Electron Stimulated Desorption of OFE Copper

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Electron Stimulated Desorption of OFE Copper Chiara Pasquino, Politecnico di Milano 9th March 2011, RF Structure Meeting

description

Electron Stimulated Desorption of OFE Copper. Chiara Pasquino, Politecnico di Milano. Dynamic Vacuum: an issue for CLIC accelerating structures. Static Vacuum : 10 -9 mbar [ G.Rumolo , C.Garion ] Dynamic Vacuum : CO 2 , H 2 < 10 -9 mbar. Technical Note, EDMS 1095288. - PowerPoint PPT Presentation

Transcript of Electron Stimulated Desorption of OFE Copper

Page 1: Electron Stimulated Desorption of OFE Copper

Electron Stimulated Desorption of OFE Copper

Chiara Pasquino, Politecnico di Milano

9th March 2011, RF Structure Meeting

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Dynamic Vacuum: an issue for CLIC accelerating structures

Static Vacuum: 10-9 mbar [G.Rumolo, C.Garion]

Dynamic Vacuum: CO2, H2 < 10-9 mbar

Technical Note, EDMS 1095288

http://ilcagenda.linearcollider.org

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Dynamic vacuum sources due to the High Gradient

Breakdowns: during the discharge a gas burst is always detected;

Dark Currents: FE currents that don’t lead to a breakdown impinge on the Copper surface causing the ESD Effect.

FAST ION – BEAM INSTABILITIES

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Dynamic Vacuum studies : Breakdowns

2*102 H2 or CO molecules released [exp. Data DC “spark test” reported in PRST-AB12, 092001 (2009)];

Uniform pressure along the structure after ~ 3ms;

Background pressure recovered after 20 ms, no dynamic vacuum problems.

[C.Garion]

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Dynamic Vacuum studies : ESD

e- on faraday cup

e- are uniformly distributed inside the cell

e- on faraday cup

S. Calatroni

Faraday Cup measurement - T18_VG24_Disk_2 – KEK [T. Higo] ESD measurement on unbaked Copper [ N. Hilleret, CAS Vacuum School 2006 - G. Vorlaufer CERN-Thesis (2002)]

H2 PP = 1.12E-8 mbar 10 times higher CO2 PP = 3.37E-9 mbar 3 times higher

NEW ESD EXPERIMENTAL DATA ON UNBAKED OFE COPPER AT HIGH ELECTRON ENERGY NEEDED!

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Dynamic Vacuum studies: theoretical models

Gortel Fully Quantum Mechanical Model

MGR Model

e-

Antoniewicz

e-

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Desorption Yield

VolQ

pumpQ

desQ

Steady State Condition

0**

jjdes

j

vol

j SpVtp

Vtp

jjdes

j SpVtp

*

kTeISpp s

jjjj 01

s

jjjj kTI

eSpp

01

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Sample Campaign

w/o etch

Passivatio

n SLAC etch

w/o etch

Passivatio

nSLAC etch

w/o etch

Passivatio

nSLAC etch

w/o etch

Passivatio

nSLAC etch

w/o etch

Passivatio

nSLAC etch

w/o etch

Passivatio

n SLAC etch

w/o etch

Passivatio

n SLAC etch

w/o etch

Passivatio

nSLAC etch

w/o etch

Passivatio

n SLAC etch

CERN 2 2 2 2 2 2 2 2 2 2 2 2 24

Bodycote 2 2 2 2 2 2 2 2 2 18SLAC 2 2 2 2 2 4 14

2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 4 56

Hydrogen (1 bar)

elliptical samples

Vacuum dynamics REFERENCE Vacuum Argon (mbar) H2 (mbar) H2 (1 bar) Vacuum Argon (mbar) Hydrogen (mbar)

• 3 Cleaning Procedures : w/o etching, passivation & SLAC etching

• Several Thermal Treatment : Vacuum, Argon, H2 atmosphere @ 1040 or 820 °C

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H2 Diffusion Profiles :SLAC bonding

0 100 200 300 400 500 600 7000

300

600

900

1200

2020 20

1040 1040

800

1040_H2

Time (minutes)

