Cover | Index | Editorial team , editorial board and reviewers
Editorial
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Editorial This volume contains the proceedings of the Ninth International Conference on Ion Beam Modification of Materials (IBMM’95) which was held at the Australian National University in Canberra, Australia from 5 to 10 February 1995. More than 300 participants attended the conference from 33 countries. Over 420 abstracts were accepted and papers delivered in either poster or oral sessions. The location of the conference contributed to a higher than normal participation from Asia. Japan contributed the largest number of abstracts (with over 60) followed by the USA, Germany and Australia. In addition to IBMM’95, there were six informal supporting workshops held at various locations both before and after the conference, to add to the scientific interactions. IBMM’95 covered all of the traditional topics of the conference series but highlighted specific areas of either particular relevance to the Australian research effort or were topical internationally. Major topic areas were: (1) Basic ion-solid interaction processes. (2) Low energy ion beam processing. (3) Disorder, defects and gettering processes in ion bombarded semiconductors. (4) High fluence implantation and phase formation. (5) Ion implantation applications in electronics and optoelectronics. (6) Ion beam modification of metals, insulators and other materials. (7) Novel ion beam equipment and techniques. The conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and optoelectronics, motor vehicle and tooling parts, coatings tailored for desired properties studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for optoelectronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in under- standing defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconduc- tors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams. Despite the heavy scientific program, the atmosphere was relaxed and informal. The early afternoons of most conference days were left free to stimulate interaction between participants both scientifically and socially. The social program included a wine and cheese reception, an evening barbeque and a meeting of the Bohmische Physikalische Gesellschaft at which a presentation was given on the origins of the first Australians. In addition, there were conference outings to sample a little Australiana and a conference banquet held in the Great Hall of the Australian Parliament House. The conference owes its success to many people. The Program and International Committees contributed in a major way to shaping the program, particularly in the selection of invited speakers. Australian Convention and Travel Services were efficient in organising registrations, accommodation and the social functions and the Australian National University generously provided facilities and services. The local committee, consisting mainly of staff and students from the Department of Electronic Materials Engineering at ANU, bore the brunt of conference organisation, especially the scientific side, dealing with abstracts, posters, logistics, funding, correspondence and manuscripts for these proceedings. The conference administrator, Toni Purdy, coordinated all of these activities in a highly professional manner. She dealt with essentially all of the correspondence, including whipping tardy authors and editors into shape and delivering the manuscripts to the publisher on time - a tremendous achievement! We also thank Keith Jones, Joyce Happee and Ruud Koole of Elsevier for their assistance in preparation of these
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Editorial
This volume contains the proceedings of the Ninth International Conference on Ion Beam Modification of Materials (IBMM’95) which was held at the Australian National University in Canberra, Australia from 5 to 10 February 1995. More than 300 participants attended the conference from 33 countries. Over 420 abstracts were accepted and papers delivered in either poster or oral sessions. The location of the conference contributed to a higher than normal participation from Asia. Japan contributed the largest number of abstracts (with over 60) followed by the USA, Germany and Australia. In addition to IBMM’95, there were six informal supporting workshops held at various locations both before and after the conference, to add to the scientific interactions.
IBMM’95 covered all of the traditional topics of the conference series but highlighted specific areas of either particular relevance to the Australian research effort or were topical internationally. Major topic areas were:
(1) Basic ion-solid interaction processes. (2) Low energy ion beam processing. (3) Disorder, defects and gettering processes in ion bombarded semiconductors. (4) High fluence implantation and phase formation. (5) Ion implantation applications in electronics and optoelectronics. (6) Ion beam modification of metals, insulators and other materials. (7) Novel ion beam equipment and techniques.
The conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and optoelectronics, motor vehicle and tooling parts, coatings tailored for desired properties studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for optoelectronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in under- standing defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconduc- tors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Despite the heavy scientific program, the atmosphere was relaxed and informal. The early afternoons of most conference days were left free to stimulate interaction between participants both scientifically and socially. The social program included a wine and cheese reception, an evening barbeque and a meeting of the Bohmische Physikalische Gesellschaft at which a presentation was given on the origins of the first Australians. In addition, there were conference outings to sample a little Australiana and a conference banquet held in the Great Hall of the Australian Parliament House.
The conference owes its success to many people. The Program and International Committees contributed in a major way to shaping the program, particularly in the selection of invited speakers. Australian Convention and Travel Services were efficient in organising registrations, accommodation and the social functions and the Australian National University generously provided facilities and services. The local committee, consisting mainly of staff and students from the Department of Electronic Materials Engineering at ANU, bore the brunt of conference organisation, especially the scientific side, dealing with abstracts, posters, logistics, funding, correspondence and manuscripts for these proceedings. The conference administrator, Toni Purdy, coordinated all of these activities in a highly professional manner. She dealt with essentially all of the correspondence, including whipping tardy authors and editors into shape and delivering the manuscripts to the publisher on time - a tremendous achievement! We also thank Keith Jones, Joyce Happee and Ruud Koole of Elsevier for their assistance in preparation of these
“ill Editorial
proceedings. Finally, we thank the conference sponsors listed on page x - it was their assistance that provided travel support and many of the extras enjoyed by conference participants.
The next conference in the series (IBMM’96) will be held in Albuquerque, New Mexico (USA) in September 1996
to be chaired by Charles Barbour and Mike Nastasi.
Jim Williams
Rob Elliman
Mark Ridgway
Gltesl Editors
