collaboration ENOVIA VPLM V5.20 delivers high-performance ...

IBM Asia Pacific Software AnnouncementAP10-0025, dated February 16, 2010

IBM Asia Pacific Software AnnouncementAP10-0025

IBM is a registered trademark of International Business Machines Corporation 1

ENOVIA VPLM V5.20 delivers high-performance designcollaborationTable of contents

1 Overview 25 Technical information 2 Key prerequisites 47 Ordering information 2 Planned availability date 52 Terms and conditions 2 Description 57 Prices 4 Product positioning 57 AP distribution 7 Program number

At a glance

ENOVIA VPLM V5.20 offers the following benefits:

• Improves concurrent engineering processes through a more flexible collaborationmechanism.

• Strengthens configuration and change management with better reporting toolsand productivity enhancements.

• Enhances collaboration with the extended enterprise and supply chain throughbetter replication and reconciliation automation, flexibility, and securitycapabilities.

• Further improves overall applications' usability and ergonomics to enable users tomaximize their productivity when using VPLM solutions such as VPM Navigator.

• Improves performance of operations such as where used, as well as search, open,and save of CATIA design data. This promotes overall faster response time andbetter scalability when using the file introspection capabilities.

Overview

ENOVIA V5.20 VPLM provides companies with enhanced concurrent engineeringmechanisms, extended configuration and change management processes, and moreflexible and seamless supply chain collaboration tools while improving performanceand overall system usability, ergonomics, and productivity. Highlights include:

• Concurrent engineering processes are enhanced through a more flexible lock/unlock mechanism. This allows multiple users to work on the same assembly,especially to reuse and move design components, while other users can continuetheir work on other parts.

• Configuration and change management are strengthened with better reportingtools and improved usage productivity. Configuration and change managementreports now indicate which objects, product configuration, and instances areaffected. This enables users to make better, more knowledgeable decisions basedon the potential impact of design changes. Improvements such as the ability tocopy-paste effectivities directly in the modification and configuration editors, aswell as to lock affected objects in the Action Editor, reduce the number of clicksrequired by users, thereby improving their productivity.

• Collaboration with the extended enterprise and supply chain is enhancedthrough better replication and reconciliation automation, flexibility, and securitycapabilities. On the replication side, a wider integration with people andorganization settings allows users to securely control the transfer of ownershipof data to partners. Synchronization utilities can now generate structurederror logs using the XML format, enabling customers to efficiently automate



error analysis. On the reconciliation side, users can precisely select the designcomponents to be merged from suppliers and OEMs, adding critical flexibility tothe process. Assembly structures can be exchanged using specific rules that applyon some instance operations, such as creation and modification, but not others.Deletion, for example, is especially relevant when working with different productconfigurations. Batch utility supports a mode that allows password encryptionfor optimized exchange security. Version 5.20 also streamlines relational designpractices by automating the reconciliation of assembly structures even whencontextual parts reside outside of their context.

• Overall application usability and ergonomics have been further improved, enablingusers to maximize their productivity when using VPLM solutions. Examples includethe ability for VPM Navigator users to apply color codes on the product structuretree based on customer-established attributes for quick identification; refresh theproduct structure tree with one click in any node while maintaining the currentexpanded tree level; further leverage customized search query for more searchcontrol; provide better integration and ergonomics of product views, and so on.Version 5.20 also provides improved filter management, which enables explicitselection of item instances or subassemblies, a combination of and/or operations,and control of multi-domain attributes, resulting in faster and more relevantresults. In addition, the ability to easily capture and retrieve the most recentCATIA design sessions as well as insert child instances significantly improvesusers' productivity and efficiency.

• Performances are improved when doing operations such as where used, as wellas search, open, and save of CATIA design data, providing overall faster responsetime. Capacity is also improved as administrators can turn off the file introspectionutility according to customized rules and specific attributes. This reduces thegeneration of unnecessary data into the database.

ENOVIA V5.20 VPLM drives innovation and helps companies get the most out of theirproduct development programs. ENOVIA V5.20 VPLM enhancements in concurrentengineering, configuration, and change management; OEMs-suppliers exchanges;and overall system usability and performance bring the entire enterprise closertogether during the product development process and into the world of life-like 3D.

Key prerequisites

ENOVIA VPLM runs on selected system levels of:

• Microsoft® Windows®

• AIX®

• Sun Solaris

ENOVIA VPLM requires a properly sized database that uses either DB2® or Oracle.

Planned availability date

February 19, 2010, except in Japan, which is March 5, 2010

Description

ENOVIA 3d com

• New ENOVIA 3d com VPM Session Builder (V3S) allows customers to graphicallybuild a CATIA (V4 or V5) working session from ENOVIA VPM V4.

• ENOVIA 3d com single sign on (SSO) login is insensitive to uppercase andlowercase, increasing productivity and collaboration.



MultiCAD

• New formats supported: Unigraphics NX4 / NX5; ProE WF4; IDI NX5 (MS13); IDINX6; DXF AutoCAD 2007.

• New functionalities: DXF 3DFaces; support on Windows 64-bit for SW2008;Assemblage SolidEdge ".asm".

• Support Microsoft Windows Vista 32/64b. Support for the following file versionshas been added: SolidWorks 2007/2008 and SolidEdge V20.

ENOVIA DMU

• DT1 supports cross-highlight for tolerance schema applied to a group of features(cgr, visu mode, and 3DXML).

• Kinematics (KIN) improvements include new APIs to compute and refreshvisualization and reset command value, as well as a new dress-up user interface.

• Offline rendering (RT1) introduces a new round corner (PHS), and real-timerendering includes settings for knowledge update.

• Human ergonomics simulation (HBR) introduces new reach envelopes and includesmanikins to accommodate German population by default.

• Digital Product Rights Manager 1 (RM1) can now protect CATAnalysis andCATProcess files and introduces a new user interface for better usability.

ENOVIA V5 VPM

See the Additional information section for information about the following enhancedproducts:

• ENOVIA - VPM Navigator (VPN)

• ENOVIA - VPM Configured Product Design (CGP)

• ENOVIA - VPM Supply Chain Engineering Exchange (WPE)

• ENOVIA - EBOM Detailing & Configuration (PAS)

• ENOVIA - Engineering Hub (EPI)

• ENOVIA - Multi-Tier Enterprise Architecture (T3A)

• ENOVIA - Document Management (DMT)

• ENOVIA - Engineering Change Management (ECM)

• ENOVIA - System & Data Administration (SAN)

ENOVIA Collaborative Enterprise Sourcing (CES)

ENOVIA CES combines engineering and sourcing functions into one unified desktopenvironment, enabling collaboration early on and throughout the product lifecycle.With CES, engineers have the tools, knowledge, and capabilities to Design forSupply. The required tools are readily available from the desktop within the IBM®Product Lifecycle Management (PLM) environment. Engineers can optimize designsfor part reuse, obsolescence, hazardous materials content, rank and preference, orany other supply consideration. At the same time, sourcing specialists can Supplyfor Design and proactively engage as active participants early in the developmentprocess.

ENOVIA VPM V4

• CATIA Session Builder: This feature, an add-on to ENOVIA Multi-PDM - CDM/VPM Plug in, increases user productivity by providing an interactive way to start aCATIA (V4 or V5) working session while in a VPM environment. This allows usersto preview selected CATIA data before importing it to a VPM session.

Note: This feature is for VPM V4 only.

• FBDI V4 model / CGR: This feature, dedicated for CATIA V5, enables greaterefficiency by allowing users to import a V4 model or CGR into VPM.



• Update CV5 product at import time: When importing CATIA data into VPM, thisfeature improves data management by giving users the option to update the datain a CATIA V5 session at import time.

Accessibility by people with disabilities

Owing to the graphics-intensive nature of its engineering design applications, thisproduct has been granted a deviation.

Product positioning

ENOVIA VPLM addresses the management and exploitation of IP accumulatedduring the complete product development process, from product specification anddefinition through manufacturing process and resource definition and simulation.The development of all products is based on observed industry best practicessuch as widespread use of 3D, interference management, relational design, earlymanufacturing involvement, and target-based development.

The best practices are based on Dassault Systemes' V5 architecture and makeextensive use of rich product, process, and resource (PPR) information.

There are four product lines available.

ENOVIA V5 VPM

• Offers manufacturing organizations a comprehensive, streamlined approach tomanaging the creation and maturation of the virtual product definition duringengineering development of new and innovative products.

• Manages the complexity of product definition from the highest level of producthierarchy (product lines) to the lowest level of feature usage (geometricsubstitutes and alternatives) throughout the product's entire lifecycle -- fromconcept to obsolescence. Exposing the full breadth of granularity in the virtualproduct model enables users to evaluate changes and improve decision makingby leveraging real-time knowledge of the cause and effect relationships needed tooptimize product quality, cost, and performance.

• Delivers a unique set of integrated applications spanning engineering andmanufacturing that supports the lifecycle management of the PPR definition inENOVIA V5 VPM and DELMIA V5. The integrated development and validation ofthe virtual product and virtual factory helps manufacturing companies reducedesign rework and costs, while significantly improving time-to-market.

• Engages, via globally dispersed teams using ENOVIA V5 VPM, in intensemultidiscipline engineering collaboration 24/7, producing more designs in less timethat are optimized for both manufacturability and market acceptance. ENOVIAV5 VPM provides a single source of up-to-date, work-in-process data, allowingdevelopment teams everywhere to extend the power of CATIA V5 knowledgewareand relational design with the assembly or entire portfolio in mind. This eliminatespart interference and increasing commonality across product lines and variants.

• Integrates data and processes across PLM using ENOVIA V5 VPM when detaileddesign information is ready for release into the extended enterprise. Flexibleprocess-modeling middleware is used to connect to existing enterprise resourceplanning (ERP), legacy, and other critical enterprise systems. With so many uniqueand changing business requirements in global manufacturing organizations, theconsolidated view ENOVIA V5 VPM provides is crucial to increasing business agilityand optimizing production schedules and development resources.

• Allows development organizations to load the design and validate all possibleproduct configurations from the top down, using ENOVIA V5 VPM, to increasethe likelihood of market success. If necessary, the development organizationswill withhold critical go-to-market decisions until late in the lifecycle to deliverprecisely the product the market expects and the margins the company requires.

ENOVIA V5 VPM extends the virtual product definition across the entire enterpriseand into the value chain using a single collaborative environment accessible via



the Web. This ensures the business of innovative product development is alwaysopen and ready to capture the market share it deserves.

ENOVIA DMU

• Enables digital product simulation, analysis, and validation. It improves productquality and accelerating decision making by providing real-time insight into real-world product performance.

• Enables real-time visualization and review of the 3D product as it evolves,streamlining collaborative review and decision making. It allows design teamsto digitally build the product mock-up and its environment, and then analyzeit to gain early insight into key factors determining design quality, productperformance, and ultimate market success.

• Includes testing and analysis tools that let engineers reduce and even eliminatethe time and cost invested in build it and break it scenarios requiring multiplephysical prototypes. More importantly, it allows them to spend more timeinnovating.

• Facilitates digital mock-up validation and simulation from detailed design tomaintenance because of the seamless integration within Dassault SystemesProduct Lifecycle Management (PLM) solutions and because it is designedfor multiCAD environments. It delivers extensive support for engineeringprocesses such as interference detection and analysis, hybrid mock-up review,packaging and product synthesis, human ergonomics analysis, engineering datavisualization, and technical publication.

• Helps to increase benefits and savings exponentially when used in conjunctionwith ENOVIA V5 VPM. It enables global organizations -- from marketing to designto maintenance -- to collaborate in real time using configurable 3D mock-ups, andto rapidly validate product variants during testing of design alternatives.

With ENOVIA DMU, development teams can transform product information intobusiness intelligence, improving decision making and product quality across theenterprise value chain.

ENOVIA 3d com

• Delivers an ideal solution by leveraging both Web and 3D technologies

• Gives anyone in a company a single point of access, federating all extendedenterprise information to facilitate decision making, collaboration, and access tothe product lifecycle pipeline

• Targets an extended enterprise-wide deployment level, including those who arenonCAx users

Alongside CATIA and DELMIA, ENOVIA VPLM delivers an integrated and open PLMvision that is the cornerstone of product development for innovators throughoutthe world. ENOVIA customers are comprised of global leaders across an array ofindustry segments, including aerospace, automotive, heavy machinery, industrialproducts, shipbuilding, petroleum, plant, and chemical.

ENOVIA CES

ENOVIA Collaborative Enterprise Sourcing (CES) manages sourcing informationin a 3D context that combines key component management functions in a singleunified desktop for both the engineering and sourcing communities. This applicationconnects all relevant enterprise users to key sourcing data needed during theproduct development process to choose, introduce, and manage components,suppliers, and manufacturers. With ENOVIA CES as the integrated sourcing systemfor the enterprise, organizations can build better products at reduced cost, managecompliance and regulatory issues, leverage offshore sourcing capabilities, andrespond quickly and effectively to competitive challenges, which provides a uniquecompetitive advantage.

ENOVIA CES targets three specific user profiles.



3D engineers

Engineers and designers fully leverage CES from within ENOVIA VPM Navigator andgain access to the enterprise catalog and component reuse capabilities directly fromwithin an advanced CATIA user interface that provides sourcing properties for partsin 3D context. Some of the key functions leveraged by this set of users include:

• Search and browse

• Find similar parts / compare parts

• Instantiate components from the enterprise catalog

Web users

Non-CAD users access CES using an advanced Web user interface. This profiletargets users who need to access and navigate the enterprise catalog, whichcontains parts with engineering and sourcing data, suppliers, and manufacturers.These non-CAD users typically use CES to:

• Search and browse

• Generate sourcing reports

• View sourcing data

Component managers, administrators, and sourcing controllers

This group of users requires additional functions that provide administration for theCES platform to manage the sourcing information in the enterprise catalog:

• Updates to the classification structure and reclassification of items

• Cross-reference management administration -- Mapping items to sites/suppliers/manufacturers

• Defining part relationships -- similar parts, spares, upgrade/downgrade

• Approval process management

Product positioning - Globalization

ENOVIA VPLM program integrated information (PII) and softcopy productinformation are available in:

• French

• German

• Japanese

• Chinese1

• Korean1

1

ENOVIA 3d com, ENOVIA VPM Lifecycle Applications, and ENOVIA V5 VPM only.

Note: ENOVIA CES program integrated information (PII) and softcopy productinformation are translated into French only.

PII is stored in compressed unicode format (UTF-8) for worldwide exchange withoutthe loss or misinterpretation of characters.

Hardware and software support services

SmoothStart/Installation Services

IBM SmoothStartTM and Installation Services are not provided.



Reference information

For information about CATIA V5.20, refer to Software Announcement AP10-0013,dated February 16, 2010.

For information about DELMIA V5.20, refer to Software Announcement AP10-0024,dated February 16, 2010.

For information about ENOVIA SmarTeam V5.20, refer to Software AnnouncementAP10-0011, dated February 16, 2010.

For information about CAA RADE V5.20, refer to Software AnnouncementAP10-0016, dated February 16, 2010.

