Electro -Thermal Interaction in Nanoscale Devices: Carbon...
Transcript of Electro -Thermal Interaction in Nanoscale Devices: Carbon...
E. Pop, Intel + Stanford 1
ElectroElectro--Thermal Interaction in Nanoscale Thermal Interaction in Nanoscale
Devices: Carbon Nanotubes and PhaseDevices: Carbon Nanotubes and Phase--
Change MemoryChange Memory
Eric PopEric PopIntel Corp. / Stanford Univ.Intel Corp. / Stanford Univ.
http://nanoheat.stanford.edu/epop/research.html
E. Pop, Intel + Stanford 2
Joule (SelfJoule (Self--Heating) in ElectronicsHeating) in Electronics
R ~ T (metals)
R ~ T1.5 (doped silicon)
Power = I2R ~ 100 Watts
http://phys.ncku.edu.tw/~htsu/humor/fry_egg.html
Portables: batteries
Reliability + Performance
CPU Power Density ~ 100 W/cm2
E. Pop, Intel + Stanford 3
Thermal Management MethodsThermal Management Methods
E. Pop, Intel + Stanford 4
Thermal Management MethodsThermal Management Methods
System Level���� Active Microchannel Cooling (Cooligy)
Transistor Level���� electro-thermal device design
Circuit + Software Level� active power management(turn parts of circuit on/off)
IBM
E. Pop, Intel + Stanford 5
ChipChip--Level Thermal NetworkLevel Thermal Network
Intel 65 nm
Ttransistors
Rconvection
Ctransistor
Cchip
Cheat sink
Tchip
Rchip
Theat sink
Cinterconnect
Tinterconnect
Tcoolant
heat spreader
Si chip
chip carrier
fan
fin array heat sink
heat spreader
Si chip
chip carrier
fan
fin array heat sink
Rdielectric
Rspreading
Top viewHottest spots > 300 W/cm2
Intel Itanium
Cross-section8 metal levels + ILD
Transistor < 100 nm
E. Pop, Intel + Stanford 6
1
10
100
1000
1990 1994 1998 2002 2006 2010
Po
we
r D
en
sit
y (
W/c
m2)
AMD
Intel
Power PC
Trend
ChipChip--Level Thermal TrendsLevel Thermal Trends
1.4SiO2
13Si (10 nm)
40Silicides
60Ge
148Si
kth (W/m/K)Material
Device Level:
Confined Geometries, Novel Materials
F.Labonte
Hot Plate
Rocket Nozzle
Nuclear Reactor
E. Pop et al., Proc. IEEE 94, 1587 (2006)
Sun surface: 6000 W/cm2
E. Pop, Intel + Stanford 7
Thermal Resistance, Electrical ResistanceThermal Resistance, Electrical Resistance
Ohm’s Law (1827)Fourier’s Law (1822)
∆ V = I × R∆T = P × RTH
P = I2 × R
R = f(∆T)
E. Pop, Intel + Stanford 8
0.1
1
10
100
1000
10000
100000
0.01 0.1 1 10L (µm)
RTH (K/m
W)
Thermal Resistance at Device LevelThermal Resistance at Device Level
Cu
GST
SiO2
Si
Silicon-on-Insulator FET
Bulk FET
Cu Via
Phase-change Memory (PCM)
Single-wall nanotube SWNT
Sources: Mautry (1990), Bunyan (1992), Su (1994), Lee (1995), Jenkins (1995), Tenbroek (1996), Jin (2001), Reyboz (2004), Javey (2004), Seidel (2004), Pop (2004-6), Maune (2006).
