Cold CMOS Electronics for the readout of very large LAr TPCs
description
Transcript of Cold CMOS Electronics for the readout of very large LAr TPCs
Gianluigi De Geronimo, Alessio D’Anadragora*, Shaorui Li, Neena Nambiar, Sergio Rescia, Emerson VernonHucheng Chen, Francesco Lanni, Don Makowiecki, Veljko Radeka, Craig Thorn, and Bo Yu
Brookhaven National Laboratory, NY, USA* University of L’Aquila, L’Aquila, Italy
Cold CMOS Electronicsfor the readout of
very large LAr TPCsCraig Thorn
On behalf of the LBNE LAr Working Group
TIPP 2011June 11, 2011
Outline• LAr40 overview• The Cold Electronics System• Analog Front End• ADC• Summary
Other presentations at TIPP 2011 describing LBNE LAr40:o [412] Membrane cryostat technology and prototyping program
towards kton scale Neutrino detectors, Rucinskio [422] Designs of Large Liquid Argon TPCs — from MicroBooNE to
LBNE LAr40, Yuo [223] Front End Readout Electronics of the MicroBooNE
Experiment, Chen
June 11, 2011 2TIPP 2011 – Cold Electronics
LBNE LArTPC inside Cryostats in Cavern
Membrane Cryostat
TPC Arrays
High Bay AccessTruss Lid for
CryostatIsolated Personnel
Access
Deep Underground Science & Engineering Lab(DUSEL) in Homestake, South Dakota, USA
LAr40 TPC2x20 killotonnes
June 11, 2011 3
Field Cage Bars
APA + CPA Assemblies form TPC modulesin the Cryostat
APA = Anode Plane Assembly
CPA = Cathode Plane
Assembly
APA CPARepeatRepeat
Unit CellTPM = TPC Module
= 1 APA + 1 CPA(+1 “terminal”
CPA)
Volume~ 0.5 x ICARUS
~2 xMicroBooNE
June 11, 2011 4
Anode Plane Assembly (APA): the core element of a TPC unit
APAs are structural and electrical units containing all
sense wires and readout
electronics. They can be tested in LN2 and stored
and transported in shipping
containers.
Cold Electronics
June 11, 2011
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TIPP 2011 – Cold Electronics
LAr TPC - Cold CMOS ElectronicsBlock Diagram – Reference Design
June 11, 2011 6TIPP 2011 – Cold Electronics
~ 7 mm
~ 5
mm
Layoutchg amp filter ac reg ADC cmp
pulser BGR, bias, temp. sens. reg control logic
mux
buffer• 16 channels• charge amplifier (adj. gain)• high-order filter (adj. time
constant)• ac/dc, adjustable baseline• test capacitor, channel mask• ADC (12-bit, 2 MS/s)• compression, discrimination• multiplexing and digital buffering• LV or CM digital interface• pulse generator, analog monitor• temperature sensor• LAr environment (> 20 years at
88K)• estimated total size ~ 6 x 8 mm²• estimated power ~ 10 mW/channel
dual-stage charge amplifier filter ac/dc
common register
channel registergain &mode bypasspeaking time &
mode
16 channels
mode
wire
mode & couplingtest
ADC12-bit, 2 MS/s
BGR, common bias, temp. sensor control logicpulse generator
compression muxdigital
interface(LV or CM)
CKCSDI
DO
AO
buffer
Block DiagramLAr TPC Front-End ASIC
• 16 channels• charge amplifier, high-order filter• adjustable gain: 4.7, 7.8, 14, 25 mV/fC (charge 55, 100, 180, 300 fC)• adjustable filter time constant (peaking time 0.5, 1, 2, 3 µs)• selectable collection/non-collection mode (baseline 200, 800 mV)• selectable dc/ac coupling (100µs)
dual-stage charge amplifier filter ac/dc
common register
channel registergain &mode bypasspeaking time &
mode
16 channels
mode
wire
mode & couplingtest
BGR, common bias, temp. sensordigital
interface
Block Diagram
analogoutputs
• rail-to-rail analog signal processing• band-gap referenced biasing• temperature sensor (~ 3mV/°C)• 136 registers with digital interface• 5.5 mW/channel (input MOSFET 3.9 mW)• single MOSFET test structures• ~ 15,000 MOSFETs• designed for room (300K) and cryogenic (77K)
operation• technology CMOS 0.18 µm, 1.8 V
6.0 mm
5.7 mm
Analog ASIC
June 11, 2011 8TIPP 2011 – Cold Electronics
Measurements affected by:• input line parasitic resistance
• ~ 150 e- at 77 K (~ 590 e- at 300K )• addressed in next revision
Layout Detail
Input MOSFETL = 270 nmW = 10 mm
(50µm x 200)gm,77K ≈ 90 mS (11 Ω)gm,300K ≈ 45 mS (22 Ω)
Input LineL ≈ 1 mm
W = 3.5 µm(M3 + M4)R77K ≈ 3 Ω
R300K ≈ 12 Ω
• CINdielectric noise (not present in wire)• ~ 60 e- at 77 K
MICAfore60
NPOfore200
tgkTC2dENC IN
0 1 2 3500
600
700
800
900
ENC
(elec
trons
r.m
.s.)