Availability of national languages

ENOVIA 3d com, ENOVIA VPM Lifecycle Applications, and ENOVIA V5 VPM areavailable in:

• French

• German

• Japanese

• Chinese

• Korean

ENOVIA DMU is available in:

• French

• German

• Japanese

ENOVIA CES is available in:

• French

Product integrated information (PII) is included on the code CDs for each operatingsystem at general availability. National language version (NLV) publications willbe available after general availability of this release. Information regarding theavailability status of the NLV publications is available at

http://www.ibm.com/support/docview.wss?rs=886&context=SW860&uid=swg2701 7233

Program number

Programnumber Program name

5628-CS5 ENOVIA CES SPO5628-DMU ENOVIA DMU Navigator SPO5628-EL5 ENOVIA V5 VPM SPO5628-EP5 ENOVIA DMU Navigator SPO5628-LCA ENOVIA V5 VPM SPO5671-ADR ENOVIA - Security Administrator5671-AED ENOVIA - Action Editor5671-ANR DMU Engineering Analysis Review 25671-CPR DMU Composites Review 25671-CUR ENOVIA - Casual User5671-C3V ENOVIA - 3d com CAD Viewing

http://www.ibm.com/common/ssi/cgi-bin/ssialias?infotype=an&subtype=ca&appname=gpateam&supplier=872&letternum=ENUSAP10-0013




http://www.ibm.com/support/docview.wss?rs=886&context=SW860&uid=swg27017233

http://www.ibm.com/support/docview.wss?rs=886&context=SW860&uid=swg27017233



5671-DAL MultiCAx - AD Plug-In5671-DEL MultiCAx - SE Plug-In5671-DER ENOVIA - VPM Product Design Cfg5671-DGL MultiCAx - IGES Plug-In5671-DH2 ENOVIA - DMU Human Simulation 25671-DMO DMU Optimizer 25671-DMT ENOVIA - Document Management5671-DM1 ENOVIA - DMU Review 15671-DM2 ENOVIA - DMU Review 25671-DM3 ENOVIA - DMU Immersive Review 35671-DPS ENOVIA - DMU Digital Product Synthesis 25671-DSL MultiCAx - SolidWorks Plug-In5671-DTL MultiCAx - STEP Plug-In5671-DV1 ENOVIA - DMU Viewer 15671-ECM ENOVIA - Engineering Change Management5671-ECV ENOVIA - VPM Electrical Cable Route Management5671-EPD ENOVIA - Enterprise Process Definition Web5671-FAR DMU Fastening Review 25671-FIT DMU Fitting Simulator 25671-HAA Human Activity Analysis 25671-HAC Human Preferred Angles Catalog 25671-HBR Human Builder 25671-HME Human Measurements Editor 25671-HPA Human Posture Analysis 25671-HPC Human Posture Catalog 25671-HTC Human Anthropometry Catalog 25671-IDL MultiCAx - ID Plug-In5671-KIN DMU Kinematics Simulator 25671-LCM ENOVIA - VPM Lifecycle Management Web Cfg5671-LCP ENOVIA - Enterprise Process Management Web Cfg5671-LCR ENOVIA - VPM Lifecycle Review Cfg5671-MGR ENOVIA - Professional User5671-NL4 ENOVIA LCA NLV Softcopy Collection Kit5671-NL5 ENOVIA DMU NLV Softcopy Collection Kit5671-NL8 ENOVIA CES NLV Softcopy Collection Kit5671-N3G ENOVIA - 3d com Navigator5671-OGL ENOVIA - MultiPDM - OP Plug-In5671-PAS ENOVIA - EBOM Detailing and Configuration5671-PDC ENOVIA - Product Definition5671-PDL MultiCAx - PD Plug-In5671-PGT ENOVIA - Program Management5671-PGW ENOVIA - PPR Hub Gateway5671-PHS Photo Studio 25671-PIM ENOVIA - Product Interference Management5671-PSO Photo Studio Optimizer 25671-PVM ENOVIA - Product Variant Management5671-RTR Real Time Rendering 25671-RVR ENOVIA - System & Data Administrator Cfg5671-SCE ENOVIA - Supply Chain Exchange5671-SPT ENOVIA - Structures Penetration Management5671-STH ENOVIA - PPR Hub STEP Part 21 Adapter5671-SUA ENOVIA - System & Users Administration Web Cfg5671-S3P ENOVIA - 3d com Space Analysis5671-UDL MultiCAx - UD Plug-In5671-VAR ENOVIA - Vault Administrator Cfg5671-VDM ENOVIA - VPM DMU Review Cfg5671-VER ENOVIA - VPM Engineer Cfg5671-VOA Vehicle Occupant Accommodation 25671-V3C ENOVIA - 3d com VPM Web Client5671-V3S ENOVIA - 3d com VPM Session Builder5671-WDF ENOVIA - Workflow Definition5671-WPE ENOVIA - VPM Supply Chain Engineering Exchange5672-SCA ENOVIA - CES Enterprise Catalog Administration Product5672-SCI ENOVIA - CES Component Introduction Management Product5672-SEC ENOVIA - CES Engineering Catalog Navigator Product5672-SCG ENOVIA - CES Enterprise Catalog Management Product5672-SLC ENOVIA - CES Enterprise Catalog Navigator Product5672-SLR ENOVIA - CES Component Reuse Product5672-SRU ENOVIA - CES Engineering Component Reuse Product5672-SSG ENOVIA - CES Component Sourcing Product5673-ANR DMU Engineering Analysis Review 25673-CPR DMU Composites Review 25673-DMO DMU Optimizer 25673-DT1 DMU Dimensioning & Tolerancing Review 1



5673-ECV ENOVIA - VPM Electrical Cable Route Management5673-FAR DMU Fastening Review 25673-FIT DMU Fitting Simulator 25673-HAA Human Activity Analysis 25673-HAC Human Preferred Angles Catalog 25673-HBR Human Builder 25673-HME Human Measurements Editor 25673-HPA Human Posture Analysis 25673-HPC Human Posture Catalog 25673-HTC Human Anthropometry Catalog 25673-KIN DMU Kinematics Simulator 25673-PHS Photo Studio 25673-PH1 Photo Studio 15673-PR1 ENOVIA - DMU Digital Plant & Ship Review 15673-PSO Photo Studio Optimizer 25673-RM1 Digital Product Rights Manager 15673-RTR Real Time Rendering 25673-SP1 DMU Space Analysis 15673-VOA Vehicle Occupant Accommodation 25673-V3S ENOVIA - 3d com VPM Session Builder5673-WPE ENOVIA - VPM Supply Chain Engineering Exchange5691-ADR ENOVIA - Security Administrator5691-AED ENOVIA - Action Editor5691-ANR DMU Engineering Analysis Review 25691-CPR DMU Composites Review 25691-CUR ENOVIA - Casual User5691-C3V ENOVIA - 3d com CAD Viewing5691-DAL MultiCAx - AD Plug-In5691-DEL MultiCAx - SE Plug-In5691-DER ENOVIA - VPM Product Design Cfg5691-DGL MultiCAx - IGES Plug-In5691-DH2 ENOVIA - DMU Human Simulation 25691-DMO DMU Optimizer 25691-DMT ENOVIA - Document Management5691-DM1 ENOVIA - DMU Review 15691-DM2 ENOVIA - DMU Review 25691-DM3 ENOVIA - DMU Immersive Review 35691-DPS ENOVIA - DMU Digital Product Synthesis 25691-DSL MultiCAx - SolidWorks Plug-In5691-DTL MultiCAx - STEP Plug-In5691-DV1 ENOVIA - DMU Viewer 15691-ECM ENOVIA - Engineering Change Management5691-ECV ENOVIA - VPM Electrical Cable Route Management5691-EPD ENOVIA - Enterprise Process Definition Web5691-FAR DMU Fastening Review 25691-FIT DMU Fitting Simulator 25691-HAA Human Activity Analysis 25691-HAC Human Preferred Angles Catalog 25691-HBR Human Builder 25691-HME Human Measurements Editor 25691-HPA Human Posture Analysis 25691-HPC Human Posture Catalog 25691-HTC Human Anthropometry Catalog 25691-IDL MultiCAx - ID Plug-In5691-KIN DMU Kinematics Simulator 25691-LCM ENOVIA - VPM Lifecycle Management Web Cfg5691-LCP ENOVIA - Enterprise Process Management Web Cfg5691-LCR ENOVIA - VPM Lifecycle Review Cfg5691-MGR ENOVIA - Professional User5691-N3G ENOVIA - 3d com Navigator5691-OGL ENOVIA - MultiPDM - OP Plug-In5691-PAS ENOVIA - EBOM Detailing and Configuration5691-PDC ENOVIA - Product Definition5691-PDL MultiCAx - PD Plug-In5691-PGT ENOVIA - Program Management5691-PGW ENOVIA - PPR Hub Gateway5691-PHS Photo Studio 25691-PIM ENOVIA - Product Interference Management5691-PSO Photo Studio Optimizer 25691-PVM ENOVIA - Product Variant Management5691-RTR Real Time Rendering 25691-RVR ENOVIA - System & Data Administrator Cfg5691-SCE ENOVIA - Supply Chain Exchange5691-SPT ENOVIA - Structures Penetration Management



5691-STH ENOVIA - PPR Hub STEP Part 21 Adapter5691-SUA ENOVIA - System & Users Administration Web Cfg5691-S3P ENOVIA - 3d com Space Analysis5691-UDL MultiCAx - UD Plug-In5691-VAR ENOVIA - Vault Administrator Cfg5691-VDM ENOVIA - VPM DMU Review Cfg5691-VER ENOVIA - VPM Engineer Cfg5691-VOA Vehicle Occupant Accommodation 25691-V3C ENOVIA - 3d com VPM Web Client5691-V3S ENOVIA - 3d com VPM Session Builder5691-WDF ENOVIA - Workflow Definition5691-WPE ENOVIA - VPM Supply Chain Engineering Exchange5693-ANR DMU Engineering Analysis Review 25693-CPR DMU Composites Review 25693-DMO DMU Optimizer 25693-DT1 DMU Dimensioning & Tolerancing Review 15693-ECV ENOVIA - VPM Electrical Cable Route Management5693-FAR DMU Fastening Review 25693-FIT DMU Fitting Simulator 25693-HAA Human Activity Analysis 25693-HAC Human Preferred Angles Catalog 25693-HBR Human Builder 25693-HME Human Measurements Editor 25693-HPA Human Posture Analysis 25693-HPC Human Posture Catalog 25693-HTC Human Anthropometry Catalog 25693-KIN DMU Kinematics Simulator 25693-PHS Photo Studio 25693-PH1 Photo Studio 15693-PR1 ENOVIA - DMU Digital Plant & Ship Review 15693-PSO Photo Studio Optimizer 25693-RM1 Digital Product Rights Manager 15693-RTR Real Time Rendering 25693-SP1 DMU Space Analysis 15693-VOA Vehicle Occupant Accommodation 25693-V3S ENOVIA - 3d com VPM Session Builder5693-WPE ENOVIA - VPM Supply Chain Engineering Exchange

Additional information

This section describes the new products and enhancements to previously announcedproducts delivered in this release. Refer to the ENOVIA VPLM product matricessection for details. For full descriptions of new and previously announced ENOVIAproducts, visit

http://www.ibm.com/solutions/plm

To get to the ENOVIA page, select ENOVIA Products. On the ENOVIA page, select anENOVIA product set.

New product

ENOVIA - 3d com VPM Session Builder (V3S)

ENOVIA - 3d com VPM Session Builder allows customers to build a CATIA (V4 or V5)working session from data stored in ENOVIA VPM V4. The session builder displaysthe CGR representation of the product structure navigator opened in VPM V4 andallows users to select document/model (such as volume query or manual selection)to be loaded in a CATIA session. Users can send representations from VPM V4 toENOVIA - 3d com VPM Session Builder through the product structure navigator.Users can then reduce the scope of representations that will be loaded in CATIA byselecting specified representations interactively.

Enhanced ENOVIA VPLM products

Refer to the Software requirements section for additional support highlights forV5.20.




ENOVIA - 3d com Navigator (PNR)

ENOVIA 3d com login using insensitive case with single sign-on (SSO): Whenusers log in to ENOVIA 3d com at the point of SSO, the sign-on entry can be eitheruppercase or lowercase characters. This ensures that users are always logged intothe correct workbook at sign-on. Previously, with sensitive case sign on, users couldbe directed to different workbooks, depending on which character case was usedfor sign on. This enhancement allows for better management of users' bookmarks,improving efficiency and productivity.

ENOVIA - MultiPDM - CDM/VPM Plug-in (VPL)

• Select Under: Allows users to select all subordinate objects in the productstructure by applying simple, intermediate, or advanced PSN query functions

• Expand up to query criteria: Allows users to specify the level of product structureby specifying a query criteria

• PSN Bookmark: Improves efficiency by allowing users to insert a bookmark toreturn quickly and easily to a designated product structure when navigatingthrough the PSN

• PSN Rollback: Enhances product design capability by allowing a global undo torevert to a previous design iteration

• VPM NT Settings Panel: Enables more efficient management of UNIX-basedsettings by allowing changes to NT outside of the VPM UNIX® environment

• Reset Matrix To Identity In Info Link: Enhances process efficiency by allowingusers to reset the matrix of product instances to the identity matrix

• Load product geometry into an optional 3D viewer: Allows users to view selectedproduct structures before loading product data into CATIA

ENOVIA - VPM Navigator (VPN)

For V5.20, ENOVIA - VPM Navigator includes new features that increase productivityand enhance ergonomics.

Search capability is improved with:

• VPM search prevaluation and clear capability: Helper buttons offer shortcuts tofacilitate searching.

• Set VPM Navigator search attribute values: This improves preferencemanagement, allowing users to keep object type selection when changingdomains, as well as improving search response time with the use of the EQUALpredicate.

• Enhanced selection in VPM NavExecute Capture command: Users can lock andkeep predefined search criteria for repeated search requests.

• User customized search query: This allows users more search control in definingsearch commands in the Search Panel.

• Sort object types in the search panel: Users can manage the order of object typesin VPM Search panel.

• 2D-3D preview of search request in results window.

Changes to the VPM Navigator Tree improve user productivity with:

• Customization of VPM Navigator product structure tree based on customer-established attributes

• Improved user interface on the VPM Navigator Layout to allow users to chooseeither a vertical or horizontal layout

Open command has been improved with the ability to:

• Disable Out of Context Open in VPM Navigator: A simplified default open panelallows users to manage a VPM session through Tools/Options.

• Open with expanded children from database, with or without current filter: Thismakes it easier and quicker to open in-context product root class (PRC).



Navigation with VPM Navigator has been enhanced with the ability to:

• Refresh PRC without collapse: This allows users to refresh VPM Navigator withone click in any node of the VPM Navigator Tree while maintaining the currentexpanded tree level.

Improved filter management increases productivity and efficiency by allowing usersto:

• Filter definitions based on:

– Selected item instance in the VPM Navigator window and the search resultwindow

– Selected sub-assembly

• Apply filtering with a combination of AND/OR conditions

• Move filtering attributes nodes in Filter dialog

• Improve filtering results by managing multi-domain attributes

Capture management has been improved by allowing users to:

• Apply capture attributes to differentiate between Query and Expand filtering

• Keep and retrieve selections from the Execute Capture command

• Capture PVS creation from authoring sessions, enabling users to:

– Capture the loaded data

– Retrieve data with standard capture tools

– Use the most recently used capture link to reload data with a single click

• Use Impacts On and Impacted By when capturing objects

Document attributes can be better managed by:

• Displaying document attributes with a Refresh Document command, allowingusers to choose attribute settings and use the same policy as other windows

Insert from ENOVIA command improvements enhance ease-of-use by:

• Allowing users to insert based on document revision or part version query, and toreview a whole inserted subassembly

• Modifying user preferences to keep last query and layout

• Modifying Search Condition window appearance for user interface consistency

Existing functionality has been improved by:

• Automating the synchronization of child instances to eliminate conflicts andimprove concurrent engineering and enhance collaboration

• Improving performance of the Where Used command with faster searching andresponse time to enable better user productivity

• Updating the Transfer Ownership panel to make it more intuitive and user-friendlyto facilitate user efficiency

• Allowing users to delete multiple, extraneous product view results (PVR) to makethe PVR display less populated with content that is no longer required

• Activating client/server traces to allow users to collect messages related toproblems between the client and the server to assist with problem resolution

User productivity and efficiency is also improved with the following enhancements:

• Child action support: Users can be more effective by applying child actionfunctions from within ENOVIA VPM Navigator, allowing them to link existingactions and view a display of linked actions in a new tab in the Properties dialoguewindow.

• Effectivity panel: Users can enter effectivity specifications in a windows form. Italso enables more effective management of effectivity by providing specification



aliases when users assign effectivity from different windows (such as theSpecification Chooser, Assign Effectivity, and Define Configuration Filter windows).

• Action modification editor: Users can better manage modifications in ENOVIA VPMNavigator and attach modifications to an action. Modifications can be created intwo ways:

– Create a modification using Actions: Gives the user a historical record ofchanges.

– Create a stand-alone modification, which is not under an action: Provideseffectivity to design changes in the prototype stage.

• CheckIn CheckOut VPM Navigator contextual menu: Provides documentmanagement commands (Check In, Check Out, Copy, and Cancel Checkout) inENOVIA VPM Navigator contextual menu. Commands are more intuitively groupedto make it easier to find them.