E. Pop, Intel + Stanford 9
• Carbon nanotube = rolled up graphene sheet
• Great electrical & thermal conductors
– Semiconducting � transistors
– Metallic � interconnects
– σ ≈ 100 x σCu ; k ≈ kDiamond
• (Some) open questions:
– Thermal conductivity of single-walled
carbon nanotubes (SWNTs)
– Great thermal conductivity k, low thermal
conductance (small d)
– Optimizing high-field transport
back gate
(p++ Si)
HfO2
S (Pd) D (Pd)
SiO2
top gate (Al) CNT
Carbon Nanotubes for ElectronicsCarbon Nanotubes for Electronics
d ~ 1-3 nm
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BackBack--ofof--thethe--Envelope EstimatesEnvelope Estimates
• Typical L ~ 2 µm, d ~ 2 nm
• On insulating solid substrate
• Heat dissipated into substrate
– Moderate power ~ 10 µW/µm
– Peak ∆T ~ 60 K
E. Pop et al., Phys. Rev. Lett. 2005; Proc. IEDM 2005
SiO2
k∆∆∆∆T
Pt
• Thermal conductivity k ~ 3000 W/m/K
• Freely suspended nanotube
• Heat dissipated along tube length
– Moderate power ~ 10 µW (10 µA @ 1 V)
– Peak ∆T ~ 400 K!
g
∆∆∆∆T
Pt
SiO2
E. Pop, Intel + Stanford 11
Transport in Suspended NanotubesTransport in Suspended NanotubesE. Pop et al., Phys. Rev. Lett. 95, 155505 (2005)
SiO2
Si3N4
nanotube Pt
Pt gate
2 µmnanotube on
substrate suspended
over trench
• Observation: significant current degradation and negative
differential conductance at high bias in suspended tubes
• Question: Why? Answer: Tube gets HOT (how?)
0 0.2 0.4 0.6 0.8 1 1.20
2
4
6
8
10
12
14
16
I (µ
A)
V (V)
On Substrate
Suspended
L = 3 µm
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Transport in Suspended NanotubesTransport in Suspended NanotubesE. Pop et al., Phys. Rev. Lett. 95, 155505 (2005)
SiO2
Si3N4
nanotube Pt
Pt gate
2 µmnanotube on
substrate suspended
over trench
• Evidence for much longer phonon lifetimes in suspended SWNTs:
– Narrower Raman linewidths of suspended tubes (Dresselhaus in APL ’04)
– Observed 50x lifetime for suspended RBM mode (Dekker in Nature ’04)
– Why? Substrate interface provides phonon relaxation channels
– Consequence: hot optical phonons in suspended SWNTs under high bias
0 0.2 0.4 0.6 0.8 1 1.20
2
4
6
8
10
12
14
16
I (µ
A)
V (V)
On Substrate
Suspended
L = 3 µm
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Quick Recap of PhononsQuick Recap of Phonons
• Phonons = quantized atomic lattice vibrations
• Transverse (u ⊥ k) vs. longitudinal modes (u || k), acoustic vs. optical• “Hot phonons” = highly occupied modes above room temperature
CO2 moleculevibrations
)](exp[),( tiit ω−⋅= rkAru
transversesmall k
transversemax k=2ππππ/a
k
Graphene Phonons [100]
200 meV
160 meV
100 meV
26 meV =
300 K
Frequency ω(cm-1)
E. Pop, Intel + Stanford 14
Phonons and Guitar StringsPhonons and Guitar Strings
• Phonons = quantized lattice vibrations
• Transverse (u ⊥ k) vs. longitudinal modes (u || k), acoustic vs. optical• “Hot phonons” = highly occupied modes above room temperature
2 µmnanotube on
substrate suspended
over trench
Guitar string on a table Free guitar string
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1
, ,
1 1 1eff
AC OP ems OP abs
λλ λ λ
−
= + +
Include OP absorption:
Transport Model Including Hot PhononsTransport Model Including Hot Phonons
0 0.2 0.4 0.6 0.8 1 1.20
2
4
6
8
10
12
14
16
I (µ
A)
V (V)
On Substrate
Suspended
L = 3 µm
++=
),(
),(
4),(
2 TV
TVL
q
hRTVR
eff
eff
C λ
λ
0( )OP AC ACT T T Tα= + −
Non-equilibrium OP:
T0
TAC = T
L
TOP
RTH
ROP
I2(R-Rc)
0 0.2 0.4 0.6 0.8 1 1.2
300
400
500
600
700
800
900
1000
V (V)
Ph
on
on
Te
mp
era
ture
(K
)
oxidation T
Optical TOP
Acoustic TAC
I2(R-RC)
TOP
TAC = TL
2( ) ( ) / 0CA k T I R R L∇ ∇ + − =
Heat transfer via AC:
