DLC Coating on Food Packaging Film Using PIII-D Technique

Chiang Mai University

IWPDA2009, 2-3 July, Singapore

DLC Coating on Food Packaging FilmUsing PIII-D Technique

D. BOONYAWANPBPF, Dept of Physics&Mat.Sci., Fac of Science, Chiang Mai University, Thailand

*ThEP Center, CHE, 328 Si Ayutthaya Rd., Bangkok 10400, Thailand



Where are us?



What is PIII-D?



• Higher ion energy (>1 keV)

• Low power (pulsed mode)

• Conducting to non-c materials used

• Selective species

PIII-D benefits



DLC- benefits

• Flexible, Reusable & Biocompatible

• Reduced friction & wear

• Reduced gas permeability

(good gas barrier)

• Well adhere to polymer

Diamond-like Carbon ?



• PET & PVDC: 60 mm

• Ar sputtering prior deposition: 5 min

• C2H2 Deposit with – 3 kV pulse 20 mS

@200Hz

• Process time: 5, 10, 15 min

Experiment



• Oxygen Transmission Rate (OTR)

• Color/transparency

• Atomic Force Microscope

• Raman spectroscopy

Characterization



Result : OTR



Result: Color

Processing Times L a b ∆E

PVDC

0 (uncoated) 99.93 -0.01 0.02 0.00

5 91.15 0.30 6.02 10.64

10 90.35 0.36 13.14 16.25

15 85.90 1.21 18.11 22.93

PET

0 (uncoated) 100.00 -0.01 0.00 0.00

5 93.56 0.19 6.05 8.84

10 92.46 0.42 12.17 14.32

15 85.36 0.63 18.02 23.23



PET 5/10/15 min



Result: Transparency



Result: Thickness I

PVDC 15 minPVDC 5 min



Result: Thickness II



Result: Raman PET



Result: Raman PVDC



Conclusions

• DLC coated PET & PVDC using planar PIII-D technique

• Growth rate ~ 10 -15 nm/min

• OTR reduced by 23% for PVDC and 21% for PET

• Films Transparency reached saturation same as OTR results

• Compare with CVD, lower in film growth rate and OTR but better in unwanted compositions



Thank you



800 1000 1200 1400 1600 1800 2000

-100

0

100

200

300

400

500

Data: Data1_B

Model: Gauss

Equation: y=y0 + (A/(w*sqrt(PI/2)))*exp(-2*((x-xc)/w)^2)

Weighting:

y No weighting

Chi^2/DoF = 84.52922

R^2 = 0.99601

y0 0 ? 0

xc1 1389.13982 ? 1.02402

w1 325.46658 ? 1.13869

A1 115660.53285 ? 625.0784

xc2 1557.52464 ? 0.25229

w2 129.63881 ? 0.80726

A2 45263.81962 ? 536.92968

G- Peak

D- Peak



Force applied :Start

Aligning:16 weeks

1 m.



Plasma deposition system



Cathodic vacuum arc plasma source

Dual filtered cathodic arc plasma,



Plasma Enhanced ALD system



The picture to showed IR-heater, temperature variable from a few ten to

390°c at 200 VAC. and substrate holder area 11×11 cm2.



(a) Bottom view

(b) Side view

The picture to showed beam profile of Ar with pressure 3.4×10-1 torr and the microwave plasma 75 watt.

(a) Bottom view

(b) Side view



Analysis Techniques :

PIXE, RBS, RBS Channeling, Ion Luminescence

1.7 MV Tandetron accelerator

PIXE IL

e-gun

Sample holder

RBSRBS/Channeling

Analysis Chamber

DLC Coating on Food Packaging Film Using PIII-D Technique

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