– Document Check-Out: Provides a file chooser (using Browse button) for the userto define where the file retrieved from the vault should be placed. This is onlyavailable if the document is checked in and locked by the current user. The stateof the document becomes Checked-out. This command is available from thesearch results.

– Document Check-In: Provides a file chooser (using Browse button) for the userto define what file to check in and to choose the vault into which it is beingchecked. This command is only allowed if the document is currently checked outand locked by/owned by the current user. It is available from the search results.

– Document Cancel Check-Out: Changes the state of the document to checked inwithout modifying the file currently in the vault. This command is available onlyif the document is a) currently checked out and b) locked by/owned the currentuser. This command is available from the search results.

– Document Copy Out: Provides a file chooser for the user to define where the fileretrieved from the vault should be placed. This does not change the state of thedocument to Checked-out. The document does not have to be locked to performthis function. This command will be available from the search results and VPMNavigator tree.

• Encrypted Password for Reconciliator Batches: Enables a batch utility to support amode that allows password encryption for reconciliator in utility inputs to hide thereal password, thus enhancing data security.

ENOVIA - VPM Configured Product Design (CGP)

• Ensuring consistency in shared data with an alternate Save for Structure ExplodedData function, which allows users to maintain an exploded view in a PVR.

• Improving user productivity and efficiency with a CAA API that allows users tocreate and synchronize a PVR while in the CATIA authoring environment.

• Facilitating user productivity by changing the default for the VPMNav Promote/Demote command to prompt users to select either an instance or a referencewhen promoting or demoting an item.

• Enhancing user productivity by allowing users to create a product viewspecification (PVS) from the authoring session. Users can now capture andbookmark an object in a CATIA session.

• Allowing users to delete multiple, extraneous PVRs to make the PVR display lesspopulated with content that is no longer required.

• Increasing user effectiveness and efficiency by displaying attributes (using astandard attribute mask) in the Refresh Document panel.

• Improving PVR usability by enabling PVR creation from the three ENOVIA VPMNavigator windows (VPM Navigator, VPM Search, and VPM Impact Graph). Supportis also enhanced for multi-selection to minimize the number of search operationsthat need to be done.

• Improving PVR batch update to support scan and update by enabling batchupdating of all PVRs and significant subsets of PVRs without having to run severalindependent processes. This results in faster processing, fostering improvedproductivity and efficiency.

• Improving productivity and efficiency by allowing users to invoke the mostrecently used capture link to reload data, such as newly inserted child instanceswith one single click.



• Enhancing efficiency by showing only modified documents in VPMNav save panel,giving users increased control and improving productivity by allowing them toopen the PRC from a PVR.

• Increasing user control and efficiency through use of Retain if an instance needsto be synchronized at PVR synchronization function. A new command, PVRSynchronization, allows users to declare one of the following for each assemblynode:

– PVR Synchronization is applied to assembly nodes.

– PVR Synchronization is not applied to assembly nodes.

– PVR Synchronization is permanently inhibited on assembly nodes.

• Fostering enhanced collaboration by synchronizing all instances at versioning.

ENOVIA - VPM Supply Chain Engineering Exchange (WPE)

• Extending the capability of engineering package exchange for data stored as anexposed structure with the following rule enhancements:

– Merging designs done by suppliers and OEMs on assembly structures using thereload from VPDM rule on an exposed structure

– Exchanging incomplete assembly structures using Overwrite and New Version byDelta rules that apply to instance creation and modification without propagatedinstance deletion in the ENOVIA V5 repository

• Enabling batch utility to support a mode that allows password encryption forreconciliator in utility inputs to hide the real password

• Improving reconciliator usability by:

– Assisting end users in rule selection by integrating check on object maturitystatus, lock status, and site ownership (in context of ENOVIA multi-sitereplication)

– Refining the policies concerning lock acquisition and release

– Extending query to integrate multi-domain search

• Automating integration of reconciliation of assembly structures with contextualparts outside their context

• Automating authorized reconciliation in batch without forcing a product structureupdate

ENOVIA - EBOM Detailing and Configuration (PAS)

• Save CATIA components as ENOVIA assembly: Ensuring customer productivitywith improved CATIA interoperability by implementing a new command, MakeComponent Reusable, which makes parts created in CATIA available in otherproduct root classes.

• Reverse configuration filter: Enhancing the configuration filter to allow usersto display an opposite view. Users can identify instances that are not valid forthe specific filter criteria and extend the effectivity of the part to make it a validinstance.

• Impact graph improvements: Improving user productivity by allowing users tomulti-select documents and instances for Impact On and Impact By informationand to see the dependencies between items. Users can select all items under theproduct root node with the following options in a contextual menu:

– Select all documents

– Select all instances

– Select all instances in context

• Search for instances linked to modification: Improving search instance capabilitiesby adding modification and operation criteria to allow for faster retrieval ofinstances impacted by a particular modification.

• Copy/paste effectivities in modification editor: Increasing user productivity byenabling cut-and-paste clipboard functionality in the modification editor so thatusers do not have to manually enter modifications.



• Copy/paste effectivities in configuration tab: Increasing user productivity byenabling cut-and-paste clipboard functionality in the configuration tab so thatusers do not have to manually enter modifications.

• Detach Modification: Increasing user productivity by enabling an undo capabilityfor more efficient correction of errors.

• Multi-selection in a sheet editor: Increasing productivity by allowing more thanone cell from the sheet editor to be copied and pasted. Previously, the sheet editoronly supported cell-to-cell copying and pasting, which could be time-consumingwhen editing a large number of objects.

• Multi-user assembly reuse lock: Fostering more effective collaboration andimproved concurrent engineering by providing a means for defining an appropriatelock policy to be applied when an instance is added, replaced, or deleted under anassembly parent. The various options are:

– Lock on parent instance and references are required.

– Lock on parent reference is required except on parent instance.

– Lock is not required for either the parent reference or instance.

• Multi-user assembly reuse move: Fostering more effective collaboration andimproved concurrent engineering by removing constraints when moving an iteminstance. Because any of its descendants are locked with this enhancement, anitem instance being moved still has to be locked by the current user, but locks byothers on descendant item instances will not prevent the move.

• Synchronize child instance: Enabling improved collaboration and concurrentengineering by ensuring that when synchronizing a selected instance, all childinstances are synchronized automatically with just one interaction.

• Copy/Paste from Microsoft Excel to attribute filter: Improving user productivity byallowing users to create multiple rows of search criteria by using the copy functionfrom a spreadsheet or text editor and pasting the cells in a search panel withmultiple rows.

• Transfer ownership check UE: Facilitating collaboration by allowing thecustomization of Check User Exit when transferring ownership of an object. Thisensures that all business rules are met before and after the transfer of ownership.

• Transfer ownership for PC/PRC: Improving collaboration by allowing the transfer ofownership for product classes and product root classes.

• Performance improvement for ENOVIA DB access: Improving user productivityand performance by allowing replacement of ENOVIA database data identified asLONG VARCHAR with the data type VARCHAR in all ENOVIA metadata (for DB2only).

• Updated DB Migration script for V5.19 and V5.20: Ensuring productivity forcustomers with an existing V5.19 database by providing migration scripts (with allspecific migration tools) to allow migration of data to a V5.20 database.

ENOVIA - Engineering Hub (EPI)

• Affirmative partial save messages: Allows users to identify successfully savedobjects in the event of a partial save operation when saving data in ENOVIA VPLMV5. Along with the messages for the unsaved objects, affirmative messages aredisplayed for the part version, document revision, and part instance for eachsaved object.

• Alternate save in exploded mode: Enhances the Save in ENOVIA VPM command,enabling the user to select a subset of data loaded in CATIA that will be saved asnew objects in the ENOVIA VPM database. This allows users to:

– Manage links between new objects and other loaded data.

– Rename new objects on the fly.

– Instantiate newly created data in an existing exploded mode product structureto allow its use independently.

• API save: Automates the EV5 save process, enabling users to automate theprocess to save a CATIA session.

• Display customized attributes in Refresh Panel: Allows users to view certaindocument revision (DR) attributes and their values in the refresh documentwindow. The attributes information retrieved from the mask (in the refreshdocument window) are the same as the document search result information,



ensuring that the attributes displayed in the refresh window will be synchronizedwith the search result window attributes.

• Performance GetExposed: Reduces server time when assembly structures areloaded in CATIA in design mode from ENOVIA.

• Performance optimize open with vault-cache: Improves performance by reducingthe interactions between vault-cache and vault-server when documents are loadedfrom the ENOVIA server.

• PVR safe save: Offers protection by forbidding some operations (such asinstantiation of a PVR inside of any kind of CATProducts, which is not recognizedas a PVR). Operations that will be forbidden in CATIA V5 in an ENOVIA V5 VPMcontext are:

– Creation of instances of a PVR CATProduct inside an exposed assembly structure

– Creation of instances of a PVR CATProduct inside a work package that is notdeclared as a PVR

– Creation of instances of ENOVIA V5 part not considered as a work packageinside a PVR

• Save performance enhancement: Reduces the time for saving large volumes ofCATIA data in ENOVIA, resulting in improved user productivity.

• Session Refresh command - rules for BB under exploded objects: Allows modifieddocuments to be refreshed based on rules that determine whether a documentcan be refreshed. This allows a refresh operation to be performed on a partdocument that is pointed to by a modified exploded product document.

• Synchronize timestamp from PV to ref during load/save process: Ensures thatthe time stamps for unsynchronized reference objects and document content aresynchronized so that modifications of data attributes are available on subsequentopenings after a save process.

• UE on Cancel Save Operation: Provides a new API to enable a new user-exit thatis triggered after the user clicks on Cancel button in Save in ENOVIA commandpanel. This allows users to tailor the Save in ENOVIA command with business logicthat fits their own needs.

• Update CATIA objects after versioning: Although transparent to an end user, thisenhancement ensures that after a versioning during a save operation, objects inCATIA session are consistent with the product model data in ENOVIA.

• Warning when loading unsynchronized children: Enables the user to identify ifthe imported instances are in unsynchronized state while loading the productstructure from VPMNav to CATIA V5. A message panel notifies the user in theearly stages of the open process that certain instances to be loaded in the sessionare out of synch. The user can continue loading the unsynchronized item instancesor stop the import process.

ENOVIA - Multi-Tier Enterprise Architecture (T3A)

• Rules-based generation of derived formats: Allows users to turn off the FileIntrospection utility for files based on both customer-defined rules and theattribute values of object types. This provides more control when generatingderived formats, allowing users (when necessary) to avoid the generation oflarge amounts of derived formats in the database. The result is more efficientmanagement of shared IP content optimizing performance, capacity, andscalability.

ENOVIA - Document Management (DMT)

• Rules-based generation of derived formats: Allows users to turn off the FileIntrospection utility for files based on both the customer-defined rules and theattribute values of object types. This provides more control when generatingderived formats, allowing users (when necessary) to avoid the generation of largeamounts of derived formats in the database. The result is improved managementof shared IP content for better control over collaboration.

• Documentation link behavior: Allows the display of the latest approved documentrevision for a document link. This function is controlled by the end user (inthe Portal settings) and provides access to the latest approved documentationrevision rather than requiring the user to search through many iterations of theinformation.



• Attribute selection and ordering for reporting: Allows users to generate an Excelreport with user-defined attributes for ENOVIA objects such as product, partreference, part instance, and document. Users can select the list and the order ofthe attributes needed in the report.

• Where used reporting: Allows users to generate an Excel report with whereused relationships of ENOVIA objects, such as product, part reference, partinstance, and document. Users can send objects to the reporting editor to displayinformation in a selected Excel report in an appropriate desired layout.

• Iteration management enhancement: Allows users to delete document versionsthat are no longer needed, according to rules defined in IterationRules.xml. Thisresults in increased user efficiency.

• Increase attributes length for instance identification and document extension:Allows instance names (V_instance_ID attribute for VPMItemInstance) to beincreased from 40 to 80 characters and allows document extensions (V_extensionattribute of VPMTPDocumentVersion) from 16 to 32 characters.

ENOVIA - Engineering Change Management (ECM)

• Affected objects report: Collaboration between users is increased by allowingusers to subscribe to events related to affected objects of actions so that they canbe notified when affected objects are added or removed.

• Lock object in action editor: Usability and productivity are improved by allowingusers to lock and unlock objects from within Action Editor, minimizing interactionsby avoiding the need for users to open a dedicated editor for those tasks.

• Affected objects enhancement: Efficiency and ergonomics are enhanced withimproved readability of affected objects by grouping item instances by productroot class. Users can see a grouping of instances linked to the same product underthe respective product node.

ENOVIA - System & Data Administration (SAN)

• To ease administration tasks relative to multi-site replication, ENOVIA System& Data Administration offers a new utility dedicated to replication management.This new utility makes it possible to create an XML script to list, remove, create,activate, or inactivate replication packages. In previous releases, this task wasaccomplished using several interactive applications such as ManagePackages,Product Editor, VPM Navigator, or LCA Navigator. This enhancement reduces theadministration cost of ENOVIA Multi-site replication, particularly in situationswhere the exchange involves more than two sites.

• Synchronization utilities can now generate an error log as a structured XMLfile, enabling customers to automate error log analysis to reduce the amount ofmanual operation for multi-site replication.

• ENOVIA System & Data Administration also includes a new privilege to refine theP&O control on ENOVIA multi-site replication tasks. Users can control the creationof a replication package that specifically allows the transfer of data ownership to apartner.

Enhanced common products

DMU Kinematics Simulator 2 (KIN)

• Improved dress-up user interface

• New APIs to compute, refresh visualization, and reset command value

Human Builder 2 (HBR)

• New Reach Envelopes available

• German population provided as default

Real Time Rendering 1 (RT1)

• Settings for knowledge update: Settings are added to allow user to updatematerial knowledge parameter after a PowerCopy.



Photo Studio 2 (PHS)

• Round corner: Ability to render round corners and round edges on a part that hasno fillet, dramatically decreasing the number of triangles created for the samerendering quality

Digital Product Rights Manager 1 (RM1)

• Edit properties: This gives content providers increased control over access andredistribution of product data with a new digital rights management (DRM)protection tab to edit and display DRM protection settings.

• RMS DRM UI Basic: When publishing a DRM license, a new basic DRM userinterface enables content providers with a credential approach or view to define alist of users and groups for read, copy, and save rights.

• RMS DRM UI Complex: An advanced DRM user interface gives content providers auser approach or view to define lists of users and groups with all their associatedcredentials. This allows content providers to assign a greater number of rights tousers and groups.

• RMS identity management supports ADFS and offline access: RM1 is in fullcompliance with Active Directory Federation Services (ADFS), a standards-basedWeb SSO service. This provides a higher level of security from an authenticationpoint of view, and also allows multiple documents from different IP servers tobe handled at the same time. Additionally, a full offline capability allows RM1 tobe effective even when users are disconnected from the network (with all thenecessary data securely stored in local cache files).

• CATAnalysis: DRM data encryption support is now available for CATAnalysisdocuments within CATIA, providing increased product data security.

• CATProcess: DRM data encryption support is now available for CATProcessdocuments within CATIA, providing increased product data security.

ENOVIA V5 VPM configurations

Note: Product licensing matrix is available on product CDs.

• ENOVIA - Casual User Configuration (CUR)

This configuration targets users whose main interest is to view data stored inENOVIA VPLM. Some of the activities that the users can perform:

– Viewing any data (part, document, or engineering change) and navigating anystructure or relationship associated with it

– Applying filters and saved contexts for quick retrieval of product structures

– Staying updated on the events of interest, such as product releases

ENOVIA 3d com C3V may be added to this configuration for CAD modelvisualization using 2D/3D viewers.

• ENOVIA - Professional User Configuration (MGR)

This configuration targets managers, team leaders, and reviewers whose activitiesinclude:

– Managing, distributing, and reviewing work assignments

– Taking advantage of document management facilities such as templatemanagement

– Visualizing digital mock-up in CATIA and ENOVIA DMU

Shareable products from ENOVIA VPM Product Editor Products and domains canbe purchased separately. For instance, EBOM Detailing and Configuration (PAS)may be added for product structures editing.