Landauer electrical resistance
E. Pop et al., Phys. Rev. Lett. 95, 155505 (2005)
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0 2 4 6 8 10 12 140
2
4
6
8
10
12
14
16
Suspended Tube Length L (µm)
Pe
ak
Cu
rre
nt
(µA
)
model with d~2 nm
o symbols: data
across ~ 30 tubes
• First experimental observation of Negative Differential Conductance (NDC)
– ALL suspended tubes show NDC; longest at fields as low as 200 V/cm
– Previous work predicts velocity saturation at E-fields > 5 kV/cm (isothermal)
• Peak current: Imax ~ 1/L, which scales as the thermal conductance
– Compare to Imax > 20 µA for same L tubes on substrate
0 0.2 0.4 0.6 0.8 1 1.20
2
4
6
8
10
12
I (µ
A)
V (V)
L = 0.8 µm
L = 2.1 µm
L = 3 µm
L = 11 µm
E. Pop et al., Phys. Rev. Lett. 95, 155505 (2005)
All Suspended Tubes Exhibit NDCAll Suspended Tubes Exhibit NDC
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0 0.5 1 1.5 20
1
2
3
4
5
6
7
V (V)
I (µ
A)
L = 2 µm
Effect of Effect of κκthth at High Temperature, Biasat High Temperature, Bias
Data
L = 2 µm
• Current at high bias: I ~ λop ~ 1/Nop ~ 1/T ~ κth• Thermal conductivity κth ~ 1/T at high T (Umklapp phonon scattering)
• I-V curve at high bias indirectly measures κth(T) at high T !
• Back out to T ~ 300 K � κ0 ~ 3600 W/m/K
κ = κ0
κ = κ0 – 4.2(T - T0)
κ = κ0T0/T
0 0.2 0.4 0.6 0.8 1 1.2 1.40
1
2
3
4
5
6
V (V)
I (µ
A)
T0 = 250, 300,
350, 400 K
V > 0.3
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Extracting SWNT Thermal ConductivityExtracting SWNT Thermal Conductivity
• Numerical extraction of k from the high bias (V > 0.3 V) tail
• Subtle second-order effect of three-phonon scattering introduces 1/T2
temperature dependence (N. Mingo, NL Jun’05)
• Comparison to data from 100-300 K of UT Austin group (C. Yu, NL Sep’05)
• Result: first “complete” picture of SWNT thermal conductivity from 100 – 800 K
E. Pop et al., Nano Letters 6, 96 (2006)
300 400 500 600 700 800
1000
1500
2000
2500
3000
3500
T (K)
k (
Wm
−1K
−1)
1/T
100 200 300 400 500 600 700 8000
0.2
0.4
0.6
0.8
1
T (K)
k⋅d
(10
−5 W
/K)
Yu et al. (Ref. 12)
This workYu et al. (NL’05)This work
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Gas Environment Dependence of NDCGas Environment Dependence of NDC
0 0.2 0.4 0.6 0.8 1 1.2 1.40
1
2
3
4
5
6
7
8
9
V (V)
I (µ
A)
Vac
1 atm Ar
1 atm N21 atm C2H4Model
0 1 2 3 4 5 60
0.2
0.4
0.6
0.8
1
1.2
1.4
# of Atoms
∆I(
µA
) N2
Ar
He
CH4
C2H4
CO2
O2
Vacuum
D. Mann et al., J. Phys. Chem. B 110, 1502 (2006)
• Current enhancement (∆I) in ambient gases does not scale with thermal conductivity of gas
• It scales with the number of atoms in the physisorbed gas molecules
• Physisorbed gases act like “weak substrates” for suspended SWNTs,
providing more vibrational modes for OP decay
Highest thermalconductivity
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Effects of Extreme EnvironmentEffects of Extreme Environment
0 0.2 0.4 0.6 0.8 1 1.2 1.40
5
10
15
20
V (V)
I (µ
A)
Pt gateCO
2
icePt gate
Dry ice encased
SiO2
Pt gate
Si3N4 SiO2
Pt gate
Si3N4
Suspended in
vacuum
• If the surrounding molecules are dense enough, they act as a
substrate, dissipating heat and relaxing optical phonons
• Environment can be engineered to modify properties of devices
D. Mann et al., J. Phys. Chem. B 110, 1502 (2006)
T = 50 K
T = 300 K
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Light Emission from Suspended SWNTsLight Emission from Suspended SWNTs
• HOT metallic tubes emit light
– Comes from center
– Highly polarized
– Emitted photons @ higher energy
than applied bias
D. Mann et al., Nature Nano (2007)
Energy (eV)2.2
suspended
1
0
2
1.4 1.6 1.8
3
2.0
on substrate S
S
D
γ(a.u.)
