the filament 15 RGA Cycles for background pressure 15 RGA Cycles with the sample biased
Desorption Yield @ 0.35 KV
Desorption Yield @ 10 KV
N2 calibration
Energy correlation
Desorption Mechanisms
Desorption Mechanisms
Stopping power and Range
Kinetic energyStopping Power (MeV cm2/gr)MeVCollisionRadiativeTotal1.00E-021.32E+011.21E-021.32E+01
Stopping power and Range
Kinetic Energy MeVRangegr/cm2Thicknesscm 1.00E-02
4.601E-045.15E-05Energy correlation
Energy correlation
Circuit
AAVV+15 V2-3 A35 KVExtra-electron source
Positive Polarization [KV]Current [A]Negative Polarization[KV]Current [A]7 0-0.2-70.681.1-1.2-80.892.2-91.8103.9-1051530-15100Degassing @ 5 KV
Improvements
Sheet1Vacuum dynamics REFERENCEVacuumArgon (mbar)H2 (mbar)H2 (1 bar)VacuumArgon (mbar)Hydrogen (mbar)Hydrogen (1 bar)w/o etchPassivation SLAC etchw/o etchPassivationSLAC etchw/o etchPassivationSLAC etchw/o etchPassivationSLAC etchw/o etchPassivationSLAC etchw/o etchPassivation SLAC etchw/o etchPassivation SLAC etchw/o etchPassivationSLAC etchw/o etchPassivation SLAC etchCERN22222222222224Bodycote22222222218SLAC2222241422222222222222222222222222456elliptical samples
Sheet2
Sheet3
bake-outTCPart of the systemEquip. DescriptionT ( C )1TMP valve1 Jacket + 1 TC1502T flanges3 Collars + 1TC1503T body1 Tape +1TC1504Full Range Gauge1 Tape +1TC1505Cross chamber flanges3 Collars + 1 TC1506 &11RGA4(2+2) Collars + 2 TC2007B-A Gauge2 Collars + 1 TC2508Sample Holding1 Tape +1TC1509Butterfly valve1 Tape +1TC12010Filament2 Tapes +1TC150
Sheet2
Sheet3
bake-out (upper part)TCPart of the systemEquip. DescriptionT ( C )1TMP1 Jacket + 1 TC1502T flanges3 Collars + 1TC1503T body1 Tape +1TC1504Full Range Gauge1 Tape +1TC1505Cross chamber flanges3 Collars + 1 TC1506RGA3 Collars + 1 TC2507B-A Gauge2 Collars + 1 TC2508Sample Holding1 Tape +1TC1509Butterfly valve1 Tape +1TC12010Filament1 Tape +1TC150
bake-out (lower part)TCPart of the systemEquip. DescriptionT ( C )1B (12)Cross body1flange+1cross body+1viewport + 1TC1502BRod1Tape+1TC803BPirani + Penning1 Tape + 1 TC1804BElbow body + Elbow flange+bellow2 Tape +1 flange + 1TC150TMP rackTMP Valve1 jacket150
Sheet3