T (

°C) H2 H2

Cu – H is an endothermic system! equal Cs at both surfaces

TpHxH

242677.4log21log 2

RTD 37320exp10*34.8 3

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H2 Diffusion Profiles: SLAC bonding

-0.5 0.0 0.51.1993573x10-4

1.1993574x10-4

C (%

wt)

x (cm)

H in Cu, 1h30 @ 1313

-0.5 0.0 0.51.194x10-4

1.196x10-4

1.198x10-4

1.200x10-4

C (%

wt)

x (cm)

1309 K 1305 K 1301 K 1297 K 1293 K 1289 K 1285 K 1281 K 1277 K 1273 K 1269 K

Ramp down, 4K/min

-0.5 0.0 0.51.1782x10-4

1.1784x10-4

1.1786x10-4

1.1788x10-4

C (%

wt)

x (cm)

1073 K

H in Cu @ 1073 K

-0.5 0.0 0.51.40x10-9

1.45x10-9

1.50x10-9

1.55x10-9

1.60x10-9

C (%

wt)

x (cm)

10 d 5 d 2 d 1 d 10 h 8 h

Heat treatment after bonding

THE ANNEALING TIME CAN BE DECREASED !!!

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ESD Experimental Set-Up

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ESD Experimental Set-Up

A

A

V

V

+15 V

2-3 A

35 KV

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Measurement Scheme

~ 20 s of desorption pulse; precise check of the background pressure; train of measurement continuous check of the pressure through the dual gauge read by Labview [thanks Rocio!!]; steady state condition useful experimental data.

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Experimental Data @ 10 KeV: Cu spare samples

1E11 1E12 1E13 1E14 1E15 1E161E-4

1E-3

0.01

0.1

1D

es Y

ield

(#m

ol/e

-)

Dose (e-/cm2)

H2 CH4 H2O N2/CO C2H6 CO2

ESD @ 10 kV

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Experimental Data @ 10 KeV: 19_PCV082C

1E15 1E161E-4

1E-3

0.01

0.1D

es Y

ield

(mol

/e-)

Dose (e-/cm2)

H2 CH4 H2O N2/CO C2H6 CO2

PCV082C @ 10 kV

Experimental Error Analysis 2

2

0

222 0

IPPIPP

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Energy Correlation: Stopping Powers

1E-3 0.01 0.11

10

Stop

ping

Powe

r (M

eV cm

2 /g)

Kinetic energy (MeV)

Stopping Power

Copper

1E-3 0.01 0.1

10

100

Stop

ping

Powe

r (M

eV cm

2/g)

Energy (MeV)

Hydrogen

1E-3 0.01 0.11

10

100

Stop

ping

Powe

r (M

eV cm

2/g)

Energy (MeV)

Nitrogen

1E-3 0.01 0.11

10

100

Stop

ping

Powe

r (M

eV cm

2/g)

Energy (MeV)

CO2

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Energy Correlation: Experimental Data

0 2 4 6 8 10 12 14

1E-3

0.01

0.1

Des

Yie

ld (m

ol/e

-)

Energy (keV)

H2 CH4 H2O N2/CO C2H6 CO2

19_PCV082C

Increase up to 2.5 KeV, then a small decrease; From 5 to 15 KeV, no dependence! Something to be studied in the future!

5 10 15 20

1E-3

0.01

0.1

Des

Yie

ld (m

ol/e

-)

Energy (keV)

H2 CH4 H2O N2/CO C2H6 CO2

19_PCV082C, Dose: 2.7E15

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Conclusions A new experimental set – up has been built in

order to provide ESD experimental data for unbaked copper at higher electron energy, as required;

The experimental set – up has been improved and it’s correctly working;

Further investigations about SLAC procedure are needed;

Further investigations on the energy correlation are required as well.

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THANKS FOR THE ATTENTION!!!!

Many thanks to: Sergio, Mauro, Walter, Rocio, Helga, Jan, Markus, Ivo, Donat, Pawel, Luigi, Paul, Wil, Holger!!!