Vds = 1.4 V
Vds = 7 V
900 750 600Wavelength (nm)
-5
5
0
1 2
source
drain
Distance (µm)
γ (a.u.)0
trench
angle0 90
γ(a.u.)
1
0
~ σT4
Polarization
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Return to SWNTs On SubstratesReturn to SWNTs On Substrates
• SWNT on insulating solid substrate
• Heat dissipated into substrate rather than along tube length
• What is the heat loss coefficient g?
• [A: need some gauge of the tube temperature]
g
∆∆∆∆T
Pt
E. Pop et al., Proc IEDM 2005; Proc IEEE 2006
SiO2
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Nanotube Temperature GaugeNanotube Temperature Gauge
g
Pt
SiO2
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Nanotube Temperature GaugeNanotube Temperature Gauge
g
Pt
• Doesn’t exist
• But… oxidation (burning) temperature is known
O2
SiO2
TBD ~ 600 oC
Suspended On substrate
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Breakdown of SWNTs in Air (Oxygen)Breakdown of SWNTs in Air (Oxygen)
• Thermogravimetric (TGA) data shows SWNTs exposed to air break
down by oxidation at 500 < TBD < 700 oC (800–1000 K)
• Joule breakdown voltage data shows VBD scales with L in air
• Supports cooling mechanism along the length, into the substrate
K. Hata, Science 306, 1362 (2004)I. Chiang, JPCB 105, 8297 (2001)
E. Pop, Proc. IEDM (2005)A. Javey, PRL 92, 106804 (2004)
T (oC)
Weight (%)
0 1 2 3 4 50
5
10
15
20
25
L (µm)
VB
D (
V)
Model
Data
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Breakdown of SWNTs: AnalysisBreakdown of SWNTs: Analysis
• For on-substrate tubes, empirically note that:
– VBD vs. L in air scales linearly, as about 5 V/µm
– Breakdown currents for L > 1 µm always around IBD ≈ 20 µA
• Analytic solution of heat conduction equation
– Heat loss per unit length: g ≈ 0.17 ± 0.03 WK-1m-1
• No assumption was made about electrical transport model
0)(')( 0 =−−+∇∇ TTgpTkA
( ) BDBDBD ITTgLV /0−=
At breakdown: LVIp BDBD /'=
0 1 2 3 4 50
5
10
15
20
25
L (µm)
VB
D (
V)
Model
Data
E. Pop et al., Proc. IEDM (2005)
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ElectroElectro--Thermal Model for mThermal Model for m--SWNTsSWNTs
• Same model as that used for suspended SWNTs
• Include Joule heating, couple with heat conduction equation
• Self-consistent solution
• No assumptions of hot phonons needed
0 0.5 1 1.5 20
5
10
15
20
I (µ
A)
V (V)
Data
Isothermal model
T−dependent model
T = 100, 200, 293 K
SiO2
PtRtubeRcontact d
Ltube
g ~ 0.17 Wm-1K-1
Lcontact
L = 3 µm
0)(')( 0 =−−+∇∇ TTgpTkA
E. Pop et al., Proc. IEDM (2005)
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Modeling Long SWNTs up to BreakdownModeling Long SWNTs up to Breakdown
• Thermal “healing length” along SWNT ~ 0.25 µm
• Current saturation ~ 20 µA in long tubes (> 1 µm) due to self-heating
• Self-heating not significant when p’ < 5 µW/µm (design goal?)