• ENOVIA - VPM Engineer Configuration (VER)

This configuration targets engineers and design managers whose activitiesinclude:



– Managing engineering bills of material (EBOMs)

– Associating CAD models to parts and product structures, taking advantage offull ENOVIA VPLM - CATIA interoperability

– Performing digital mock-up reviews, including product interference analysis

– Exchanging data with suppliers using SMARTBOM briefcase

– Sending data to DELMIA IPD

– Managing work assignments related to the above activities

Shareable products from ENOVIA VPM Product Editor Products can be purchasedseparately. For example:

– ENOVIA - Product Variant Management (PVM) for product lines and optionsplanning

– ENOVIA - Program Management (PGT) for managing programs, milestones, andobject lifecycle definition

• ENOVIA - Security Administrator Configuration (ADR)

This configuration targets corporate or departmental administrators whose mainactivities consist of setting up:

– Databases and P&O profiles

– Access privileges and default environments for departments and end users

• ENOVIA - System and Data Administrator Configuration (RVR)

This configuration targets chief system and data administrators who are in chargeof ENOVIA VPLM implementation. In addition to the products dedicated for systemsetup, most products from ENOVIA V5 VPM and ENOVIA VPM Lifecycle productsare included for user support and customization purposes.

• ENOVIA - VPM Product Design Configuration (DER)

VPM design engineers design parts, assemblies, and products. These usersnormally design directly in CATIA V5 and save the design work in ENOVIAVPLM (Engineering Hub) afterwards. These users include design managers withadditional responsibilities such as managing work assignments (actions) relatedto the design activities, performing clash analysis, and exchanging data withsuppliers.

This is the same group of users targeted by the VPM Engineer configuration. Thedifference is that all applications provided within this configuration are availablethrough the CATIA V5 user interface. Designers can access both design andlifecycle management functions from within CATIA V5 to facilitate easy adoption ofENOVIA V5 VPM functions among CATIA users.

This configuration targets design engineers and design managers whose activitiesinclude:

– Creating and managing EBOMs structure

– Designing CAD models and associating them to parts and products

– Performing advanced part design

– Performing relational design and changing impact analysis

– Performing digital mock-up reviews, including product interference analysis

– Sending data to DELMIA IPD

– Managing work assignments (actions) related to the above activities

• ENOVIA - Vault Administrator Configuration (VAR)

This configuration targets systems administrators whose main activities include:

– Creating and managing the vaults.

– Performing data backup and restore.

– Managing remote and local vaults.



– Storing ENOVIA VPLM using the V5 architecture/vaulting system. This product ispurchased stand-alone on top of ENOVIA VPLM configurations.

• ENOVIA - VPM DMU Review Configuration (VDM)

This configuration targets users who participate in product design reviews, butdo not require the full product design capabilities delivered by the ENOVIA - VPMProduct Design Configuration.

• ENOVIA - VPM LifeCycle Review Configuration (LCR)

This entry configuration is used for the Web-based, light client ENOVIA VPMLifecycle products. It targets enterprise users whose main activities include:

– Searching and navigating on product and project information stored in anENOVIA VPLM database

– Performing visualization and annotation on 2D/3D documents using 2D/3Dviewers

– Collaborating with other enterprise users (ENOVIA - Instant Collaboration canbe added on top of this configuration.)

– Performing limited authoring function such as transferring ownership andchanging lifecycle status (promote, demote)

• ENOVIA - VPM LifeCycle Management Web Configuration (LCM)

This configuration offers project and change management capabilities. Allproducts included in this configuration operate within the Web-based, light-clientenvironment of ENOVIA VPM Lifecycle products.

This configuration targets managers and supervisors whose main activitiesinclude:

– Search and navigate on product and project information stored in an ENOVIAVPLM database

– Perform visualization and annotation on 2D/3D documents using 2D/3D viewers

– Manage changes to product data and documents

– Use workflow to manage changes and automate corporate processes

– Use Microsoft Project to manage projects in ENOVIA VPM Lifecycle products

– Collaborate with other enterprise users (ENOVIA - Instant Collaboration can beadded on top of this configuration.)

• ENOVIA - Enterprise Process Management Web Configuration (LCP)

This configuration targets people who are involved in enterprise processadministration, management, and participation.

There are two types of workflow users who use this configuration:

– Process administrators

– Process users (initiators and participants)

• ENOVIA - System & Users Administration Web Configuration (SUA)

This configuration targets corporate or departmental administrators whose mainactivities include:

– Performing ENOVIA VPLM system installation

– Setting up database

– Setting up people and organization profiles

ENOVIA VPLM product matrices

There are three matrices for the ENOVIA VPLM product sets: ENOVIA 3d com,ENOVIA DMU, and ENOVIA V5 VPM.

ENOVIA 3d com product matrix

I = Product included in a configuration



A = Product available as an add-on to a configurationS = Product available as a shareable product on top of a configurationN = Not applicable

Configurations C3V N3G(1) V3C ENOVIA 3d com Classic Products PNR ENOVIA - 3d com Navigator I I IPVR ENOVIA - 3d com Viewer I I NP3B ENOVIA - 3d com Publish N I NS3P ENOVIA - 3d com Space Analysis S S NV3S ENOVIA - 3d com VPM Session N A/S A/S BuilderN35 ENOVIA - 3d com Navigator V5 I I N Plug-InOGL ENOVIA - MultiPDM - OP Plug-In N S NPML ENOVIA - MultiPDM - PM Plug-In N I NVPL ENOVIA - MultiPDM - CDM/VPM N I I Plug-In

Configurations C3V N3G(2) V3C ENOVIA MultiCAx Products DCL ENOVIA - MultiCAx - CATIA I I N Plug-InDDL ENOVIA - MultiCAx - DELMIA N I N Plug-InDSL MultiCAx - SolidWorks Plug-In S S NDEL MultiCAx - SE Plug-In S S NDAL MultiCAx - AD Plug-In S S NDTL MultiCAx - Step Plug-In S S NPDL MultiCAx - PD Plug-In S S NIDL MultiCAx - ID Plug-In S S NUDL MultiCAx - UD Plug-In S S N

2

N3G configuration allows user to query, navigate, and access product information stored inENOVIA VPLM ENOVIAVPM or ENOVIA V5 VPM.

ENOVIA DMU product matrix

I = Product included in a configurationA = Product available as an add-on to a configurationS = Product available as a shareable product on top of a configurationN = Not applicable

Configurations DV1 DM1 DM2 DPS DH2 DM3 ENOVIA DMU DU1 ENOVIA - DMU Navigator 1 I I N N N NSP1 DMU Space Analysis 1 A A N N N NPR1 ENOVIA - DMU Digital Plant A A A A A A & Ship Review 1DT1 DMU Dimensioning A I I I A A & Tolerancing Review 1RT1 Real Time Rendering 1 N I I I I NPH1 Photo Studio 1 A A A A A ARM1 Digital Product Rights A A A A A A Manager 1DMU ENOVIA - DMU Navigator 2 N N I I I NSPA DMU Space Analysis 2 N N I I I IFIT DMU Fitting Simulator 2 N N A/S I A/S A/SKIN DMU Kinematics Simulator 2 N N A/S I A/S A/SDMO DMU Optimizer 2 N N A/S A/S A/S A/S



CPR DMU Composites Review 2 N N A/S A/S A/S A/SPHS Photo Studio 2 N N A/S A/S A/S A/SPSO Photo Studio Optimizer 2 N N A/S A/S A/S A/SRTR Real Time Rendering 2 N N A/S A/S A/S I DU3 ENOVIA - DMU Navigator 3 N N N N N IANR DMU Engineering Analysis N N A/S A/S A/S A/S Review 2HBR Human Builder 2 N N A/S A/S I A/SHME Human Measurements Editor 2 N N A/S A/S I A/SHPA Human Posture Analysis 2 N N A/S A/S I A/SHAA Human Activity Analysis 2 N N A/S A/S I A/SHTC Human Anthropometry N N A/S A/S A/S A/S Catalog 2HPC Human Posture Catalog 2 N N A/S A/S A/S A/SHAC Human Preferred Angles N N A/S A/S A/S A/S Catalog 2VOA Vehicle Occupant N N A/S A/S A/S A/S Accommodation 2FAR DMU Fastening Review 2 N N A/S A/S A/S A/S

Configurations DV1 DM1 DM2 DPS DH2 DM3 ENOVIA MultiCAx Products DCL ENOVIA - MultiCAx - CATIA I I I I I I Plug-InDDL ENOVIA - MultiCAx - DELMIA I I I I I I Plug-InDSL MultiCAx - SolidWorks S S S S S S Plug-InDEL MultiCAx - SE Plug-In S S S S S SDAL MultiCAx - AD Plug-In S S S S S SDTL MultiCAx - Step Plug-In S S S S S SPDL MultiCAx - PD Plug-In S S S S S SIDL MultiCAx - ID Plug-In S S S S S SUDL MultiCAx - UD Plug-In S S S S S SDGL MultiCAx - IGES Plug-In S S S S S S

ENOVIA V5 VPM product matrix

I = Product included in a configurationA = Product available as an add-on to a configurationS = Product available as a shareable product on top of a configurationN = Not applicable

Configurations DER VDM ENOVIA VPM Navigator Products VPN ENOVIA - VPM Navigator I IRLD ENOVIA - VPM Relational Design I NCGP ENOVIA - VPM Configured Product Design I IWPE ENOVIA - VPM Supply Chain Engineering A/S A/S ExchangeECV ENOVIA - VPM Electrical Cable Route A/S A/S Management

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM Product Editor Products ADK ENOVIA - Applications I I I I I N N N N N DesktopAED ENOVIA - Action Editor N I I I N N N N N NPDC ENOVIA - Product N N I I N N N N N N



DefinitionPAS ENOVIA - EBOM Detailing N N I I N N N N N N & ConfigurationPIM ENOVIA - Product N N I I N N N N N N Interference ManagementSPT ENOVIA - Structure N N S S N N N N N N Penetration ManagementEPI ENOVIA - Engineering Hub I I I I I N N N N NT3A ENOVIA - Multi-Tier I I I I I N N N N N Enterprise ArchitectureDMT ENOVIA - Document S I N I S N N N N N ManagementPGT ENOVIA - Program S S N I S N N N N N ManagementECM ENOVIA - Engineering S S N I S N N N N N Change ManagementSCE ENOVIA - Supply Chain S S N S S N N N N N ExchangePVM ENOVIA - Product Variant S S N I S N N N N N Management

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM Lifecycle Products LCN ENOVIA - VPM Lifecycle N N N I N N I I I I Navigator WebW3V ENOVIA - Web Viewer N N N I N N I I I NDCM ENOVIA - Document N N N I N N N I I N Management WebCGM ENOVIA - Engineering N N N I N N N I N N Change Management WebWDF ENOVIA - LCA Workflow N N N I N N N S N N DefinitionWFM ENOVIA - Workflow N N N I N N N I N N Management WebEPM ENOVIA - Enterprise N N N I N N N I I N Process Management WebEPD ENOVIA - Enterprise N N N I N N S S S S Process Definition Web

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM Enterprise GatewayProducts PGW ENOVIA - PPR Hub S S N S S N N N N N GatewaySTH ENOVIA - PPR Hub Step S S N S S N N N N N Part 21 Adapter

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM AdministrationProducts SYA ENOVIA - Multisite System N N N I N N N N N I Administration WebPOC ENOVIA - People, N N N I N N N N N I Organization & Security WebSAN ENOVIA - System & Data N N N I I N N N N N AdministrationPOS ENOVIA - People, N N N I I N N N N N Organization & SecurityVSA ENOVIA - Vault Server N N N N N I N N N N Administration



ENOVIA VPLM APIs

The ENOVIA VPLM - CAA API products are delivered with Component ApplicationArchitecture Rapid Application Development Environment (CAA RADE; 5691-CDC).This release offers one new API, VPM Supply Chain Engineering Exchange.

For information about the CAA RADE products, visit


ENOVIA V5 VPM customization

Customize ENOVIA V5 VPM using the CAA RADE V5 tools (for example, 5691-CDC,5691-PAD), which can be ordered separately.

Reorganize the user interface without CAA RADE by using masks. These can bemanipulated either by the system administrator or the end user. The user can:

• Remove attributes or move them within user panels

• Insert user-defined attributes into panels

• Reorganize or create tabs

• Rename tabs and attributes

• Relate masks to document types

• Support multiple environments where objects may have different attributes

Without CAA RADE V5, the user can:

• Customize lifecycle definitions for different object types

• Define object maturity values

• Create filters to selectively present objects to users

• Set default (for example, a default repository path) or acceptable values forattributes

User exits can be developed for a limited set of functions, including object promotionand version and revision control.

Using CAA RADE V5, the user can:

• Create new objects and object attributes

• Use ENOVIA V5 VPM APIs to develop code that adds, extends, or replaces objectbehavior

• Define additional lifecycle operators

• Extend the inter-/intra-enterprise import/export platform

• Implement legacy federation through ENOVIA 3d com / ENOVIA DMU

ENOVIA VPLM Data Customization

Using CAA-RADE Data Model Customizer (part of the CAA RADE V5 development toolthat can be ordered separately), the users can add their own data on the followingmodelers:

• ENOVIA V5 VPM Product Structure

• ENOVIA Document

• ENOVIA ECO and ECR

Additional details

For descriptions of other ENOVIA VPLM products, visit




http://www.ibm.com/solutions/plm/guide

Technical information

Specified operating environment

Hardware requirements

The support of the following operating systems ended with V5.19:

• IBM AIX V5.3

• Hewlett-Packard HP-UX

V5.20 is the last release supported on the following operating systems:

• Sun Solaris

• IBM AIX Workstations

ENOVIA DMU required components and features

• Disk drive: An internal or external disk drive is required (minimum recommendedsize 2 GB) to store program executables (installation of all ENOVIA DMU productsrequires about 700 MB on Windows, 900 MB on AIX, and 800 MB on Solaris),program data, usage environment, and paging space.

• Memory: 256 MB of RAM is the minimum recommended amount of memory forall applications. 512 MB of RAM is recommended for ENOVIA - DMU Navigatorapplications on large assemblies. Requirements may be greater when a largeamount of data is used.

• Internal/external drives: A CD-ROM drive is required for program installationand access to the online documentation, which can be downloaded optionally todisk.

• Graphics display: A graphics color display, compatible with selected platform-specific graphics adapter. The minimum recommended size for usability reasons is17 inches. The minimum resolution required for Windows workstations is 1024 x768 and 1280 x 1024 on UNIX workstations. When selecting a graphics adapter,hardware texturing capability is strongly recommended when using ENOVIA - DMUproducts that use texture mapping, in which case the amount of RAM has to beadequate for the number and complexity of textures to be used.

• Keyboard: A specific keyboard compatible with selected installation locale may berequired for national language support.

• Pointing device: Three-button mouse; on Windows workstations, a two-buttonmouse can be used (the third button is emulated with a keyboard sequence).The three-button mouse is recommended for usability reasons. IntelliMouse (twobuttons plus wheel) is an alternative to the three-button mouse on Windowsworkstations, with the wheel acting as the middle button and allowing additionalmanipulations such as panning and scrolling.

• Optional components and features: A SpaceBall or a SpaceMouse can beused in addition to the standard mouse to perform graphic manipulations (zoom,pan, rotate). The required drivers are delivered with these devices. DMU FittingSimulator 2 (FIT) supports the SpaceBall. The SpaceBall and the SpaceMouse aresupported on both Platform 1 (P1) and Platform 2 (P2). While in P1, they enablegraphic manipulations (in examine or fly modes).

In P2, they also make it possible to move objects (part trajectories in ENOVIADMU fitting, for example).

The robustness of the overall solution is dependent on the robustness of theoperating system and the hardware environment used. For a list of Windows NT®and UNIX hardware configurations certified by Dassault Systemes for runningENOVIA DMU products, visit


http://www.ibm.com/solutions/plm/guide




Although ENOVIA DMU products can run on other configurations or other graphicsadapters, incidents specific to these configurations or adapters are not accepted forsupport.

ENOVIA DMU platform-specific hardware requirements

Windows XP

• System unit:Intel® Pentium® III-, Pentium 4-, or Xeon-based workstationsrunning Microsoft Windows XP Professional Edition SP2, Microsoft Windows VistaEnterprise, or Microsoft Windows Vista Business.

• Graphics adapter: A graphics adapter with 3D OpenGL accelerator is required.