Peaking Time (µs)
Dielectric: MICA NP0
T=77KC
IN=220pF
0 1 2 30
200
400
600
800
1000
1200
1400
1600
1800
simulated input MOSFET
target at 90K
measured
simulated whole front-end
EN
C (e
lectro
ns r.
m.s.
)
Peaking Time (µs)
T=300K T=77K
CDET
=220pF
Noise Measurements
ASIC revision 2 designed and fabricated, currently being tested
Dynamic Range > 3,000
Qmax=300fC
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v1
v2
FEE ASIC Evaluation
FEE Test Stand for MicroBooNE is operational Full front end electronics chain, from CMOS ASIC to Receiver/ADC
board, data is acquired to PC through FPGA board and Gigabit Ethernet
One temporary 32 channel cold cable is available which has one broken channel
Without detector capacitance, noise is ~200e- with 1us peaking time
Nonlinearity and crosstalk are less than 0.5%
FEE test stand will be upgraded with the second version of ASICs and two prototype cold cables, more tests to follow
June 11, 2011 10TIPP 2011 – Cold Electronics
June 11, 2011 11TIPP 2011 – Cold Electronics
0.0 0.3 0.6 0.9 1.2 1.5 1.80
2
4
6
8
10CMOS018SIMULATED (foundry parameters)
LN RT
I D [m
A]
VDS
[V]
NMOS, L=0.18µm, W=10µm
0.0 0.3 0.6 0.9 1.2 1.5 1.80
2
4
6
8
10CMOS018
NMOS, L=0.18µm, W=10µm
MEASURED LN RT
I D [m
A]
VDS
[V]
Some differences in saturation voltage, sub-threshold slope, transconductance
IDvsVDS
IDvsVGS
0.0 0.3 0.6 0.9 1.2 1.5 1.810-5
10-4
10-3
10-2
10-1
100
101
CMOS018
SIMULATED(foundry parameters)
LN RT
ID
gm
I D [mA]
, gm [m
S]
VGS
[V]
NMOS, L=0.18µm, W=10µm
0.0 0.3 0.6 0.9 1.2 1.5 1.810-5
10-4
10-3
10-2
10-1
100
101
CMOS018
MEASURED
ID
gm
LN RT
I D [mA]
, gm [m
S]
VGS
[V]
NMOS, L=0.18µm, W=10µm
MOS Static Model
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-4 -2 0 2 4 6 8
0.0
0.2
0.4
0.6
0.8
Am
plitu
de [V
]
Time [µs]
T=300K T=77K
Gain 25 mV/fCPeaking time 1µs
Pole-zero cancellation at 77K to be addressed in next revision
K77atV164.1
K300atV185.1VBGR
Bandgap Reference
0 10 20 30 40 50
Am
plitu
de [a
.u.]
