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ECE 126
Introduction to Analog Integrated Circuits Design
Lab 1: MOSFET DC Ids – Vds Characteristic Curve &
Spice Extraction of Small-Signal Model Parameters
Submitted by:
Guisadio, Johanna Whil R.
Submitted to:
Prof. Allenn Lowaton
September 26, 2015
Step 1:
Connect the NMOS and PMOS. Simulate the Ids-Vgs characteristic
curve.
a.) NMOS
HSPICE CODE: .OP RESULT
Figure 1: Ids-Vgs characteristic curve of an NMOS.
The graph in Figure 1 shows the characteristics of the drain current as gate-to-
source voltage is increased. There is no current flow when Vgs is less than Vth (|Vtn|).
Beyond Vgs, the current will start to increase almost linearly before if saturates.
Figure 2: Ids-Vgs characteristic curve of a PMOS.
This graph in Figure 2 shows the characteristic of the drain current in a PMOS.
As with that of an NMOS, no current flows when the gate-to-source voltage is less than
the threshold voltage. If Vgs is further increased such that its magnitude is more than the
threshold voltage, there will now be current flowing and will linearly increase as Vgs is
increased. Thus, the direction of the current flow in a PMOS is opposite in an NMOS
with respect to the drain and source.
Step 2:
Disconnect the gate and the drain of the MOS of the figure 1.2(a). Then, assign
the different values of Vgs to its gate terminal. Simulate the Ids-Vgs characteristic curve.
a.) NMOS
HSPICE CODE: .OP RESULT
Figure 3. Ids-Vds characteristic curve of an NMOS with W/L=0.5u/0.18u.
This graph shows how increasing the gate-to-source voltage increases the drain
current. As the gate voltage is increased, there will be greater channel inversion in the
substrate of a NMOS allowing more current to flow through.
Vgs
=0.595V
Vgs
=0.58V
Vgs
=0.56V
Vgs
=0.54V
Figure 4. Ids-Vds characteristic curve of an NMOS with W/L=0.5u/0.185u.
Same in NMOS, more current will flow as the magnitude of the gate-to-source
voltage is increased Noted that the Vgs applied must be negative, that is, the way it is
“wired” must be opposite with respect to that of an NMOS so that the p-substrate will be
repelled away from the gate to allow channel inversion.
Vgs
= -0.65V
Vgs
= -0.70V
Vgs
= -0.75V
Vgs
= -0.82V
Step 3:
Follow Step 2, change the channel length. Simulate the Ids-Vgs characteristic curve.
HSPICE CODE: .OP RESULT
a.) NMOS
Figure 5. An NMOS Ids-Vds characteristic curve with W=0.5u.
The drain current is inversely proportional with the length of the channel since
longer channel creates more resistance. As shown in the graph, the longer the channel
length, the less the current flows and so there is less saturation current also.
l=0.18u
l=0.20u
l =0.25u
l=0.30u
Figure 6. A PMOS Ids-Vds characteristic curve with W=0.5u.
Changing the channel length in NMOS also applies to PMOS. Longer channel
lessens the saturation current in the device while shorter channels allows more current
to flow. At higher drain current flow, more gate-to-source voltage is needed to achieve
saturation.
l= 0.258u
l= 0.22u
l= 0.20u
l= 0.18u
Step 4:
Set |Vgs| to a value smaller than |Vt| to operate the MOS in subthreshold region.
Simulate the Ids-Vgs characteristic curve.
Figure 7: Ids-Vgs characteristic curve of an NMOS operated in subthreshold region.
(Noted: y-axis is in log scale).
HSPICE CODE:
a.) NMOS
In the subthreshold region, the gate-to-source voltage is less than the effective
voltage. The current of the graph is in logarithmic scale to show the exponential
relationship between drain current and Vgs in this region of operation.
Figure 8: Ids-Vgs characteristic curve of a PMOS operated in subthreshold region.
(Noted: y-axis is in log scale).
b.) PMOS
HSPICE CODE:
We can see from this graph that at subthreshold region, the drain currents at
different gate-to-source voltages differ exponentially. We can observe that as currents
increased, the drain-to-source voltage also increased.
Questions:
1. If we increase W/L of the device in Step 1, what changes will occur to the curve?
- As the W/L of the device increased, the curve will have a bigger slope
either in NMOS or PMOS. Since resistance is inversely proportional to W/L, so
as the channel width increased and decreased the channel length, resistance will
also decrease. Thus, there will be more current flowing through the channel of
the MOSFET.
2. When the dimensions Wn/Ln equal Wp/Lp, does |Idsp|/Idsn equal µp/µn?
- Yes. Using the equation of ID at the saturation region (or in any other
region).
;;
since,
so,
3. What relationship between the channel length and the slope of Ids – Vds
Characteristic Curve of NMOS and PMOS?
- When the channel length is increased, the slope of the characteristic curve
will decrease. So, when the channel length is shortened, more current can flow
due to less resistance and the graph will become steeper.
4. When the MOSFET operates in subthreshold region, what is the relationship
between Vgs and the slope of the Ids – Vgs Characteristic Curve? What device,
either PMOS or NMOS, has the larger slope? Why?
- The drain current depends exponentially on the gate-source voltage in
sub-threshold region. NMOS has a larger slope because it has larger current
than PMOS.
CONCLUSION:
As we observe in the characteristic curve of NMOS and PMOS, there is no
current flow when the gate-to-source voltage is less than the threshold voltage. But
when we increased the Vgs such that its magnitude is more than the threshold voltage,
the current will linearly increase as Vgs is increased. If we compare the current that flows
in NMOS AND PMOS, the direction of the current flow in a PMOS is opposite in an
NMOS with respect to the drain and source.
There are some factors that can affect the drain current, such that, as we
increased the gate-to-source voltage, the drain current also increases. Aside from the
gate-to-source voltage, one factor that can increase the amount of current at increased
Vgs is the channel length where the drain current is inversely proportional with the length
of the channel. And in the subthreshold region, when the gate-to-source voltage is
smaller than the Vth, there is still current flowing from drain to source.