Note: Graphics performance (panning, zooming, rotating model) depends on theselected adapter. Recommended minimum:

• 24-bit, true color, double buffered visual

• 24-bit Z-buffer

• Stencil buffer

• Minimum supported resolution 1024 x 768; 1280 x 1024 recommended forusability

• Network adapter: An active LAN adapter (Ethernet or token ring, installed andconfigured) is required for licensing purposes.

Supported configurations of Windows XP

For a current list of hardware configurations, certified by Dassault Systemes forrunning ENOVIA DMU products, visit


Windows x86-64 64-bit environment

• Disk drive: 2.5 GB.

• Memory: 4 GB is the minimum recommended amount of memory.

• System unit:Intel EM64T, AMD Opteron 64-bit based workstations runningWindows XP Professional x64 Edition.

• Graphics adapter: A graphics adapter with a 3D OpenGL accelerator is required.

Note: Graphics performance on local transformations (panning, zooming, androtating model) will depend on the selected graphics adapter. The graphicsadapter should have the following capabilities:

– 24-bit, true color, double buffered visual

– 24-bit Z-buffer

– Stencil buffer

– Minimum supported resolution 1024 x 768; 1280 x 1024 recommended forusability reasons

• Network adapter: An active LAN adapter (Ethernet or token ring, installed andconfigured) is required for license key purposes.

• Supported configurations on Windows XP Professional x64 Edition: For anupdated list of hardware configurations, certified at Dassault Systemes for runningENOVIA 3d com V5 products, visit


AIX

• System unit: Any IBM Server or workstation that is POWER® processor-basedtechnology that is supported by AIX V6.1

• Graphics adapter -- One of the following graphics adapters:





– GXT4000P

– GXT4500P

– GXT6000P

– GXT6500P

Sun Solaris

• System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Sun Blade 100, SunBlade 150, Sun Blade 1000, Sun Blade 1500, Sun Blade 2000, Sun Blade 2500,or Sun Blade 1500+ (1.5 GHz) workstation based on UltraSPARC processor,supported on Solaris 10, provided that requirements are met.


– Creator3D

– Creator3D Series III

– Elite 3D (U10-440 Mhz only, for U10 workstations)

– Expert3D Lite

– Expert3D

– XVR-500

– XVR-1000

– XVR-1200

– XVR 600

ENOVIA 3d com client hardware requirements

Common requirements

The following requirements are common to all operating systems supported byENOVIA 3d com. System unit and graphics requirements are platform-specific andinclude:

• Disk drive: 100 MB of disk space is required for data dynamically downloadedfrom the ENOVIA 3d com product server.

• Memory: 128 MB of RAM is the minimum recommended amount of real memory;256 MB of RAM is recommended on ENOVIA 3d com clients.

• Graphics display: A graphics color display, compatible with the selectedplatform-specific graphics adapter. The minimum recommended size for usabilityreasons is 17 inches. The minimum resolution required for Windows workstationsis 1024 x 768, and 1280 x 1024 on UNIX workstations.

• LAN adapter: A network adapter is required to connect the server and clients tothe LAN or WAN.


• Pointing device: Two- or three-button mouse.

Platform-specific requirements

Microsoft Windows

• System unit:Intel Pentium III- or Pentium 4-based workstations runningMicrosoft Windows XP Professional Edition SP1 or SP2, Microsoft Windows VistaEnterprise, or Microsoft Windows Vista Business and Enterprise.

• Graphics adapter: A 3D graphics adapter is required.

Note: Memory consumption is about 50 MB after all ENOVIA 3d com applets, theJavaTM Virtual Machine, and the browser itself is loaded.



AIX

• System unit: Any IBM system family supported on AIX V6.1 with systemunits based on POWER4TM, POWER5TM, POWER6TM, or PowerPC® 970 processortechnologies.


– GXT4000P

– GXT4500P

– GXT6000P

– GXT6500P

Sun Solaris

• System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Ultra80, Sun Blade100, Sun Blade 150, Sun Blade 1000, Sun Blade 1500, Sun Blade 1500+ (1.5GHz), Sun Blade 2000, or Sun Blade 2500 workstation based on the UltraSPARCprocessor, supported on Solaris 10 (SPARC) provided that requirements are met.

• Graphics adapter: One of the following graphics adapters:

– Creator3D

– Creator3D Series III

– Elite 3D (U10-440 MHz for Ultra 10 workstations)

– Expert 3D Lite

– Expert 3D

– XVR-500

– XVR-1000

– XVR-1200

– XVR-600

ENOVIA 3d com server hardware requirements

Common requirements (classic ENOVIA 3d com)

The following requirements are common to all operating systems supported byENOVIA 3d com products. System unit and graphic requirements are platform-specific and are detailed in the sections that follow:

• Disk drive: An internal or external disk drive is required to store programexecutables (installation of all ENOVIA 3d com products requires about 800 MBon Windows or Solaris, 1.1 GB on AIX), program data, usage environment, andpaging space. Requirements may be larger when large amounts of data are used.

• Memory: 256 MB of RAM is the minimum recommended amount of memory forall applications. Requirements may be greater when large amounts of data areused.

• Internal/external drives: A CD-ROM drive is required for program and onlinedocumentation installation.

• Display: A graphic color display, compatible with the selected platform-specificgraphics adapter. The minimum recommended size is 17 inches. The minimumresolution required for Windows workstations is 1024 x 768, and 1280 x 1024 onUNIX workstations.

• LAN adapter: A network adapter is required to connect the server and clients tothe LAN or WAN.


• Pointing device: Three-button mouse.



General rules for memory requirements (classic ENOVIA 3d com)

The memory requirement depends on the number of simultaneous ENOVIA 3d comsessions; the users need to dimension the server system accordingly.

The server dimensioning needs to take into account the memory used by the CAD/CAM process on the server.

For CATIA V5 (classic ENOVIA 3d com)

• ENOVIA 3d com consumes 50 MB for the first session plus 10 MB for eachadditional session for an average 1 MB model.

• The RAM requirement formula is the following: 50 MB + n*10 MB+n*m MB, wheren is the number of maximum concurrent sessions and m the average size of theCATIA models.

Note: If several models are selected in one session, only one model remainsloaded at the same time, optimizing the memory consumption. As an example, for10 concurrent users manipulating 10 MB average-size models, the minimum RAMrequirement is 256 MB.

• For better response time, a graphics card can be installed on the server andshared in a sequential mode between the simultaneous sessions to improve 3Drendering. Customers must dimension the graphics card accordingly.


Windows XP (classic ENOVIA 3d com)

• System unit: Any Intel Pentium 4, Intel Xeon® workstation runningMicrosoft Windows 2003 Standard Edition or Windows 2003 Enterprise Edition.

• Graphics adapter: The same as for CATIA V5. For a list of supported graphicsadapters, visit


UNIX (AIX or Solaris) (classic ENOVIA 3d com)

For system unit and graphics adapter requirements, refer to ENOVIA 3d comclient hardware requirements in this section.

Note: In addition to graphics adapters supported on an AIX ENOVIA 3d com client,Virtual Frame Buffer technology offered through AIX operating system is alsosupported on an AIX ENOVIA 3d com server.

ENOVIA V5 VPM client hardware requirements

Common requirements

The following requirements are common to all operating systems supported byENOVIA V5 VPM. System unit and graphic requirements are specific to the platform.

• Disk drive: 250 MB of disk space.

• Memory: Client workstation RAM: Minimum 256 MB recommended.

• Internal/external drives: CD-ROM drive for program and online documentationinstallation.

• Display: A graphic color display, compatible with the selected platform-specificgraphics adapter. The minimum recommended size is 17 inches. The minimumresolution required for Windows workstations is 1024 x 768, and 1280 x 1024 onUNIX workstations.

• Graphics adapter: An OpenGL graphics adapter, compatible with the windowingmanager of the selected operating system (CDE on AIX or Solaris).

• LAN adapter: A network adapter to connect the server and clients to the LAN orWAN.




• Keyboard: Keyboard compatible with selected installation locale may be requiredfor national language support.

• Pointing device: Two- or three-button mouse.


Windows XP

System unit:Intel Pentium III- or Pentium 4-based workstations runningMicrosoft Windows XP SP 1 or SP 2 Professional, Microsoft Windows Vista Enterprise,or Microsoft Windows Vista Business.

AIX

System unit

• Any RS/6000®, based on POWER4 processor family supported on AIX V6.1

• System units based on POWER5 or PowerPC 970 processor families, supported onAIX V6.1

Sun Solaris

System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Ultra80, Sun Blade 100,Sun Blade 150, Sun Blade 1000, Sun Blade 1500, Sun Blade 1500+ (1.5 GHz), SunBlade 2000, or Sun Blade 2500 workstation based on the UltraSPARC processorsupported on Solaris 10 (SPARC).

ENOVIA V5 VPM server hardware requirements

Common requirements

The following requirements are common to all operating systems supported byENOVIA V5 VPM. System unit requirements are specific to the platform.

• Disk drive: Internal or external disk drive to store program executables, programdata, usage environment, and paging space. Installation of all ENOVIA V5 VPMproducts requires approximately 1.0 GB on AIX or Solaris. Requirements may belarger when large amounts of data are used.

• Memory: ENOVIA V5 VPM requires at least 256 MB of real memory for the firstsession, including the operating system, but could use up to 2 GB (or more insome cases) depending on system settings, database parameters, and otherfactors.

If ENOVIA V5 VPM server is installed on the same server as the database, be sureto add the database memory requirement to that needed for ENOVIA V5 VPM.

Additional memory is required for each additional application server session,and 75 MB should be used as a typical-use starting point (with a minimum of 25MB per user session for those only logged-on). More or less additional-sessionmemory may be required, depending on user-specific factors such as the amountof data loaded, the number of different application areas open concurrently, localcustomizations, and so on. Additional sizing rules will be provided after furthercapacity planning evaluations.

• Internal/external drives: CD-ROM drive for program and online documentationinstallation.

• Display: A graphic color display compatible with the selected platform-specificgraphics adapter. The minimum recommended size is 17 inches. The minimumresolution required is 1024 x 768 on Windows workstations and 1280 x 1024 onUNIX workstations.

• Graphics adapter: An OpenGL graphics adapter, compatible with the windowingmanager of the selected operating system (CDE on AIX).

• LAN adapter: Network adapter to connect the server and clients to the LAN orWAN.

• Keyboard: Keyboard compatible with selected installation locale may be requiredfor national language support.



• Pointing device: Three-button mouse.


Windows 2003

System unit:Intel Pentium III- or Pentium 4-based workstations or server runningMicrosoft Windows Server 2003 Standard Edition and Windows Server 2003Enterprise Edition are supported on ENOVIA V5 VPM server side.

AIX

System unit: Any IBM system family supported on AIX V6.1 with system unitsbased on POWER4, POWER5, POWER6, or PowerPC 970 processor technologies.

Sun Solaris

System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Sun Blade 100, SunBlade 150, Sun Blade 1000, Sun Blade 1500, Sun Blade 2000, or Sun Blade 2500workstation based on the UltraSPARC processor, supported on Solaris 10 (SPARC).

Note: ENOVIA VPLM application server and Web-client (ENOVIA VPM LifecycleNavigator) deployment on WebSphere® Application Server are supported on Solaris(WebSphere Application Server V6.0.2 on Solaris 32).

Software requirements

Requirements for interoperability with CATIA products

• CATIA V5 and ENOVIA VPLM must be at the same release, service pack, and hotfix level for proper interoperability.

• CATIA V5 and ENOVIA VPLM ENOVIAVPM interoperability is supported betweenvarious CATIA V5 release and ENOVIA VPLM ENOVIAVPM PTF levels. Refer to themost recent ENOVIA VPLM ENOVIAVPM PTF program directory for the currentprerequisite and recommended interoperability PTFs.

Operating system support exceptions

There are four MultiCAx products that are only supported on Windows XP:

• MultiCAx - SolidWorks Plug-in

• MultiCAx - SE Plug-in (Solid Edge)

• MultiCAx - AD Plug-in (ACIS - DXF3D - Inventor)

• MultiCAx - UD Plug-in (Unigraphix Direct Interface)

ENOVIA DMU common software requirements

Refer to the Program Directory or contact the IBM Support Center for appropriatecorrective service to apply to the following software.

ENOVIA DMU platform-specific software requirements

ENOVIA DMU V5 runs on selected system levels of:

• Microsoft Windows XP

• AIX

• Sun Solaris

Windows XP

Minimum level required: Microsoft Windows XP Professional Edition SP2, or later,with the following components:



• Microsoft Windows XP delivers an implementation of OpenGL libraries. DassaultSystemes will provide recommendations related to driver levels based on testedgraphic adapters at

http://www.3ds.com/support/hardware-certification/overview/• A localized version of the operating system may be required when the selected

installation differs from Latin1.

Additional Windows XP requirements

• MS06-075: Vulnerability in Windows could allow elevation of privilege. Informationis available at

http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx• MSI Installer 3.1: Windows Installer 3.1 v2 (3.1.4000.2435) is available at

http://support.microsoft.com/kb/893803• Windows XP Professional x64 Edition (refer to the following section for description)

ENOVIA DMU V5 64-bit on Windows XP Professional x64 edition

• Minimum level required: Windows XP Professional x64 Edition.

• Microsoft implementation of OpenGL libraries, as delivered with Windows. Forrecommendations related to driver levels based on tested graphic adapters, visit

http://www.3ds.com/support/hardware-certification/overview/

ENOVIA DMU V5 32-bit on Windows XP Professional x64 edition

• Minimum level required: Windows XP Professional x64 Edition



The following set of patches are required when running 32-bit applications on x64environment:

• KB903648: When using macro and VBScript features, Version 5 may crash whenaccessing more than 2 GB of address space. A Microsoft patch is available tocorrect this problem. To see Microsoft Article KB903648, visit

http://support.microsoft.com/default.aspx?scid=kb;en-us;903648• KB911021: Required for applications allowing more than 2 GB of address space.

Contact your Microsoft support representative for any questions regarding thispatch.

AIX

Base support:

• AIX V6.1 (using 64-bit kernel) with the following components:

– OpenGL and GL3.2 Runtime Environment, delivered with the operating system

– Common Desktop Environment (CDE), delivered with the operating system

– XL C/C++ Enterprise Edition V7.0.0 Run-time Environment: XL 7 May 2005 PTFR/T (xlC.aix50.rte at level 7.0.0.6), delivered through APAR IY71976

– XL Fortran Enterprise Edition V9.1.0 for AIX Run-Time: November 2004 XLFortran for AIX V9.1 Runtime PTF

Base support is available in

http://www.ibm.com/software/awdtools/fortran

Additional support

AIX V6.1 (using 64-bit kernel) with the following components:


http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx

http://support.microsoft.com/kb/893803



http://support.microsoft.com/default.aspx?scid=kb;en-us;903648




• OpenGL and GL3.2 Runtime Environment (delivered with the operating system)

• Common Desktop Environment (CDE), delivered with the operating system

• XL C/C++ Enterprise Edition V8.0.0 Run-time Environment: January 2006 IBM C++ Runtime Environment Component for AIX, available at

http://www.ibm.com/support/docview.wss?uid=swg24011532• XL Fortran Enterprise Edition V10.1.0 for AIX Run-Time: Base level available at

http://www-1.ibm.com/support/docview.wss?uid=swg24010669• Support for the use of nodelock license requires:

– IY80993: Workaround Application Dependency on System-ID

– Firmware Version AT061_061, or later

• Nodelock licensing requires the following patches:

– IY82392: 0C9 System Crash with Graphics Adapter.

– Support of GXT4500P requires the following patch to be applied: IY80526:CATIA V4 Hangs on GXT4500P when rotating a model.

WebSphere Application Server V6.1 and WebSphere Portal Server support orIBM IntelliStation® P185 support requires AIX 6.1 with the above recommendations.

Sun Solaris

The minimum indicated level is Sun Solaris 10 H/W 05/03 with the followingcomponents:

• C and C++ runtime environment (delivered with the operating system).

• OpenGL runtime environment (delivered with the operating system).

• Fortran runtime environment (delivered with ENOVIA - DMU Navigator).

• CDE (delivered with the operating system).

• A localized version -- May be required when the selected installation locale differsfrom ISO-1.

• Motif 2.1.

• 119280-06 CDE 1.6: Runtime library patch for Solaris 10 is required.

Notes:

• Additional support for Solaris Runtime on SPARC system is Solaris 10.03/05 (on32-bit only).

