ERL beam instrumentation - KEK
Transcript of ERL beam instrumentation - KEK
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ERL beam instrumentation
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ERL beam instrumentation group
T. Mitsuhashi
S. HiramatsuT. KasugaT. Obina
M. TobiyamaT. NaitohT. FurukawaM. Satoh
N. Nakamura
Developments of monitors
Developments of control including fs technology
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Beam
Beam
Beam instrumentation for the ELR
1. Profile measurementFluorescence screen
Optical profile monitor by OTR or SRWire scanner SEM or Compton scatteringHigh speed gated camera
2. Position measurement BPM electronicBPM SR or OTR
3. Intensity measurementDCCT, Differential DCCT
Photocathode, Faraday cupSR or OTR intensity monitor
4. Emittance measurementFluorescence screen with slitWire scannerInterferometer SR or OTR
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5. Temporal structureStreak camera SR or OTRIncoherent intensity interferometer SR or OTRCSR interferometer CSRBLM opto-electric
6. HaloWire scannerCoronagraph SR or OTR
7. Beam loss
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ERL試験機のレイアウト
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現在提案されている周回部のOptics案(原田)
長直線部の中心
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Arc1部
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Dispersion赤:ビームサイズ測定 Emittance評価 Halo測定 Dispersionなし緑:ビームサイズ測定 Dispersion評価 光学的ビーム位置 測定PBPM青:Halo測定 Dispersionあり
全ての四極にはBPMをつけるArcの中心にはBPMがつけられるか?
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5m
0m
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0m
6m
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SR1
SR2
SR3 SR4
BPM蛍光板、OTR
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入射部および加速空洞直線部
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入射部
蛍光板またはスリット付蛍光板(emittance 評価)
BPMストリップラインワイヤースキャナーまたはSEM
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OTR,蛍光板
BPM
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cavity BPMBLM (one pass, Opto-electric type)
Test port for developments
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differential DCCT for current valance
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Arc2部
SR5
SR6SR7
BPM
蛍光板,OTR
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Dump line
BPM
蛍光板
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SRI, Streak cameraHalo, profile
3SR
or OTRPosition, profile
6Fluorescence screen
Position1BPMSR
Position, timing, phase8BPMArc1
Position, profile1OTR
Position, profile3Fluorescence screen
Position, timing, phase3BPMStraight1
cavity
Position, profile4Fluorescence screenMerger
Emittance, Halo1Wire scannerSEM mode
Emittance2Fluorescence screen (with slit)
Position, profile2Fluorescence screenPosition, timing2BPM(strip line)Injector
CommentResolutionAccuracyDevice
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Position3BPM
Position, profile4Fluorescence screen
Dump line
Bunch by bunchCurrent
1WCM
DC current1DCCT
Current difference1Differential DCCTOthers
SRI, Streak cameraHalo, profile
3SR
or OTRPosition, profile
6Fluorescence screen
Position1BPMSR
Position,timing, phase
8BPMArc2
Bunch lengthBLM(Opto-electric)
developmentTest section
Accurate Position2Cavity BPM
Position, timing, phase
2BPMStraight 2
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Test facility for shortpulse beam at PFBT
Development of beam monitors Development of fs technology
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現状PF-BT
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電荷制限WCM6.5W
65Wビーム
6.5Wビーム
0.65Wビーム
インターロック
電荷制限WCM
0.65W
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Test port for the development of beam monitors
0.6ps to 4psec 60W (2.5GeV,1nc, 25pps)
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BH31 入口εx=40 (nm*rad)εy=13 (nm*rad)
σz=1.4 (mm)=4.2(psec)σε=1.0 x 10-3
R56=1.0 (m) Normal : BK-BH31間
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εx=40 (nm*rad)εy=13 (nm*rad)
σz=0.99 (mm)=3.3(psec)σε=1.0 x 10-3
BH31 入口
R56=0.0 (m) Isochronous: BK-BH31間
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εx=40 (nm*rad)εy=13 (nm*rad)
σz=0.17 (mm)=0.57(psec)σε=10.0 x 10-3
BH31 入口
R56=0.1 (m)T566 = -0.11 (m) Bunch Compress: BK-BH31間
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Beam instrumentation based on Optical and opto-electric method
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Incoherent SR intensity Interferometry
forShort bunch mesurement
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( )⎥⎥
⎦
⎤
⎢⎢
⎣
⎡
⎟⎟
⎠
⎞
⎜⎜
⎝
⎛
⎟⎟⎠
⎞⎜⎜⎝
⎛
σδτ−−
στ+⎟⎟
⎠
⎞⎜⎜⎝
⎛
τδτ−−σ=δτ
2p
2
p2
c
22
p124
exp2
11
*
4exp
2
11Kcount
We thus obtain coincidence count;
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Illustration of intensity interference pattern with chaotic light pulse.
Illustration of intensity interference pattern with coherent light pulse.
Phase correlation peak in the center.
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er
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0.9
0.92
0.94
0.96
0.98
1
1.02
0 20 40 60 80 100
Corner-Cube Displacement (mm)
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Pulse envelope length σp
Coherent length of wave pockets τc
Pulse envelope length σp is always longer than Coherent length of wave
pockets τc.
σp ≥ τc
We can measure the very short pulse length with intensity interferometry
with nearly no theoretical limit on temporal resolution.
Actual resolution will be limited by dispersion of the glass.
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Coronagraph for halo measurement
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Objective lens
Field lens
Baffle plate (Lyot stop)
Relay lens
Opaque disk
Anti-reflection disk
Baffle plates to reduce reflection
Optical layout of the coronagraph
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65.8mA 61.4mA 54.3mA
45.5mA 35.5mA 396.8mAMulti-bunch
bunch current 1.42mA
Beam tail images in the single bunch operation at the KEK PF measured at different current
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Single bunch 65.8mA
Exposure time of CCD : 3msec
Exposure time of CCD : 100msec
Intensity in here : 2.05x10-4
of peak intensity
2.55x10-6
Background leavel : about 6x10-7
Far tail
Observation for the more out side
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Bunch length monitoring by Opto-electric method
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Er
Principal ofelectro-optical
samplingPD
1. Sampling:� simple analysis� balanced detector allows high sensitivity� good synchronization required� multi-shot method� arbitrary time window possible
Er
Principal oftemporal-
wavelength correlationcamera
2. Chirp laser method:� single shot method� some more effort for laser and laser diagnostics required � resolution due to laser ~ √t0· tchirp� time window ~ 1-20ps
Er
Principal oftemporal-spatial
correlationcamera
3. Spatial method:� single shot method� imaging optics is critical� resolution due to geometry > t0/cos(α)� time window ~ 1-20ps
Electro-Optical Sampling
TTF2 @ 140m
TTF2: Methods 1&2 installed at 140 m, method 3 will be used at 190 m
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ElectroElectro--Optical SamplingOptical Sampling200 200 µµm ZnTe crystalm ZnTe crystal
ee−−
Ti:s laser
Ti:s Ti:s laserlaser
Adrian Cavalieri et al., Adrian Cavalieri et al., U. Mich.U. Mich.
SingleSingle--ShotShot
<300 fs<300 fs
170 fs rms170 fs rms
Timing JitterTiming Jitter(20 Shots)(20 Shots)
ee−− temporal information is encoded temporal information is encoded on transverse profile of laser beamon transverse profile of laser beam
Courtesy of J. Hastings