Understanding transport
in a 3 µµµµm metallic SWNT
up to breakdown:Tmax ~ 600
oC = 873 KVmax ~ 15 V
Model
Data
E. Pop et al., submitted to JAP, pre-print cond-mat/0609075
−1.5−1−0.5 0 0.5 1 1.5300
500
700
900
X (µm)
T (
K)
E. Pop, Intel + Stanford 29
Some Notes on Some Notes on ShorterShorter SWNTsSWNTs
• Thermal “healing length” along SWNT ~ 0.2 µm
• Current saturation ~ 20 µA in long tubes (> 1 µm) due to self-heating
• Self-heating not significant when p’ < 5 µW/µm (design goal?)
• In short (< 1 µµµµm) tubes current enhancement (> 20 µµµµA) very likely
aided by Joule heating shifting towards the contacts
60
40
20
0
I DS (µA)
1 .51 .00 .50 .0VDS (V )
0 1 2 3 4 50
5
10
15
20
25I (µ
A)
V (V)
Isothermal
With self−heating
L=2 µm
L=5 µm
L=15 µm
55 nm
85 nm
150 nm
300 nm
700 nm
Javey, PRL’04
Short tubes
E. Pop, Intel + Stanford 30
From Nanotubes to PhaseFrom Nanotubes to Phase--Change MemoryChange Memory
0.1
1
10
100
1000
10000
100000
0.01 0.1 1 10L (µm)
RTH (K/m
W) GST
Phase-change Memory (PCM)
High thermal resistance:
• SWNT due to small
thermal conductance (very
small d ~ 2 nm)
• PCM due to low thermal
conductivity materials (SiO2,
Ge2Sb2Te5)
Single-wall nanotube SWNT
E. Pop, Intel + Stanford 31
What Is PhaseWhat Is Phase--Change Memory?Change Memory?
• PCM: Like Flash memory (non-volatile)
• PCM: Unlike Flash memory (resistance change, not charge storage)
• Faster than Flash (100 ns vs. 0.1–1 ms), smaller than Flash (which is
limited by ~1000 electrons stored/bit)
• For: iPod nano, mobile phones, PDAs, solid-state hard drives…
Si
GST
Flash PCM
Bit (1/0) is ~2000
electrons stored on
Floating Gate
Bottom electrode
heater (e.g. TiN)
Bit (1/0) is stored as
resistance change with
material phase
SiO2
E. Pop, Intel + Stanford 32
How PhaseHow Phase--Change Memory WorksChange Memory Works
• Based on Ge2Sb2Te5 reversible phase change: Ramorph / Rxtal > 100
• Short (10 ns), high pulse (0.5 mA) melts, amorphizes GST
• Longer (100 ns), lower pulse (0.1 mA) crystallizes GST
• Small cell area (sits on top of heater), challenge is reliability and
lowering programming current (BUT, helped by scaling!)