• Support of the XVR 600 graphic adapter -- Requires OpenGL runtime environmentat level 1.3.

Access to product information (ENOVIA DMU / ENOVIA 3d com)

Product information and User GALAXY (online product marketing information)are delivered in HTML format. An HTML browser is required to access thisdocumentation. Online documentation may be installed and used only in an officiallysupported operating environment.

In a UNIX environment (AIX, Solaris):

• Mozilla 1.7 for AIX with Java plug-in installed

• Firefox 2.0 for Sun Solaris SPARC available at

http://www.mozilla.com/en-US/firefox/2.0.0.3/releasenotes

In a Windows environment, either

• Microsoft Internet Explorer at a minimum level of 7.0

• Firefox 2.0 with Java plug-in installed

http://www.ibm.com/support/docview.wss?uid=swg24011532

http://www-1.ibm.com/support/docview.wss?uid=swg24010669




Although other HTML browsers might provide access to the online documentation,browsers other than those mentioned above are not eligible for support should therebe problems with them.

In addition to a Java-enabled Web browser, a Java plug-in at level 1.5 (or 5.0) isrequired to search online documentation.

Note: Improvements in HTML searching and printing capabilities eliminate the needto duplicate product information in the Portable Document Format (PDF) format. PDFCDs are therefore no longer included in the ENOVIA VPLM softcopy collection kit.

For Microsoft Windows, Java plug-in Version 5 Update 7 may be downloaded from

http://java.sun.com/products/archive/index.html

For AIX, Java Runtime Environment version Java 1.5.0 SR3 can be downloaded from

http://www-106.ibm.com/developerworks/java/jdk/aix/service.html

For Sun Solaris, Java Runtime Environment Version 5 Update 7 may be downloadedfrom


ENOVIA DMU prerequisites for the license management environment

• Windows workstations must have an active LAN card (Ethernet or token ring)and TCP/IP installed and properly configured, but there is no requirement for theworkstations to be connected to the network.

• No additional software is required when accessing nodelock licenses.

• IBM License Use Management (LUM) is required to serve concurrent licensesacross a network. A LUM configuration file (i4ls.ini) is required on ENOVIA - DMUclients to access concurrent licenses from these servers.

• ENOVIA VPLM add-on product (AOP) and shareable products may require licensekeys for prerequisite products that are not already included in a standardconfiguration. Prerequisites for shareable products can be satisfied by a standardconfiguration, by an AOP within a custom configuration, or by a shareable product.

However, because all add-on products are defined within one custom license key,any AOP prerequisites must be satisfied by either a standard configuration or byother AOPs purchased and defined within the same custom configuration.

• There is no limit to the number of ENOVIA DMU processes launched for a givenlicense key (configuration or product). For instance, a user can launch thefollowing simultaneous processes:

– A Version 5 interactive session

– A Version 5 process executed through an OLE container application

– Replay of macros recorded from captured sequences of Version 5 userinteractions

• IBM LUM level - IBM LUM at a minimum level 4.6.8.3 is required.

LUM 4.6.8 with Patch 4.6.8.3 is shipped with ENOVIA VPLM. Various release levelsof LUM may be downloaded, at no charge, from

http://www-01.ibm.com/software/awdtools/lum/support.html

ENOVIA DMU macro replay capabilities

ENOVIA DMU products have built-in macro record and replay: For UNIX, theinterpreter is VisualBasic (VB) Script 3.0 from Mainsoft. It is included in ENOVIADMU products as shared libraries.

For Windows, the interpreter is either:







• VB Script 5.0, or later, delivered with Microsoft Internet Explorer. VB Scriptlibraries at level 5.0.0.3715 are delivered with Internet Explorer 5.0, or later,with later versions of Internet Explorer. Use of VB Script is recommended fordeveloping Windows/UNIX compatible macros.

• Microsoft VisualBasic for Applications (VBA) 6.0, or later. VBA is delivered andinstalled by default with ENOVIA DMU.

ENOVIA DMU printer and plotter support in a UNIX environment

ENOVIA DMU products provide support for main plotter/printer languages:

• CGM-ISO, ATA, CALS

• OCE Graphics GPR50: VDF Plotting routines

• PostScript®

ENOVIA DMU printer and plotter support in a Windows environment

Support of printers and plotters on Windows is performed through the availability,for the targeted printers/plotters, of the corresponding vendors' drivers, compatiblewith the targeted version of the operating system. Contact the appropriate printer/plotter vendor for support.

Batch monitoring using WebSphere MQ (formally known as MQSeries®)

Using WebSphere MQ communication tools, some batch operations can now belaunched remotely. When implemented at the batch level, this optional featurerequires:

• WebSphere MQ V6.0. For information about availability, visit

http://www.ibm.com/software/integration/wmq• WebSphere MQ client -- Required on systems where the transaction is initiated.

WebSphere MQ server is required on systems where remote batches are executed.

ENOVIA DMU software installation

• On Windows, installing and uninstalling rely on Windows-compliant tools suchas InstallShield, which enables anyone familiar with Windows procedures andconcepts to install the software.

• The concepts, procedures, and look and feel of installation procedures forWindows are carried over to the UNIX environment to give a common ENOVIA -DMU products interface for all supported operating systems.

• Installation procedures feature:

– Easy and fast installation: Any user can install and execute the product with alimited number of interactions.

– Reduced user environment: When installed, a product requires customization.

– Customizable installation: The user can select downloaded products.

ENOVIA 3d com client software requirements

Common client software requirements

Java-enabled Web browser on the client machines

• Windows

Microsoft Internet Explorer 7.0 or Mozilla 1.7 on Windows with Java plug-in V6.0update 2 available under the JDK/JRE 6.0 section at

http://java.sun.com/products/archive/index.html• AIX

For Mozilla 1.7, the recommended plug-in on AIX, is Java 1.5.0 SR3, which isavailable at

http://www.ibm.com/software/integration/wmq




http://www-106.ibm.com/developerworks/java/jdk/aix/service.html• Solaris

Use Mozilla Firefox 2.0 browser, which is available at


On Sun Solaris, AIX, and Windows, for classic ENOVIA 3d com, the Java RuntimeEnvironment at level 1.5 (or 5.0) is required for ENOVIA 3d com Classic. JavaRuntime Environment can be downloaded from

• Sun Solaris


http://www-106.ibm.com/developerworks/java/jdk/aix/service.html• Windows


Dynamic conversion to virtual reality modeling language (VRML) does not requireany additional software.

• If no plug-in is available to display the converted data, the browser will propose tostore the data with the extension .wrl on the client.

• If a VRML plug-in is available, it is automatically invoked for viewing andmanipulation.

For interoperability between a CATIA V5 session and a VPM database, usinga ENOVIA 3d com DB2 client or Oracle client, refer to the appropriate VPMannouncement for specific supported relational database management system(RDBMS) release levels.

Platform-specific software requirements

UNIX

Operating system requirements for clients on UNIX machines are the same as thosestated in the ENOVIA V5 VPM server software requirements in this section.

Windows XP

Microsoft Windows XP SP2 with the following components:

• Microsoft Windows XP delivers an implementation of OpenGL libraries. DassaultSystemes will provide recommendations related to driver levels based on certifiedconfigurations at


These drivers may offer a CATIA V5 application setting. If available, the usershould select this setting (from Display Properties screen on Microsoft WindowsXP Control Panel) so that any application-specific features can be used. The usercan update these libraries depending on the graphics adapter selected when heinstalled the adapter and associated drivers.

• A localized version of the operating system may be required when the selectedinstallation locale differs from Latin1.



http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx• MSI Installer 3.1 : Windows Installer 3.1 v2 (3.1.4000.2435) available at












• Windows XP Professional x64 Edition (refer to the following section for description)

Windows XP Professional x64 edition for V5 32-bit




The following set of patches are required when running 32-bit applications on x64environment:

• KB903648: When using macro and VBScript features, Version 5 may crash whenaccessing more than 2 GB of address space. A Microsoft patch is available tocorrect this problem. To see Microsoft Article KB903648, visit

http://support.microsoft.com/default.aspx?scid=kb;en-us;903648• KB911021: Required for applications allowing more than 2 GB of address space.

Contact your Microsoft support representative.

ENOVIA 3d com server software requirements

Information in this section describes requirements specific to each supportedoperating system on ENOVIA 3d com servers.

Windows 2003

Windows Server 2003 Standard Edition or Windows Server 2003 Enterprise Edition isrequired with Service Pack 1.

• Microsoft Windows 2003 delivers an implementation of OpenGL libraries. Theselibraries may be updated depending on the selected graphics adapter when theuser installs the graphics adapter and associated drivers.

• DirectX at minimum level 8.1 is required for correct operation of ENOVIA 3d comServer in a multi-user environment. It is available from

http://www.microsoft.com/downloads/• A localized version of the operating system may be required when the selected

installation locale differs from Latin1.

AIX

Base support:



• Common Desktop Environment (CDE), delivered with the operating system

• XL C/C++ Enterprise Edition V7.0.0 Run-time Environment: XL 7 May 2005 PTF R/T (xlC.aix50.rte at level 7.0.0.6), delivered through APAR IY71976

• XL Fortran Enterprise Edition V9.1.0 for AIX Run-Time: November 2004 XL Fortranfor AIX V9.1 Runtime PTF

Base support is available at


Additional support includes:



• CDE, delivered with the operating system




http://www.microsoft.com/downloads/







– Firmware Version: AT061_061, or later



– Support of GXT4500P requires the following patch to be applied: IY80526:CATIA V4 Hangs on GXT4500P when rotating a model.

WebSphere Application Server V6.1 and WebSphere Portal Server support orIBM IntelliStation P185 support requires AIX 6.1 with respect to previously describedrecommendations.

Sun Solaris

Sun Solaris 10 SPARC HW 03/05, including:

• C and C++ runtime environment (delivered with the operating system).

• OpenGL 1.3 runtime environment (delivered with the operating system).

• Fortran runtime environment (delivered with the operating system).

• A localized version of the operating system may be required when the selectedinstallation locale differs from ISO-1.


• WebSphere Application Server V6.1 is currently supported.

Notes

• WebSphere Application Server 6.0.2 is currently supported on Solaris 32.

• Current support for Solaris Runtime on SPARC system is Solaris 10.03/05 (on 32-bit only).

Additional ENOVIA 3d com server software requirements

The following components are required or optional on ENOVIA 3d com servers for allsupported operating systems:

HTTP server

• ENOVIA 3d com Classic requires an HTTP server (not delivered with the ENOVIA3d com products) on the server machine. The user will need to configure it afterthe ENOVIA 3d com installation.

• ENOVIA 3d com Classic supports the following HTTP servers:

– Apache Server

– IBM HTTP Server

– Microsoft Internet Information Services

– Incidents specific to other servers will not be eligible for support.

ORBIX

ORBIX (supplied with ENOVIA 3d com Navigator) enables Internet interoperabilityobject protocol (IIOP) based, CORBA-compliant communications on the server side.





Java virtual machine (classic and modular 3d com)

• A Java Runtime Environment is required for the Workbook server at the followinglevel:

– Windows: Sun, Java Runtime Environment Version 5 Update 7 may bedownloaded from

http://java.sun.com/products/archive/index.html– AIX: Java Runtime Environment version Java 1.5.0 SR3 can be downloaded

from

http://www-106.ibm.com/developerworks/java/jdk/aix/service.html– Sun Solaris: Java Runtime Environment Version 5 Update 7 may be downloaded

from


Workbook can be managed through a WebSphere Application Server.

WebSphere Portal (ENOVIA 3d com Web Navigator and ENOVIA - VPMLifecycle Navigator)

On AIX and Windows, WebSphere Portal Server V5.1.0.2 on WebSphere ApplicationServer V6.0.2 can be used with the new File Explorer and the ENOVIA 3d com WebNavigator and ENOVIA - VPM Lifecycle Navigator portlets. For more informationabout WebSphere Portal, visit

http://www.ibm.com/websphere/portal

To use the Sametime® collaboration capabilities, Lotus® Instant Messaging andWeb Conferencing V7.5.1 is required.

ENOVIA 3d com prerequisites for the license management environment

• "Nodelock" license keys are not allowed with ENOVIA 3d com. LUM is required toserve concurrent license keys across a network. A LUM configuration file (i4ls.ini)is required on clients to access concurrent license keys from these servers.

Note: Concurrent offline licensing is not supported.




Optional ENOVIA 3d com server requirements

For CATIA V5

• CATIA V5 server code is included on the ENOVIA 3d com CD-ROM and installed bydefault. To use ENOVIA 3d com in conjunction with CATIA V5, the user must installENOVIA 3d com with the ENOVIA 3d com Navigator or with ENOVIA 3d com CADViewing configuration.

• The ENOVIA 3d com Navigator and CAD Viewing configurations include a Version 5server that supports reading and visualizing of CATIA 3D data created at any levelup to and including CATIA V5.12 and CATIA V4.2.4.1.

Notes

• MultiCAx plug-ins (ProEngineer, Unigraphics, and I-deas) must be installed on theserver side when multi-CAD support is required.

• ENOVIAVPM (for installation using ENOVIA - MultiPDM CDM/VPM Plug-in) requiresENOVIAVPM V1.6.




http://www.ibm.com/websphere/portal




Requirements for using instant collaboration capabilities with ENOVIA 3dcom

• Sametime Server: 7.5.1

• Server operating system: Refer to Sametime release Note

• Client operating system: Windows, AIX V6.1, Solaris 10

Using ENOVIAVPM V1.6 with ENOVIA VPLM V5.20 or CATIA V5.20 products

ENOVIAVPM V1.6 customers who plan to interoperate with the V5.20 family ofENOVIA VPLM or CATIA products must install an ENOVIAVPM program temporary fix(PTF) to obtain the required interoperability level. (V5.20 service pack may also berequired.)

The required PTF could vary, depending on whether the base level of the V5.20product is being used, or a subsequent service pack level. Check the V5.20documentation for interoperability information, or contact IBM Support for specificdetails, or visit

http://www.ibm.com/software/applications/plm/support

Select Fixes, tools on the left side.

ENOVIA V5 VPM Enterprise Process Definition (E-PD) support

This product is supported on Windows XP only.

ENOVIA V5 VPM client software requirements

Common client software requirements

For ENOVIA VPM Product Editor and ENOVIA V5 VPM: Java Runtime environment,V1.5 is required (refer to the respective Program Directories for further details.)

For Web-client ENOVIA V5 VPM (ENOVIA - VPM Navigator): The following Java-enabled Web-browsers on the client machines are supported:

• Windows

– Microsoft Internet Explorer 7.0, or later, on Windows with Java plug-in 1.5.0_07available at

http://java.sun.com/products/archive/index.html– Mozilla 1.7 with Java plug-in 1.5.0_07 available at


Java Runtime Environment Version Java 1.5.0 SR3 can be downloaded from

http://www-106.ibm.com/developerworks/java/jdk/aix/service.html• Sun Solaris

Use Mozilla Firefox 2.0 browser, which is available at


Use Mozilla Firefox 2.0 browser with Java Runtime Environment Version 5 Update7, which may be downloaded from


http://www.ibm.com/software/applications/plm/support








Platform-specific client software requirements

UNIX

Operating system requirements for clients on UNIX machines are the same as thosestated in the ENOVIA V5 VPM server software requirements section.

Windows XP

Microsoft Windows XP Professional SP2 with the following components:

• Microsoft Windows XP delivers an implementation of OpenGL libraries. DassaultSystemes will offer recommendations related to driver levels based on certifiedconfigurations at


These drivers may offer a CATIA Version 5 application setting (see Control Panel,Display Properties), which should be selected when available, as they may containapplication-specific features. The user can update these libraries depending on thegraphics adapter selected when he installed the adapter and associated drivers.

• A localized version of the operating system may be required when the selectedinstallation locale differs from Latin1.



http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx• MSI Installer 3.1 : Windows Installer 3.1 v2 (3.1.4000.2435) available at

http://support.microsoft.com/kb/893803• Windows XP Professional x64 Edition (refer to the following section for description)

Windows XP Professional x64 edition for V5 32-bit

• Minimum level required: Windows XP Professional x64 Edition.



These drivers may offer a CATIA V5 application setting (see Control Panel, DisplayProperties tabs), which should be selected when available, as they may containapplication-specific features.