Time [µs]
Peak time [µs] 0.5 1.0 2.0 3.0
collecting mode
non-collecting mode
gain [mV/fC]25147.84.7Adjustable gain, peaking time and baseline
maximum charge 55, 100, 180, 300 fC
variation ≈ 1.8 %
K77atVm3.259K300atmV0.867
VTMP
Temperature Sensor
~ 2.86 mV / °K
Signal Measurements
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n p
e ne
logic
n p e ne
share
curr
ent s
ourc
e
shaped pulse (current signal I)
I v1
sa1
i1
sb1 dsc1
v2
sa2
i2
sb2 dsc2
vm-1
sam-1
im-1
sbm-1 dscm-1
d1 d2 dm-2 dm-1
V
Current mode ADC• dual stage6-MSBs in 150ns, 6-LSBs in 250ns• single trigger conversion per stage• 12-bit resolution• 2 MS/s conversion rate • power dissipation 3.6 mW at 2 MS/s• power-down option for low rate
applications• wake up in few tens of ns
• layout size: 0.23 mm x 1.25 mm
ADC cell
Clockless low power ADC stageDemonstrated in ASIC for SNS, see De Geronimo, et al., IEEE Trans NSS, 54
(2007) 541
ADC - Architecture
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• operation verified at room and cryogenic temperatures• differential non-linearity limited by timing design error in control circuit• integral non-linearity limited by mismatch (linear → common centroid)
ADC - Preliminary Results
ASIC revision being designed, to be fabricated in July
ADC output - 500mV dc
σ=1.1LSB
77 K
ADC output - 1.4 V sine
300 K16-channelADC+buffer
6mm
4.3 mm
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• CMOS performs better at cryogenic temperatures• Defined and predictable design for cryogenic T is possible• Low-noise at cryogenic T demonstrated
• ENC < 1,000 e- at 200pF ~5mW/ch.• characterization and modeling of CMOS 180nm
• Long lifetime at cryogenic T possible with guidelines• Critical building blocks - front-end & ADC - developed
• Future work• Improve cryogenic static models• Optimize ADC• Merge, add zero-suppression & buffering, and finalize
Conclusions and Future Work
June 11, 2011 16TIPP 2011 – Cold Electronics
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Backup Slides
LAr TPC - Cold CMOS ElectronicsBlock Diagram – Alernate Design
June 11, 2011 18TIPP 2011 – Cold Electronics
M4
200fF (mismatch σ < 0.25% (< 0.5% lot-to-lot)
M1 MP M2 M2xN2
MNto
shaper
frominput wire
M1xN1
C2 C2xN2C1 C1xN1
cal. pulse
M3
dis en
dual-stage charge amplifier
N1 = 20 N2 = 3, 5, 9, 16
CINJ = 180 fF nominalIntegrated injection capacitance (10 x 18 µm²)Disabled (grounded) when unused
K77atfF183
K300atfF184CINJ
Calibration Scheme
Measured with high-precision external capacitance change ~ 0.5%
• increases as the temperature decreases
J. Cressler et al.
• Degradation is due to impact ionization• charge trap in oxide, interface generation → shift in Vth and gm
Lifetime - Basic Mechanism
Commercial technologies are rated 10 years lifetime (10% gm shift) in continuousring oscillator operation: T = 300 K, L = Lmin, Vds = nominal VDD+5%, VGS≈ VDS/2)
• Substrate current is a monitor of impact ionization• increases with drain voltage• is higher in short channel devices• has a maximum at VGS≈ VDS/2
J. Cressler et al.
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Desired lifetimeat low temperature can be achieved by:1. decreasing VDS (e.g. decreasing
the supply voltage)
2. decreasing JD(i.e. decreasing the drain current density)
3. increasing L (i.e. non-minimum channel length devices)
J. Cressler et al.
Accelerated tests at cryogenic temperature are being performed to verify guidelines
Lifetime - Design Guidelines
analog circuits- operate devices at low current density- use non-minimum channel length L
Accelerated tests at increased VDSallow extrapolation of lifetime
digital circuits- operate devices at -10% of nom. VDD
- use non-minimum channel length L- operate at low clock frequency
Design guidelines can be obtained for:
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