GST
PCM
Amorphous
PolycrystallineRESET
Pulse
Time
SET
Pulse
Glass Temperature
~ 150 oC
Melting Temperature
~ 600 oC
Tem
pera
ture
Bottom electrode
heater (e.g. TiN)
E. Pop, Intel + Stanford 33
Samsung 512 Mb PCM PrototypeSamsung 512 Mb PCM Prototype
“Samsung completed the first working prototype of what is expected to be the main memory
device to replace high density Flash in the next decade – a Phase-change Random Access
Memory (PRAM). The company unveiled the 512 Mb device at its sixth annual press conference
in Seoul today.” Source:
http://samsung.com/PressCenter/PressRelease/PressRelease.asp?seq=20060911_0000286481
Sep 11, 2006
Put in perspective:NAND Flash chips of8+ Gb in production
E. Pop, Intel + Stanford 34
Intel/ST PhaseIntel/ST Phase--Change Memory WaferChange Memory Wafer
“Intel CTO of Flash Memory Ed Doller holds the first wafer of 128 Mbit phase change memory
(PCM) chips, which has just been overnighted to him from semiconductor maker
STMicroelectronics in Agrate, Italy. Intel believes that PCM will be the next phase in the non-
volatile memory market.” Source: http://www.eweek.com/article2/0,1895,2021841,00.asp
Sep 28, 2006
E. Pop, Intel + Stanford 35
PCM Material ChallengesPCM Material Challenges
• Thermal and electrical conductivities 25 – 625 oC
• Thermal resistance of interfaces between materials (high surface to
volume ratio)
• Phase change physics – thermal and temporal evolution
• (Practical goal: memory cell with lower programming current)
GST
GST
Ti(Al)N
SiO2
SiO2
Separate GSTand top/bottom electrode
E. Pop, Intel + Stanford 36
GST Thermal Conductivity and InterfaceGST Thermal Conductivity and Interface
• GST thermal conductivity 0.2–1.0 W/m/K (SiO2 ~ 1.3 W/m/K)
• Thermal interface resistance (TIR) ≈ equivalent to 10-20 nm GST
• TIR alters temperature profile and may be key to device operation
J. Reifenberg et al., ITHERM 2006
c)
a)
d = 50 nm
TIR = 0
TIR = 2.5e-8 m2K/W
TIR = 5.0e-8 m2K/W
700 oC
25 oC
0.4
0.6
0.8
1
1.2
1.4
0 0.2 0.4 0.6 0.8 1 1.2
0 2 10-8
4 10-8
6 10-8
8 10-8
1 10-7
1.2 10-7
Pro
gra
mm
ing
Vo
ltag
e [
V]
k [W*m^-1*K^-1]
Boundary Resistance [m^2*K*W^-1]
E. Pop, Intel + Stanford 37
AC and DC Thermal MeasurementsAC and DC Thermal Measurements
• AC harmonic heating of thin GST films (3-ω method)
– 35-70-140 nm thin GST films, capped by SiO2
• DC electrical thermometry of electrode metals
– Transport physics (electrical, thermal) in amorphous materials
L
Si Substrate ~500µµµµm
A A
SiO2 ~20nm
I-
V-
V+I+
w
HL
Si Substrate ~500µµµµm
A A
SiO2 ~20nm
I-
V-
V+I+
w
HL
A A
I-
V-
V+I+
w
H
Au
GST (35-140 nm)
SiO2 (20 nm)
Si Substrate
SiO2 (20 nm)
AC heating
DC heating
Ti(Al)N
E. Pop, Intel + Stanford 38
ConclusionsConclusions
Summary:
• Self-heating due to small dimensions or thermal insulation
• HOT metallic single-wall carbon nanotubes at high bias:
– Hot phonons and thermal conductivity of SWNTs
– Light emission and breakdown (burning) of SWNTs in air
• Role of interface thermal resistance and material properties (amorphous vs. crystalline) in phase-change memory
Publications (see http://nanoheat.stanford.edu/epop/research.html)
• E. Pop, D. Mann, J. Cao, Q. Wang, K. Goodson, H. Dai, Phys. Rev. Lett. 95, 155505 (2005)
• E. Pop, D. Mann, J. Reifenberg, K. Goodson, H. Dai, Proc. IEDM, Washington DC (2005)
• J. Reifenberg, E. Pop, A. Gibby, S. Wong and K. Goodson, ITHERM 106 (2006)
• D. Mann, E. Pop, Q. Wang, K. Goodson, H. Dai, J. Phys. Chem. B 110, 1502 (2006)
• E. Pop, D. Mann, Q. Wang, K. Goodson, H. Dai, Nano Letters 6, 96 (2006)
• D. Mann et al., to appear in Nature Nano (2007)
E. Pop, Intel + Stanford 39
AcknowledgmentsAcknowledgments
• Profs. Ken Goodson, Hongjie Dai, Philip Wong
• Drs. David Mann, Qian Wang
• John Reifenberg, SangBum Kim, Matt Panzer, Yuan Zhang
• Intel: Drs. Y. Zhang, B. Johnson, D. Kencke, I. Karpov, G. Spadini
E. Pop, Intel + Stanford 40