• Although the V5 products are 32-bit applications, they can allocate up to 4 GB ofmemory when running on this operating system.

• The following set of patches are required when running 32-bit applications on x64environment:

– KB903648: When using macro and VB Script features, V5 may crash whenaccessing more than 2 GB of address space. A Microsoft patch is available tocorrect this problem. To see Microsoft Article KB903648, visit

http://support.microsoft.com/default.aspx?scid=kb;en-us;903648– KB911021: Required for applications allowing more than 2 GB of address space.

Contact your Microsoft support representative.

ENOVIA V5 VPM server software requirements

Common server software requirements

Java Runtime Environment V1.5.0 (5.0) is required.

• Sun Solaris









http://www-106.ibm.com/developerworks/java/jdk/aix/service.html• Windows


Database Management System (DBMS) requirements

ENOVIA VPLM data persistency is independent of a specific implementation. Itsupports:

• ENOVIA V5 VPM requirement on DB2

When running on Windows, AIX 6.1, or Sun Solaris 10, IBM DB2 UDB ClientVersion DB2 V9.5 Fix Pack 3a.

• ENOVIA VPM requirement on ORACLE

Oracle 10.2.0.2 client-connection modules are required when running onWindows, AIX, and Sun.

Contact the local IBM or Oracle representative for planning and support informationabout DB2 or Oracle.

Notes

• DB2 UDB Enterprise Edition V9.5 Fix Pack 3a is shipped with ENOVIA V5 VPMV5.20.

• Further DB2 or Oracle fixpack requirements, if any, will be documented in programdirectories.

• Contact the local IBM or Oracle representative for planning and supportinformation about DB2 or Oracle.

ENOVIA VPM Lifecycle Navigator V5 32-bit on Windows XP Professional x64edition




Platform-specific server software requirements

Information in this section describes requirements specific to each supportedoperating system on ENOVIA V5 VPM servers.

Microsoft Windows

• Microsoft Windows Server 2003 Standard Edition or Windows Server 2003Enterprise Edition is required with Service Pack 1.

• Microsoft Windows delivers an implementation of OpenGL libraries. These librariesmay be updated depending on the selected graphics adapter when installing thegraphics adapter and associated drivers.

• DirectX at minimum level 8.1 -- Required for correct operation of ENOVIA V5 VPMserver in a multi-user environment. Available from


Also available with Windows XP Service Pack 1.

• A localized version of the operating system may be required when the selectedlocal installation differs from Latin1.








AIX


• XL C/C++ Enterprise Edition V7.0.0 Run-time Environment: XL 7 May 2005 PTF R/T (xlC.aix50.rte at level 7.0.0.6), delivered through APAR IY71976

• XL Fortran Enterprise Edition V9.1.0 for AIX Run-Time: November 2004 XL Fortranfor AIX V9.1 Runtime PTF, available at


Additional support:



• CDE, delivered with the operating system





– Firmware Version: AT061_061, or later



– Support of GXT4500P requires the following patch to be applied: IY80526:CATIA V4 hangs on GXT4500P when rotating a model.

WebSphere Application Server V6.1 and WebSphere Portal Server support orIBM IntelliStation P185 support requires AIX V6.1 with above recommendations.

Sun Solaris

Sun Solaris 10 SPARC HW 03/05, including:

• C and C++ runtime environment -- Delivered with the operating system.

• OpenGL runtime environment -- Delivered with the operating system.

• CDE -- Delivered with the operating system.


Support of the XVR 600 graphic adapter requires OpenGL runtime environment atlevel 1.3.

Note: A localized version of the operating system may be required when theselected installation locale differs from ISO-1.

Additional software requirements on the server side

The following components are required or optional on thin client (ENOVIA - VPMLifecycle Navigator) servers for all supported operating systems. It is also requiredfor VPM Navigator customers who implement ENOVIA - VPM Navigator InstantCollaboration.

WebSphere Application Server

• Implementing ENOVIA VPM Lifecycle Navigator requires WebSphere ApplicationServer (refer to ENOVIA VPM Lifecycle Program Directories for detailedinformation on ENOVIA VPM Lifecycle Navigator implementation).






Note: ENOVIA VPM Lifecycle Navigator products installed on the WebSphereApplication Server are supported on AIX and Windows 2003 server.

• ENOVIA VPM Lifecycle application server and the Web Application Server may runon different machines and are installed separately. This Web Application Serverrequires:

– IBM WebSphere Application Server Express, Base or Network DeploymentV6.0.2 is the recommended level.

– An HTTP server, supported by the selected WebSphere Application Serverversion. The following servers are supported:

-- Apache Server

-- IBM HTTP Server

-- Microsoft Internet Information Services

Incidents specific to other servers will not be eligible for support.

LDAP: In the case that ENOVIA VPM Lifecycle Navigator Web Application Servermanages SSO, an LDAP directory server supported by the selected WebSphereApplication Server version is required in addition to the above middlewarerequirements.

ORBIX: The ORBIX 3.0.1 product (supplied with ENOVIA VPM Lifecycle Navigator) isused and enables IIOP-based, CORBA-compliant communications on the server side.

Lotus Sametime: For customers deploying ENOVIA - VPM Navigator InstantCollaboration and ENOVIA 3d com Instant Collaboration, Lotus Sametime ServerV7.5.1 is required in addition to the above middleware requirements.

MQ: For customers deploying ENOVIA - Enterprise Process Management Web (E-PM) and ENOVIA - Enterprise Process Definition Web (E-PD), the following MQapplications are required in addition to the above middleware requirements:

• Message-oriented middleware: WebSphere MQ V6.0

• Workflow engine: WebSphere MQ Workflow V3.6

Additional ENOVIA V5 VPM requirements

Access to product information (ENOVIA V5 VPM)

Product documentation is delivered in HTML format. An HTML browser is required toaccess this documentation. Product documentation may be installed and used only inan officially supported operating environment.

• On Windows, Microsoft Internet Explorer 6.0, or later, with Java plug-ins at level1.5.

• On UNIX, except Windows, Mozilla 1.7 with Java plug-ins at level 1.5 (the Javalevel is available in the program directories)

Although other HTML browsers might provide access to the online documentation,browsers other than those mentioned above are not eligible for support should therebe problems with them.

In addition to a Java-enabled Web browser, a Java plug-in at level 1.4 is required onthe client side.

Note: Improvements in HTML searching and printing capabilities eliminate the needto duplicate product information in the PDF format. PDF CDs are therefore no longerincluded in the ENOVIA VPLM softcopy collection kit.



Prerequisites for the ENOVIA V5 VPM license management environment

• Nodelock license keys are not allowed with ENOVIA V5 VPM. IBM LUM is requiredto serve concurrent license keys across a network. A LUM configuration file(i4ls.ini) is required on clients to access concurrent license keys from licenseservers.

Note: Concurrent offline licensing is not supported.




Documentation

Complete online documentation is available on CD. Totally Web-oriented usingstandard HTML and graphics formats, online documentation is readily accessibleusing a standard Web browser. Navigation help includes the ability to do full textsearch.

Documentation is also available in PDF. Printing and browsing requires Adobe®Acrobat Reader V5.0, or later. To download, visit

http://www.adobe.com/

License Management Model

ENOVIA V5 VPM delivers identical license management mechanisms in UNIX andWindows environments, based on LUM and on the UNIX license management server,shareable across UNIX and Window clients. The following license managementprinciples apply:

• A license key is required to use an ENOVIA V5 VPM configuration or product.

• License keys are acquired and released for the total configuration. The productswithin a standard or custom configuration cannot be broken up or shared outsideof it.

• In all cases, license keys are acquired at the beginning of the process (login) andreleased at its termination (logout).

ENOVIA V5 VPM products and configurations are licensed on a concurrent usagebasis.

ENOVIA VPLM General Licensing Principles

ENOVIA VPLM AOP and sharable products may require prerequisite products thatare not included in a standard purchased configuration. When a prerequisiteproduct is not included in the selected standard configuration, both the AOP andits prerequisite products must be purchased and included as AOPs within a customconfiguration.

Prerequisites for shareable products can be satisfied by a standard configuration, byan AOP within a custom configuration, or by a shareable product.


http://www.adobe.com/



Planning information

Packaging

ENOVIA VPLM packaging

Note: The ENOVIA VPLM API CDs are shipped with CAA RADE as LCD4-7422.

ENOVIA 3d com / ENOVIA DMU box kit (LK4T-0077)

• Five code CDs (in one cardboard CD holder) for ENOVIA 3d com (LCD4-4242)containing:

– AIX (2 CDs)

– Solaris (2 CDs)

– Windows

• Six code CDs (in one cardboard CD holder) for ENOVIA DMU (LCD4-4676)containing:

– AIX

– AIX 64-bit

– Solaris (2 CDs)

– Windows

– Windows 64-bit

• One Program Directory CD (LCD7-3619)

• One LUM Run Time V4.6.8 + patch 4.6.8.3 CD (LCD4-7882)

• English Documentation: 2 CDs (in a double jewel case; SK3T-5188)

– ENOVIA 3d com V5R20 English Documentation CD

– ENOVIA DMU V5R20 English Documentation CD

• Informal documents

– PLM Products Current User Memorandum (GI11-4403)

– PLM Products Software Registration Memorandum (GI11-4404)

The following are shipped outside the box kit:

• Licensed Program Specifications (GI11-6293)

• Six CDs (in a one portfolio CD holder) for ENOVIA MULTICAx products(LCD4-7456)

– AIX

– AIX 64-bit

– Solaris

– Windows

– Windows 64-bit

– Program directory

ENOVIA V5 VPM box kit (LK4T-0078)

Each shipment of ENOVIA V5 VPM includes:

• Seven code CDs (in one cardboard CD holder) for ENOVIA V5 VPM (LCD4-7617)containing:

– AIX (2 CDs)

– AIX 64-bit

– Solaris (2 CDs)

– Windows

– Windows 64-bit



• One Program Directory CD (LCD7-3619)

• One LUM Run Time V4.6.8 + patch 4.6.8.3 CD (LCD4-7882)

• English Documentation: One CD (in a single jewel case; SK3T-7835)

– ENOVIA V5 VPM English Documentation CD




The following are shipped outside the box kit:


• DB2 V9.5 FP3a code CDs (LCD7-3667) -- 2 DVDs in a double jewel case

ENOVIA CES

• Eight code CDs in a plastic CD holder (LCD7-2700) containing:

– Program Directory

– AIX (2 CDs)

– Solaris (2 CDs)

– Windows (2 CDs)

– English online documentation

• One LUM Run Time V4.6.8 + patch 4.6.8.3 CD in trim pack (LCD4-7885)





Security, auditability, and control

The announced programs use the security and auditability features of the operatingsystems software. The customer is responsible for evaluation, selection, andimplementation of security features, administrative procedures, and appropriatecontrols in application systems and communication facilities.

Ordering information

Current licensees

Current licensees will receive a program reorder form that can be returned directlyto IBM CSO SW Asset Fulfillment. Reorder forms will be mailed within two weeks ofthe planned availability date. Reorder forms returned to IBM CSO SW AssessmentFulfillment will be processed within 10 working days of receipt.

Should you require further assistance, contact your country IBM representative.

New licensees

Orders for new licenses will be accepted now. For new licensees, shipment willnot occur before the availability date. Should you require assistance, contact yourcountry IBM representative.

An order for ENOVIA VPLM V5 basic licensed programs consists of:

• A licensed standard configuration program order (5691-XXX, 5672-XXX)

• A licensed custom configuration (5691-XXX) with add-on products (5693-XXX)

• Optional licensed shareable product program order (5691-XXX, 5672-XXX)



• One system program order (SPO) (5628-XXX)

The 5691-XXX, 5672-XXX, and 5693-XXX orders are required for billing and assetregistration. The 5628-XXX order is required to ship machine-readable materials andpublications.

ENOVIA VPLM V5 is available only on CD-ROM.

Release summary

New product

ENOVIA - 3d com VPM Session Builder (V3S)

Product ordering using legacy systems

To order a standard configuration or shareable product, specify the:

• Configuration/shareable product program number

• Appropriate charge option (PLC with ALC or YLC)

• The user quantity

Note: The configurator will automatically add to your order:

• The appropriate billing feature numbers

• Feature number 9001 for asset registration

• The appropriate SPO information

To order a custom configuration, specify:

• The standard configuration program feature number

• The appropriate charge option (PLC with ALC or YLC)

• The user quantity

• The AOPs (applies to Process Detailing and Validation only)

Note: The configurator will automatically add to your order:

• The AOP indicator codes and AOP PIDs

• The appropriate billing feature numbers

• Feature number 9001 for asset registration

• The appropriate SPO information

Shareable product

5691-V3S ENOVIA V5 3d com VPM Session Builder Product

Charge Featureoption Description number

PLC V3S Prod L3PHALC V3S Prod L3PJYLC V3S Prod L3PK

Add-on product (AOP)



PLC V3S AOP B0MCALC V3S AOP B0MDYLC V3S AOP B0ME



Non-billable AOP indicator codes

5691-N3G ENOVIA-3d com Navigator Configuration


5693-V3S AOP Indicator 4485 Code

5691-V3C ENOVIA - 3d com VPM Web Client Configuration



The following information applies to the Greater China Group, India, Vietnam, andSri Lanka.

Shareable product



YMC V3S Prod L3PPPSC V3S Prod L3PMCOTC V3S Prod L3PNOTC V3S Prod L3PL

Add-on product (AOP)



YMC V3S AOP B0MJPSC V3S AOP B0MGCOTC V3S AOP B0MHOTC V3S AOP B0MF

Non-billable AOP indicator codes

5691-N3G ENOVIA-3d com Navigator Configuration





5691-V3C ENOVIA - 3d com VPM Web Client Configuration



Basic machine-readable material

System program orders (SPOs)

ENOVIA VPLM V5 programs for all platforms (UNIX and Microsoft Windows) areshipped under either the 5628-CS5, 5628-DMU, or 5628-LCA SPO. The SPO isrequired for all program shipments and future updates.

Initial orders placed for a program type 5691 without a corresponding order or MESfor the 5628-DMU SPO will either fail order validation or will not generate a mediashipment. Each customer number must have its own SPO.

New 5628-DMU program function codes

Note: There are no new program function codes this release.

New 5628-LCA program function codes

Note: There are no new program function codes this release.

Initial orders

When ordering the first configuration for ENOVIA VPLM V5, an order is automaticallygenerated for the correct corresponding SPO (5628-CS5, 5628-DMU, or 5628-LCA).Both the program order and the SPO must be for the same CPU system type/systemnumber and must have the same scheduled shipment date.

Subsequent orders

Note: The term configuration used here refers to configurations as well as ENOVIACES products that deliver media.

The SPO must have a feature number for every ENOVIA VPLM V5 configuration thatis installed or on-order. Therefore, when a configuration that was not previouslyinstalled is ordered, the SPO must be updated.

• To update an on-order system: When a license for a new 5691/5672 programis ordered for an on-order system, either the 5628-CS5, 5628-DMU, or 5628-LCA SPO must be updated to reflect the feature number of the licensed programdesired. Also, for asset registration and billing purposes, an order for theindividual licensed program type 5691 is required.

• To update an installed system: When a license for a new 5691/5672 programis ordered for an installed system, either the 5628-CS5, 5628-DMU, or 5628-LCA SPO must be updated to reflect the feature number of the licensed programdesired.

Media feature number

The feature number for all SPO media is 3410.

Customization options

Select the appropriate feature numbers to customize your order to specify thedelivery options desired. These features can be specified on the initial or MESorders, as indicated.

For example, if publications are not desired for the initial order, specify featurenumber 3470 to ship media only. For future updates, specify feature number 3480to ship media updates only. If, in the future, publication updates are required, order



an MES to remove feature number 3480; then the publications will ship with thenext release of the program.

Initial shipments

Feature Description 3444 Serial Number Only (suppresses media and publications) Does not apply to Japan. 3470 Ship Media Only (suppresses initial shipment of publications) 3471 Ship Documentation Only (suppresses initial shipment of media)

Update shipments

Feature Description 3480 Ship Media Updates Only (suppresses update shipment of publications) 3481 Ship Documentation Only (suppresses update shipment of media) 3482 Suppress Updates (suppresses update shipment of media and publications)

Expedite shipments

Feature Description 3445 Local IBM Office Expedite (fee charged to the branch office)

Expedite shipments will be processed to receive 72-hour delivery from the time IBMSoftware Delivery and Fulfillment (SDF) receives the order. SDF will then ship theorder via overnight air transportation.

