E.Huttel, Vacuum Workshop, ALBA, 12-13 Sept.05 Forschungszentrum Karlsruhe / ANKA The ANKA Vacuum...

E.Huttel, Vacuum Workshop, ALBA, 12-13 Sept.05

Forschungszentrum Karlsruhe / ANKA

The ANKA Vacuum System

S.Hermle A.VölkerE.Huttel T.Fischböck



ANKA Parameter

Energy 0.5 – 2.5 GeV

Emittance 50 nm

Circumference 110.4 m

Current 0.2 (0.4) A

Loss per Turn 0.6 MeV

Energy Accept. 0.015

Bbend 0.3 – 1.5 T

Damping 3, 3, 1.5 ms

In operation:3 Beam lines for Micro fabrication9 Analytical Beam linesIn planning: 3



One of the Row

BESSY ANKA SLS CLS ASP

First Beam April 1998 Jan 2000 Dec. 2000 Dec. 2003 (2006)

Material LN316 LN316 LN316 LN316 LN316

Absorber Lumped + Distributed

Lumped + Distributed

Lumped Lumped Lumped

Pumps Triode Diode (Ti) Diode (Ti) Diode (Ti+Ta)

Diode (Ti)

Baking In-situ Pre bake ‘In–situ’ ‘In–situ’ ‘In–situ’

Flanges CF CF VAT Seal VAT Seal VAT Seal

Manufacturer PINK, FMB FMB FMB FMB FMB

Ingmar Lehmann, FMBLothar Schulz, SLSErhard Huttel, ANKA



Vacuum Chamber Lay Out



Lay out, Continued

Following chamber: e-beam chamber onlyDistributed AbsorberSmall pumps (150 l/s) every 1.5 m

Large Chamber (Dipole plus following Quad /Sextupole )e-beam Chamber plus Ante ChamberEach ante chamber:

Lumped absorber (Covering 80% of SR)Large (500/300 l/s) pumps



Pumping

Standard Diode Ion pumps Varian16 x 500 l/s16 x 300 l/s63 x 150 l/s

30 Controller300 l/s + 500 l/s connected to 1 Contr.Up to 8 150 l/s connected to 1 Contr.Each pump current measured



Vacuum Preparations and Assembling

Specification: Leak rate < 10-10 mbar l/sDesorption rate: < 10-12 mbar l/ (s cm2)Masses>40 < 0.01

No Firing

Baking and test at factory

Baking and assembling on side(Pumps, gauges, absorber)

Venting with N2

Assembling in storage ring

Pumping



Production



Expected Vacuum Behavior

0.0E+00

5.0E-09

1.0E-08

1.5E-08

2.0E-08

2.5E-08

0 1 2 3 4 5 6 7 8 9 10 11 12 13

length [m]

pre

ssure

[m

bar]

1.E-06

1.E-05

1.E-04

1.E-03

1.E-02

1.E+21 1.E+22 1.E+23 1.E+24

Dose [ph]

eta

[mo

l /p

h ]

Distributed AbsorberC.Herbeaux et al. Vac60(2001)113

Lumped AbsorberV.V.Anashin et al. EPAC(1998)2163

1.E-6

1.E-5

1.E-4

1.E-3

1.E-2

1.E-1

1.E+20 1.E+21 1.E+22 1.E+23 1.E+24 1.E+25

Dose per length [Ph / m]

Eta

[m

ol /

ph

]10 Ah

100 Ah

Exposed: 0.035 m Factor 10 difference for dose per length



1.E-3

1.E-2

1.E-1

1.E+0

1.E+1

1.E-2 1.E-1 1.E+0 1.E+1 1.E+2 1.E+3

dose at 2.5 GeV [Ah]

Cu

rren

t *

lifet

ime

[Ah

]

1.E-8

1.E-7

1.E-6

1.E-5

pre

ssu

re /

curr

ent

[mb

ar/A

]

What We Get (Logarithmic Scale) !

0

0.5

1

1.5

2

2.5

0 0.5 1 1.5 2 2.5

E [GeV]

p [

10-9

mb

ar]

0

0.5

1

1.5

2

2.5

0 0.5 1 1.5 2 2.5

E [GeV]

p [

10-9

mb

ar]

Prediction PAC98

Linear in Energy and Current

SLS

Saturation due to Touscheck



What Happened (Linear scale) !

0.0

5.0

10.0

15.0

20.0

25.0

30.0

35.0

40.0

0 200 400 600 800 1000 1200 1400 1600 1800

Dose [Ah]

Lif

eti

me@

100 m

A [

h]

Kr Accident

SUL Wiggler

Wera Undulator + Broken Window

SCU14

50 Ah to recover, when ¼ of storage ring vented N2

100 Ah, when vented with air

With more Valves now,10 Ah to recover when

venting straight section only



Major Accident I (Kr Lamp 2002)

(Standard diodes do not pump noble gases)Pumped Storage Ring with Turbo PumpsWhile baking all PumpsRecovered!!

Not my design!!They did not tell us!Look for the BL design!!

Syn.Rad.

Kr lamp for bakingbehind Be – Mirror (Exposed to SR)

Broke

Conclusion: Standard Diodes or ok



Major Accident II 2003 (Broken FE Window)

Exposed SR to air H2O !, Not dry N2 !

Cleaning with Syn.Rad. took 100 Ah to recover!

Syn.Rad.

Pyrex window in Diagnostic Front EndReplaced after 3 Year of Use

(became brown)New one broke after 6 month



Instrumentation (Storage Ring)

1.E-10

1.E-09

1.E-08

8:00 10:00 12:00 14:00 16:00 18:00 20:00 22:00 0:00 2:00 4:00 6:00 8:00p

[m

bar]

No Pirani, I do not miss them !12 Penning Gauges

4 QMS

1.E-10

1.E-09

1.E-08

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24

p [

mb

ar]

95 Ion Pump Current Monitors



Manufacturer

Product Typ No. Manuf. Cost €

Chamber 316 LN 110.4 m FMB 0.6 Mill ok

Ion Pumps

Controller

150 – 500 l/s

Midivac

63/16/16

30

Varian 0.4 Mill ok

now ok

Roughing Turbo

150 l/s 6 Varian 0.05 Mill ok

Gauges -

Sector Valves

Roughing

100 CF

63 CF

6

16

Cetec 0.02 Mill ok (Schedule-)

Gauges, QMS

Leak Det.

IKR70, PG300,

QMS422

8 Pfeiffer 0.02 Mill ok



Conclusion

Effect Gain

Firing Reduces H2 ?

Pre bake Removes H2O Needed

‘In situ’ bake out Removes H2O better 20 Ah

Material:

Desorption

Conductivity

Cost

=> better

.η (Al) > η (SS) ~ η (Cu)

.λ (SS) < λ (Al) ~ λ (Cu)

Cost (Cu) > Cost (Al) > Cost (SS)

Steel best cost performance?

unless you go to NEG coating

Ti Sublimator Additional pumping speed ?

Standard Diodes Pumping speed 50 % higher Yes

NEG coating Removes H2 CO 200 Ah

Only Lumped absorber

Better conductance source to sink

25-50 % better

pressure

E.Huttel, Vacuum Workshop, ALBA, 12-13 Sept.05 Forschungszentrum Karlsruhe / ANKA The ANKA Vacuum...

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