One English softcopy collection kit is automatically included in all shipments.National language versions (NLVs) of the softcopy publications in French, German,Japanese, and Korean at the current release level will be available after generalavailability at no charge. Customers of record can order one additional kit usingproduct identifier (5628-XXX) and the features below:

FeaturePublication number

ENOVIA V5 Softcopy Collection Kit - English 7100ENOVIA V5 Softcopy Collection Kit - French 7101ENOVIA V5 Softcopy Collection Kit - German 7102ENOVIA V5 Softcopy Collection Kit - Japanese 7103 (ENOVIA 3d com / ENOVIA V5 VPM)ENOVIA V5 Softcopy Collection Kit - Korean 7105

By using the following form numbers, additional softcopy collection kits can beordered through the IBM Publication Ordering System

http://www.elink.ibmlink.ibm.com/public/applications/publications/ cgibin/pbi.cgi

ENOVIA V5 (ENOVIA 3d com / ENOVIA DMU)

http://www.elink.ibmlink.ibm.com/public/applications/publications/cgibin/pbi.cgi



Softcopy Collection Kit - English (SK3T-5188) ENOVIA V5 (ENOVIA 3d com / ENOVIA DMU) Softcopy Collection Kit - French (SK3T-0572) ENOVIA V5 (ENOVIA 3d com / ENOVIA DMU) Softcopy Collection Kit - German (SK3T-0573) ENOVIA V5 (ENOVIA 3d com / ENOVIA DMU) Softcopy Collection Kit - Japanese (SK3T-0574) ENOVIA V5 (ENOVIA 3d com only) Softcopy Collection Kit - Korean (SK24-0017) ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - English (SK3T-7835) ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - French (SK3T-0617) ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - German (SK3T-0616) ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - Japanese (SK3T-0615) ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - Korean (SK24-0016) ENOVIA CES Softcopy Collection Kit - English (SK4T-3623) ENOVIA CES Softcopy Collection Kit - French (SK4T-3624)

Terms and conditions

Agreement

IBM Customer Agreement

Designated machine

Not required

Variable charges apply

No

Location license applies

No

Use limitation applies

Yes, as implemented by the license management model described.

ENOVIA VPLM license management model

ENOVIA VPLM controls the number of concurrent users of a ENOVIA VPLMconfiguration or product, according to the number of license keys acquired for theconfiguration or product.

ENOVIA VPLM delivers identical license management mechanisms on UNIX andWindows environments, based on IBM LUM. The following license managementprinciples apply:

• An ENOVIA VPLM configuration (standard or custom) will require a license key.License keys for ENOVIA VPLM configurations are acquired and released for thetotal configuration. The products within a configuration cannot be shared.



• Each ENOVIA VPLM shareable product will require a license key, in addition to onefor the prerequisite configuration and any prerequisite product, if applicable.

• In all cases, ENOVIA VPLM configuration license keys are acquired at thebeginning of the process and are released at its termination.

• ENOVIA VPLM AOP and shareable products may require license keys forprerequisite products that are not already included in a standard configuration.Prerequisites for shareable products can be satisfied by a standard configuration,by an AOP within a custom configuration, or by a shareable product. However,because all AOPs are defined within one custom license key, any AOP prerequisitesmust be satisfied by either a standard configuration or by other AOPs purchasedand defined within the same custom configuration.

Additional licenses, features, or authorizations, as appropriate must be obtained toextend use levels.

Additional licenses or features, as appropriate, must be obtained to exceed usagelimits.

ENOVIA 3d com products and ENOVIA PPR Hub MultiPDM plug-ins licensing

All ENOVIA VPLM products are concurrent-user licensed in a manner similar tolicense use in CATIA V5. The license keys of ENOVIA 3d com configurations andshareable products are installed on the server and can be accessed by thin clients(no code is installed on clients). A license for one user gives one connection line.Any offline user is required to have a ENOVIA 3d com license access with which codecan be downloaded. Code should not be duplicated from a previous download.

When accessing other systems via ENOVIA 3d com products, you need to have alicense or required authorization on that system. For example, to work with data inENOVIA VPLM ENOVIAVPM, ENOVIAPM, or Optegra, a license for the correspondinguser role within those systems is needed. The ENOVIA 3D com Navigator and CADViewing configurations can have an optional corequisite loaded on the server forCAD access.

For CATIA V5, the required CAD server is included and installed by default. Whenused in conjunction with CATIA V4, you need to install CATIA COM license keys onthe server. One license of CATIA V4 COM authorizes 10 simultaneous connections.

Note: The ENOVIA 3d com Space Analysis product has an optional corequisite ofthe corresponding CATIA Space Product (5691-SPA) for CATIA V4 (with the same10:1 ratio of users per license). If data such as CAD models are to be loaded intothe authoring system such as CATIA V5, the corresponding product configurationand license must be available.

The ENOVIA 3d com Web Search (part of the ENOVIA PPR Navigator product)function can be installed on CPUs other than the server to which an authorizeduser connects. The user task uses the search function to go through its ENOVIA 3dcom Web Browser for the correct connection. Because of this capability, the searchfunction is restricted to users defined on the ENOVIA 3d com server. This restrictionapplies even if the search component is physically installed on a CPU other thanENOVIA 3d com Navigator server.

ENOVIA DMU products licensing principles

ENOVIA DMU Navigator Configuration licenses continue as already announced andin use within the ENOVIA VPLM Portfolio. Working under the CATIA V5 concurrent-user licensing scheme, ENOVIA DMU products use the same methods. This providesa consistent user seat designation across both CATIA V5 and ENOVIA VPLM.ENOVIA DMU products such as Kinematic Simulation or DMU Optimizer, licensed asshareable in CATIA V5, now also work and can be shared within the ENOVIA DMUenvironment.



ENOVIA PPR Hub MultiCAx plug-in licensing principles

All MultiCAx Plug-ins are licensed as concurrent-user shareable products availableto ENOVIA 3d com, CAD Viewing, and ENOVIA DMU users. Specifying a MultiCAxlicense in the profile enables the workstation to use the MultiCAx capabilities withinany simultaneous sessions on the same workstation (of ENOVIA 3d com Products,CAD Viewing, or ENOVIA DMU Products).

ENOVIA VPLM general licensing principles

ENOVIA VPLM AOP and sharable products may require prerequisite products thatare not included in a standard purchased configuration. When a prerequisiteproduct is not included in the selected standard configuration, both the AOP andits prerequisite products must be purchased and included as AOPs within a customconfiguration. Prerequisites for shareable products can be satisfied by a standardconfiguration, by an AOP within a custom configuration, or by a shareable product.

Use of DB2 UDB components:

ENOVIA V5 VPM V5.19 and ENOVIAVPM V1.6 are shipped with the DB2 UniversalDatabaseTM (DB2 UDB) program. (ENOVIA V5 VPM ships DB2; ENOVIA 3d comand ENOVIA DMU do not ship DB2.) You are authorized to use this DB2 UDB onlyin conjunction with and in support of the solution (as defined below), and areauthorized to install and use this DB2 UDB only in association with your licenseduse of the ENOVIA VPLM products for the storage and management of data used orgenerated by the solution and not for any other data management purposes. Onlyinbound and outbound data transactions in which the solution directly either creates,reads, updates, or deletes data are permitted.

Examples of uses not permitted include (1) inbound connections to the databasefrom other applications for queries or report generation, or (2) outbound databaseconnections in which the solution provides no added value to the data transaction.

The solution and DB2 UDB can be installed on either the same server or separateservers. In the case where DB2 UDB is installed on a separate server, the accesspoint to the DB2 UDB server must be solely through the solution server.

Solution is defined as any ENOVIA VPLM or ENOVIA SmarTeam program productother than those listed as follows:

• SmarTeam -- Development Suite, a component of the IBM program productSmarTeam -- Development Suite Configuration (5691-SDV)

• All CAA RADE products and APIs

Educational allowance available

No

Volume orders

Contact your IBM representative.

Warranty applies

Yes

Licensed program materials availability

Restricted Materials of IBM: No Non-Restricted Source Materials: None Object Code Only (OCO): All



Program services

Program Services offer a method of reporting code-related problems for ENOVIAVPLM licensed software products. Program Services are available electronically usingthe problem submission process at the PLM Technical Support Web site at

http://www.ibm.com/software/applications/plm/support/

Note: In order to use this facility, you must use an IBM ID that has associated to itthe licensed IBM customer number under which the product was purchased. If youhave not yet obtained an IBM ID, visit

http://www.ibm.com/account/profile/

If you have not yet associated the licensed IBM customer number to your IBM ID,you will be prompted to do so when accessing the problem submission facility.

When using Program Services, the problem report is submitted via the PLM TechnicalSupport Web site; all subsequent communications will be via e-mail. The responsetime for these problem reports, regardless of the severity, will be within twobusiness days. All communications must be in English.

Not all options of the Product Lifecycle Management (PLM) technical support e-services are available in all countries.

If the problem reported is not determined to be a code-related problem, thecustomer will be informed that work will continue on it provided the customerhas ECSR (Electronic Customer Support Representative) Enhanced Support. Foradditional information about the Enhanced Support contract and other available PLMservices offerings, visit


Click on the Support Offerings link under Buying and managing support orcontact your PLM marketing representative or authorized IBM Business Partner formore information.

Preventive Service is delivered through the next release of ENOVIA VPLM products.The new release also includes corrections to problems, depending on the time oftheir submission and their severity.

During the Program Services period, Corrective Service for ENOVIA VPLM releasesis delivered through service packs on a regular basis. A service pack includescorrections for Blocking Problems in production systems reported on this release andall corrections available for all components at the time it is built. Service packs areprovided at the same time for all platforms currently supported. Each service packsupersedes the previous one and may be installed on top of the released level or ontop of a previous service pack. (The exception is WLS products, where CorrectiveService is provided in the next release of the product. No maintenance for WLSproducts is provided in the service packs.)

Customers may request a correction via a service pack for blocking problems. Ablocking problem is defined as:

• A problem that stops production: The customer is currently using the level forwhich a fix is requested in a production environment.

• A problem that prevents migration: The customer must provide the migrationplan.

• A problem that halts testing of a given level: A fix will allow the customer tocontinue the testing.

• Installation problem: A problem that prevents the customer from installing orusing the product.

• Regression: Problems reported as regressions may be due to an operation thatwas being performed erroneously or created incorrect data with a previous releaseand the current release no longer permits these operations. Therefore, each


http://www.ibm.com/account/profile/




problem reported as a regression must be evaluated. True regressions will behandled as Severity 1 problems.

Note: Customers experiencing problems with DB2 UDB V9.5 delivered with theENOVIA V5 VPM product may report these problems through PLM product support,as long as DB2 UDB is being used in conjunction with ENOVIA V5 VPM and both theDB2 and ENOVIA V5 VPM products are still within their respective support periods.Customers will receive the same level of support as they are entitled to for theirENOVIA VPLM products.

Customers experiencing problems with IBM License Use Management (LUM)products when used with ENOVIA VPLM products may report these problemsthrough PLM product support. Note this only applies when the LUM product is beingused in conjunction with an ENOVIA VPLM product and the ENOVIA VPLM productis within its support period. LUM products are not included in the enhanced supportoffering; LUM problems will receive the Program Services level of support and mustbe submitted via the Problem Reporting process at the PLM Technical Support Website at


Program Services will be provided for this release of ENOVIA VPLM products (V5.20)until October 19, 2012. After that date, should it be necessary for customers whoare up-to-date on their Annual License Charge (ALC) payments to extend support, asupport extension will be available for an additional fee.

This extension is for one year only, with no possibility of renewal, and will be limitedto support of critical situations found in production running on an announced,supported environment and subject to the availability and maintainability ofoperating systems, databases, middleware, and hardware (clients and servers) atthe time the critical situation is reported. Critical situation means a Severity 1 defectthat is blocking production and has no workable alternative to unblock production.

In order to ensure uninterrupted support, support extension requests shouldbe submitted at least six months prior to the end of support date through thecustomer's marketing team or Business Partner.

This extension of support will not constitute an alternative to the customer'smigration to the latest release or version of the installed products and therefore thecustomer is obligated to have a documented and viable migration plan to the latestrelease or version in order to obtain an extension of support.

For a list of all currently supported releases of PLM products, visit


On the left under Choose your task select Planning, then on the subsequent pageunder Plan an upgrade, select PLM Software End of Support Dates.

Note that Product Lifecycle Management must be added to your list of products;otherwise, the PLM portlets will not be displayed.

IBM Operational Support Services - SupportLine

No

Other support

PLM Support Centers





Prices

PLC/ALC: Customers who pay a PLC and an ALC for a licensed program receiveenhancements and future releases, if any, at no additional charge. Significantnew functions may be offered as an optional feature and charged for separately.If a replacement program is announced and the customer elects to license thereplacement program for a PLC/ALC and replace the prior program, an upgradecharge may apply.

The first payment consists of the primary license charge and the annual licensecharge. The annual license charge applies yearly thereafter.

Use level charge: Charges for this program are based on usage levels. When acustomer upgrades to a higher level of usage, a usage upgrade charge will apply,equal to the difference between the charge for the current level of usage and thehigher level of usage.

For all local charges, contact your IBM representative.

IBM Global Financing

IBM Global Financing offers competitive financing to credit-qualified customers toassist them in acquiring IT solutions. Offerings include financing for IT acquisition,including hardware, software, and services, from both IBM and other manufacturersor vendors. Offerings (for all customer segments: small, medium, and largeenterprise), rates, terms, and availability can vary by country. Contact your localIBM Global Financing organization or visit

http://www.ibm.com/financing

IBM Global Financing offerings are provided through IBM Credit LLC in the UnitedStates, and other IBM subsidiaries and divisions worldwide to qualified commercialand government customers. Rates are based on a customer's credit rating, financingterms, offering type, equipment type, and options, and may vary by country. Otherrestrictions may apply. Rates and offerings are subject to change, extension, orwithdrawal without notice.

AP distribution

Country/Region Announced AP IOT ASEAN* Yes India/South Asia** Yes Australia Yes People's Republic of China Yes Hong Kong S.A.R. of the PRC Yes Macao S.A.R. of the PRC Yes Taiwan Yes Korea Yes New Zealand YesJapan IOT Japan Yes *Brunei Darussalam, Indonesia, Cambodia, Lao People's Democratic Republic, Malaysia, Philippines, Singapore, Thailand, Vietnam **Bangladesh, Bhutan, India, Sri Lanka, Maldives, Nepal, Afghanistan

Trademarks

http://www.ibm.com/financing



Microsoft, Windows and Windows NT are registered trademarks of MicrosoftCorporation in the United States, other countries, or both.

SmoothStart, POWER4, POWER5, POWER6 and DB2 Universal Database aretrademarks of IBM Corporation in the United States, other countries, or both.

AIX, DB2, IBM, POWER, PowerPC, RS/6000, WebSphere, IntelliStation, MQSeries,Sametime and Lotus are registered trademarks of IBM Corporation in the UnitedStates, other countries, or both.

UNIX is a registered trademark of The Open Group in the United States and othercountries.

Intel, Pentium and Xeon are registered trademarks of Intel Corporation or itssubsidiaries in the United States and other countries.

Java and all Java-based trademarks are trademarks of Sun Microsystems, Inc. in theUnited States, other countries, or both.

PostScript and Adobe are registered trademarks of Adobe Systems Incorporated inthe United States, and/or other countries.

Other company, product, and service names may be trademarks or service marks ofothers.

Terms of use

IBM products and services which are announced and available in your countrycan be ordered under the applicable standard agreements, terms, conditions,and prices in effect at the time. IBM reserves the right to modify or withdraw thisannouncement at any time without notice. This announcement is provided foryour information only. Reference to other products in this announcement does notnecessarily imply those products are announced, or intend to be announced, in yourcountry. Additional terms of use are located at

http://www.ibm.com/legal/us/en/

For the most current information regarding IBM products, consult your IBMrepresentative or reseller, or visit the IBM worldwide contacts page

http://www.ibm.com/planetwide/

http://www.ibm.com/legal/us/en/

http://www.ibm.com/planetwide/

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